course overview ece/che 4752: microelectronics processing laboratory gary s. may january 8, 2004
TRANSCRIPT
Course Overview
ECE/ChE 4752: Microelectronics ECE/ChE 4752: Microelectronics Processing LaboratoryProcessing Laboratory
Gary S. May
January 8, 2004
Outline
IntroductionIntroduction Silicon ProcessingSilicon Processing History of ICsHistory of ICs Review of Semiconductor DevicesReview of Semiconductor Devices Conductivity and ResistivityConductivity and Resistivity MOS TransistorsMOS Transistors Hot-Point ProbeHot-Point Probe 4-Point Probe4-Point Probe
Growth of Electronics Industry
Electronics industry is fundamentally dependent on semiconductor Electronics industry is fundamentally dependent on semiconductor integrated circuits (ICs).integrated circuits (ICs).
What do you learn in 4752?
This course deals with the fabrication of semiconductor devices and ICs.
ICs today have over 107 components per chip, and this number is growing.
Fabricating these circuits requires a sophisticated process sequence which consists of hundreds of process steps.
In this course, we’ll go through a process sequence to make complementary metal-oxide-semiconductor (CMOS) transistors.
Outline
IntroductionIntroduction Silicon ProcessingSilicon Processing History of ICsHistory of ICs Review of Semiconductor DevicesReview of Semiconductor Devices Conductivity and ResistivityConductivity and Resistivity MOS TransistorsMOS Transistors Hot-Point ProbeHot-Point Probe 4-Point Probe4-Point Probe
Types of Semiconductors
ElementalElemental CompoundCompound
SiSi GaAs, InP (III-V)GaAs, InP (III-V)
GeGe CdS, CdTe (II-VI)CdS, CdTe (II-VI)
Silicon vs. Germanium
Ge was used for transistors initially, but silicon took over in the late 1960s; WHY?
(1) Large variety of process steps possible without the problem of decomposition (as in the case of compound semiconductors)
(2) Si has a wider bandgap than Ge=> higher operating temperature (125-175 oC vs. ~85 oC)
(3) Si readily forms a native oxide (SiO2) high-quality insulator protects and “passivates” underlying circuitry helps in patterning useful for dopant masking
(4) Si is cheap and abundant
Silicon Disadvantages Low carrier mobility (Low carrier mobility () => ) =>
slower circuits (compared to GaAs)slower circuits (compared to GaAs)
Indirect bandgap:Indirect bandgap: Weak absorption and emission of lightWeak absorption and emission of light Most optoelectronic applications not possibleMost optoelectronic applications not possible
MaterialMaterial Mobility (cmMobility (cm22/V-s)/V-s)
SiSi nn = 1500, = 1500, pp = 460 = 460
GeGe nn = 3900, = 3900, pp = 1900 = 1900
GaAsGaAs nn = 8000, = 8000, pp = 380 = 380
Outline
IntroductionIntroduction Silicon ProcessingSilicon Processing History of ICsHistory of ICs Review of Semiconductor DevicesReview of Semiconductor Devices Conductivity and ResistivityConductivity and Resistivity MOS TransistorsMOS Transistors Hot-Point ProbeHot-Point Probe 4-Point Probe4-Point Probe
The Transistor
Bell Labs invented the transistor in 1947, but didn’t believe ICs were a viable technology
REASON: Yield For a 20 transistor circuit to work 50% of the
time, the probability of each device functioning must be:
(0.5)1/20 = 96.6% Thought to be unrealistic at the time
1st transistor => 1 mm x 1 mm Ge
ICs and Levels of Integration
1st IC: TI and Fairchild (late 50s)A few transistors and resistors => “RTL”
Levels of integration have doubled every 3-4 years since the 1960s)
Moore’s Law
Complexity Acronyms
SSI = small scale integration (~100 components) MSI = medium scale integration (~1000
components) LSI = large scale integration (~105 components) VLSI = very large scale integration (~105 - 106
components) ULSI = ultra large scale integration (~106 - 109
components) GSI = giga-scale integration (> 109 components)
State of the Art
1 GB DRAM 90 nm features 12” diameter wafers Factory cost: ~ $3-4B
=> Only a few companies can afford to be in this business!
