euv/debris 3. hvm euv light source remaining atoms was ... · power (at present) peak/average...
TRANSCRIPT
When will we reach the end of the tunnel ?
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Type LPP
Power (at present) peak/average 104W/21W
Plasma No electrode
Mitigation Pre pulse + Magnet
Life limitation ( several 1000 hr )
Remark ・Theoretically no limit
・Engineering works still to be done
LPP:CO2 laser and Tin source High power pulsed CO2 laser
Magnetic field plasma mitigation
Pre-Pulse plasma technology
EUV sources
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
SPIE 2010
(Feb.2010)
EUV Symposium
(Oct.2010)
SPIE2011
(Feb,2011)
EUV power ( @ I/F) 69 W 104 W 42 W
EUV power ( clean @ I/F) 33 W 50 W 20 W
Duty cycle 20 % 20 % 5%
Max. non stop op. time >1 hr <1 hr >7 hr
Average CE 2.3 % 2.5 % 2.1%
Dose stability :simulation (+/- 0.15%) -
Droplet diameter 60mm 60mm 30mm
CO2 laser power 5.6 kW 7.9 kW 3.6kW
System operation Data ( ETS device)
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
0
5
10
15
20
25
30
0 1 2 3 4 5 6 7 8
Time [H]
EU
V p
ow
er
@ IF
cle
an
[W
]
System operation result on ETS
Long time system operation demonstrated
Operation duration: 7 hours
Droplet 30 mm diameter
Full repetition rate: 100 kHz
In burst clean power: 20W (average)
25W (max)
Conditions;
Control: Droplet position control ON, EUV energy control OFF
CO2 laser = 3.6kW @ 100kHz
Duty=5% (50msecON、950msecOFF)
25W= CE 2.6%
20W= CE 2.1%
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Higher CE challenge more than 5%
3 key challenges
Small droplet supply with Droplet on Demand
Dual wavelength Laser Produced Plasma
Perfect ionization and Magnetic mitigation
- Stable and small droplet
- high power CO2 laser
- the best plasma creation
main-pulse
CO2 laser
pre-pulse laserDroplet generator
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Droplet Generator on Demand
0
10
20
30
40
50
60
70
0 10 20 30 40 50
Ve
loci
ty [m
/s]
Accelerating Voltage VA [kV]
5kV
6kV
7KV
8KV
Extracting Voltage VE
Large controllability of droplet
Timing SpeedTiming Speed Direction
Current
performance
Target
for pilot
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Conversion Efficiency vs.. CO2 Laser Intensity
After CE optimization
3.3% →3.8%→4.7% (@ pilot condition)
Final Target
After Optimization
Before
optimization
New champion data of CE = 4.7% (June.2012)
CO2 intensity (a.u.)
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
EUV Output Power vs. CO2 Input Power
We expect 2.5mJ EUV output corresponds to 250W clean
power with CE >4.7%
SPIE2012
Champion data at
present
CE=4.7%
CO2=23kW
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Magnetic mitigation
Collector mirror protection Concept
Droplet
(liquid)
Crashed-mist
(liquid)
Plasma
(gas)
mist size <300mm,
100% vaporization to atom
droplet <20mm
CO2 laser irradiation
100% ionization
Guided ion Ion trapped
Ions with low energy
trapped by B field
pre-pulse main-pulse
No Large Fragment s
atom 0 ion 0
All Tin atoms should be ionized.
① Magnet field is effective for guiding ions to protect mirror
② All Tin fragments and atoms are needed to be ionized
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Critical issue investigation with 10Hz device
- Double pulse optimization
- Debris mitigation mechanism
- Higher CE investigation
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Proper pre-pulse condition
Droplet shooting scheme
a) without main-pulse laser
pre-pulse irradiationTime
Main pulse laser
/ EUV emission after EUV emission
b) with main-pulse laser
Back
illuminator
CCD
camera
EU
V
sensor
Drive laser
Tin droplet
LIF
camera
EUV/Debris
Measurement
port
Corrector mirror
Intermediate focus
EUV/Debris
Measurement
port
Back
illuminator
CCD
camera
EU
V
sensor
Drive laser
Tin droplet
LIF
camera
EUV/Debris
Measurement
port
Corrector mirror
Intermediate focus
EUV/Debris
Measurement
port
Perfect
vaporization!
