fast vacuum for optical disc metallization and
TRANSCRIPT
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Fast Vacuum for Optical Disc Metallization
and Photovoltaic Coatings
B. Cord, M. Hoffmann, O. Hohn, F. Martin
SINGULUS Technologies AG, Kahl am Main
SINGULUS
TECHNOLOGIES
June 2014
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 2 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
SINGULUS Overview
Replication CD, DVD, Blu-ray Vacuum (UHV) Multi-Layer Deposition Vacuum coating,
Thermal Treatment,
Chemistry
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 3 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Content
Optical Disc: Dynamic Vacuum at Metallization
Pirani-, Diaphragm-, Ion-Gauges
Photovoltaics: Process Pressure Measurement for
Plasma Enhanced Chemical Vapour Deposition
(PE-CVD)
Capacitance (Diaphragm) Gauges
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 4 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
BD-Dual Layer (50GB)
PC-Disc: 1.1 mm
Reflector L0: 35 nm Ag (<60%R<85%)
Laquer: 72 μm
Moisture Barrier: 10 nm SiN
Laquer Hardcoat: 3 µm
Laquer: 25 μm
Semi Reflector L1: 25 nm Ag (<18%R<30%)
Optical Disc Blu-ray ROM
Fully Automated Production: CD, DVD and Blu-ray
Vacuum
(Sputtering)
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 5 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Single Station Magnetron Sputtering System
Cycletime 1,5 - 4,5s
CD-Metallizer SINGULUS
Sputter Station:
- Gassupply Ar
- Turbomolecularpump
- Ion gauge
(10-4 to 1 Pa)
Small volume Loadlock:
- Volume about 100ccm
- Prepump of about 20cbm/h
- Piranitype vacuumsensor
(1 to 10+5 Pa)
DVD-System Spaceline BD-System BLULINE
Turntable:
- Rotation 180° and
- Up and down
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 6 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
BLULINE: Vacuum Layout
Process chamber vacuum:
(turbomolecular pump,
ion gauge)
10-8Pa base pressure
Loadlock:
(prepump, Pirani Gauge in
pump line):
Setting of pumpdown
threshold (in mV of gauge
reading)
Display of evacuation time
(ms)
500ms = 1mbar (= 6200mV) Prepump
Loadlock
Venting
Loadlock
Pumping
Process
Chamber
Vacuum Schematics: Loadlock and process chamber
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 7 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Metallizer: Dynamic Vacuum in Load lock
Opening of pump valve Closing of pump valve
Threshold
vacuum trigger:
45 Pa
Load lock: Pump down
Base pressure pump
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 8 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Metallizer: Dynamic Vacuum in Load lock
Opening of pump valve Closing of pump valve
Threshold
vacuum trigger:
45, 100, 200, 500 Pa
Load lock: Pump down
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 9 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Metallizer: Dynamic Vacuum in Loadlock
Process chamber:
Bayard Alpert Gauge
Load lock:
Pirani Gauge
Start pump down
Load lock
Closing of pump valve and
opening of load lock
to process chamber
Loadlock: Pumpdown; Pressure burst into Process chamber
Pressure
burst Closing of load lock
to process chamber
2s
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 10 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Metallizer: Dynamic Vacuum in Process Chamber
Opening of load lock
to process chamber
(different thresholds)
Process chamber:
(one TMP)
Process chamber:
(two TMP’s)
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 11 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Metallizer: Dynamic Vacuum in
Process Chamber with Argon gas
Gauges:
Pirani Bayard Alpert Ion Gauge
Argon gas
Air from
load lock
Plurality of gauges
at DN25 cross
Dynamic behaviour of different gauges
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 12 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
BLULINE: Dynamic Vacuum in Load lock
Pirani Gauge in pumpline
Additional Pirani gauge at loadlock
(for experiment only) Loadlock vented
Start pump down
Late reaction of Pirani
after start pumpdown
Pirani: Dynamic behaviour at high Pressures (>1000Pa)
Base pressure pump
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 13 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Loadlock: Dynamic Vacuum Measurement
Start pump down
(opening of valve)
Pirani /Diaphragm gauge
bottom of load lock
Pirani/Diaphragm
gauge top of load lock
Pirani
gauge top of
load lock
Late reaction of
Pirani after start
pump down
Pirani: Study of Dynamic behaviour at high Pressures (>1000Pa);
Comparison to combined Pirani/Diaphragm
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 14 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Loadlock: Dynamic Vacuum Measurement
Slow venting
Fast venting
Pirani: Study of Dynamic behaviour at high Pressures (>1000Pa);
Comparison to combined Pirani/Diaphragm
Pirani
Pirani
Combined
Pirani/Diaphragm
Combined
Pirani/Diaphragm
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 15 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Optical Discs: Pirani – Diaphragm – Ion
Gauges
Summary of Gauges for rough and high vacuum
Pirani: Gauge of choice for 100Pa level with good time resolution
Pirani shows large deviations for dynamic vacuum measurement
at levels of >1000Pa
Combined Pirani/Diaphragm gauge good solution up to 1000hPa
Ion gauges seem to be fastest
Absolute, precise pressure measurement with ion gauges
needs careful integration and calibration
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 16 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Photovoltaics: Coating of Si-wafer with Si-Nitride
→ SINGULAR multi chamber coating tool
→ Inductively coupled plasma source
→ Deposition by Plasma assisted
chemical vapor deposition (PECVD)
→ Process gases like NH3, SiH4, N2, ….
