rf iv waveform measurement and engineering

53
1 Centre for High Frequency Engineering School of Engineering Cardiff University RF IV Waveform Measurement and Engineering - Role in Transistor Characterization and Amplifier Design - Contact information Prof. Paul J Tasker – [email protected] website: www.engin.cf.ac.uk/chfe IEEE MTT-S Distinguished Microwave Lecturer 2008-2010

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1

Centre for High FrequencyEngineeringSchool of EngineeringCardiff University

RF IV Waveform Measurement and Engineering- Role in Transistor Characterization

and Amplifier Design -

Contact information

Prof. Paul J Tasker –[email protected]: www.engin.cf.ac.uk/chfe

IEEE MTT-S DistinguishedMicrowave Lecturer

2008-2010

2

RF Waveform Measurement and Engineering- powerful dynamic transistor characterization tool

Basic Concept– Use RF Waveform Measurement and Engineering Systems to investigated

both the transistors dynamic I-V (Current-Voltage) plane and its Q-V(Charge-Voltage) plane

Both qualitative and quantitative Alternatives: DC I-V, Pulsed I-V, bias dependent s-parameters

Applications Technology Evaluation

– Observe and quantify its dynamic large signal response

Technology Optimization– Link technology design to system performance

Technology Modelling– support the development of CAD tools

Circuit Design Tool– Support the development of Power Amplifiers

3

RF Waveform Measurement and Engineering- powerful dynamic transistor characterization tool

Transistor Characterization: Case Study– Use RF Waveform Measurement and Engineering Systems to investigated

general performance of Transistor Technology

Current Limits, Modes of Operation, RF Cooling

4

Transistor RF I-V Waveforms– Detailed Insight into Dynamic Behaviour Limitations

- 2 0 0-3

-1 0 0

-2

0

-1

100

0

200

1

2

3

5004003002001000

T im e (p s e c )

Gate C

urrent [mA

/mm

]

Gat

e V

olta

ge [V

]

Measure Input voltage and current waveforms– function of input drive level

Detailed Insight into DynamicBehaviour

– Gate Diode: Forward DiodeConduction and ReverseBreakdown

– Gate Capacitance

Relevant information for both– Device Engineer– PA Circuit Designer

AlGaAs/InGaAs HFET @ 4 GHz

5

Transistor RF I-V Waveforms– Detailed Insight into Dynamic Behaviour Limitations

Measure Output voltage and current waveforms– function of input drive level

Detailed Insight into DynamicBehaviour

– Drain Current Saturation: KneeRegion and Breakdown

– Gate-Drain Trans-capacitance

Relevant information for both– Device Engineer– PA Circuit Designer

AlGaAs/InGaAs HFET @ 4 GHz

5004003002001000

Tim e (psec)

10

8

6

4

2

0

600

500

400

300

200

100

0D

rain Current [m

A/m

m]D

rain

Vol

tage

[V]

6

Device Response Waveform Shapes

– Insight provided by eliminating time axes Effects of dynamic transfer characterisation

clearly observed DC/RF Dispersion

Effects of Delay/Trans-capacitance clearlyobserved

I-Q Extraction

@ 4.0 GHz

-3

-2

-1

0

1

Gat

e V

olt

age

[V]

5004003002001000

Time (psec)

500

400

300

200

100

0

Drain

Curren

t [mA

/mm

]Dynamic Transfer CharacteristicMeasurements

500

400

300

200

100

0

Dra

in C

urr

ent

[mA

/mm

]

-3 -2 -1 0 1

Gate Voltage [V]

Transistor RF I-V Waveforms– Detailed Insight into Dynamic Behaviour Limitations

7

Transistor RF I-V Waveforms– Detailed Insight into Dynamic Behaviour Limitations

Quadratic RF Breakdown Locus

Vgs = -1.1 Vds = 3.5

Vgs = -0.6 Vds = 5.5

DC I/VMeasured

Load Lines

800700

600500400300200100

0

Dra

in C

urre

nt [m

A/m

m]

15.012.510.07.55.02.50.0Drain Voltage [V]

Dynamic Breakdown in Low Noise AlGaAs/InGaAs HFET’s

Device Response Waveform Shapes

– Insight provided by eliminating time axes Effects of dynamic gate-drain breakdown

clearly observed

8

Transistor RF I-V Waveforms– Detailed Insight into Dynamic Behaviour Limitations

160

120

80

40

0

Coll

ecto

r C

urr

ent

[mA

]

1086420

Collector Voltage [volts]

RF Dynamic LoadLinesmeasured at 2 GHz

RF Cooling inHandset PAAlGaAs/InGaAs HBT’s

Device Response Waveform Shapes

– Insight provided by eliminating time axes Effects of dynamic RF cooling clearly

observed

– Linked with pulsed RF I-V technique

9

Performance UnderstandingReactive Non-Linearity's

-10

-5

0

5

10

Gat

e C

urre

nt I gs

[mA]

-8 -6 -4 -2 0 2Gate Voltage Vgs [V]

Input Characteristic

160

120

80

40

0Dra

in C

urre

nt I ds

[mA]

-8 -6 -4 -2 0 2Gate Voltage Vgs [V]

Transfer Characteristic

Technology

Waveform MeasurementPower Sweep @ 1.8 GHz

-10

-5

0

5

10

Gat

e C

urre

nt I d [m

A]

