new transition metal silicoselenides possessing cdi2-type structures

6
Mat. Res. Bull., Vol. 23, pp. 107-112, 1988. Printed in the USA. 0025-5408/88 $3.00 + .00 Copyright (e) 1988 Pergamon Journals Ltd. NEW TRANSITION METAL SILICOSELENIDES POSSESSING CdI2-TYPE STRUCTURES + J. Qopalakrishnan and K.S. Nanjundaswamy Solid State and Structural Chemistry Unit Indian Institute of Science, Bangalore-560012, India (Received August 20, 1987; Communicated by C.N.R. Rao) ABSTRACT Three different kinds of first-row transition metal silicoselenides having CdL-related structures have been synthesized Vanadium and chromium Z form VSiSe and Cr _vSiSe, which are similar to MPSe crystallizing 3 1~^ ~ 3 in a hexagonal structure. Manganese forms Mn3/2SiSe 3 which is isostruc- tural with Mn3/zSiTe 3. With Fe, Co and Ni, a new type of silicoselenide of the formula MSi 2 Se4 (M = Fe, Co or Ni) is obtained. These sohds crystallize in the CdLz/Cr3S 4 structure where M atoms and Si-Si pairs occupy the cation positions. MATERIALS INDEX: Silicoselenides~ vanadium, chromium, manganese, iron, cobalt and nickel. INTRODUCTION Layered transition metal dichalcogenides exhibiting reversible intercalation of inorganic and organic species are of special interest in solid state chemistry (1,2), the prototype example being TiS with the Cd[ structure (3). Transition 2 2 metal phosphoselenides of the general formula MPSe 3 also adopt CdI_-related Z structure where P-P pairs and M atoms are ordered at Cd sites (4). Intercalation chemistry of MPSe~ and their thio analogues has been widely investigated in the literature (5,6). In view of the relationship between the electronic structures of solids containing P-P and Si-Si linkages (7), we expected that it may be possible to prepare transition metal silicoselenides which are analogous to MPSe 3. Because of the difference in the valencies of P and Si, the compositions are however not likely to be the same. A [SizSe 6] unit with 5i-5i bonds will bear six positive charges while a similar [PzSe6 ] unit possesses four positive charges. Accordingly, we would expect the formulas of silicoselenides to be MSiSe 3 where M is a trivalent metal and M3/2SiSe3 where M is a divalent metal. ]n addition, we would also expect the composition MSi~.See to be stable with divalent M atoms; in this case, equal amounts of M and (Si-Si) units would occupy Cd positions in the Cdl structure. 2 +Contribution No. 470 from the Solid State and Structural Chemistry Unit. 107

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Page 1: New transition metal silicoselenides possessing CdI2-type structures

Mat. Res. Bull . , Vol. 23, pp. 107-112, 1988. Printed in the USA. 0025-5408/88 $3.00 + .00 Copyright (e) 1988 Pergamon Journals Ltd.

NEW TRANSITION METAL SILICOSELENIDES

POSSESSING CdI2-TYPE STRUCTURES +

J. Qopalakrishnan and K.S. Nanjundaswamy Solid State and Structural Chemistry Unit

Indian Inst i tute of Science, Bangalore-560012, India

(Received August 20, 1987; Communicated by C.N.R. Rao)

ABSTRACT Three d i f ferent kinds of f i rs t - row transi t ion metal si l icoselenides having C d L - r e l a t e d structures have been synthesized Vanadium and chromium

Z form VSiSe and Cr _vSiSe, which are simi lar to MPSe crysta l l iz ing

3 1~^ ~ 3 in a hexagonal structure. Manganese forms Mn3/2SiSe 3 which is isostruc- tural wi th Mn3/zSiTe 3. With Fe, Co and Ni, a new type of si l icoselenide of the formula MSi 2 Se 4 (M = Fe, Co or Ni) is obtained. These sohds crysta l l ize in the CdLz/Cr3S 4 structure where M atoms and Si-Si pairs occupy the cat ion positions. MATERIALS INDEX: Silicoselenides~ vanadium, chromium, manganese, iron, cobalt and nickel.