→ Modular design for various processes
(e.g. SiNx, AlOx, a-Si)
Four identical PECVD
Process stations
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 17 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
TECHNOLOGY: ICP - PECVD
Process pressure
Measurement:
Direct Pressure gauges
(Diaphragm, Capacitance)
Pressure Measurement of Process gases for PECVD:
• Usage of gas independent sensors (Diaphragm Capacitance Gauges)
• Range 0,01 to 100 Pa
• Avoid decomposition of gases at hot filaments (no ion gauges)
• Issue of sensor contaminations
Plasma chamber Substrate
Pump
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 18 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
TECHNOLOGY: ICP - PECVD
SiH4 NH3
Additional Gas
Valves
Plasma: Inductively coupled plasma (ICP)
Vacuum: 0,01 to 100 Pa
Static SiNx Process:
Process on 9s, transport 3s with no gas
going into chamber (avoid chamber
crosscontamination)
Flowcontroller
Gas Valves
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 19 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Photovoltaics: PECVD Stations
with Capacitance Gauges
Different
SiH4 Flows
Topic: Actual pressure in chamber after gasflow switching
Pressures SiH4
Pressures NH3
Flows NH3
Flowmeter on
Valve opening
SINGULAR:
Pressures in Chamber without plasma
Flowmeter on
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 20 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Photovoltaics: PECVD Stations
with Capacitance Gauges
SINGULAR Machine#1:
Pressure versus Flow relation:
- Measurement at four stations
- Machine to machine comparison
SiH4
NH3
Topic: Station to station comparison of process pressure
at identical gas flows
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 21 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Photovoltaics: PECVD Stations
with Capacitance Gauges
SINGULAR Machine#2:
Pressure versus Flow relation:
Measurement at four stations
SiH4
NH3
Pressure Deviation
at Station 4 (No#2)
Topic: Station to station comparison of process pressure
at identical gas flows
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 22 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Photovoltaics: PECVD Stations
with Capacitance Gauges
SINGULAR Machine #1 and #2:
Comparison SiH4
NH3
Precise and stable pressure
measurement over time and
from sensor to sensor required
Topic: Machine to machine comparison of process pressure
at identical gas flows
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 23 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Photovoltaics: PECVD Stations
with Capacitance Gauges
SINGULAR
Pressures in Chamber without plasma
Different gas
valve
opening times
Topic: Actual pressure in chamber after gasflow switching
Optimizing the gas inlet
for shortest pressure
stabilization time
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 24 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Photovoltaics: PECVD Stations
with Capacitance Gauges
Summary Capacitance Gauges for PECVD
Accuracy of absolute pressure measurement good (but not perfect)
Often zeroing of gauge required
Signal rise/fall times in the range of some hundred milliseconds,
but difficult to judge due to gas filling times for the vacuum
chamber
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SINGULUS TECHNOLOGIES AG
25-June-2014 - 25 -
PTB, Workshop on Vacuum Metrology, June 25th 2014
Question:
Operation of the Capacitance Gauges:
Absolute pressure accuracy over time?
What is best routine for the often required zeroing?
Thanks for your attention
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