novel water based cerium acetate precursor solution for the deposition of epitaxial cerium oxide...
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ORIGINAL PAPER
Novel water based cerium acetate precursor solution for thedeposition of epitaxial cerium oxide films as HTSC buffers
Tran Thi Thuy Æ S. Hoste Æ G. G. Herman ÆN. Van de Velde Æ K. De Buysser Æ I. Van Driessche
Received: 30 December 2008 / Accepted: 10 March 2009 / Published online: 21 March 2009
� Springer Science+Business Media, LLC 2009
Abstract A novel water based precursor solution using
ethylenediaminetetraacetic acid (H4EDTA) as a complex-
ant and acetic acid and ethylenediamine (EDA) as
additional components to obtain CeO2 buffer layers on Ni
(5%W) tapes is described in detail. The influence of com-
plexation behavior in the formation of transparent and
homogenous sols and gels by the combination of cerium
acetate, acetic acid and H4EDTA has been studied. The
optimal growth conditions for cerium oxide were Ar-5% H2
gas processing atmosphere, solution concentration levels of
0.2–0.4 M, a dwell time of 60 min at 900 �C and 5–30 min
at 1,050 �C. X-ray diffraction, SEM, spectroscopic ellips-
ometry and pole figures were used to characterize the CeO2
films. Highly textured CeO2 layers were obtained.
Keywords Species distribution simulation � CeO2 buffer
layers � Thin films � Water based � Sol–gel � EDTA
1 Introduction
Epitaxial ceramic buffer layers are deposited onto a Ni-W
substrate to prevent Ni diffusion into the superconducting
layer and transfer a strong biaxial texture from the substrate
to the superconducting layer. Oxide buffer layers such as
CeO2 have obtained a great deal of interest as a diffusion
barrier for growth of YBCO films [1]. Compared with the
other methods, the sol–gel process [2] has the potential
advantage not only of achieving homogeneous mixing of
the component cations on atomic scale, but also forming
films or fibers which are of great technological importance
[3]. In recent studies, it is shown that CeO2 films fabricated
from cerium acetate precursor in organic solvent have a
high texture quality and this may be a promising step in the
fabrication of YBCO—coated conductors [4]. The advan-
tage of cerium acetate is that the acetate ligands are
retained in the complex. It leads to a reduction of free
cerium ions in precursor solution. Meanwhile, CeO2 films
fabricated from cerium acetate water based precursor
solutions have not been documented yet. Besides this, as it
is a water based method, it is environmental friendly and
expected to leave less carbon residue, which is detrimental
for the superconducting properties.
We have selected and studied the combination of
H4EDTA and acetic acid in order to establish the prepa-
ration of stable precursor solutions which can be used for
dip coating of buffer layers. Furthermore, a species distri-
bution program was employed to assess the influence of
complexation behavior in the formation of transparent and
homogeneous sols and gels. From these stable precursor
solutions, cerium oxide buffer layers were synthesized. The
CeO2 layers were characterized by using X-ray diffraction
(XRD) and pole figures for phase purity and texture,
scanning electron microscopy (SEM) for homogeneity and
microstructure and atomic force microscopy (AFM) for
surface roughness analysis.
2 Experimental
2.1 Chemicals
Cerium acetate Ce(OAc)3, KNO3, HNO3, ethylenediamine
(EDA), and H4EDTA were purchased from Sigma–Aldrich
T. T. Thuy (&) � S. Hoste � G. G. Herman � N. Van de Velde �K. De Buysser � I. Van Driessche
Department of Inorganic and Physical Chemistry, Ghent
University, Krijgslaan 281-S3, 9000 Gent, Belgium
e-mail: [email protected]
123
J Sol-Gel Sci Technol (2009) 51:112–118
DOI 10.1007/s10971-009-1949-7
(Germany). Glacial acetic acid (99 wt %) was obtained
from Chem.-Lab (Belgium).
Thermo gravimetric analysis/differential thermal analy-
sis (TGA/DTA) was performed on the starting cerium
acetate to determine the water content of the cerium acetate
in order to assure the concentration and the ratio of cerium
to ligands in the precursor solution.
