thermally induced stress in a glass-silicon bonded mems micro-structure

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earch, Inc. 2142 – N. 88 th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail ally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Stru A Finite Element Analysis ( FEA ) using flexPDE Craig E. Nelson - Consultant Engineer

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Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure A Finite Element Analysis ( FEA ) using flexPDE. Craig E. Nelson - Consultant Engineer. The purpose of this numerical experiment is to learn about the field distribution of stress and strain in a MEMS microstructure. - PowerPoint PPT Presentation

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Page 1: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

A Finite Element Analysis ( FEA ) using flexPDE

Craig E. Nelson - Consultant Engineer

Page 2: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

The purpose of this numerical experiment is to learn about the field distribution of stress and strain in a MEMS microstructure.

This knowledge helps the engineer to better understand the stress on a bond line as will occur when anodic bonding of glass and silicon is attempted.

In this model, a high bonding temperature is impressed on all parts which subsequently cool to room temperature. As the material cools, it shrinks differing amounts in different materials and in different places within a given material, thus “freezing in” stress that, unless relieved, will exist for the life of the bonded part.

Depending on circumstances, the bond line may be sufficiently stressed to fail during the cooling process.

Page 3: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Model Geometry

Silicon Wafer

Glass

Silicon Wafer

Anodic Bond Line

Anodic Bond Line

Page 4: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Strained Structure – Shrinkage is Greatly Magnified

ShrinkageShrinkage

Page 5: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Temperature Gradient During Cooling

Page 6: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Strain Distribution Field – Horizontal Direction

Page 7: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Strain Distribution Field – Vertical Direction

Page 8: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Strain Distribution Field – Vector Plot

Page 9: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Stress Distribution Field – Horizontal Direction

Page 10: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Stress Distribution Field – Vertical Direction

Page 11: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Shear Stress Distribution Field

Page 12: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Stress Distribution Field – Tension

Page 13: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Principal Stress Distribution Field – Horizontal Component

Page 14: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Principal Stress Distribution Field – Vertical Component

Page 15: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Angle of Principal Stress Distribution Field

Page 16: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Von Mises Stress Distribution Field

Page 17: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Strain Distribution Field – Horizontal Component

Page 18: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Stress Distribution Field – Horizontal Component

Page 19: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Stress Distribution Field – Vertical Component

Page 20: Thermally Induced Stress in a Glass-Silicon Bonded MEMS Micro-Structure

Nelson Research, Inc. 2142 – N. 88th St. Seattle, WA. 98103 USA 206-498-9447 Craigmail @ aol.com

Summary and Conclusions

A finite element model has been developed that allows insight into the field distribution of stress and strain in an anodic bonded glass-silicon MEMS microstructure.

This knowledge helps the engineer to better understand the stress and strain on the glass-silicon bond line and other parts of the solution domain.

The model could be further developed in many further ways.