7205403601800Phase [°]

-8-6-4

-20

2 Gate Voltage Vgs [m

A]160

120

80

40

0Dra

in C

urre

nt I d [m

A]

7205403601800Phase [°]

16

12

8

4

0

Drain Voltage Vds [m

A]

Extraction State Functions I & QReactive strongly second order

-10

-5

0

5

10

Gat

e C

urre

nt I gs [m

A]

-8 -6 -4 -2 0 2Gate Voltage Vgs [V]

1.0

0.8

0.6

0.4

0.2

0.0

Gate C

apacitance [pF]

160

120

80

40

0Dra

in C

urre

nt I ds

[mA]

-8 -6 -4 -2 0 2Gate Voltage Vgs [V]

-1.0-0.8-0.6-0.4-0.2

0.0 Trans Capacitance [pF]

Measured RF I-V Waveforms– Unifying Analysis Tool

Performance EvaluationWeak AM-PM observed

30

20

10

0

Out

put p

ower

[dBm

]

2018161412108642Input Power [dBm]

-60

-40

-20

0

20

f0 2f0 3f0

18013590450

-45-90

Phas

e [d

eg]

2018161412108642Input Power [dBm]

174

172

170

168

166

f0 2f0 3f0

Performance

Performance UnderstandingReactive Non-Linearity's

-10

-5

0

5

10

Gat

e C

urre

nt I gs

[mA]

-8 -6 -4 -2 0 2Gate Voltage Vgs [V]

Input Characteristic

160

120

80

40

0Dra

in C

urre

nt I ds

[mA]

-8 -6 -4 -2 0 2Gate Voltage Vgs [V]

Transfer Characteristic

Technology

10GaAs HBT Performance as a function of Load Impedance

-30

-20-10

01.25

1.30

1.35

-30

-20

-10

0

10

20

-30

-20

-10

0

10

20

[dBm]

[dBm]

VBE [V]Pin [dBm]

Output Power versus Input Power and Base Bias Voltage

-30

-20

-10

01.25

1.30

1.35

0

10

20

30

40

50

0

10

20

30

40

50

[%]

[%]

VBE [V]Pin [dBm]

Efficiency versus Input Power and Base Bias Voltage

-30-20

-100

1.25

1.30

1.35

-35

-30

-25

-20

-15

-10

-5

-35

-30

-25

-20

-15

-10

-5

[dBc]

[dBc]

VBE [V]

Pin [dBm]

2nd Harmonic Output Power versus Input Power and Base Bias Voltage

-30-20

-100

1.25

1.30

1.35

-60

-50

-40

-30

-20

-60

-50

-40

-30

-20

[dBc]

[dBc]

VBE [V]

Pin [dBm]

3rd Harmonic Output Power versus Input Power and Base Bias Voltage

Experimental Emulatethe affect of varyingexternal parameters:In this case input drivelevel and input DCbias voltage

Note, have allinformation onmagnitude and phaseof all voltage andcurrent Fouriercomponents

Measured RF I-V Waveforms– General purpose Analysis Tool

11

RF Waveform Measurement and Engineering- powerful dynamic transistor characterization tool

Transistor Characterization: Case Study– Use RF Waveform Measurement and Engineering Systems to investigated

factor limiting the observed power performance of the emerging GaNTransistor Technology

Current Collapse, Knee Walkout, Poor Pinch-off

12

Approach: Drive the GaN transitor in tocompression while measuring RFOutput V & I Waveforms (840MHz)

Plot against one another to give theRF Load-line

Waveforms show compression at RFBoundaries differs from the DC

Boundaries, hence clearly identifyingsource of the problem: knee walkout or

current collapse

30

25

20

15

10Out

put V

olta

ge V

D [V

]

7205403601800Phase [deg]

120

80

40

0

Out

put C

urre

nt ID [m

A]

7205403601800Phase [deg]

250

200

150

100

50

0

Outp

ut C

urr

ent I D

[mA

]

4035302520151050Output Voltage VD [V]

Transistor Characterization: GaN Case Study- visualizing the DC-RF Dispersion Problem

Commonly observed that the RF Power Performance of the GaNtransistor was less than predicted (DC I-V & s-parameters)

13

Measured drain current with fundamental load-pull only– Complex load-lines are more difficult to interpret: cause concern in extracting boundaries

Measured drain current with 3-harmonic load-pull– Simple load-lines are easy to interpret: no ambiguity in extracting boundaries

For quantitative results make full use of waveform engineering, however,fundamental alone does provide for qualitative insight.

