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TEA Systems Corp. Confidential
LithoWorks PEBLithoWorks PEBLithoWorks PEBLithoWorks PEB
On-Wafer analysis of two wafers
August 8, 2003
Thermal analysis of two PEB plates:
093-08_peb_bake7.csv
093-08_peb_bake8.csv
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August 2003 LithoWorks PEB - Two plate study Page -2-TEA Systems Corp. Confidential
PEB #7
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August 2003 LithoWorks PEB - Two plate study Page -3-TEA Systems Corp. Confidential
PEB #7 overview
• Left graphic Details location of sensor points
• Right graphic Summary of rise/fall times vs temperature
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August 2003 LithoWorks PEB - Two plate study Page -4-TEA Systems Corp. Confidential
Sensor variation from wafer mean
• Each site contains a plot of delta-temp versus time
• Area product of (degrees * seconds), summed over
all sites. This is proportional to the energy entered into the wafer during the bake.
• Area Variance Energy variation across the wafer Summed deg-sec’s over all sites reporting
total variation from mean-temperature over time.
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August 2003 LithoWorks PEB - Two plate study Page -5-TEA Systems Corp. Confidential
Corresponding points on the graph
• Moving the mouse to a point on the temp-time curve will highlight the corresponding points on the delta-temp wafer plot
(50.1 sec, 113 C)
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August 2003 LithoWorks PEB - Two plate study Page -6-TEA Systems Corp. Confidential
On-Wafer thermal loading?
• Notice how the 7 wafer-center sites are the first to rise in temperature.• Note also the two sites located over the On-Wafer sensor packed lag in heading and also lag in
cooling. This area also does not reach uniformity until the end of the heading cycle. This is most probably due to the thermal-mass loading of the sensor packet.
• The red-dot on each plot marks the same relative point on each site.
Area of sensor packet
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August 2003 LithoWorks PEB - Two plate study Page -7-TEA Systems Corp. Confidential
PEB 7; Thermal Energy Delivered
• Plot of thermal area (deg-sec) across wafer.
• Notice that there is a range of 168,714 deg-sec with the upper left of the wafer receiving the most energy
• Thermal-package sensor area is relatively cool
• No activation threshold was set for this plot
thermal sensor area
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August 2003 LithoWorks PEB - Two plate study Page -8-TEA Systems Corp. Confidential
PEB 7; Thermal Energy Delivered
• Plot of area (deg-sec) integrated over time
• Notice that there is a range of 168,174 deg-sec with the upper left of the wafer receiving the most energy
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August 2003 LithoWorks PEB - Two plate study Page -9-TEA Systems Corp. Confidential
PEB 7: Thermal Energy Variance across wafer
• Variation in energy (integrated temperature*time) delivered
• Variation is greatest at wafer’s upper left corner, least in center & right.
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August 2003 LithoWorks PEB - Two plate study Page -10-TEA Systems Corp. Confidential
Thermal Energy Variance Across Wafer - Contour
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TEA Systems Corp. Confidential
PEB 8 Data
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August 2003 LithoWorks PEB - Two plate study Page -12-TEA Systems Corp. Confidential
Plate PEB 8, Bake Curve• Top: PEB 8
• Bottom: PEB 7
• Curves appear very similar in shape.
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August 2003 LithoWorks PEB - Two plate study Page -13-TEA Systems Corp. Confidential
PEB 8; Delta-Temperature Response
(50.1 sec , 113 C)
• Same point is marked on the time-temp curve. Distribution in upper left of wafer
is now very uniform.
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August 2003 LithoWorks PEB - Two plate study Page -14-TEA Systems Corp. Confidential
Comparison PEB 8 vs PEB 7• Time-Temp Area
Differences
• PEB 8 has a higher energy
area. Exhibits greater
excursion range and variation across the plate.
PEB 8 PEB 7
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August 2003 LithoWorks PEB - Two plate study Page -15-TEA Systems Corp. Confidential
Comparison: Delta temperature with time
• PEB 8 exhibits more variation at the bottom of the wafer.
