the surface analysis laboratory interfacial chemistry and adhesion phenomena… · 2018-03-07 ·...
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The Surface Analysis Laboratory
Interfacial Chemistry and Adhesion Phenomena:
How to Analyse and How to Optimise
John F Watts
Department of Mechanical Engineering Sciences
The Surface Analysis Laboratory
The Role of Surface Analysis in
Adhesion Studies
• Assessing surface characteristics (cleaning/pretreatment)
• Forensic analysis of failed joints, coatings etc.
• Fundamental studies of adhesion
o Sectioning of real systems
o XPS and ToF-SIMS of thin films
o Adsorption isotherms
The Surface Analysis Laboratory
Surface Analysis
The Surface Analysis Laboratory
The Problem Faced by the Analyst
ARXPS d ~10nm
X-ray spectroscopies d ~200nm
RBS d ~1μm
d
Interface Region
Substrate
Adhesive or Coating 10’s m - mm
100’s m - mm
The Surface Analysis Laboratory
The Buried Interface
Obtaining analytical
information from intact
interfaces is very difficult.
Carrying out in-situ
experiments within the
spectrometer can be useful
but only rarely is the
interphase chemistry
exposed in this manner
J F Watts, Surf Interf Anal, 12, 497-503, (1988)
The Surface Analysis Laboratory
TEM/PEELS Cross-Sections
A J Kinloch, M Little, J F Watts, Acta Materialia, 48, 4543, (2000)
PAA treated joint PAA + primer joint
abrupt interface diffuse interphase
The Surface Analysis Laboratory
Epoxy + GPS/Aluminium Joint
Fig. 2. Composite image of the cross-section of a
sample containing 1% (w/w) of APS showing the
aluminium/adhesive interface from several TEM
images.
Fig. 3. EELS spectrum of the core loss region of the oxygen
K edge along the aluminium oxide layer for a sample
containing 0.5% (w/w) of APS.
Fig. 5. Graph representing the relative oxygen content over the
oxide layer for the various APS concentrations, obtained from
EELS spectra. At 0.5% APS, the oxygen profile is bi-lobar,
whilst at 1% and 2% the oxygen concentration has only one
maximum, near the silane and near the Al respectively.
J Bertho, V Stolojan, M-L Abel, J F Watts, Micron, 41, 130, (2010)
The Surface Analysis Laboratory
Oxide Stripping + Depth Profiling
Chemical removal
of metal substrate,
depth profiling of
oxide in situ by ion
sputtering.
Interphase can
then be analysed
directly
J F Watts, J E Castle, J Mat Sci, 18, 2987, (1983)
The Surface Analysis Laboratory
Interface Chemistry
Fe(II)
Fe(II) satellite
Iron 2p3/2 spectrum
showing Fe(II)
component at
interface. Oxide is
entirely Fe(III).
The Surface Analysis Laboratory
Ultra Low Angle Microtomy
Angle Sectioning Block
12 x 12 x 7 mm3
+ 25 m = 0.03O
+ 50 m = 0.07O
+ 100 m = 0.15O
+ 200 m = 0.33O
Microtome Knife
Angled Sectioning Block
Polypropylene Block
The Surface Analysis Laboratory
ULAM Geometry
XPS
spot
size/m
ULAM taper angle/o
0.03 0.33 2.0
100 60 600 3500
15 13 100 500
Depth Resolution ULAM/nm
Coating
Small area XPS analysis mode
(100 m)
Substrate q
S J Hinder, C Lowe, J T Maxted, J F Watts, J Mater Sci, 40, 285, (2005)
Depth resolution attainable depends on the taper angle and
the size of the analytical probe. In XPS small area XPS in
the range 15 -500 m, for ToF-SIMS < 1 m
The Surface Analysis Laboratory
XPS Line Scan Along Taper
0
2
4
6
8
10
12
14
16
18
20
0 0.013 0.026 0.039 0.052 0.065 0.078 0.091 0.104 0.117 0.13 0.143 0.156 0.169
Depth / um
Ato
mic
%
0
0.5
1
1.5
2
2.5
3
3.5
4
Fluorine
Nitrogen
PVdF Polyurethane
X-ray Spot = 15m
Step Size = 18 m
13nm
F: DZ = 50 nm
N: DZ = 27 nm
PVdF Topcoat on Polyurethane Primer
13
ToF-SIMS Line scan
500 µm
500 µm - 128 pixels
𝑝𝑖𝑥𝑒𝑙 𝑖𝑛𝑡𝑒𝑛𝑠𝑖𝑡𝑦
𝑝=128
𝑝=1
0
0.2
0.4
0.6
0.8
1
0 1 2
Rel
ativ
e p
eak
inte
nsi
ty
Depth (µm)
For each of the 128 rows Pixel depth = f(cutting angle)
Positive ToF-SIMS image,
characteristic ion of the primer formulation
14
Stitched Images: Two Coat System