140

120

100

80

60

40

20

0

-20

I D [m

A]

7203600Phase [°]

140

120

100

80

60

40

20

0

I D [m

A]

7203600Phase [°]

160

140

120

100

80

60

40

20

0

Out

put C

urre

nt I

C [m

A]

50403020100Output Voltage V C [V]

Dynamic Load Lines

160

140

120

100

80

60

40

20

0

50403020100

Transistor Characterization: GaN Case Study- visualizing the DC-RF Dispersion Problem

14

• Investigate factors that influence the knee walkout or current collapseproblem: Quiescent Drain Bias Voltage

The Dynamic RF kneeboundary shifts as DC drain

bias increases

(10, 15 and 20V)

This limits achievablepower densities

250

200

150

100

50

0

Outp

ut C

urr

ent I D

[mA

]

4035302520151050Output Voltage VD [V]

Still unclear whether should relateproblem to knee walkout or current

collapse

Transistor Characterization: GaN Case Study- visualizing the DC-RF Dispersion Problem

15

800

600

400

200

0Out

put C

urre

nt [m

A/m

m]

403020100Output Voltage [V]

Use active load-pull to take a series ofmeasurements for increasing loadvalues on a 250um device: RF “Fan”Diagram @ 0.83 GHz

Small Load (almost a short) RL ≈ 5Ω

High Load (approaching an open)RL ≈ 1500Ω

RF “Fan Diagram”: GaN HFET Application- evaluation of trapping (“knee walkout”) problem

Harmonically rich waveforms

16

250

200

150

100

50

0

Outp

ut C

urr

ent ID

[mA

]

80757065605550454035302520151050Output Voltage VD [V]

RF “Fan Diagram”: GaN HFET Application- evaluation of trapping (“knee walkout”) problem

Repeat for a Range of Drain BiasValues to Observe Detailed Features

– Clearly identifies the problem: kneewalkout

– guide development of appropriatephysical models

– guide optimum use in circuitapplications

17

200

150

100

50

0Out

put C

urre

nt I D

[mA

]6050403020100

Output Voltage VD [V]

RF Dynamic Load Lines

DC Quiescent Bias Point

Comparison with pulsed I-V Measurements– Determine boundaries by simultaneously pulsing both gate and drain voltage (DIVA

System) from quiescent Class A bias point

Compressed current waveforms confirm thatthe device is in compression

16012080400

IG [m

A]

7006005004003002001000 Phase [。]

Clearly observe both predictvery similar “RF knee-walkout” as VD increases

Transistor Characterization: GaN Case Study- Class A RF I-V Waveforms versus Pulsed I-V

18

Comparison with pulsed I-V Measurements– Problem in this case is that the quiescent bias point is not on the DC I-V plane:

Where do we pulse from?

“RF knee-walkout” is sensitive tomode of operation

Transistor Characterization: GaN Case Study- Class B RF I-V Waveforms versus Pulsed I-V

150

100

50

0Out

put C

urre

nt I

D [

mA

]

706050403020100Output Voltage VD [V]

IV Bias Point

RF Self Bias Point

Same voltage VG bias point– poor agreement

150

100

50

0Outp

ut C

urr

ent I

D

[m

A]

706050403020100Output Voltage VD [V]

Bias Points

Same current ID bias point– good agreement

6

4

2

0

Max

Pow

er [W

/mm

]

403020100Drain Voltage Vd [V]

Theoretical Predicted Measured Class A Measured Class B Measured Class F

Best performance – tuned Class F, 5.5 W/mm, 70% efficiency

19

RF Waveform Measurement and Engineering- powerful dynamic transistor characterization tool

Transistor Characterization: Technology Evaluation andOptimization

– Poor Pinch-off very similar to knee walkout investigations

– Reliability and device stress: emerging area.

20

250

200

150

100

50

0

Outp

ut C

urr

ent I D

[mA

]

80706050403020100Output Voltage VD [V]

250

200

150

100

50

0

Outp

ut C

urr

ent I D

[mA

]

80706050403020100Output Voltage V

D [V]

Undesirable “Soft” Pinch-off Behaviour Improved Pinch-off Behaviour

Evaluate Different Buffer Layer Design (Level of Fe Doping)– Elimination of soft pinch-off– No significant effect at the Knee Region

RF “Fan Diagram”: GaN HFET Application- evaluation of buffer layer design (“soft pinch-off”)

Increased Fe

21

Transistor RF I-V Waveforms: GaN HFET Application– Detailed Insight into Dynamic stress/reliability Limitations

RF waveforms were periodically sampled 100 times during the 1.5hour RF stress period 1.8GHz Large-signal CW (≈ 3dB of gain compression), VD = 20V, Class A, Zf0 ≈ POUT

-20

-10

0

10

20

Input C

urr

ent IG

[m

A]

7006005004003002001000

Phase [°]

Initial Waveform

Final W aveform

-20

-10

0

10

20

Input C

urr

ent IG

[m

A]

-10 -8 -6 -4 -2 0 2 4Input Voltage VG [V]

Input Characteristics

Initial

Final

Dynamic Input Characteristics– Highlights the displacement current

through CGS– A small increase in leakage can be

seen at the breakdown end-8

-6

-4

-2

0

2

Input V

olta

ge V

G [V

]

7006005004003002001000

Phase [°]

22

Transistor RF I-V Waveforms: GaN HFET Application– Detailed Insight into Dynamic stress/reliability Limitations

Dynamic Load lines (overlaid on DC-IVs)– Useful for visualising DC-RF dispersion – a non-permanent

problem– Here the degradation is permanent suggesting a different

mechanism

300

250

200

150

100

50

0

Outp

ut C

urr

ent ID

[mA

]

403020100Output Voltage VD [V]

Initial Load Line

Pre-Stress Post-Stress

Final Load Line

250

200

150

100

50

0O

utp

ut C

urr

ent ID

[m

A]

