Athena Guide :

Grid: A finer grid should exist in those areas of the simulation structure where ion implantation will occur,where p-n junction will be formed, or where optical illumination will change photoactive component concentration. The number of arithmetic operations necessary to achieve a solution for processes simulated, using the finite element analysis method could be estimated as (Np) , where is of order 1.5 - 2.0 and Np is number of nodes. Photo lithography

6.25: ILLUM.FILTERILLUM.FILTER specifies the illumination source shape and illumination source filtering in OPTOLITH.

SyntaxILLUM.FILTER [CIRCLE|SQUARE|GAUSSIAN|ANTIGAUSS|SHRINC] [GAMMA=] [RADIUS=] [ANGLE=] [SIGMA=] [IN.RADIUS=] [OUT.RADIUS=] [PHASE=] [TRANSMIT=] [CLEAR.FIL]

: . CIRCLE|SQUARE|GAUSSIAN|ANTIGAUSS|SHRINC . shrinc : . Gamma . Gamma=0 . shrinc : Radius . . shrinc : Angle (illumination & projection) ( filling factor) : sigma . shrinc : in.radius & out.radius . Phase Transmit . . reset : clear.fil ExampleThe following example defines a SHRINC illumination source, where the quadruple circular illumination sources are located at 45 to the x-axis with the center at a radius of 0.2 from the origin and a circle radius of SIGMA=0.2. ILLUM.FILTER SHRINC RADIUS=.2 SIGMA=.2 ANGLE=45

ILLUMINATIONILLUMINATION specifies the basic illumination parameters in OPTOLITH.

SyntaxILLUMINATION [I.LINE|G.LINE|H.LINE|DUV.LINE|LAMBDA=] [X.TILT=][Z.TILT=] [INTENSITY=]

. OPTOLITH : Illumination . : ... I.LINE|G.LINE|H.LINE|DUV.LINE

: Lambda . . ]> : [X.TILT=][Z.TILT= : [INTENSITY=[INFILE=] [DEMAG=] [GAP=[OPAQUE|CLEAR] [DEFOCUS=[WIN.X.LOW=] [WIN.X.HIGH=] [WIN.Z.LOW=] [WIN.Z.HIGH=[DX=] [DZ=] [X.POINTS=] [Z.POINTS=] [N.PUPIL=