100micron
20 micron
droplet
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Atom measurement by LIF - 2
3 mm
①w/o CO2 laser ②w/ CO2 laser
Laser
Remaining atoms was estimated by subtracting
w/ CO2 vs. w/o CO2 measurement
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
0
0.2
0.4
0.6
0.8
1
1.2
0 0.25 0.5 0.75 1
Ion
nu
mb
er
(arb
. u
nit
)
Magnetic Field (arb. unit)
Ion Measurements by Faraday cups
Amount of ion is measured by Faraday cup
>99% of Tin goes to Tin ion catcher !!
Faraday
cup 1 @
mirror
position
Magnetic
Field
EUV Collector
Mirror position
Drive laser
Amount of ions
going to Tin ion
catchers
Amount of Tin ions not
going to ion catchers
Faraday cup 2
@ Tin ion catcher
position
Proto / Pilot
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Results Summary
Tin molecule measurement results
pre-pulse laser + CO2 laser irradiation : ionized 93% of Tin
Only pre-pulse laser irradiation : ionized 3% of Tin
This
time
Proto
Condition
Repetition
rateHz 10 100k
Experimental Condition:
Same as proto machine
only
Pre-pulse
Irradiation
pre-pulse laser + CO2 laser
Irradiation
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Estimated deposition and cleaning rates
Deposition rate: 1.2 nm / Mpls*
Cleaning rate: 4.4 nm / Mpls**
Clean operation feasibility proven
*Estimation of Tin atom dispersion
: isotropic
** Estimation based on experimental
data under pilot conditions
Cleaning rate
CO2 Laser Energy [a.u.]
CO2 energy at
final proto / pilot
Clean operation is proven by test data with
ETS and 10Hz source
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Gigaphoton’s Light at the End of the
EUV Tunnel!
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
GL200E system overview
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
GL200E proto constructed at Hiratsuka facility
Main-
AMP2
Main-
AMP1
BDU3
BDU4
Pre-AMP
OSC
Pre-AMP
CO2 laser OSC+Pre-AMP
CO2 laser Main-AMP
EUV-chamber
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
EUV light generated at Proto system
PROTO Source
90kHz operation
30% Duty
Max. 7W clean power within burst
Maximum 7W clean power at Proto system is on line
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
EUV Source product roadmap
GL200E pilot will be delivered to Scanner maker Q4 2012
Initially at 50W clean power
Follow-on upgrade to 250W
★ 1st source delivery
Power
250W
100W
2014 201520132010 201220112009
ETS
GL200E
■ Copyright 2012 GIGAPHOTON INC. all rights reserved.
Summary
1st generation integrated setup LPP source (ETS) and 10 Hz device:
Smaller droplet (droplet size reduction from 60mm to 30 mm) extends operation time to 7 hours around 20W(clean power @I/F, 5%duty) level
operation.
10Hz experiment proved debris mitigation concept experimentally.
That is proper pre-ionization and main ionization make >93% ionization. This technology enables clean light source in combination with magnetic field.
10Hz experiment clarify CE (Conversion Efficiency) improvement, with <20mm droplet we found the region where CE >4.7% and perfect vaporization are simultaneously possible.
2st generation LPP source (GL200E):
Concept of design and outline is reported.
Our final goal of GL-200E is 250W and the feasibility is supported by high CE experimental data.
We observed 1st EUV light on proto source with 18W equivalent level at present. Next target is 50W level demonstration by 4Q 2012.
■ Copyright 2011 GIGAPHOTON INC. all rights reserved.
0
1
2
3
4
5
0 5 10 15 20 25 30
EU
V C
lea
n P
uls
e E
nerg
y (
mJ
)CO2 Laser Power(kW)
CE 3%
CE 4%
EU
V C
lea
n P
ow
er
(W)
0
300
100
200
CE 5%400
500
After CE optimization
3.3% →3.8%→4.7% (@ pilot condition)
New champion data of CE = 4.7% (May.2012)
Dual wavelength Laser Produced Plasma
Outline
1. Introduction
2. Engineering Test source
1st Generation (ETS) device: System experiment
– Operation Data
10Hz device: Critical issue experiment
– Vaporization experiment
– Ionization experiment
– Magnetic mitigation
– Pre-pulse and high CE
3. HVM EUV light source
Product roadmap
2nd Generation device: Development status
– Configuration
– Latest status
4. Summary
High CE technology for HVM EUV source 1 2 3 4 5 6
7 8 9 10 11 12
13 14 15 16 17 18
19 20 21 22 23
Hakaru Mizoguchi and Shinji Okazaki / GIGAPHOTON INC.