Negative ToF-SIMS images : 8 (500 µm x 500 µm) squares
1 mm
Large scale overview of the interface and species migration
Primer Topcoat
1 mm
15
Line Scan : Species Segregation
500 µm - 128 pixels
0
0.5
1
1.5
2
2.5
0 0.5 1 1.5
rela
tive
pe
ak in
ten
sity
depth (µm)
Line scan
Characteristic fragment
of a primer component
Characteristic
fragment
of the topcoat
The Surface Analysis Laboratory
ToF-SIMS of ULAM Section
d)
b) a)
c)
1
3
2
+ve SIMS -ve SIMS
Polyurethane ions
PVdF ions
(a) m/z = 149: C8H5O3+
(b) m./z = 26: CN-
(c) m/z = 59: C3H4F+
(d) m/z = 19: F-
FoV is 500 m
500 m
250 nm
S J Hinder, C Lowe, J T Maxted, J F Watts, Surf Interf Anal, 36, 1575, (2005)
The Surface Analysis Laboratory
ToF-SIMS Anions from Images
0
500
1000
1500
2000
2500
3000
3500
0 20 40 60 80 100 120 140 160 180 200
m/z
Co
un
ts
a) 25
41-42
49
66
100
121
0
1500
3000
4500
6000
7500
9000
10500
12000
13500
15000
0 20 40 60 80 100 120 140 160 180 200
m/z
Co
un
ts
c) 19
49
39
85
Point 2: Bulk Polyurethane
Point 1: Bulk PVdF
c)
1
3
2
The Surface Analysis Laboratory
ToF-SIMS at Interface
0
200
400
600
800
1000
1200
1400
0 20 40 60 80 100 120 140 160 180 200
m/z
Co
un
ts
b) 19
31
55 71
87
85
121
185 141
Point 3: PU and PVdF at Interface c)
1
3
2
PCA on Positive Spectra from Interfacial Region to Identify
Those that are not Characteristic of PVdF or PU
Negative ToF-SIMS
The Surface Analysis Laboratory
Minor Additive
0
300
600
900
1200
1500
1800
2100
2400
2700
3000
30 40 50 60 70 80 90 100 110 120 130 140 150 160 170 180 190 200
m/z
Co
un
ts31
55
71
85
185
41
A negative ion ToF-SIMS mass spectra of the pure acrylic co-resin
component of the PVdF topcoat formulation in the mass range 30-200m/z.
x10
The Surface Analysis Laboratory
ToF-SIMS Images of Acrylic Ions
a) b)
e) f)
d) c)
Negative Ion Mass
Selected Images
(a) m/z = 31: CH3O-
(b) m/z = 55: C3H3O-
(c) m/z = 71: C3H3O2-
(d) m/z = 85: C4H5O2-
(e) m/z = 87: C4H7O2-
(f) m/z = 141: C9H13O4-
The Surface Analysis Laboratory
Coil Coating: Adhesion Promoter
500 µm
128 pixels= 16 strips x 8 pixels
128 pixels
RoI: Region of Interest
∑8 x 128 of Recording Relative
Intensity (RI) for each
specific fragment
RI vs. RoI
Convert RoI to Depth
RI vs. Depth √ = 2°
8 pixels = 15.6 µm
1.08 µm
Red: Top coat
Green: Primer
Blue: HDGS
500 µm
25 µm
ULAM
Approximately same
area is used for XPS
line scan.
Depth profile of a various fragments
obtained by reconstruction of SIMS spectra
across the top coat/primer/metal area from
16 regions of interest.
The Surface Analysis Laboratory
XPS Line Scan: ULAM Section
The region associated with the primer
layer can be determined considering the
change in the elements concentration:
Analysis point at a depth of ~18 µm
where the concentration of carbon starts
to decrease.
Analysis point at a depth of ~25µm where
Zn signal is observed to become more
intense.
Having Characterised all the individual
components present in the formulation,
it can be concluded that nitrogen is
associated with the adhesion promoter
molecule.
0
10
20
30
40
50
60
70
0 5 10 15 20 25 30 35 40
Su
rfac
e C
on
cen
trat
ion
%
Depth (µm)
C Co N O Zn
Changes in C, O, Zn, Co and N elemental
concentration traversing a ULAM taper which
has exposed the buried topcoat/primer/metal
substrate interfaces of the sample with higher
concentration of adhesion promoter.
|------------Topcoat-----------Primer--------------HDGS------|
The Surface Analysis Laboratory
0
10
20
30
40
50
0 2 4 6 8 10 12
RP
I x 1
00
00
C2H6N C3H8N C4H10N
C5H10NO2 Molecular ion x 50 Zinc
Depth (µm)
Depth profile of the fragments originating from
the adhesion promoter molecule obtained by
reconstruction of SIMS spectra across the
metal/primer/topcoat area from 16 regions of
interest. the intensity of molecular ion reaches
the maximum intensity at the primer/topcoat
interface (the intensity of the molecular ion
has been multiplied by 50).