-10 -8 -6 -4 -2 0 2 4Input Voltage VG [V]

Initial Transfer Characteristic

Final Transfer Characteristic

Dynamic Transfer Characteristics– Very little degradation until VG swings

above -3V– No change around VT ≈ -6V

23

RF Waveform Measurement and Engineering- powerful “real time” design tool

Basic Concept– Use RF Waveform Measurement and Engineering Systems to

investigated and achieve the required circuit/system performance. Key: Performance is theoretically defined in terms of the voltage

and/or current waveforms Alternatives: build and test, CAD tools (requires non-linear model)

Relevant Circuit Design Problem– Those that involve strongly non-linear (‘large signal”) device

operation, not weakly non-linear or linear operation Power Amplifier Design beyond Class A/AB Switching Amplifiers Frequency Multipliers/Dividers

24

Review PA Design Situation- too reliant on Build & Test

Vgs VdsDC Supply

RF Power Meter

ZS ZL

Design Approach Experimental Data Essential

– I-V, s-parameters, load-pull contours Design Knowledge: mode of operation, class A, AB,

– Efficiency Demands: Move to more complex modes B, F, E or switching modes Build, Evaluate and Adjust

– Bias point– Load and Source impedance @ fundamental (and harmonics)

High

Power

Low 0 100

Efficiency

25

Review PA Design Situation- incorporate Basic Principles: “Waveform Engineering”

Vgs VdsDC Supply

RF Power Meter

ZS ZL

Waveform Engineering

High

Power

Low 0 100

Efficiency

Cur

rent

Vol

tage

Cur

rent

Time Time Voltage

26Design Example: Class B Amplifier Emulation/Measurement

Efficiency increasedfrom 44% to 55%

“Class B Operation”

200

150

100

50

0Col

lect

or C

urre

nt [m

A]

121086420Collector Voltage [volts]

@ 2.0 GHz12

8

4

0

Col

lect

or V

olta

ge [V

]

10008006004002000

Time [psec]

200

150

100

50

0

Collector C

urrent [mA

]

HBT biased to operate in class B, low quiescent current• Current waveform is half rectified• Voltage waveform is not sinusoidal

12

8

4

0Col

lect

or V

olta

ge [V

]

10008006004002000Time [psec]

200

150

100

50

0

Collector C

urrent [mA

]

@ 2.0 GHz

Engineer harmonic impedances: Short second/third harmonic• Current waveform is half rectified• Voltage waveform is now sinusoidal

RF I-V Waveform Engineering- insight provided by having measured waveforms

27Design Example: Class F Amplifier Emulation/Measurement

Efficiency increasedfrom 44% to 65%

“Class F Operation”

200

150

100

50

0Col

lect

or C

urre

nt [m

A]

121086420Collector Voltage [volts]

12

8

4

0Col

lect

or V

olta

ge [V

]

10008006004002000Time [psec]

200

150

100

50

0

Collector C

urrent [mA

]

@ 2.0 GHz

RF I-V Waveform Engineering- insight provided by having measured waveforms

HBT biased to operate in class B, low quiescent current• Current waveform is half rectified• Voltage waveform is not sinusoidal

Engineer harmonic impedances: Short/open second/thirdharmonic

• Current waveform is half rectified• Voltage waveform is now a square wave

@ 2.0 GHz12

8

4

0Col

lect

or V

olta

ge [V

]

10008006004002000

Time [psec]

200

150

100

50

0

Collector C

urrent [mA

]

28

RF Waveform Measurement and Engineering- “on-line” direct utilization in amplifier design cycle

Waveform Data

EngineerWaveforms and

document desiredload impedances

Output Match

CADLayout Fabricate

Direct u

tiliza

tion

Direct u

tiliza

tion

of characteriz

ation

of characteriz

ation

systemsystem

in design loop

in design loop

Relevant Circuit Design Problems– Those that involve strongly non-linear

(‘large signal”) device operation. Power Amplifier Design beyond

Class A/AB Switching Amplifiers Frequency Multipliers/Dividers Etc.

29

RF Waveform Measurement and Engineering- powerful dynamic transistor amplifier design tool

Transistor Amplifier Design: Case Study– Use RF Waveform Measurement and Engineering Systems to investigated

how to realize in practice the theoretically predicted high efficiency modesof operation

Class B, Class F or their variants

30

Design of Highly Efficient RF Power Amplifier- requires engineer of voltage and current waveforms

Simple Theoretical Understanding

Practical solution

Transistorcharacteristics

CircuitBandwidth

Advanced Theoretical Understanding

V & I engineering100

80

60

40

20

0

-207006005004003002001000

76543210

Out

put C

urre

nt [m

A] Output Voltage [V]]

Phase

100

80

60

40

20

07006005004003002001000

76543210O

utpu

t Cur

rent

[mA]

Output Voltage [V]]

Phase

Designed in an intelligent manner a classF efficient RF Power Amplifier

Maximized Output Power Realized 75% PAE

Ready for realization

31

100

80

60

40

20

0

Outp

ut C

urr

ent ID

[m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

Outp

ut V

olta

ge V

D [V]

100

80

60

40

20

0

Outp

ut C

urr

ent ID

[m

A]

7006005004003002001000

Phase [°]

Ideal Class F occurs if the current and voltage waveforms are simultaneouslyengineered such that:

The currentwaveform

contains f0 andcorrect

proportions ofthe even

harmonics

The voltagewaveformcontains f0 andcorrectproportions ofthe oddharmonics

If this is achieved there is no overlap between the waveforms, resultingin no dissipated power and 100% efficiency.