INTRODUCTION

Layered t ransi t ion metal dichalcogenides exhibi t ing reversible in terca la t ion of inorganic and organic species are of special interest in solid state chemistry (1,2), the prototype example being TiS wi th the Cd[ structure (3). Transit ion 2 2 metal phosphoselenides of the general formula MPSe 3 also adopt C d I _ - r e l a t e d

Z structure where P-P pairs and M atoms are ordered at Cd sites (4). In terca la t ion chemistry of MPSe~ and their thio analogues has been widely invest igated in the l i te ra ture (5,6). In view of the relat ionship between the electronic structures of solids containing P-P and Si-Si linkages (7), we expected that i t may be possible to prepare t ransi t ion metal si l icoselenides which are analogous to MPSe 3. Because of the di f ference in the valencies of P and Si, the composit ions are however not l ike ly to be the same. A [SizSe 6] unit wi th 5i-5i bonds wi l l bear six posit ive charges whi le a s imi lar [PzSe6 ] unit possesses four posit ive charges. Accordingly, we would expect the formulas of si l icoselenides to be MSiSe 3 where M is a t r iva lent metal and M3/2SiSe3 where M is a divalent metal . ]n addit ion, we would also expect the composit ion MSi~.See to be stable wi th divalent M atoms; in this case, equal amounts of M and (Si-Si) units would occupy Cd positions in the Cdl structure.

2

+Contr ibut ion No. 470 f rom the Solid State and Structural Chemistry Unit.

107

Page 2: New transition metal silicoselenides possessing CdI2-type structures

108 J . GOPALAKRISHNAN, et al. Vol. 23, No. 1

We invest igated the format ion of Cd]z - re la ted phases in M-Si-Se (M = V, Cr, Fe, Co, Ni) systems by sealed tube react ion of the elements at elevated tempe- ratures. In this paper, we describe the synthesis of several new CdI - re lated,

2 • •

f i rs t - row transi t ion metal si l icoselenides. We have succeeded in character,z ing three d i f fe rent kinds of si l icoselenides of the fo l lowing formulas-" MSiSe 3 (M = V, Cr), M~/SiSe] (M = Mn), and MSizSe 4 (M = Fe, Co, Ni).

EXPERIMENTAL

Mixtures of M, Si, and Se corresponding to the composit ion MSiSe3, M 1 +xSiSe3, M3/zSiSe] and MSi2Se 4 were reacted in evacuated sealed si l ica ampoules at 700-800°C for varying durat ion ranging upto two weeks. The inner walls of the si l ica tube was coated wi th carbon to avoid react ion wi th the container. Solid phases formed were ident i f ied by powder X-ray d i f f rac t ion. Composit ions of the compounds formed in each case were f ixed by repeated t r ia l .

X-ray powder d i f f rac t ion patterns were recorded wi th a JEOL JDX-SP powd(,r d i f f rac tomete r using nickel f i l te red CulZ.~radiat ion. Infrared spectra in KBr pel lets were recorded using a Perk in-Elemer Model 580 spectrometer.

RESULTS AND DISCUSSION

We at tempted to prepare d i f fe rent composit ions in the M-Si-Se (M = V, Cr,

TABLE 1

Lat t i ce parameters and structure types of f i rs t - row transi t ion metal si l icoselenides

Compound Lat t i ce parameters Structure type

VSiSe3 Hexagonal -" a = 6.520(8) o -MPSe3 c = 19.550(9) A

Crl+xSiSe3 Hexagonal ." _a = 6.644(8) o MPSe 3 c = 19.643(7) A

Mn3/2SiSe 3 Hexagonal • a = 6.510 (3) o Mn3/2SiTe3 c = 13.715(4) A

FeSi2Se 4 Hexagonal : a = 3.615(3) o CdI 2 c = 6.048(2) A

CoSi2Se 4 Monocl in ic = a = 5.945(5) Cr3S 4 = 3.586(8) o

B = 91.82(4) °, --_c = 11.108(8)A

NiSi25e 4 Monocl in ic : a : 6.038(9) Cr3S 4 = 3.411(8)

O

6 = 91.84(4) ° c = 11.014(8)A

Page 3: New transition metal silicoselenides possessing CdI2-type structures

Vol. 23, No. 1 SILICOSELENIDES 109

TABLE 2

X-ray powder' d i f f rac t ion data of Mn3/2SiSe 3

o o o o

hkl dobs(A) dcal(A) l./l ° hkl dobs(A) dcal(A) i / [o

002 6.862 6.858 15 206 1.774 1.775 7 004 3.423 3.429 65 008 1.712 1.714 22 112 2.945 2.940 35 I08~ 1.640 ~ 7 104 2,931 2,930 100 304J 1,643 1,647

