1 brookhaven science associates national synchrotron light source ii nanoprobe beamline k....
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National Synchrotron Light Source II
Nanoprobe Beamline
K. Evans-LutterodtNovember 8th, 2007
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Scientific Mission
Allow the study of nanomaterials which today play important roles in many diverse scientific fields, opening up a wide range of scientific problems ranging from studying the structure and function of catalytic nanoparticles, to the mapping of strain in buried grain boundaries, to determining the structure of single molecule devices.
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Example: Energy ResearchFully functioning micro-fuel cells
Fritz Prinz, Stanford Univ.
R. O’Hayre, F. B. Prinz, J. Electrochem. Soc. 151, A756 (2004)
Need to determine
Structure
Composition
Volume
Surface Area
of Pt nanoparticles in a carbon matrix
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Beamline Requirements and Specifications
• Requirements• 10% Source size stability• Floor vibration monitoring• 25nm floor noise; (active vibration isolation gives 0.25nm)• Remote endstation
• Specifications• 1nm (convolution of spot size and mechanical stability)• Energy range*, 4.3 keV to 30 keV (covers elements Sc to U )
*Do not expect to have 1nm over entire energy range (18 keV+)
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Conceptual Layout of Nanoprobe
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Physical Layout of Nanoprobe
FOE
Mono hutch 1
Mono hutch 2
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Location
Nanoprobe line
XPCS
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Insertion Device
• CPMU U19, or U20 device
• Low Beta straight section (maximum brightness)
Type of source Low- straight section (6.6m)
σx [μm] 28
σx' [μrad] 19
σy [μm] 2.6
σy' [μrad] 3.2
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Front end Layout
• Front End Fixed Mask (FEFM)• Z=14m• Aperture Y=300um, X=1100um
• Differential Pump• Z=14.5m
• Front End Adjustable Horizontal Source Aperture (FEHA)• Z=16m• Aperture Y=open, X=(0-1500um)+/- 500um
• Shield Wall• Z=26.7m
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Engineering Analysis of Front End Fixed Mask
Thermal Analysis
Stress Distribution
Subjected to white beam from U19 CPMU device:
Analysis also performed for FE horizontal aperture
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First Optics Enclosure
Contains:
• Power filter (Diamond)
• White beam Slits
• Horizontal Focusing mirror
• Conductance limiting Be window
• High heat load mono
• White beam monitor
• Bremsstrahlung stop
• Mono fluo screen
• Secondary Horizontal Source Aperture (+ BPM)
• Monochromatic shutter
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Power management
Undulator produces 7.8kW
• FEFM (Mask) absorbs (7.8kW - 354W)=7.446 kW
• HFM (Mirror) absorbs (354W-220W)= 134W
• HHM (Mono) absorbs 220W• HRM ( Mono) ~0W
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Monochromatic Hutch 1
Tertiary Slits
Beam monitor
High Resolution Mono
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Monochromatic Hutches
Hutch 1• Quad diode BPM • Aperture: Y=10mm, X=25mm
• Removable • Tertiary Horizontal Source Aperture
• Aperture Y=open, X = (0-5.0mm)+/-30mm• Monochromatic Fluorescent Screen• High-resolution mono (10-5 dE/E,
removable fixed exit, energy range set by high res optics.)
• Possible location for experimental endstation
Hutch 2• 1 nm experimental
endstation (at > 75m from source)
• Includes nanofocusing optics and sample stage
• Emphasizes fluorescent measurements
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Multilayer Laue Lenses
substrate
Varied line-spacing grating
Depth-graded multilayers on flat Si substrate
• Deposit varied line-spacing grating on flat substrate (thinnest structures first)
• Section to 5-20 m thickness (high aspect ratio structure)
•Assemble two into a single device (MLL)
CNM, APS group: Maser et al.
< 20nm performance!
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Instead of solid refractive optic:
Use a kinoform:
One can view the kinoform equivalently as
a) A blazed zone plate
b) An array of coherently interfering micro-lenses.
Kinoform Optics
K. E-L et al. (2003)
< 80 nm
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Beamline design issues are the same for types of optics:
Both are line focus elements:
will allow to correct for different vertical and horizontal source locations
Both are chromatic ~ 10-5, but MLL bandwidth is factor of 2 broader
We do not need to re-design beamline to accommodate either optic
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Source
rad
mS
m
rad
mS
m
H
cohH
H
V
cohV
V
6.19
68
29
2.5
6.7
2.3
,
,
Focusing Optics
mD
DeMag
f 500
7600
Focal Point
@ 76.01m
Front End Aperture (FEFM + FEHA)
.
