0 1 width-dependent statistical leakage modeling for random dopant induced threshold voltage shift...
TRANSCRIPT
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Width-dependent Statistical Leakage Modeling for Random Dopant Induced Threshold Voltage Shift
Jie Gu, Sachin Sapatnekar, Chris Kim
Department of Electrical and Computer EngineeringUniversity of Minnesota
[email protected]/~chriskim
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Outline Introduction Conventional statistical leakage modeling Proposed statistical leakage modeling
“Microscopic” random dopant fluctuation
Experimental results Application to leakage sensitive circuits
Dynamic circuits SRAM memory bitlines
Conclusions
4
Motivation
worst-case corner
(150nm CMOS Measurements, 110°C)
nominal corner
4X variation between nominal and worst-case leakage Channel length/width variation, line edge roughness,
dopant fluctuation Performance determined at nominal leakage Power/robustness determined at worst-case leakage
0
50
100
150
200
Normalized IOFF
Nu
mb
er o
f d
ies
0 1 2 3 4 5 6 7
5
Leakage Variation Impact: Dynamic Circuit Example
Static keeper prevents the dynamic node droop Keeper has to be properly sized for sufficient noise margin Accurate leakage estimation is critical for meeting noise margin
requirements
0
50
100
150
200
Pull down leakage
Nu
mb
er o
f d
ies
0 1 2 3 4 5 6 7
clk
...RS0
D0
RS1
D1
RS7
D7
Dyn_out
keeper
IleakIleakIleak
wo
rst-
case
co
rner
Over-designed for robustness
Fail to meet target robustness
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Conv. Statistical Leakage Modeling
0VV W,,0T0T
Conventional approach (square-root method):
Device parameters provided by fabs:
00VT
VT
/mkTqVleak
LW
LW/)(V
)(V
WeI
0T
0T
T
Statistically, larger devices have lesser variation
W0
GSD
W
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µ-RDF Induced Threshold Voltage Shift
Threshold voltage depends on both the # of dopants in the channel and the “microscopic” random dopant placement
30mV+ VT shift has been reported by P. Wong (IEDM ’93)
VT=0.78V, 130 dopants, Leff = 30nm
3D simulation results on surface potential A. Asenov, TED 1998
VT=0.56V, 130 dopants, Leff = 30nm
Evenly distributed dopants
Dominant leakage path
Unevenly distributed dopants
S
D
S
D
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Golden Statistical Leakage Modeling
Golden approach:
0T
0T
Ti
VTi
VTi
n
1i
/mkTqV0leak
)(V
)(V
eWI
Need to sum the leakage dist. of the sub-devices
0VV W,,0T0T
Device parameters provided by fabs:
W0
VTi
GSD
W0W=nW0
VTi+1
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Conventional versus Golden Method
3σsquare3σgolden
32%
Leakage model shows 32% discrepancy btwn 3σ values µ(VT) reduces when adding lognormal distributions
Delay model matches well with golden results µ(VT) does not change when adding normal distributions
32nm PTM
Leakage distribution Delay distribution
1,)V-(VWIn
1iTidd0on
n
1i
/mkTqV0leak
TieWI
32nm PTM
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Statistical Leakage Estimation
Effective VT concept introduced to model width-dependency
inaccurate
VTi W0
Golden Conventional Proposed
W=nW0VTi+1
Given reference device parameter: W0 , ,0TV0TV
),,W(f)(V
),,W(f)(V
eWI
0T0T
0T0T
Teff
VVTeff
VVTeff
/mkTqVleak
00VT
VT
/mkTqVleak
LWLW
/)(V
)(V
eWI
0Tsq
0Tsq
sqT
0T
0T
Ti
VTi
VTi
n
1i
/mkTqV0leak
)(V
)(V
eWI
(VTi varies due to RDF )
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Previous Work and Our Contribution
To the best of our knowledge, this is the first work to model the VT dependency on device width Previous work proposed by Ananthan (DAC06), Chang (DAC05),
Narendra (ISLPED02) did not consider this Simple closed-form expression derived that can handle
continuous width case
mkTqV
1
T1
eW
mkTqV
2
T2
eW
mkTqV
3
T3
eW
lawsquarefollows
)V()V()V( T3T2T1
Previous work Proposed
))V(),V(,W(f)V(
))V(),V(,W(f)V(
0T0TiTi
0T0TiTi
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Given a reference device with Wx, μ0, σ0
Wy=nWx Discrete width multiplication
Directly apply Wilkinson’s method
Wy=αWx (α=n/m) Continuous width multiplication (α is any rational
number) Extend Wilkinson’s method to handle
continuous integration
Calculation of Effective VT
q/mkT
V
yq/mkT
Vn
1ixleak
yTiTx
eWeWI
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Wilkinson’s Method
2/m2/mn
1i1
2yy
2ixix nee)S(Eu
2yyjxixij
2jx
2ixjxix
2ixix
2m222/)r2(mmn
1ij
1n
1i
2m2n
1i
22 enee2e)S(Eu
122y
21y
uln2uln
uln2/1uln2m
First moment:
Second moment:
Moment matching results:
yxn
1i
nWeeW i
Sum of lognormals can be approximated as a single lognormal with a calculable mean and standard deviation
y is the new Gaussian variable calculated by moments matching
A. Abu-Dayya, IEEE Vehicular Technology Conference, 1994
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Discrete Width Multiplication (Wy=nWx)
0)n
e)1n(eln(B
2TxV
2x
2TxV
2