J

201 2,755 2,760 15 220 1,626 1,627 2 114 2,358 2,361 32 222 1,584 1,583 8 006 2,290 2,286 11 313 1,482 1,480 2 205 1.965 1.968 9 224 1.469 1.470 5 213 1.932 1.931 19 226 1.324 1.325 3 300 1.880 1.879 16 14.10 1.262 1.264 10 301 ~ 1.862 ~ 25 405 1.252 1.253 9 116J 1.860 1.870 J

Mn, Fe, Co, Ni) systems taking into account the known ox idat ion states of M atoms in chalcogenides. Considering that V and Cr exist in the t r i va lent state in several chalcogenides, we expected that compounds of s to ich iometry VSiSe 3 and CrSiSe3would be formed. Indeed we could prepare single phase mater ia ls

corresponding to VSiSe_ and Cr 1 +xSiSe. (x = 0.2) possessing hexagonal structures )

simi lar to MPSe 3 analogues (Table 1). S~ince Mn is known to exist in the divalent state in chaleogenides, we ant ic ipated t ha t a compound of the formula Mn~SiSe3 to be formed. Powder d i f f rac t ion pat tern of the manganese compour~l (Fig. '1) neat ly indexes on a hexagonal system wi th a = 6.510(3) and c = 13.715(4)A (Tab le 2). The c - a x i s of Mn3DSiSe~ is t w i c e t h a t of the CdI z s t r u c t u r e and not t h r e e t i m e s as ~ VSiSe3and C~" I S~iSe3. This shows t h a t the c a t i o n layer s e q u e n c e in this compound is l ike ly to b~Xas fol lows- I Mn~/3 (Si2)il~lMn~131~zl31 Se2, where I::ldenotes cat ion vacancy. Accordingly, the com-156und-is" isoslEruc~ural wi th Mn3/zSiTe 3 (8 ) .

With Fe, Co and Ni, solid state react ion corresponding to the composit ion M..^SiSe 3 did not yield single phase mater ials. On the other hand, composit ions

) / z corresponding to MSi~ Se 4 were readi ly formed as single phases possessing Cd[ 2 -re lated structures (Fig. 1)~ Indeed the FeSizSe 4 indexes on a CdI 2 cel l wi th a= 3.615(3) and 2 = 6.0b,8(2)A (Table 3). The Co and Ni compounds of this stoichio- metry also possess CdI 2 structure but show addi t ional superstructure lines which are indicat ive of an ordering of M atoms and Si-Si units at the octahedral sites. I f we assume that there is a 1:1 type of ordering of Si-Si and M atoms in the C d l . s t r u c t u r e , MI , . (S i_ ) Iml Se . , one would e x p e c t t he s t r u c t u r e s of t h e s e sol ids would be re la ted to ~rf~/~5 , Cr 1 Crl/21~/2 I S (9,10) Accordingly we could index

• . 3 4 . 2 . . " • • •

the powder d i f f rac t ion pat tern of Co~i~ ~eZ4 and NISI2Se 4 on monochnlc unit cells re lated to the Cr:~ S 4 structure (Table b,). MSi2Se 4 reported in this invest igat ion const i tute a new series of layered mater ia ls simi lar to the transi t ion metal dichalcogenides wi th a vander Walls gap. I t would therefore be interest ing to invest igate the in terca la t ion behaviour of these compounds.

A schematic representat ion of the structures o f the new sil icoselenides synthesized is shown in Fig. 2. The unit cell parameters of the si l icoselenides

Page 4: New transition metal silicoselenides possessing CdI2-type structures

110 J . GOPALAKRISHNAN, et al. Vol. 23, No. 1

10

(o)

g

I I I I I I I I I I I

(c) s -

o ,,m

I I I I I I I I I I

(d) 8 ~_ .

I I I 1 I 1 1 I I I 15 20 25 3 0 35 40 4 5 50 55 6 0 65

Cu K,C 28 (deg)

FIG. 1 X-ray powder diffraction of (a) Crl+xSiSes, (b) Mn3/2SiSes, (c) FeSi2Se 4 and (d) NiSi2Se 4.