2.2 EQUIL program
The EQUIL program [5] was used to calculate the distri-
bution of the different species which might form into the
precursor solution. The simulation was run for a solution
containing Ce(III), acetic acid, and H4EDTA in the molar
ratio 1:10:0.8 in the pH range 2–11. The stability constant
data needed for that purpose were taken from the literature
[6, 7]. The detailed model of species used with EQUIL is
shown in Table 1.
2.3 Preparation of precursor solution and substrates
The scheme to make CeO2 precursor solution is indicated
in Fig. 1. The CeO2 precursor solution was prepared by
dissolving cerium acetate in a mixture of water and acetic
acid with the stoichiometric ratio Ce3?: acetic acid of 1:10.
EDTA in acid form (H4EDTA) was dissolved in EDA
solution with the stoichiometric ratio Ce3?: EDTA of
1.0:0.8. The final pH of solution was adjusted by EDA up
to a value between 5.5 and 6.0. This combination of
compounds leads at pH 5.5–6.0 to clear and homogeneous
sol and gel as shown in Fig. 2. The solutions could be
stored at room temperature for a year without losing
stability.
The Ni 5 atomic % W tapes were heated and treated for
recrystallization at 1,000 �C for 1 h under a reducing
Ar-5%H2 atmosphere, these conditions constitutively pro-
duce a good biaxial texture formation [8]. It is also
effective to remove the native surface Ni oxide [9]. The
evolution of wettability of Ni-W surface was determined
by contact angle analysis using the sessile drop contact
technique. The drop has a contact angle of 54� when it is
untreated. This contact angle decreased to 39� after thermal
treatment. After this, the substrates were chemically
cleaned in different solvents. The details of the procedure
employed are as follows: the substrates were first dipped in
acetone and secondly in methanol for 5 min. This proce-
dure was followed by a rinse in deionized water for 5 min
[10]. After degreasing the contact angle is reduced insig-
nificantly from 39� to 33�. Then the substrates were dipped
in a hot mixture of H2O2:HCOOH = 1:1 for 15 min. The
mixture was heated to 55–57 �C. The temperature of the
mixture increased further automatically because of the
exothermic reaction of hydrogen peroxide in formic acid.
The contact angle is decreased radically from 33� to *0�indicating a perfect wettability. Finally, the clean substrates
were kept in methanol until use. These substrates were
taken out and dried at room temperature in the clean room
before dip coating.
2.4 Dip coating and heat treatment
The films were prepared using dip coating at room tem-
perature in a clean room (class 10000) with a computer
Table 1 The stability constant data of Ce3? with acetic acid and
EDTA taken from [6, 7] used as model for the EQUIL program
logb Stoichiometry
Ce3? HOAc EDTA H
4.56 0 1 0 1
10.07 0 0 1 1
16.68 0 0 1 2
18.96 0 0 1 3
20.96 0 0 1 4
22.46 0 0 1 5
22.46 0 0 1 6
1.91 1 1 0 0
3.09 1 2 0 0
3.68 1 3 0 0
15.94 1 0 1 0
-19.70 1 0 0 -3
-13.78 0 0 0 -1
The compositions of species are given with stoichiometric coeffi-
cients. A negative coefficient for H means bonded OH-
Glacial acetic acid (HOAc: Ce3+ = 10:1)
Reflux 90°C, 1h
Cerium acetate (aq)
Reflux 90°C, 1h
EDTA solution(EDTA: Ce3+ = 0.8:1.0) EDTA was dissolved in
Ethylenediamine solution
Clear light yellow solution 0.25M, pH=5.8, η = 3.2 cP
Clear yellow gel
Fig. 1 Schematic overview of the preparation of the aqueous CeO2
precursor solution
J Sol-Gel Sci Technol (2009) 51:112–118 113
123
controlled precision dip coater. After dipping into the
solution concentration levels of 0.2–0.4 M, they were held
immersed for 10 s and withdrawn at as speed of 10, 20, 30,
40, 50 mm/min.
