semiconductor device modeling and characterization – ee5342 lecture 8 – spring 2011
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Semiconductor Device Modeling and Characterization – EE5342 Lecture 8 – Spring 2011. Professor Ronald L. Carter [email protected] http://www.uta.edu/ronc/. First Assignment. e-mail to [email protected] In the body of the message include subscribe EE5342 - PowerPoint PPT PresentationTRANSCRIPT
Semiconductor Device Modeling and
Characterization – EE5342 Lecture 8 – Spring 2011
Professor Ronald L. [email protected]
http://www.uta.edu/ronc/
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First Assignment
• e-mail to [email protected]– In the body of the message include
subscribe EE5342 • This will subscribe you to the
EE5342 list. Will receive all EE5342 messages
• If you have any questions, send to [email protected], with EE5342 in subject line.
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Second Assignment
• Submit a signed copy of the document that is posted at
www.uta.edu/ee/COE%20Ethics%20Statement%20Fall%2007.pdf
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Additional University Closure Means More Schedule
Changes• Plan to meet until noon some days in the next few weeks. This way we will make up for the lost time. The first extended class will be Monday, 2/14.
• The MT changed to Friday 2/18• The P1 test changed to Friday 3/11.• The P2 test is still Wednesday 4/13• The Final is still Wednesday 5/11.
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Shockley-Read-Hall Recomb
Ev
EcEfEfi
E
k
Ec
Ev
ET
Indirect, like Si, so intermediate state
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S-R-H trapcharacteristics1
• The Shockley-Read-Hall Theory requires an intermediate “trap” site in order to conserve both E and p
• If trap neutral when orbited (filled) by an excess electron - “donor-like”
• Gives up electron with energy Ec - ET
• “Donor-like” trap which has given up the extra electron is +q and “empty”
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S-R-H trapchar. (cont.)• If trap neutral when orbited (filled)
by an excess hole - “acceptor-like” • Gives up hole with energy ET - Ev
• “Acceptor-like” trap which has given up the extra hole is -q and “empty”
• Balance of 4 processes of electron capture/emission and hole capture/ emission gives the recomb rates
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S-R-H recombination• Recombination rate determined by:
Nt (trap conc.),vth (thermal vel of the carriers),sn (capture cross sect for electrons),sp (capture cross sect for holes), with
tno = (Ntvthsn)-1, and tpo = (Ntvthsn)-1, where sn~p(rBohr)2
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S-R-Hrecomb. (cont.)• In the special case where tno = tpo
= to the net recombination rate, U is
)pn( ,ppp and ,nnn wherekT
EfiEcoshn2npnpnU
dtpd
dtndGRU
oo
oTi
2i
t
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S-R-H “U” functioncharacteristics• The numerator, (np-ni
2) simplifies in the case of extrinsic material at low level injection (for equil., nopo = ni
2) • For n-type (no > n = p > po =
ni2/no):
(np-ni2) = (no+n)(po+p)-ni
2 = nopo - ni
2 + nop + npo + np ~ nop (largest term)
• Similarly, for p-type, (np-ni2) ~ pon
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S-R-H “U” functioncharacteristics (cont)• For n-type, as above, the
denominator = to{no+n+po+p+2nicosh[(Et-Ei)kT]}, simplifies to the smallest value for Et~Ei, where the denom is tono, giving U = p/to as the largest (fastest)
• For p-type, the same argument gives U = n/to
• Rec rate, U, fixed by minority carrier
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S-R-H net recom-bination rate, U• In the special case where tno = tpo
= to = (Ntvthso)-1 the net rec. rate, U is
)pn( ,ppp and ,nnn wherekT
EfiEcoshn2npnpnU
dtpd
dtndGRU
oo
oTi
2i
t
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S-R-H rec forexcess min carr• For n-type low-level injection and
net excess minority carriers, (i.e., no > n = p > po = ni
2/no), U = p/to, (prop to exc min carr)
• For p-type low-level injection and net excess minority carriers, (i.e., po > n = p > no = ni
2/po), U = n/to, (prop to exc min carr)
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Minority hole lifetimes. Taken from Shur3, (p.101).
