flatness recovery technique may 30, 2008 t. higo and t. takatomi

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Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

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Page 1: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

Flatness recovery technique

May 30, 2008T. Higo and T. Takatomi

Page 2: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

Flatness control• We made T18_VG2.4_disk #1, #2 ( also #3 and #4) by outside company,

Morikawa.• The machine, Seibu-denki, is precision lathe but the alignment of the axis

is intentionally slanted.• A study was done to make the end surface to be adjusted by a NC

movement of making a cone shape with its minimum step of 0.1 micron.• It seems we can control the surface well if we can accept the minimum

step of the NC control.• How do you think this cure? If you accept it, we do not need to make the

final machining at KEK. If not, we do the final cut at KEK but it gives us much work load.

• The cutting for the damping waveguide may simply makes us do the final cut at KEK. It will be determined at the preparation stage of the fabrication. I worry that some time is needed even for us because many years has passed since we made a so-called butterfly cell for DDS3 etc.

• Please give us comments.

Page 3: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

CLIC_vg1-A   Flatness measurement

Distribution of FlatnessCLIC_vg1(A&B)

0

2

4

6

8

10

12

14

0.5 0.6 0.7 0.8 0.9 1 1.1 1.2 1.3 1.4 1.5

Flatness(μ m)

Num

ber

cupdisk

A-No.00 cupside A-No.00 diskside

両面とも1 μ m程度中ベコになっている。これは加工機の初期設定によるものと考えられるばらつきは ±0.5 μ m程度

1 μ m中高にすることで平面度 ±0.5 μ mが可能

Page 4: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

Study condition in Japanese• 試験、測定:株式会社森川製作所

• 試験内容:    加工プログラムにより中高に加工した場合の平面の評価    ( 0μ m狙い、 0.2 μ m中高狙い、 0.5 μ m中高狙い)

• 加工条件:– 加工機:西部電機旋盤SNC-35HP(最小設定単位:0.1 μ

m)– ワーク:無酸素銅(アニール無し) φ55×20– 加工条件:

• 工具:単結晶ダイヤモンドバイト• 加工液:トナオイルS ( 昭和シェル石油 )• チャック:三爪チャック(チャック圧 0.07MPa)• 回転数: 500min-1• 切削速度: 0.015mm/rev• 切り込み量 :0.005mm

Page 5: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

平面 0 μ m狙い

Page 6: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

平面 0 .2μ m中高狙い

Page 7: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

平面 0 .5μ m中高狙い

Page 8: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

0.5μ m狙い平面写真

目視では段差は見られない

Page 9: Flatness recovery technique May 30, 2008 T. Higo and T. Takatomi

Result and discussion• The shape due to three nails for chucking were found. We assume that

this is due to the rough machining, though we should confirm.• Concave shape was confirmed without NC correction. The better flatness

this time is due to using a different machine, though of the same series. – 0.5 micron: CLIC_VG1=SNC-20HP (Seibu-denki)– 0.2 micron: Present test=SNC-35HP (Seibu-denki)

• The case of 0.5 micron target becomes 0.5 micron convex, as designed.• The step of NC correction is 0.1 micron. • I think the 0.1 micron step is tolerable.• KEK or SLAC should check this conclusion experimentally. If no voids

remains after diffusion bonding, it should be OK.• If OK, do we apply convex correction by say 0.2 microns?