The dip coated samples were converted to the gel in a
dust free furnace for 1 h at 60 �C. Subsequently, these
amorphous gels were transformed to the desired crystalline
CeO2 phase by an appropriate heat treatment in a quartz
tube furnace. The optimization of heat treatment was
shown in the Table 2. The data in the Table 2 shows that
the optimal growth conditions for this precursor were
Ar-5% H2 gas processing atmosphere, a dwell time 60 min
at 900 �C and another dwell time range of 5–30 min at
1,050 �C.
2.5 Characterization
The thermal decomposition behavior of the gel networks
was studied by TGA–DTA (STD 2960 Simultaneous DSC–
TGA). Identification of the different phases present in the
CeO2 films was performed by X-ray diffraction (Siemens
D5000, CuKa). Scanning electron microscopy (SEM)
(Philips 501), Atomic force microscope (AFM) Molecular
Imaging Picoplus with PicoScan 2100 Controller and XRD
pole figures were also employed to indicate the overall
morphology of the cerium oxide films. Spectroscopic
ellipsometry (JA Woollam Alpha-SE) was used to measure
the thicknesses of the films.
3 Results and discussion
3.1 Characterization of precursor solutions
To control the hydrolysis reactions upon gel formation and
to avoid precipitation of metal hydroxides suitable organic
ligands are usually added to the precursor solution [3]. The
basic idea behind that is the reduction of the concentration
of free Ce3? in the solution by formation of soluble chelate
complexes. EDTA and acetic acid could be considered as
complexing agents. Although acetic acid was present with
a ratio higher than 1 in comparison with the metal ions, it
can hardly play an important role in complexation of Ce3?
due to its very low stability constant value of 101.91 for the
mono acetate complex [Ce(CH3COO)]2? [6, 7]. Therefore,
the ideal precursor solution should contain a stronger
ligand such as EDTA4-. EDTA4- [11–13] forms strong 1:1
complex with Ce3?. The equilibrium constant for the
reaction, Ce3?? EDTA4-� [Ce(EDTA)]- is 1015.98
[6, 7]. But EDTA in its acid form is only sparingly soluble
in water. At room temperature its solubility is limited to
0.5 g/L (0.05 W/V) and this solution has a pH of 2.7. The
neutralization of EDTA with weak bases like ammonia or
ethylene diamine (EDA) results in the formation of
ammonium salts with a significantly increased solubility in
water. This now allows the preparation of EDTA solutions
in the concentration range of 5–30% when the pH is raised
to around 6 [14]. In our precursor solution EDA in stead of
Fig. 2 Pictures of clear and homogeneous sol and gel
Table 2 Optimization of heat treatment for deposition of CeO2 on Ni-W in Ar-5% H2 atmosphere
No Ramp1
(�C/min)
T1 (�C) Dwell1 (min) Ramp2 (�C/min) T2 (�C) Dwell2 (min) Ramp3 (�C/min) T3 (�C) Ratio (%)
(200/(111 ? 200)) 9 100
1 5 1000 120 10 25 75.0
2 10 900 60 10 950 30 5 25 76.9
3 10 900 60 10 1000 30 5 25 82.1
4 10 900 60 10 1050 30 5 25 85.0
5 10 900 60 10 1100 30 5 25 87.5
6 10 900 60 10 1100 60 5 25 58.6
7 5 900 60 10 1050 120 10 25 85.7
8 5 900 90 10 1050 5 10 25 88.5
9 5 900 60 10 1050 5 10 25 100.0
10 5 900 60 10 1050 20 10 25 100.0
11 5 900 60 10 1050 30 10 25 100.0
Bold values indicates that only one parameter was changed, the other was constant
114 J Sol-Gel Sci Technol (2009) 51:112–118
123
ammonia was used because of a greater stability of the
precursor solution at higher temperature. A clear, stable
precursor solution was obtained when the molar ratio
EDTA:Ce3? was adjusted to the value of 0.8.
With the molar ratio of Ce3?: acetic acid: H4EDTA of
1:10:0.8 as in the precursor, the distribution of different
species was calculated using the stability constant data
from literature. The result is shown in Fig. 3. One can see
that coordination by EDTA4- starts at very acidic medium.