Design of Highly Efficient RF Power Amplifier- review of theoretical understanding: Class F

32

• The achievable efficiency in a real design is constrained by ourability to correctly engineer the ideal waveforms.

• Circuit Bandwidth• In real PA designs harmonic control is commonly limited to 2f0 and 3f0 due to the

complexity of matching circuits.

• Following the analysis of Rhodes,* for a Class F design with harmonics only up to 3f0ideally terminated, the maximum achievable efficiency is limited to an upper limit of90.6% - assuming your matching network is lossless!

!

"current = iRF 2 # IDC( )

!

"voltage = vRF 2 #VDC( )

We can quantify the ability to engineer ideal waveforms by two factorsηcurrent and ηvoltage using the DC and fundamental RF components:

* J.D. Rhodes “Output universality in maximum efficiency linear power amplifiers”International Journal of Circuit Theory and Applications, volume 31, 2003, pp.385-405

Design of Highly Efficient RF Power Amplifier- review of practical constraints: System and Circuit Bandwidth

33

100

80

60

40

20

0

Curr

ent [m

A]

7006005004003002001000

Phase [°]

1.0

0.8

0.6

0.4

0.2

0.0

Voltage [

V]

6004002000

Phase [º]

1.0

0.8

0.6

0.4

0.2

0.0

Voltage [

V]

6004002000

Phase [º]

1.0

0.8

0.6

0.4

0.2

0.0

Voltage [

V]

6004002000

Phase [º]

90.60.8161.111F (3f0)

1000.9001.111F (Ideal)

78.50.7071.111B

500.7070.707A

η = ηcurrent x ηvoltage x 100 [%]ηvoltageηcurrentClass

100

80

60

40

20

0

Curr

ent [m

A]

6004002000

Phase [º]

Design of Highly Efficient RF Power Amplifier- review of practical constraints: System and Circuit Bandwidth

34

100

80

60

40

20

0

Ou

tpu

t C

urr

en

t ID

[mA

]

1086420Output Voltage V

D [V]

Imin

Vmin

Area of IV Plane available forconversion into RF power

• A further limitation on achievable efficiency in practical designs arises fromfeatures of real transistor characteristics which make a fraction of the dcdissipated power unavailable for conversion to RF power:

Achievableefficiency isscaled by theratio ofAvailable toUnavailableIV plane Area

Design of Highly Efficient RF Power Amplifier- review of practical constraints: Transistor Limitations

!

"current = iRF 2 # IDC( )

!

"voltage = vRF 2 #VDC( )

We can quantify the ability to engineer ideal waveforms by two factorsηcurrent and ηvoltage using the DC and fundamental RF components:

35

70

60

50

40

30

20

10

0

-10

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD [V

]

Ratio = 0.170

60

50

40

30

20

10

0

-10

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD [V

]

Ratio = 1

DC average

70

60

50

40

30

20

10

0

-10

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD [V

]

Ratio = 0.870

60

50

40

30

20

10

0

-10

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD [V

]

Ratio = 0.670

60

50

40

30

20

10

0

-10

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD [V

]

Ratio = 0.470

60

50

40

30

20

10

0

-10

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD [V

]

Ratio = 0.2

-j50

-j10

-j25 -j100

-j250

10 25 50 100 2500

j50

j10

j25 j100

j250

S21

Radius=1.0 S12

Radius=1.0

2f0 f0 = Ropt

-j50

-j10

-j25 -j100

-j250

10 25 50 100 2500

j50

j10

j25 j100

j250

S21

Radius=1.0 S12

Radius=1.0

2f0 f0 = Ropt

-j50

-j10

-j25 -j100

-j250

10 25 50 100 2500

j50

j10

j25 j100

j250

S21

Radius=1.0 S12

Radius=1.0

2f0 f0 = Ropt

-j50

-j10

-j25 -j100

-j250

10 25 50 100 2500

j50

j10

j25 j100

j250

S21

Radius=1.0 S12

Radius=1.0

2f0 f0 = Ropt

-j50

-j10

-j25 -j100

-j250

10 25 50 100 2500

j50

j10

j25 j100

j250

S21

Radius=1.0 S12

Radius=1.0

2f0 f0 = Ropt

60

55

50

45

40

Effic

iency [%

]

1.00.80.60.40.20.0

Harmonic Termination Ratio

• Starting with Class B bias for a half rectified current waveform, what is theeffect of tuning the second harmonic to a short?

