how to support the access of new users in distributed ... · how to support the access of new users...
TRANSCRIPT
How to support the access of new users in
distributed research infrastructures: a first
prototype for It-fab
Lorenza Ferrario, FBK and It-fab
• It-fab – outline of the ENL Italian network
• Building the It-fab technology and know-how repository
• Virtual access to It-fab – a demo tool
Summary
• Data management according to FAIR principles
• Conclusions and future work
Italian network implementing the ENL Italian node
Microfabrication
0.8 micron “CMOS like”
cleanroom, 500 sq.
meters
Si-MEMS cleanroom,
100 sq. meters
package area
Nanofabrication by e-
beam lithography
Testing
Electrical and functional
(optic, gas, solar
efficiency) on wafer
testing, manual and
automatic probes
Material
characterization
SIMS
ToF-SIMS
PTR-MS
XPS
XRD, XRF
SEM+EDX
AFM
RAMAN
Strengthening Nanofabrication – FESR investments
ISO 9001-9015 Certification
The Micro and Nano Facility FBK
http://mnf.fbk.eu http://cmm.fbk.eu
RF-MEMS Microheaters
(for gas sensing)
Microresonators
Devices developed at MNF
Silicon Photomultipliers
Single and Double Side Microstrip
• Several thousands of sqm of cleanrooms
• Advanced sensor and material technologies
• Excellence in nanomaterials, analysis, characterization
• Several hundreds of users: reserachers, technicians,
Students, PhDs, post-doc, ERCs
• ENL benchmarking: in progress
• Interaction with RTOs, Universities and Companies
(i) establishment of harmonized rules, for clean room
management and access policies, IP rules, external costs and
reporting;
(ii) harmonization and sharing of design and simulation
software, service contracts, management of professional
services;
(iii) definition of joint best practices for reciprocal support
and backup, complementarities, standardization of clean room
practices, interoperability and data exchange formats;
(iv) definition of common information system for know-how,
projects and equipment databases;
Acting as an attractive open research
infrastructure, coherent with ENL aims
• Let people know what It-fab can do
• Access rules, tariffs
• Training schema (safety, quality)
• Supporting users during process requirement
definition
• Better communication and coordination among
partners
Management execution system
Management execution system
external users
Optimized decisions about new equipment
Resources DB:TechnologyEquipment
Access and training policiesTariffs
Processing:Sensor
process flow
It-fab partners Temporary backup
Some interactions with It-fab
A single It-fab entry point
Structuring questions and answers
pre-processing users requests
addressing the requests according to
Information sharing
Personal contacts
web pagesSchools, conferences,
workshops
TechnologyEquipmentMaterialsProcesses
State of the resources
PoliciesAccess rules
costs
ISO classCompatibility
rules
Information groups
Relational DB prototype
Equipment
DB
Material DB
Access
Policies
Query toolDB direct access
Laboratories
DB
Operation required:
Adding/removing/patterning/mea
suring/thermal process
Starting from:
Blank wafer/Processed
wafer/Other item (sample, wafer
quarter,…)
Item history: what seen
before? What on the top?
It-fab virtual infrastructure
In progress sw tool
DEMO
DEMO
DEMO
DEMO
DEMO
DEMO
DEMO
DEMO
DEMO
AppProcessComposer
FabDeposition
Processes
ModificationProcesses
LithographicsMask
emulator
FAIR , OpenData, OpenScience
Findable Accessible Interoperable Reusable
FAIR principles
• Associated to unique identifier
• Well structured
• Findable by common and open protocols – http, ftp
• Consistent
• Suited to reuse, and machine processing
• …..
http://www.go-fair.org
An exampple: XML equipment description
equipmentId equipmentName processGroup handling forbiddenMaterials furtherInformation state decontaminationProcedures parameters
P001L001E003 RTP atmospheric thermal process 4 Au,Cu,Fe,Na,K https://www.bo.imm.cnr.it/unit/articles/clean-room 1 none
P001L002E001 Alcatel DRIE DRIE 4 Au,Cu,Fe,Na,K https://www.bo.imm.cnr.it/unit/articles/clean-room 1 ashing
P002L001E001 AMS200 DRIE DRIE 6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 0
Available gases: O2, SF6, C4F8, CH4, Ar
Pressure ~10E-2 mbar
Flows: O2 0-200 sccm; C4F8 0-400sccm; SF6
0-1000 sccm; He 0-200sccm, Ar 0-200 sccm,
N2 0-1000 sccm, CH40-100 sccm
Source generator 0-3000 W
Bias power 0-300 W
Chuck temperature -12 - +20 ºC
P002L001E002 Tegal903 plasma sample,4,6 https://mnf.fbk.eu/infrastructure 0 chamber and handling cleaning
P002L001E003 SPTS PECVD plasma sample,4,6 https://mnf.fbk.eu/infrastructure 1 chamber and handling cleaning
P002L001E004 Eclispe MRC IV PVD 6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1
P002L001E005 Centrotherm OX3 atmospheric thermal process 4,6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1
P002L001E006 Centrotherm LPCVD TEOS LPCVD 4,6 Au,Cu,Fe,Na,K https://mnf.fbk.eu/infrastructure 1
P002L001E007 Track SVG 8600 coating and developing 6 https://mnf.fbk.eu/infrastructure 2
Table format
<it-fabDB xmlsl=https://www.it-fab.org/equipment/….><id> P002L001E001</id><equipment>
<equipmentUniqueId>P002L001E001</ equipmentUniqueId ><equipmentName>AMS200 DRIE</equipmentName><equipmentProcessGroup>DRIE</equipmentProcessGroup><equipmentHandling>6</equipmentHandling><forbiddenMaterials>Au,Cu,K</forbiddenMaterials><exendedInfo>mnf.fbk.eu</extendedInfo><equipmentState>1</equipmentState><equipmentCleaningProcedures>ashing</equipmentCleaningProcedure><equipmentParameters>
<processGas>O2, SF6, C4F8, CH4, Ar</processGas><chamberPressure unit=”mBar”> 10e-2</chamberPressure><sourceGeneratorPowerMin unit=”W”>0</sourceGeneratorPowerMin><sourceGeneratorPowerMax unit=”W”>3000</sourceGeneratorPowerMax><biasPowerMin unit=”W”>0</biasPowerMin><biasPowerMax unit=”W”>300</biasPowerMax><chuckTemperatureMin unit=”oC”>-12</chuckTemperatureMin><chuckTemperatureMax unit=”oC”>20</chuckTemperatureMax>
</equipmentParameters></equipment>
Conclusions
Future work on the virtual process sw:
• Keep developing: adding etching, doping and patterning
to the process validators
• Enhancing the checking algorithms to better address
process flow building
• Further work on the FAIR data analysis
It-fab as Open RI
Documentation and tools to enable more and better use of
the infrastructure
Feedback and inputs from outside It-fab