At pH 2.2, 50% of [Ce(EDTA)]- is already formed. From
pH 3.0 on the formation of [Ce(OAc)]2? is detected, but its
presence is at most 4%. The concentration of free Ce3? is
reduced significantly from 46 to 22% due to the formation
of [Ce(EDTA)]-. The lowest concentration of free Ce3? in
solution is reached at about pH 5.5. From pH 6.0 on free
Ce3? starts to precipitate as Ce(OH)3. So the optimal pH
range of the precursor solution is 5.5–6.0. In this pH range
clear and stable sols and gels were obtained. The role of
acetic acid in the precursor solution is probably providing
more buffer capacity in a hydrogen bonding network of
solutes and water.
3.2 Characterization of CeO2 precursor gels
The thermal decomposition behavior of CeO2 precursor
gels was studied in order to obtain information on the
decomposition of the deposited precursor layers and
establish a suitable heat treatment schedule. Figure 4
shows the TGA–DTA curves in air and in Ar for CeO2
precursor gels in the range from 25 �C to 1,100 �C. At
temperatures below 200 �C, two large decomposition steps
occur at 85 and 160 �C in rapid succession. These two
steps can be associated with the release of water and acetic
acid due to their boiling points. Soon after, at temperatures
ranging from 200–500 �C, gases such as CO, CO2, NO,
NO2 escape from the gel due to its decomposition. The
mass loss of the gel in air and in Ar is almost the same from
room temperature to 300 �C. However, starting from a
temperature of 300 �C the mass loss of the gel in Ar
decreased much slower than the one in air, regardless of the
oxygen rates. From a temperature of 800 �C on the mass
loss of the gel in air and in Ar are also the same. As can be
seen from the TGA curve (curve 2), there is no mass loss
above 800 �C. This corresponds most likely to the crys-
tallization of cerium oxide. It is in agreement with the
nucleation and growth analysis by in situ high temperature
XRD given in [4].
3.3 Characterization of CeO2 films
The h–2h scans of the CeO2 films are shown in Fig. 5. The
growth conditions for cerium oxide films were Ar-5% H2
gas processing atmosphere, a dwell time 60 min at 900 �C
and another dwell time range of 5–30 min at 1050 �C. The
strong CeO2 (200) peaks and absence of non-(h00) peaks
indicate that the buffer layers have a strong cube texture.
The intensity of (200) peaks depends on the thicknesses of
the films. The thicker film was formed, the higher intensity
of (200) was obtained.
Ce3+
[Ce(OAc)]2+
[Ce(OAc)2]+
[Ce(EDTA)]-
Ce(OH)3
0
20
40
60
80
100
10.28.26.24.22.2
pH
%
Ce3+
[Ce(OAc)]2+
[Ce(OAc)2]+
[Ce(OAc)3]
[Ce(EDTA)]-
Ce(OH)3
pH area (5.5-6.0) to produce clear, stable and homogeneous sol and gel
Fig. 3 Distribution of species
which contain Ce(III) ion, acetic
acid, EDTA, at 25 �C, I = 0.1 M
(with ratio of Ce3? acetic acid:
EDTA in 1:10:0.8)
J Sol-Gel Sci Technol (2009) 51:112–118 115
123
To examine the in-plane orientation of a CeO2 buffer
layer on Ni-W, pole figures were measured on a treated
Ni-W and a CeO2 film. Figure 6 shows the pole figures of
Ni (111) and CeO2 (222) in comparison. The CeO2 poles
are rotated by 45� with respect to the underlying Ni-W tape
due to an improved lattice match in this orientation
between CeO2 and Ni-W. The CeO2 buffer layer shows a
very good in-plane alignment (U-scan) on Ni with full-
width-at-haft-maximum (FWHM) value of 6.76� (Ni: 6.00�).
This value means that an expitaxial CeO2 film has been
formed onto the biaxially textured Ni-W tape. The results
are shown in Fig. 7.
An AFM micrograph of a CeO2 buffer layer, presented
in Fig. 8, indicates a continuous, crack-free, and dense
surface morphology. The average roughness is around
3.5 nm, which is rougher than the surface roughness of the
Ni-W substrate (around 2.0 nm).