Adhesion promoter segregates to the primer
surface when added to the primer
formulation at the higher concentration.
Adsorption studies on this molecule proves
that there is no chemical interaction between
the metal substrate and adhesion promoter
molecule.
The concentration of the adhesion promoter
at the higher level is beyond the critical
miscibility limit of the primer and the
adhesion promoter is rejected from the
formulation towards the outer surface.
0
10
20
30
40
50
60
70
0 5 10 15 20 25 30
Surf
ace
Co
nce
ntr
atio
n%
Depth (µm)
C N O Zn
Correlative Surface Analysis:
XPS and ToF-SIMS
The Surface Analysis Laboratory
The Thin Film Approach
d
Interface Region
Substrate
Adhesive or Coating 10’s m - mm
100’s m - mm
thin (< 2 nm film on substrate)
select sample from the plateau
region of the adsorption isotherm
The Surface Analysis Laboratory
PMMA on Oxidised Metals
S R Leadley, J F Watts,
J Adhes, 60, 175, (1997)
0.2 eV
The Surface Analysis Laboratory
Polymer Conformation
J F Watts, S R Leadley, J E Castle, C J Blomfield,
Langmuir, 16, 2292, (2000).
PMMA on Oxidized Si and Al
The Surface Analysis Laboratory
Organosilane Adhesion Promoters
Molecular Dynamics Models of:
(a) Epoxy
(b) Amino
(c) Vinyl
The Surface Analysis Laboratory
High Resolution ToF-SIMS
The intense SiOAl+
peak is indicative of a
covalent bond between
the aluminium oxide
and the organosilane
adhesion promoter
The Surface Analysis Laboratory
Specific Interactions
SiHO
OH
O
(CH2)3 O CH2 CH CH2
OH
Al
O H
SiHO
OH
O
(CH2)3 O CH2 CH CH2
O
Al
The Surface Analysis Laboratory
Flame Treatment Used for
Many Years
The Surface Analysis Laboratory
Flame Treatment of Automotive
Polypropylene
The Surface Analysis Laboratory
Example XPS Spectra
XPS spectra for Sample A untreated (lower) and treated
(upper).
C1s
O1s
The Surface Analysis Laboratory
As Received PP Samples
Sample B
Sample C
Sample A
Sample D
C1s
O1s
The Surface Analysis Laboratory
Mono XPS Valence Band
Untreated
1 Pass
3 Passes
7 Passes
characteristic of pendant methyl group
The Surface Analysis Laboratory
XPS/Cluster Profiling
X-ray photoelectron spectroscopy performed
using the Thermo Scientific K-Alpha system
• Monochromated X-ray source
• Fully automated acquisition
MAGCIS (monatomic and gas cluster ion source)
used to produce craters
• Ar Cluster size up to 2000 atoms
• Ion energy = 2 - 8 keV
• Monatomic Ar ion beam
The Surface Analysis Laboratory
Depth Profiling
0
10
20
30
40
50
60
70
80
90
100
0 10 20 30 40 50 60
Ato
mic
perc
en
t (%
)
Etch Depth (nm)
C1s
O1s (5x)
Analysis on a K-Alpha using large cluster ions to etch (Ar1000)
Depth calculation using estimate from Irganox reference.
The Surface Analysis Laboratory
ToF-SIMS Identification of
Oxygenation
C3H5O
C4H9
untreated
treated
The Surface Analysis Laboratory
mass / u69.00 69.05 69.10
4x10
2.0
4.0
Inte
nsit
y
4x10
1.0
2.0
Inte
nsit
y
4x10
0.5
1.0
1.5
Inte
nsit
y
4x10
1.0
2.0
Inte
nsit
y
4x10
1.0
2.0
Inte
nsit
y4x10
1.0
2.0
Inte
nsit
y
C3HO2
C4H5O C5H9 8 passes
6 passes
3 passes
2 passes
1 pass
Untreated
ToF-SIMS of Oxidation Process
The Surface Analysis Laboratory
Additives: ToF-SIMS Spectra
Additive Chemical structure Characteristic peaks
Ethylene Bis-steramide 282, 310
Irganox™ 1010 57, 203, 219, 259
The Surface Analysis Laboratory
Ablation of Additives
C18H36NO
C20H40NO C15H23O
C17H23O
Ethylene Bis-steramide Irganox™ 1010
untreated untreated
treated treated
The Surface Analysis Laboratory
Conclusions
• Chemical analysis of interfaces responsible for adhesion
requires careful sample preparation.
• In model systems explicit bond formation can be identified.
• In commercial systems the inter-diffusion and segregation of the
individual components in a formulation may be equally (or even
more) important.
• The use of this films allows bonding, configuration and bond
density to be established.
• For extruded products residual processing aids or additives as
well as low functionality may compromise adhesion.
• Pretreatments must remove the former and enhance the latter.