-j50

-j10

-j25 -j100

-j250

10 25 50 100 2500

j50

j10

j25 j100

j250

S21

Radius=1.0 S12

Radius=1.0

2f0 f0 = Ropt

60

55

50

45

40

Effic

iency [%

]

1.00.80.60.40.20.0

Harmonic Termination Ratio

60

55

50

45

40

Effic

iency [%

]

1.00.80.60.40.20.0

Harmonic Termination Ratio

60

55

50

45

40

Effic

iency [%

]

1.00.80.60.40.20.0

Harmonic Termination Ratio

60

55

50

45

40

Effic

iency [%

]

1.00.80.60.40.20.0

Harmonic Termination Ratio

60

55

50

45

40

Effic

iency [%

]

1.00.80.60.40.20.0

Harmonic Termination Ratio

Eliminated 2nd harmonic fromvoltage waveform

Harmonic Termination Ratio:Z @ 2f0 normalised by Z @ f0

Design of Highly Efficient RF Power Amplifier- review of practical constraints: Impedance Scaling

36

Good short circuits harder to achieverelative to a Small Ropt

Makes high efficiency harder toachieve in large devices

Possible solution - include numerousshort circuits integrated onto the die toallow subsets of transistor cells to begiven a better short…

Packaging parasitics can form a filterblocking higher harmonics…

60

55

50

45

40

Effic

iency [%

]

1.00.80.60.40.20.0

Harmonic Termination Ratio

Harmonic Termination Ratio:Z @ 2f0 normalised by Z @ f0

Design of Highly Efficient RF Power Amplifier- review of practical constraints: Impedance Scaling

37

Need to select a suitable drive level for harmonicgeneration (approaching P1dB)

Ideally we need to ensure we have separated theharmonics:– only odds in the voltage waveform– only evens in the current waveform

…but will the practical device allow this!

Design of Highly Efficient RF Power Amplifier- review of practical constraints: Transistor Transfer Characteristic

38

50

40

30

20

10

0

Fundam

enta

l dc a

nd 2

nd [m

A]

-1.0 -0.8 -0.6 -0.4 -0.2 0.0

Gate Bias [V]

5

4

3

2

1

0

Oth

er H

arm

onic

s [m

A]

dc f0 2f

0 3f

0 4f

0 5f

0

• Practical constraints:• Other harmonics are not zero

• Optimum bias is a function of voltage waveform “shape” and RF drive level

Engineering The Current Waveform– Gate bias control to null the odd harmonics

Optimumbias atVG=-0.7Vto null 3f0

• In class F optimum performance will only occur if the most significant oddharmonics (usually only consider 3f0) are not present in the current waveform.

• Using Fourier analysis of the measured current waveforms we can locate thisoptimal case…

Odd harmonicnulls do not occursimultaneously

39

• Engineering the voltage waveform to a square wave involves tuning the 3rd

harmonic to an open and increasing the fundamental load to maintain thesame current swing.

• Note, the optimum Class F behaviour will only occur if the current at 3f0remains null.

Engineering The Voltage Waveform- Open tuned 3rd harmonic gate bias sweep

1.0

0.8

0.6

0.4

0.2

0.0

Ra

tio

-1.5 -1.4 -1.3 -1.2 -1.1 -1.0 -0.9 -0.8 -0.7 -0.6 -0.5 -0.4

Gate Bias [V]

100

80

60

40

20

0

Efficie

ncy [%

] PO

UT [W

]

Ratio = 0.224

Ratio Efficiency POUT

1.0

0.8

0.6

0.4

0.2

0.0

Ra

tio

-1.5 -1.4 -1.3 -1.2 -1.1 -1.0 -0.9 -0.8 -0.7 -0.6 -0.5 -0.4

Gate Bias [V]

100

80

60

40

20

0

Efficie

ncy [%

] PO

UT [W

]

Ratio = 0.224

Ratio Efficiency POUT

1.0

0.8

0.6

0.4

0.2

0.0

Ra

tio

-1.5 -1.4 -1.3 -1.2 -1.1 -1.0 -0.9 -0.8 -0.7 -0.6 -0.5 -0.4

Gate Bias [V]

100

80

60

40

20

0

Efficie

ncy [%

] PO

UT [W

]

Ratio = 0.224

Ratio Efficiency POUT

1.0

0.8

0.6

0.4

0.2

0.0

Ra

tio

-1.5 -1.4 -1.3 -1.2 -1.1 -1.0 -0.9 -0.8 -0.7 -0.6 -0.5 -0.4

Gate Bias [V]

100

80

60

40

20

0

Efficie

ncy [%

] PO

UT [W

]

Ratio = 0.224

Ratio Efficiency POUT 100

80

60

40

20

0

-20

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD[V

]

100

80

60

40

20

0

-20

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD[V

]

100

80

60

40

20

0

-20

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD[V

]

100

80

60

40

20

0

-20

ID [m

A]

7006005004003002001000

Phase [°]

7

6

5

4

3

2

1

0

VD[V

]• Since Class F requires an open termination at 3f0, it is impossible to verify this

condition has been met by direct measurement of the 3f0 harmonic current.- Consider v3rd/vfund ratio. Theory predicts 1/6 (=0.167)

40

1.0

0.8

0.6

0.4

0.2

0.0

Voltage [

V]

6004002000

Phase [º]

1.0

0.8

0.6

0.4

0.2

0.0

Voltage [

V]

6004002000

Phase [º]

• Plotting the dynamic load-line for thefinal design shows the interaction ofthe waveforms with the knee region.

• The final experimentallyengineered “class F” waveformsachieved a drain efficiency valueof 75%,

• This is extremely high given theboundary conditions and drainbias of the real device used.