Tx
BrB2V
2
22V
2V
VV
B/
B/2
1
TxTy
TxTy
where
Both the mean and sigma of VT decreases with larger device width
The mean and sigma of VT also decreases with smaller rx
Effective VT Sub-device VT
.coeffncorrelatior,qmkTB x
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Spatial Correlation Coefficient)eW,eW(r)eW,eW(r 2Ty1Tyi2Txi1Tx BV
y
BV
y
BVn
1ix
BVn
1ix
1e
1e
)eW()eW(
)eW(E)eW(E)eWeW(E
)eW,eW(r
2TyV
2
2TyV
2y
2yT1yT
2yT1yT2yT1yT
2yT1yT
B
Br
BV
y
BV
y
BV
y
BV
y
BV
y
BV
y
BV
y
BV
y
1n
e)1n(e
1e
)eW()eW(
)eW(E)eW(E)eWeW(E
)eW,eW(r
2TxVx
2TxV
2
2TxV
2x
i2Txi1Tx
i2Txi1Txi2Txi1Tx
i2Txi1Tx
rB
Br
BVn
1ix
BVn
1ix
BVn
1ix
BVn
1ix
BVn
1ix
BVn
1ix
BVn
1ix
BVn
1ix
x2V
2V
xBrB
2V
2
y rr
ne)1n(e
ln
Br
Ty
Tx
2x
2x
2TxV
2
Tx
ry goes up as width increases (rx≤ ry ≤1 and ry=1 iff rx=1)
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Reference Device Size Independence
Same results can be obtained independent of the reference device size
22V
2V
VV
B/
B/2
1
TyTx
TyTx
)n/1
e)1n/1(eln(B
2TyV
2y
2TyV
2
Ty
BrB
2V
2
x2V
2V
y rrTy
Tx
Given μy, σy of a large device with Wy, we can reverse the calculation to find out μx, σx of a smaller device with Wx
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Assume there exists a small virtual device that satisfies Wx=mW0,
Wy=nW0. Applying Wilkinson’s for both we get,
x2V
2V
y rrTy
Tx
Continuous Width Multiplication (Wy=αWx)
Expression identical to the discrete width multiplication case
22V
2V
VV
B/
B/2
1
TxTy
TxTy
where 0)e)1(e
ln(B
2TxV
2x
2TxV
2
Tx
BrB2V
2
Effective VT Sub-device VT
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Width Dependent VT Statistics
21mV difference in VT mean between conventional and golden method
No significant difference in VT sigma between golden, square-root, and proposed method
32nm PTM
21mV
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Leakage Distribution Comparison:Different Widths
Leakage estimation error (3σ point) reduced from 10.5% to 0.8% using the proposed model
3σsquare
(10.5% error)
3σproposed
(0.8% error)
3σgolden
W=5W0
/ =10%, r=0TxVTxV
3σsquare
(11.4% error)
3σproposed
3σgolden
(1.4% error)
/ =10%, r=0TxVTxV
W=10W0
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Leakage Distribution Comparison:Different σ/µ’s
Error of conventional approach increases to 45.5% for larger σ/µ due to larger variation between the sub-devices
Proposed approach exhibits a smaller leakage estimation error (<12.0%) limited by the accuracy of the Wilkinson’s formula
/ =15%TxVTxV
3σsquare
(26.8% error)
3σproposed
(5.1% error)
3σgolden
W=5W0, r=0
3σsquare
(45.5% error)
3σproposed
(12.0% error)
3σgolden
/ =25%TxVTxV
W=5W0, r=0
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Leakage Distribution Comparison:Different Correlation Coefficients
Conventional model does not consider spatial correlation (assumes that sub-devices are uncorrelated)
Proposed work’s estimation error is small for a wide-range of VT correlation coefficients
3σsquare
(19.0% error)
3σproposed
(0.8% error)
3σgolden
r=0.1
W=10W0, / =10%TxVTxV
3σsquare
(33.8% error)
3σproposed
(0.4% error)
3σgolden
r=0.4W=10W0, / =10%TxV
TxV
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Design Example: Dynamic Circuit Keeper Sizing
Conventional approach underestimates the pull-down leakage misguiding the designer to use a smaller keeper
This work shows that a 30% keeper size up is required to meet the target noise margin
clk
...RS0
D0
RS1
D1
RS7
D7
Dyn_out
keeper
IleakIleakIleak0
50
100
150
200
250
300Square-root Proposed Golden
Pull-down NMOS WidthK
eep
er S
ize
(nm
)
15W0 30W0 45W0
20%5%
20%3%
25%
5%* Numbers show estimation error
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Design Example: SRAM Bitline
Actual bitline delay is 3-12% longer than expected when using the conventional model due to underestimated bitline leakage
10% Vdd
BL
Vo
lta
ge
(V
)
Time (ns)0.2 0.4 0.6
Vdd
10% Vdd
BL
Bitline Delay w/o BL Leakage
Bitline Delay w/ BL Leakage
200
300
400
500
600
64 128 256
Square-root Proposed Golden
Number of Cells per Bitline
3σ
Bit
lin
e D
ela
y (
ps
)
3% 0.3%5%
0.5%
11%
1%* Numbers show estimation error
WL='1'
'1' '0'
BL
WL='0'
'0' '1'
WL='0'
'0' '1'
Ion
Ileak
Sense Amplifier
VT0
VTn
Unaccessed cells
Accessed cell
Ileak
BL
...
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Conclusions “Microscopic” RDF leads to width-dependent VT
Conventional statistical VT model is inaccurate Only capable of modeling on current (linear function of VT)
Fails to model leakage current (exponential function of VT)
Exhibits as much as 45% error in 3σ leakage value
Proposed width-dependent VT model Simple closed-form expression with than 5% estimation error Can be expanded to general sources of within-device variation Handles both uncorrelated and correlated process variables Useful for leakage-sensitive circuit designs such as dynamic
circuits, SRAM bitlines, and subthreshold logic