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Minority electron lifetimes. Taken from Shur3, (p.101).
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Parameter example• tmin = (45 msec)
1+(7.7E-18cm3Ni+(4.5E-36cm6Ni
2
• For Nd = 1E17cm3, tp = 25 msec– Why Nd and tp ?
M. E. Law, E. Solley, M. Liang, and D. E. Burk, “Self-Consistent Model of Minority-Carrier Lifetime, Diffusion Length, and Mobility,” IEEE Electron
Device Lett., vol. 12, pp. 401-403, 1991.
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M. E. Law, E. Solley, M. Liang, and D. E. Burk, “Self-Consistent Model of Minority-Carrier Lifetime, Diffusion Length, and Mobility,” IEEE Electron
Device Lett., vol. 12, pp. 401-403, 1991.
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S-R-H rec fordeficient min carr• If n < ni and p < pi, then the S-R-H
net recomb rate becomes (p < po, n < no):
U = R - G = - ni/(2t0cosh[(ET-Efi)/kT])• And with the substitution that the
gen lifetime, tg = 2t0cosh[(ET-Efi)/kT], and net gen rate U = R - G = - ni/tg
• The intrinsic concentration drives the return to equilibrium
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The ContinuityEquation• The chain rule for the total time
derivative dn/dt (the net generation rate of electrons) gives
n,kzjyixn
is gradient the of definition The
.dtdz
zn
dtdy
yn
dtdx
xn
tn
dtdn
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The ContinuityEquation (cont.)
vntn
dtdn then
,BABABABA Since
.kdtdzjdt
dyidtdxv
is velocity vector the of definition The
zzyyxx
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The ContinuityEquation (cont.)
etc. ,0xx
dtd
dtdx
x
since ,0dtdz
zdtdy
ydtdx
xv
RHS, the on term second the gConsiderin .vnvnvn as
ddistribute be can operator gradient The
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The ContinuityEquation (cont.)
.Equations" Continuity" the are
Jq1
tp
dtdp and ,Jq
1tn
dtdn
So .Jq1
tnvnt
ndtdn
have we ,vqnJ since ly,Consequent
pn
n
n
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The ContinuityEquation (cont.)
z).y,(x, at p or n of Change of Rate Local explicit"" the
is ,tpor t
n RHS, the on term first The
z).y,(x, space in point particular a at p or n of Rate Generation Net the represents
Eq. Continuity the of -V,dtdp or dt
dn LHS, The
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The ContinuityEquation (cont.)
q).( holes and (-q) electrons for signsin difference the Note z).y,(x, point the of" out" flowing ionsconcentrat
p or n of rate local the is Jq1 or
Jq1 RHS, the on term second The
p
n
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The ContinuityEquation (cont.)
inflow of rate rate generation net change of rate Local
:as dinterprete be can Which
Jq1
dtdp
tp
:as holes the for equation continuity the write-re can we So,
p
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References *Fundamentals of Semiconductor Theory and
Device Physics, by Shyh Wang, Prentice Hall, 1989.
**Semiconductor Physics & Devices, by Donald A. Neamen, 2nd ed., Irwin, Chicago.
M&K = Device Electronics for Integrated Circuits, 3rd ed., by Richard S. Muller, Theodore I. Kamins, and Mansun Chan, John Wiley and Sons, New York, 2003.
• 1Device Electronics for Integrated Circuits, 2 ed., by Muller and Kamins, Wiley, New York, 1986.
• 2Physics of Semiconductor Devices, by S. M. Sze, Wiley, New York, 1981.
• 3 Physics of Semiconductor Devices, Shur, Prentice-Hall, 1990.