• Ideal square wave requires allharmonics – we only control the first 3

1.0

0.8

0.6

0.4

0.2

0.0

Voltage [

V]

6004002000

Phase [º]

• Optimal 3 harmonic only voltagewaveform has a v3rd/vfund ratio of 1/6 if theboundary conditions are ideal (vertical)• However due to the finite on-resistanceof the real knee boundary the optimalratio is higher, at almost 1/4

Engineering The Voltage Waveform- Why was extra third harmonic developed?

41

50

40

30

20

10

0

Fund

amen

tal d

c an

d 2n

d [m

A]

-1.0 -0.8 -0.6 -0.4 -0.2 0.0

Gate Bias [V]

5

4

3

2

1

0

Other H

armonics [m

A]

dc f0 2f

0 3f

0 4f

0 5f

0

RF Waveform Measurement and Engineering- “on-line” direct utilization in amplifier design cycle

Simple Theoretical Understanding: Provides If not How and Why

Simple bias requirement

developing theoretically based but practically relevant waveformengineering design methodologies

Transistorcharacteristics

CircuitBandwidth

2nd Harmonicshort circuit

Advanced Theoretical Understanding: Must provide How and Why

3rd

harmonic:open

circuit“relaxation”

revise bias requirement

706050403020100

-10

ID [m

A]

7006005004003002001000Phase [。]

76543210

VD [V

]

Ratio = 0.6

I engineering

706050403020100

-10

ID [m

A]

7006005004003002001000Phase [。]

76543210

VD [V

]

Ratio = 0.1

V engineering

100

80

60

40

20

0

Out

put C

urre

nt I

D [m

A]

7006005004003002001000Phase [。]

76543210

Output V

oltage V D [V]

42

High Power Class F Design

5W Si LDMOS @ 900 MHz

Class F clearly achieved High Power 36.0 dBm (4W) High Efficiency 77.2%

5W Si LDMOS @ 2100 MHz

Class F clearly achieved High Power 35.9 dBm (4W) High Efficiency 77.1%

Engineered and Measured Intrinsic Waveforms: Design Aid

800

600

400

200

0

Cur

rent

(mA)

8006004002000time (ps)

60

50

40

30

20

10

0

Voltage (V)

800

600

400

200

0

Cur

rent

(mA

)

2000150010005000time (ps)

60

50

40

30

20

10

0

Voltage (V

)

Apply Waveform Design Methodology- 5W Si LDMOS into Class F Emulation/Design

43

Apply Waveform Design Methodology- 10W GaN HFET & 5W Si LDMOS into Inverse Class F

5W Si LDMOS @ 900 MHz

Inverse Class F clearly achieved High Power 37.3 dBm (5.4W) High Efficiency 73%

0.8

0.6

0.4

0.2

0

Cur

rent

(A)

2.01.51.00.50Time (ns)

80

60

40

20

0

Voltage (V)

0.5 1.0 1.5 2.00.0

10203040506070

0

80

0.00.20.40.60.81.0

-0.2

1.2

Time (ns)

Cur

rent

(A) Voltage (V)

10W GaN HFET @ 900 MHz

Inverse Class F clearly achieved High Power 40.8 dBm (12W) High Efficiency 81.5%

Engineered and Measured Intrinsic Waveforms: Design Aid

44

• ‘Right first time’ waveform based designthrough the realisation of a high-performance inverse class-F PA

• Impressive efficiency of 81% at high outputpowers

• High Power achieving 12W form a 10Wdevice

.

12W Inverse class-F Amplifier Realisation– right first time design using CREE 10W device

First P

ass Design

First P

ass Design

Success

Success

45

RF Waveform Measurement and Engineering- powerful dynamic transistor amplifier design tool

Investigation of “New Design Space”– Use RF Waveform Measurement and Engineering Systems to stimulate

new theoretically investigations in alternative high efficiency modes ofoperation

– Move beyond the discrete design point thinking to design continuumthinking

– The Class B to Class J Continuum New Theory Improved Bandwidth

46-1.0

-0.5

0.0

0.5

1.0

-1.0 -0.5 0.0 0.5 1.0

RF Waveform Measurement and Engineering- provides for new theoretical insight

Consider the Class B and Class J Mode ofoperation

– Both have a half rectified current waveform– Both have the same theoretical power and

efficiency values– But have very different voltages waveforms

Different fundamental and 2nd harmonicreactance’s

3.0

2.0

1.0

0.0

No

rma

lize

d V

olta

ge

720630540450360270180900

Phase

Normalised Class B voltage waveform

3.0

2.0

1.0

0.0

No

rma

lize

d V

olta

ge

720630540450360270180900

Phase

Normalised Class J voltage waveform

* J.D. Rhodes “Output universality in maximum efficiency linear power amplifiers”International Journal of Circuit Theory and Applications, volume 31, 2003, pp.385-405

Are these not just different solutions of thesame mode?

– Rhodes* provide some mathematical insight Optimum fundamental reactance is mathematical

defined by harmonic reactive terminations

FundamentalImpedance

2nd harmonicImpedance

47-1.0

-0.5

0.0

0.5

1.0

-1.0 -0.5 0.0 0.5 1.0

RF Waveform Measurement and Engineering- provides for new theoretical insight

They are just different solutions of the samemode?