Horizontal Focusing Mirror (HFM)
Secondary Horizontal Source Aperture (SHSA)
mradmfwh
nmfwhm
V
V
50
0.1
Operational Mode 1: Direct mode
Endstation in mono hutch 2 ( back hutch)
Side View
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mD
DeMag
f 269
1360)1(
)1(
Secondary Focusing Optics
mD
DeMag
f 500
50)2(
)2(
.
Source
rad
mS
m
V
cohV
V
2.5
6.7
2.3
,
Focal Point @ 41.34m
Front End Aperture (FEFM + FEHA)
Secondary Horizontal Source Aperture (SHSA)rad
mS
m
H
cohH
H
6.19
68
29
,
Waveguide
mradmfwh
nmfwhm
V
V
50
0.1
)2(
)2(
..
Operational Mode 2: Waveguide mode
Endstation in mono hutch 1mradmfwh
nmfwhm
V
V
0.9
50
)1(
)1(
Primary Focusing Optics
Horizontal Focusing Mirror (HFM)
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Endstation 1 (APS Nanoprobe/Xradia)
Endstation Features
First version being commisioned at APS
Optical resolution 30nm
Mechanical resolution projected 5nm
More R&D required for positioning
Fluorescence nanoprobe
Full Field imaging
Nano-Diffraction
Nano-tomography
Cryo sampleholder
Beam Direction
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Requirements imposed on Project
On Conventional Facilities:• Real time monitoring of vibrations• Long beamline
• Satellite Building• Utilities• Ramp over long beamline section
On Accelerator Systems• Electron beam stability of 0.3 microns over 8 hrs
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Outstanding Issues
• Diamond filter thickness and phase error characterization
• 1nm resolution optics; Ongoing R&D effort
• Conservative mode is long beamline.
• Progress elsewhere on waveguide mode might give shorter beamline
• Vibration analysis/design ( see next)
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Should we attach nanoprobe to ring or not?Option A: Nanoprobe slab connected to main ring
Option B: Nanoprobe slab isolated from main ring
Nick Simos; finite element analysis tools
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And the answer is:
Some vibration sources:
and the system response
Separating the nanoprobe remote slab reduces vibrations at experiment
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WBS Dictionary: All activity related to the design, construction, and commissioning without beam of an insertion device beamline for nanoprobe studies.
Undulator Beamline 2 Hard X-ray Nanoprobe (HXN)
Total Estimated Cost ($ x 1000)
WBS Description
Direct $
Total Burdened
& Escalated
Bottoms up Contingency
Total with Contingency
FTEs LaborNon-Labor
(Mtrl, Trvl, Act)% $ Value
1.04.05.02 Undulator Beamline 2Hard X-ray Nanoprobe (HXN) 12.5 1,084 8,784 12,726 44 5,592 18,319
1.04.05.02.01 Enclosures 0.4 34 1,200 1,474 2 413 1,887
1.04.05.02.02 Beam Transport 0.1 6 250 318 .10 32 349
1.04.05.02.03 Utilities 0.5 34 350 508 1 102 610
1.04.05.02.04 White Beam Components 0.4 30 203 299 2 60 359
1.04.05.02.05 High Heatload Optics 0 0 1,248 1,615 1 291 1,905
1.04.05.02.06 Beam Conditioning Optics 0.4 31 604 770 1 85 855
1.04.05.02.07 Personnel Safety System 0.8 49 65 182 .24 44 226
1.04.05.02.08 Equipment Protection System 0.4 24 25 86 .24 20 104
1.04.05.02.09 Endstation 1 0.7 57 3,481 4,238 6 3,221 7,460
1.04.05.02.11 Beamline Controls 0.2 12 400 497 2 149 646
1.04.05.02.12 Beamline Control Station 0 0 25 34 0 0 34
1.04.05.02.13 Beamline Management 8.7 806 33 1,642 2 804 2,447
1.04.05.02.14 Satellite Building 0 0 900 1,064 1 372 1,436
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Schedule Summary
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Summary
• Nanoprobe line can be built to specifications, on time and on budget
• The design will deliver 1nm beams and experimental capability that will have significant impact across a range of disciplines
• Risks• Need significant improvements in positioning control• Optics R&D • Attention to vibration sources