A SEM micrograph of a CeO2 buffer layer on Ni-W
with thickness of 21.0 nm, exposed in Fig. 9 also reveals
that the film is continuous as well as crack-free.
The surface roughness of CeO2 on Ni-W obtained by
AFM measurements with different thicknesses were given
in Fig. 10. The thicknesses of the films were calculated
from spectroscopic ellipsometry measurements by fitting
(1)
(2)
488.385
(3)
357.778
85.5497160.826
(4)
0.00
20.00
40.00
60.00
80.00
100.00
0 200 400 600 800 1000Temperature, °C
Wei
gh
t, %
-20
-10
0
10
20
30
Tem
per
atu
re d
iffe
ren
ce, °
C/m
g
(1)_weight%_in air
(2)_weight%_in Ar
(3)_temp. difference_in air
(4)_temp. difference_in Ar
Fig. 4 TGA–DTA curves of
CeO2 gels in air and in Ar
atmosphere
(200)
-20
180
380
580
780
980
1180
1380
454035302520
2- Theta (degrees)
Lin
(co
un
ts p
er s
eco
nd
), r
elat
ive
inte
nsi
ty 13.9 nm21.0 nm35.4 nm
Fig. 5 XRD of CeO2 thin films
on Ni-W
116 J Sol-Gel Sci Technol (2009) 51:112–118
123
the parameters of a reference (known thicknesses) CeO2–
NiW model. The roughness value increased steeply with
the increase of film thicknesses from 10 to 40 nm.
Increasing the thicknesses of the films resulted in a gradual
increase of the roughness and starting from a thickness of
50 nm the roughness tends to be a constant. Nevertheless,
the roughness values of films varied in very small values
from 2 to 3.5 nm. Based on this observation, we can con-
clude that the films are smooth even though the thicknesses
of the films were extensively varied.
Fig. 6 X-ray pole figures of aNi-W (111) and b CeO2 on a
Ni-W substrate
-200
3300
6800
10300
13800
40 90 140 190 240 290 340 390
Lin
(co
un
t)
Lin
(co
un
t)
Ni (111)FWHM 6.00
0
100
200
300
400
500
60 110 160 210 260 310 360 410
Phi-scale (°)Phi-scale (°)
CeO2 (222)FWHM 6.76°
Fig. 7 Phi scans of Ni-W and a CeO2 buffer layer on a Ni-W substrate
Fig. 8 AFM micrograph of
CeO2 film with thickness of
21.0 nm in 2d (4 9 4 lm) and
3d (4 lm 9 4 lm 9 41.2 nm)
J Sol-Gel Sci Technol (2009) 51:112–118 117
123
4 Conclusion
We have successfully synthesized a novel water based
cerium acetate precursor. It is very stable and is expected to
leave less carbon residue compared to the precursors based
on organic solvents. It was also favorably used for the
preparation of CeO2 films. The influence of complexation
behavior in the formation of transparent and homogenous
sols and gels by the combination of cerium acetate, acetic
acid and H4EDTA has been studied and interpreted using
simulated metal-ligands equilibriums with the EQUIL
program. The occurrence of different species at different
pH values could be related to stable gel formation condi-
tions. The optimal growth conditions for cerium oxide were
Ar-5% H2 gas processing atmosphere, solution concentra-
tion levels of 0.2–0.4 M, a dwell time of 60 min at 900 �C
and another dwell time range of 5–30 min at 1,050 �C.
These films were characterized by XRD, AFM, SEM and
pole figures. Spectroscopic ellipsometry was used to mea-
sure the thickness of films. Highly textured CeO2 layers
were finally obtained.
Acknowledgments The authors would like to acknowledge the
following people D. Vandeput (Ghent University) for AFM mea-
surements, O. Janssen (Ghent University) for XRD, SEM and pole
figure measurements, M. Backer (Zenergy Power, GmbH) for pro-
viding us with Ni–W tape and T. Wagner (Lot–Oriel Company) for
spectroscopic ellipsometry measurements.
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