– The Class J - Class B - Class J* Continuum

– Many more possible solutions

3.0

2.0

1.0

0.0

No

rma

lize

d V

olta

ge

720630540450360270180900

Phase

Normalised Class J voltage waveform

α = 1

3.0

2.0

1.0

0.0

No

rma

lize

d V

olta

ge

720630540450360270180900

Phase

Normalised Class B voltage waveform

α = 0

3.0

2.0

1.0

0.0

No

rma

lize

d V

olta

ge

720630540450360270180900

Phase

Normalised Class J voltage waveform

α = -1

48

80

60

40

20

0

Dra

in V

olta

ge

(V

)

2000150010005000

Normalised Time (samples)

RF Output Voltage ! = -1.05 (Class-J*)

! = -0.85

! = -0.75

! = -0.65

! = 0 (Class-B)

! = 0.65

! = 0.75

! = 0.85 (~Class-J)

80

60

40

20

0

Dra

in V

olta

ge

(V

)

10008006004002000

Normalised Time (samples)

RF Output Voltage500

400

300

200

100

0

Dra

in C

urr

en

t (m

A)

10008006004002000

Normalised Time (samples)

RF Output Current

On Cree 2W on-wafer device:• Maintain constant Pin to device• Vary Z(f0) = Ropt + j k Ropt

• Vary Z(f2) = - j k Ropt -1 ≤ k ≤ 1

α = X1/R1 = -X2/R1

RF Waveform Measurement and Engineering- experimental validation of new theoretical insight

49 Increased design flexibility

-100

-50

0

50

100

X2 (

j !)

-80 -60 -40 -20 0 20X

1 (j!)

58

56

56

54

52

52

52

50

50

48

46

46

46

4

4

42

On Cree 2W on-wafer device:• R1 held to Ropt, R2 held to 1.5Ω• X1 and X2 were swept to

examine the impact of thedeviation off the Class-JBcontinuum contour

Results• Class-JB continuum visually

identifiable with a high efficiencycontour

• Roll-off of efficiency is greater for adeviation in fundamental loadcompared to second harmonic

RF Waveform Measurement and Engineering- Class J-B-J* Continuum Sensitivity Analysis

50

Class-J output matching schematic:

– Compromises need to be made/considered across this size of bandwidth.

– Fundamental load impedance matching given priority.

– Second harmonic already close to optimum class-J reactance at centre frequency ofdesired bandwidth as a result of output capacitance Cds Z2f0 allowed more latitude during the design.

– Shunt shorted-stub increases the effective capacitive reactance of second harmonicload at lower frequencies.

Realising Class-J Matching

DUT+output

parasitics

DC biasfeed PA

Output

Cds

(0.000 to 0.000)

output_deembed_gamma[3]

output_deembed_gamma[2]

output_deembed_gamma[1]

(0.000 to 0.000)

output_deembed_gamma[3]

output_deembed_gamma[2]

output_deembed_gamma[1]

Z2f0

Zf0

51

80

70

60

50

40

30

Dra

in E

ffic

ien

cy /

%

2.52.42.32.22.12.01.91.81.71.61.51.41.31.2

Frequency / GHz

80

70

60

50

40

30

Dra

in E

fficie

ncy / %

Realised PA Drain Efficiency80

70

60

50

40

30

Dra

in E

ffic

ien

cy /

%

2.52.42.32.22.12.01.91.81.71.61.51.41.31.2

Frequency / GHz

80

70

60

50

40

30

Dra

in E

fficie

ncy / %

Realised PA Drain Efficiency

Model-Predicted Efficiency

Device Efficiency, Under Load-Pull

60%+ efficiency between1.35 and 2.25GHz

Performance of PA Prototype (1st it.)

The PA shows a measured 60%-and-above drain efficiency across thefrequency range 1.35-2.25GHz.

Drain efficiency measured for PA, model simulation and load-pullemulation.

Closely agreeing results with the load-pull emulation. Output power across this same bandwidth is 9-11Watts (device-rated power).

Proposed bandwidth not met entirely, but still a 50% bandwidth PA achieved.

52

Second design iteration extending high-efficiency operation across theoriginally intended PA bandwidth of 1.5-2.5GHz

Input matched PA Resulting gain and PAE profiles

80

70

60

50

40

30

Dra

in E

ffic

ien

cy /

%

2.72.62.52.42.32.22.12.01.91.81.71.61.51.41.3

Frequency / GHz

80

70

60

50

40

30

Dra

in E

fficie

ncy / %

1st Design Iteration

2nd Design Iteration

Performance of PA Prototype (2nd it.)

70

60

50

40

30

20

10

0

Eff

icie

ncy,

PA

E,

Po

ut,

Ga

in /

%,

%,

dB

m,

dB

2.72.62.52.42.32.22.12.01.91.81.71.61.51.4

Frequency / GHz

70

60

50

40

30

20

10

0

Effic

ien

cy, P

AE

, Po

ut, G

ain

/ %, %

, dB

m, d

B

10dB minimum gain

More than 50% PAE

Efficiency improvement withsecond design

53

RF Waveform Measurements and Engineering – a powerful tool and concept

Device Technology System ApplicationCircuit Design/Emulation

Waveform are the unifying link between device technology,circuit design and system performance

Analysis Tool

Doherty PA

Circuit EmulationDesign/Evaluation

Tool

Design/CADTool

load-pull