design and fabrication of a radiation-hard 500-mhz digitizer using deep submicron technology

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R. Kass US LC Conference 1 Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology R. Kass The Ohio State University July 29, 2004 S. Smith SLAC K.K. Gan, M.O. Johnson, R.D. Kass, A. Rahimi, C. Rush The Ohio State University

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Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology. July 29, 2004. R. Kass The Ohio State University. K.K. Gan, M.O. Johnson, R.D. Kass, A. Rahimi, C. Rush The Ohio State University. S. Smith SLAC. Presentation Outline. l NLC Requirements - PowerPoint PPT Presentation

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Page 1: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

R. Kass US LC Conference1

Design and Fabrication of a Radiation-Hard 500-MHz DigitizerUsing Deep Submicron Technology

R. Kass

The Ohio State UniversityJuly 29, 2004

S. SmithSLAC

K.K. Gan, M.O. Johnson, R.D. Kass, A. Rahimi, C. Rush

The Ohio State University

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Presentation Outline

NLC Requirements

ADC (“digitizer”) Design

Progress Report

Plans

Page 3: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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NLC will collide 180-bunch trains of e- and e+:bunch spacing: 1.4 nsalignment of individual bunches in a train: < 1 mBPM determines bunch-to-bunch misalignmenthigh bandwidth kickers bring the traininto better alignment on next machine cycle multi-bunch BPM system with digitizers: 11-bit effective resolution 500 MHz bandwidth 2 G samples/s

Beam Position Monitor Requirements at NLC

Page 4: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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Requirements of NLC Digitizers

Function Qty. Resolution

(eff. bits)

Bandwidth

(MHz)

Comments

LLRF Control 13,000 11 100 Slightly beyond state-of-the-art

Structure BPM 22,000 8 5 Existing technology

“Quad” BPM 10,000 11 12 Existing technology

Multi-bunch BPM 1,200 11 500 Well beyond state-of-the-art

Total 46,200

important to demonstrate feasibility of high speed/resolution digitizersredesign of low level RF technology is needed without the digitizers

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Proposal Design a digitizer chip using deep-submicron technology (0.25 m)use enclosed layout transistors and guard rings☺radiation hard: > 60 Mrad☺no need for costly shielding and long cables☺easy access to electronics for testing and maintenance Extensive experience in chip design using Cadencedesigned radiation-hard chips for CLEO III, ATLAS, CMS

Why OSU is interested?help to solve a challenging NLC problempotential applications in HEP

Holtkamp Committee rankings: 2 on scale of 1 to 4 (lowest)funded for 2003-4 and 2004-5

Page 6: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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12-bit Pipelined Digitizer

input crudely digitized by 1st 3-bit cell digitized value subtracted from input

difference is amplified by 8 and sent to 2nd 3-bit cell…

13 bit: roundto 0 or 12 bit

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most challenging digitizer: 11 bit, 2 G samples/s, 500 MHz bandwidth input: sequence of doublets at 1.4 ns batch spacing

characterize with one parameter: pulse height

minimum sampling: 1/1.4 ns = 714 MHz

interleaving 3 digitizers for redundancy

2 G samples/s

Digitizer for Multi-bunch BPM

Page 8: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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submicron CMOS supply voltage: 2.5 V

differential signal: ~ 1.6 V full swing

LSB: 1.6 V/212 = 390 V

stability/accuracy of comparator thresholds,amplifier & S/H gains, charge injection:195 V = 0.5 LSB = 0.5/212 → 0.012%

Precision

Page 9: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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gain-bandwidth requirement:

assume 0.7 ns for sample and 0.7 ns for hold settling to 0.5 LSB for 12-bit digitizer requires 9: 0.5/212 ~ e-9

ns/9 78 psrise time 2.2 psgain x bandwidth 8 x 1/2GHz

IBM process SiGe BiCMOS 6HP/6DM via MOSIS: ☺40 GHz NPN bipolar transistors

Fabrication Process

Page 10: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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3-Bit Cell

Page 11: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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Simulate with Cadencesample/hold + flash ADC/flip-flop:designed/simulatedfrom schematic with parasitic capacitances

multiplexer: logic is fast but somewhat noisy

op-amp + encoder: use real devices in simulation

3-Bit Cell Status

Page 12: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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design and simulated from schematic with parasitic capacitancesswitch-on resistance small enough to allow 9 in 700 ps

switching offset (noise) largely cancelled with dummy switch:100 mV 1 mV

Sample/Hold Status

Page 13: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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Cadence Simulation of Sample/Hold Progress

switch chargeinjection

Amplifier: idealAmplifier: Jan. 04 design

Amplifier: July 04 design

Page 14: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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AMP Specsrise time goal: 171 ps achieve:186 psneed V=195V for 12-bit precision

Simulation of Amplifier

January 2004V=298V

July 2004V=194V

Page 15: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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Offsets differ by~2.8mV

Issues to be resolved:Offset from S/H not constant.Offset is a function of input signal slope.

Current S/H Simulation Issue

VT(“/vin”) ≡ input to 1st S/HVT(“/out2”) ≡ Output from 2nd S/H

Page 16: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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Year 2004-5: complete design of amplifier + 3-bit cell layout, submission, and testing of the building block circuitsYear 2005-7 layout, submission, and testing of the prototype digitizer radiation hardness tests continued system design of prototype 11-bit digitizer

Plans

Page 17: Design and Fabrication of a Radiation-Hard 500-MHz Digitizer Using Deep Submicron Technology

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EXTRA SLIDES FOLLOWS

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