Outline
IntroductionIntroduction Silicon ProcessingSilicon Processing History of ICsHistory of ICs Review of Semiconductor DevicesReview of Semiconductor Devices Conductivity and ResistivityConductivity and Resistivity MOS TransistorsMOS Transistors Hot-Point ProbeHot-Point Probe 4-Point Probe4-Point Probe
Diamond Lattice
Tetrahedral structure Tetrahedral structure
4 nearest neighbors4 nearest neighbors
Covalent Bonding
Each valence electron Each valence electron shared with a nearest shared with a nearest neighborneighbor
Total of 8 shared valence Total of 8 shared valence electrons => stable electrons => stable configurationconfiguration
Doping
Intentional addition of impurities Adds either electrons (e-) or holes (h+) =>
varies the conductivity () of the material Adding more e-: n-type material Adding more h+: p-type material
Donor Doping
Impurity “donates” extra e- to the material
Example: Column V elements with 5 valence e-s (i.e., As, P)
Result: one extra loosely bound e-
P
e-
Acceptor Doping
Impurity “accepts” extra e- from the material
Example: Column III elements with 3 valence e-s (i.e., B)
Result: one extra loosely bound h+
B
h+
Outline
IntroductionIntroduction Silicon ProcessingSilicon Processing History of ICsHistory of ICs Review of Semiconductor DevicesReview of Semiconductor Devices Conductivity and ResistivityConductivity and Resistivity MOS TransistorsMOS Transistors Hot-Point ProbeHot-Point Probe 4-Point Probe4-Point Probe
Ohm’s Law
J = E = E/where: = conductivity, = resistivity,
and E = electric field
= 1/ = q(nn+ pp)
where: q = electron charge, n = electron concentration,
and p = hole concentration
For n-type samples: ≈ qnND
For p-type samples: ≈ qpNA
Resistance and Resistivity
area = A
length = L
R = L/A
Outline
IntroductionIntroduction Silicon ProcessingSilicon Processing History of ICsHistory of ICs Review of Semiconductor DevicesReview of Semiconductor Devices Conductivity and ResistivityConductivity and Resistivity MOS TransistorsMOS Transistors Hot-Point ProbeHot-Point Probe 4-Point Probe4-Point Probe
MOSFET
Metal-oxide-semiconductor field-effect transistor
D
G B
S
IDn
VGS
VDS+
-
VBS
+
-
+
-
S
G B
D
-IDp
VSD
+
-
VSG
+
-
VSB
+
-
n-channel devicep-channel device
G = gate, D = drain, S = source, B = body (substrate)
MOSFET Cross-Section
S VG
oxide
VD > 0
n+ n+ID
ID
L
p-type Si
cross-sectional view (not to scale)
G
D S
top view (not to scale)
Basic Operation1) Source and substrate grounded (zero voltage)2) (+) voltage on the gate
Attracts e-s to Si/SiO2 interface; forms channel3) (+) voltage on the drain
e-s in the channel drift from source to drain current flows from drain to source
valve (gate)
pipe (channel)
drain source
Hot-Point Probe
Determines whether a semiconductor is n- or p-type Requires:
Hot probe tip (soldering iron) Cold probe tip Ammeter
Hot-Point Probe
1) Heated probe creates high-energy “majority” carriers holes if p-type electrons if n-type
2) High-energy carriers diffuse away3) Net effect:
a) deficit of holes (net negative charge for p-type); ORb) deficit of electrons (net positive charge for n-type)
4) Ammeter deflects (+) or (-)
4-Point Probe
Used to determine resistivity
4-Point Probe1) Known current (I) passed through outer probes2) Potential (V) developed across inner probes
= (V/I)tF
where: t = wafer thicknessF = correction factor (accounts for probe geometry)
OR: Rs = (V/I)F
where: Rs = sheet resistance (/)
=> = Rst
Virtual Cleanroom
http://www.ece.gatech.edu/research/labs/vc/http://www.ece.gatech.edu/research/labs/vc/
Web site that describes entire ECE/ChE 4752 Web site that describes entire ECE/ChE 4752 CMOS Fabrication Process!CMOS Fabrication Process!