PEB 8 PEB 7
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August 2003 LithoWorks PEB - Two plate study Page -16-TEA Systems Corp. Confidential
PEB 8; Thermal energy delivered
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August 2003 LithoWorks PEB - Two plate study Page -17-TEA Systems Corp. Confidential
Thermal Energy Delivered – Bake 8 Contour
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August 2003 LithoWorks PEB - Two plate study Page -18-TEA Systems Corp. Confidential
Comparison: Thermal Energy Delivered – PEB 8/ PEB 7
• Both wafers as plotted on the same scale.• More thermal energy delivered to PEB 7
PEB 8 PEB 7
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August 2003 LithoWorks PEB - Two plate study Page -19-TEA Systems Corp. Confidential
Thermal Energy Variation – Bake 8 Contour
• Energy delivered as a delta from the wafer average temperature.• Energy = Sum((Temperature-Activation Temp.) * DeltaTime)
DeltaTime = time interval of sample
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August 2003 LithoWorks PEB - Two plate study Page -20-TEA Systems Corp. Confidential
PEB 8: Greatest variation in thermal energy
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August 2003 LithoWorks PEB - Two plate study Page -21-TEA Systems Corp. Confidential
Comparison: Thermal Energy Variation – PEB 8/ PEB 7
• Scales vary but characteristic is same• PEB 7 has has significantly better energy uniformity
PEB 8 PEB 7
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August 2003 LithoWorks PEB - Two plate study Page -22-TEA Systems Corp. Confidential
Comparison energy variation statistics
• PEB 8 exhibits A greater mean temperature, range and variance of temperature than PEB 7
PEB 8 PEB 7
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August 2003 LithoWorks PEB - Two plate study Page -23-TEA Systems Corp. Confidential
PEB 8/ PEB 7; thermal variation
• PEB 8 and 7 variations plotted to the same scale.
PEB 8 PEB 7
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August 2003 LithoWorks PEB - Two plate study Page -24-TEA Systems Corp. Confidential
Thermal range study Bake8
• Temperature range about the average temperature of the wafer at each time-slice.
• The cycled-temperature rose a total of 98.07 degrees.
• Steady state uniformity is 0.18 degree across wafer.
• Notice that the wafer at 121 degrees (max. temp at 134 sec.) did not reach steady-state uniformity.
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August 2003 LithoWorks PEB - Two plate study Page -25-TEA Systems Corp. Confidential
Thermal range study Bake7
• Same study with PEB 7
• This study shows a red square at each transition start/stop point on the curve.
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August 2003 LithoWorks PEB - Two plate study Page -26-TEA Systems Corp. Confidential
Range Uniformity Summary
• Plots exhibit the thermal range across the wafer at each time-slice• Both plates exhibit the same steady-state thermal resolution.
Thermal range and maximum temperatures differs by approximately one degree
• Neither plate reaches steady state while at the maximum temperature.• Bake 8 has
greater across-wafer variations (9.6 v 7.0 degrees) Greater range at the final temperature (0.9 v 0.6 degree) Smoother cooling curves than 7 Near identical rise/cool thermal slopes and time at the maximum temperature compared with Bake 7
• Conclusion: Bake 8 has more thermal variation across the wafer.
Bake 8 Bake 7
Bake 8
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August 2003 LithoWorks PEB - Two plate study Page -27-TEA Systems Corp. Confidential
Thermal Uniformity at any point in time• Generate single or matrix
graphics of all of the plots.
• A “movie” video will also be added to allow you to watch wafer heating.
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August 2003 LithoWorks PEB - Two plate study Page -28-TEA Systems Corp. Confidential
Thermal changes during the up-ramp
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TEA Systems Corp. Confidential
Feature Analysis from older data sets.
These data sets are not necessarily tied in with the peb 7&8
This is an attempt to see if there is any obvious correlation in the hopes that they may have been processed on one of the plates.
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August 2003 LithoWorks PEB - Two plate study Page -30-TEA Systems Corp. Confidential
New Hotplate Top-CD
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August 2003 LithoWorks PEB - Two plate study Page -31-TEA Systems Corp. Confidential
New hotplate, PR2 variation
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August 2003 LithoWorks PEB - Two plate study Page -32-TEA Systems Corp. Confidential
BCD Response
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August 2003 LithoWorks PEB - Two plate study Page -33-TEA Systems Corp. Confidential
TCD Old
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August 2003 LithoWorks PEB - Two plate study Page -34-TEA Systems Corp. Confidential
Old Plate, TCD residuals to wafer
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August 2003 LithoWorks PEB - Two plate study Page -35-TEA Systems Corp. Confidential
Old Plate; TCD - IFD and Mean
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August 2003 LithoWorks PEB - Two plate study Page -36-TEA Systems Corp. Confidential
Old, PR2 Wafer
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August 2003 LithoWorks PEB - Two plate study Page -37-TEA Systems Corp. Confidential
Old PR2 Wafer Resids
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August 2003 LithoWorks PEB - Two plate study Page -38-TEA Systems Corp. Confidential
PR2 IFD and Mean for each field (wafer removed)
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August 2003 LithoWorks PEB - Two plate study Page -39-TEA Systems Corp. Confidential
SWA – PR1 Old Wafer
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August 2003 LithoWorks PEB - Two plate study Page -40-TEA Systems Corp. Confidential
SWA1 Old PEB - Wafer
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August 2003 LithoWorks PEB - Two plate study Page -41-TEA Systems Corp. Confidential
PR2 – SWA Wafer model
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August 2003 LithoWorks PEB - Two plate study Page -42-TEA Systems Corp. Confidential
PR2 – SWA Wafer Resids