TABLE }

X-ray powder diffraction data of FeSi25e 4

O O

hk| dobs(A) dcal(A) I/I °

001 6.050 6.048 5 002 3.050 3.024 4 101 , 2.780 2.780 90 102 2.170 2.175 100 003 2.012 2.016 25 110 1.810 1.807 45 111 1.725 1.732 20 004 1.510 1.512 23 202 1.390 1.390 10

Page 5: New transition metal silicoselenides possessing CdI2-type structures

Vol. 23, No. 1 SILICOSELENIDES 111

TABLE 4

X-ray powder d i f f rac t ion daLa of NiSi2Se 4

0 0 0 0

hkl dobs(A) deal(A) I / l ° hkl dobs(A) dcal(A) I/1 °

002 5.510 5.504 6 114 ~ 2.003~ i01 5.365 5.369 5 204 - 2.U03 2.002J 25

101 5.195 5.221 30 301 1.993 1.992 10 703 3.175 3.181 95 301 1.972 1.970 4 103 3.100 3.091 8 213 1.945 1.946 7 200 3.010 3.017 40 213 1.903 1.905 6 110 2.965 2.969 20 015 1.855 1.850 5 502 2.692 2.682 45 006 1.830 1.834 20 712 2.643 2.631 100 303 1.795 1.790 75 113 2.488 2.498 85 310 1.734 1.734 15 013 2.308 2.298 5 312 1.665 1.667 28 ~05 ~ 2.090 ~ 206 1.595 1.591 33 211J 2.100 2.080 ~ 25 i07 1.535 1.534 10 204 2.075 2. 67 5 305 1.505 1.505 I0 714 2.030 2.034 35 220 1.488 1.485 5

are l isted in Table 1.

The presence of Si-Si bonds in these compounds is revealed by i.r. spectra. A strong band seen around 420-450 cm -1 in al l the compounds is character is t ic

(al (b) (c)

O Se

O M o Si

FIG. 2

Schematic representat ion of the structures of (a) MSiSe3(M

(b) IVln3/2SiSe 3 and (c) MSi2Se 4 (M = Fe, Co, NiL

= V, Cr),

Page 6: New transition metal silicoselenides possessing CdI2-type structures

112 J. GOPALAKRISHNAN, et al. Vol. 23, No. 1

of Si2Se 6 units with Si-Si linkage. Si2Br6 shows this band at 479 cm -~ (11). MPSe 3 analogues show similar characteristic absorption around 4145 cm -I (12).

ACKNOWLEDGEMENT

The authors thank Professor C.N.R. Rao, F.R.S., for valuable advice and encouragement.

REFERENCES

I. C.N.R. Rao and 3. Gopalakrishnan, "New Directions in Solid State Che- mistry", Cambridge University Press (1986).

2. M.S. Whittingham and A.3. Jacobson, eds., "intercalation Chemistry", Aca- demic Press, New York (1982).

3. M.S. Whittingham, Prog. Solid State Chem. I_~2, 41 (1978).

4. W. Klingen, G. Eulenberger, and H. Hahn, Z. Anorg. Allg. Chem. 401, 97 (1973).

5. 3.W. Johnson, "intercalation Chemistry", M.S. Whittingham and A.3. Jacob- son, eds., p. 267, Academic Press, New York (1982).

6. R. Clement, O. (3arnier and 3. Jegoudez, [norg. Chem. 25, 11404 (1986) and the references listed therein.

7. R. Hoffman and C. Zheng, 3. Phys. Chem. 89, 4175 (1985).

B. H. Vincent, D. Leroux, and D. Bijaoui, 3. Solid State Chem. 6_~_3, 349 (1986).

9. F. 3ellinek, Acta Cryst. I___O0, 620 (1957).

10. F. Hulliger, "Structural Chemistry of Layer-Type Phases", F. Levy, ed., p. 307, D. Reidel, Dordrecht-Holland (1976).

11. F. H6fler, W.Sawodny and E. Hengge, Speetrochim. Acta 26A~ 819 (1970).

12. T. Mathey, R. Clement, C. Sourisseau and CL Lucazeau, Inorg. Chem. 19, 2773 (1980).