mesoporous silica thin films: k ~ 2 required for
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Mesoporous silica thin films: k ~ 2 required for <0.10 m integrated circuits
P. Yang, et al., Adv. Mat. 10, 1385 (1998)
• Current dense fluorinated silica or polymer films are not suitable
• Porosity is required, with mechanical and thermal stability
Transmission electron micrographs
1.5 2 2.5 3 3.5 4
PerpendicularParallel x4
Arb
itrar
y In
tens
ity
95 Å
(200) (300)
X-ray diffraction
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Bio-Optic Synthetic SystemsDr.Leonard Buckley, DARPA/DSO
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N.A. Melosh et al., Adv. Mater., submitted.
a b c
Tetraphenylporphyrin/silica/EO106-PO70-EO106
Optical Limiting Materials for Vision/Pilot Protection
Improved damage resistance compared to polymer hosts
a b c
1 mm
0 wt% F127 35 wt% F127 55 wt% F127
Increased dye solubility compared to inorganic glass hosts
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0 100 200 300 400 500
0 wt%29 wt%35 wt%45 wt%55 wt%
Tra
nsm
itta
nce
Incident Intensity (mJ/cm2)
Reduced light transmission at higher laser intensities
with Dr. Thomas Cooper, Wright-Patterson AFB