synthesis and characterization of organic/inorganic heterostructure films for hybrid light emitting...
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Synthesis and characterization of organic/inorganic heterostructure
films for hybrid light emitting diode
Toshihiko Toyama *, Tokuyuki Ichihara, Daisuke Yamaguchi, Hiroaki Okamoto
Department of Systems Innovation, Graduate School of Engineering Science, Osaka University, Toyonaka, Osaka 560-8531, Japan
Available online 12 July 2007
bstract
Thin-film light emitting devices based on organic materials have been gathering attentions for applying a flat-panel display and a solid-state
ighting. Alternatively, inorganic technologies such as Si-based thin-film technology have been growing almost independently. It is then expected
hat combining the Si-based thin-film technology with the organic light emitting diode (OLED) technology will develop innovative devices. Here,
e report syntheses of the hybrid light emitting diode (LED) with a heterostructure consisting of p-type SiCx and tris-(8-hydroxyquinoline)
luminum films and characterization for the hybrid LEDs. We present the energy diagram of the heterostructure, and describe that the use of high
ark conductivities of the p-type SiCx as well as inserting wide-gap intrinsic a-SiCx at the p-type SiCx/Alq interface are effective for improving
evice performance.
2007 Elsevier B.V. All rights reserved.
ACS : 78.60.Fi; 73.21.Ac; 73.40.Lq; 72.80.Le; 79.60.�I; 79.60.Jv
www.elsevier.com/locate/apsusc
Applied Surface Science 254 (2007) 295–298
eywords: Light emitting diode; Thin film; Silicon carbide; Organic semiconductor; Electronic structure; Trapped-charge-limited current
1. Introduction
Thin-film light emitting devices have been gathering
attentions for applying a flat-panel display and a solid-state
lighting [1,2]. An organic light emitting diode (OLED) is one of
the most promising candidates because of high luminance,
excellent visibility, lightweight and mass-producibility [1,2].
Alternatively, Si-based thin-film technology has also excellent
mass-producibility as evidenced by productions of thin-film
transistor and thin-film solar cells [3]. Furthermore, we
investigated thin-film light emitting devices based on silicon
carbide (SiCx) alloys very previously [4]. So far, the organic and
inorganic technologies have been growing almost indepen-
dently, however, it is expected that combining the Si-based thin-
film technology with the organic light emitting diode
technology will develop innovative devices. For instance,
compared to the organic materials, Si-based thin-films usually
have excellent durability against humidity, thus improving the
* Corresponding author. Tel.: +81 66 850 6317; fax: +81 66 850 6316.
E-mail address: [email protected] (T. Toyama).
169-4332/$ – see front matter # 2007 Elsevier B.V. All rights reserved.
oi:10.1016/j.apsusc.2007.07.071
lifetime of OLED is to be possible due to the combined
technology.
Here, we describe syntheses of the hybrid light emitting diode
(LED) based on the organic/inorganic heterostructure consisting
of p-type SiCx and tris-(8-hydroxyquinoline) aluminum (Alq)
films, and we also mention the energy diagram of the
heterostructure as well as current transport properties of the
hybrid LED.
2. Experimental details
The structure of the hybrid LED was glass/transparent
conductive oxide (TCO)/p-type SiCx/Alq/Al. Regarding the
TCO layer, SnO2:F/indium tin oxide (ITO) double-coated film
was used [4]. The p-type SiCx layer was deposited on the TCO
layer by plasma enhanced chemical vapor deposition (PECVD)
from a mixture of H2, SiH4, C2H6, and B2H6 gases at 230 8C.
The excitation frequency was 40.68 MHz [5,6]. The other
deposition conditions are described elsewhere in detail [5–7].
Amorphous (a-) or microcrystalline (mc-) SiCx films were
prepared for the p-type SiCx. After short air breakage for
transferring the sample from the PECVD apparatus, Alq
(Kodak) and Al were deposited on the p-type SiCx sequentially
Fig. 2. Light emission spectra of hybrid LED (solid) and of OLED (dotted),
respectively.
T. Toyama et al. / Applied Surface Science 254 (2007) 295–298296
by thermal evaporation in high vacuum (<3 � 10�6 Torr). The
area of the Al electrode was 0.033 cm2. Typical thicknesses of
p-type SiCx and Alq layers were 15 and 70 nm, respectively. A
conventional OLED with a hole-transport material of 4,40-bis[N-(1-naphthyl)-N-(2-naphthyl)amino]biphenyl (TNB)
(Kodak) instead of p-type SiCx was also fabricated.
Ultraviolet-ray photoyield spectroscopy (UV-PYS) is often
used for identifying the band profile. An UV-PYS system
consisting of a vacuum monochromator and a channeltron was
used [8]. Electrons excited by the monochromatic light are
emitted from surfaces, and detected by the channeltron.
Device characterization was performed with Keithley 2400
current source/voltmeter (or voltage source/ammeter), Topcom
BM-7fast luminance meter, and Ocean Optics USB2000
spectrometer. The LEDs were set in vacuum in an optical
dewar, and the light emission was monitored through a glass
window. All measurements were carried out at room
temperature.
3. Results and discussion
Fig. 1 shows the UV photoyield spectrum of the a-SiCx film.
The photoemission from surfaces, Y, can be expressed as
Y � (E � Eth)5/2 where Eth denotes the emission threshold
energy correspond to the excitation energy from the Fermi level
to the vacuum level, and E the photon energy being in
accordance with an indirect optical excitation equation [9]. Eth
was estimated as around 5.3 eV, which is in good agreement
with the Eth of a-SiCx with low carbon contents reported by
Brown et al. [9]. On the other hand, the temperature dependence
of a-SiCx indicated the activation energy of 0.6 eV, and the
activation energy of a p-type amorphous silicon alloy
corresponds to the Fermi level above the valence band top
[3]. The optical bandgap of a-SiCx of 1.9 eV was estimated
from the transmittance spectrum in accordance with the Tauc
plot [3]. Based on the experimental results, the energy diagram
Fig. 1. UV photoyield spectrum of p-type a-SiCx. Inset shows energy diagram
of hybrid LED based on p-type a-SiCx/Alq heterojunction.
of the hybrid LED is depicted in the inset of Fig. 1. The energy
structure including the energy levels of the normal lowest
unoccupied molecular orbital (LUMO) and highest unoccupied
molecular orbital (HOMO) of Alq is referred to Ref. [10].
From the hybrid LED, yellowish-green light emission was
successfully observed. Fig. 2 shows a typical emission
spectrum of the hybrid LED compared to that of OLED.
The emission peaking at 540 nm of the hybrid LED arises from
the Alq layer. The difference in the wavelengths of 600–800 nm
would originate from the interference fringe due to the
refractive index of p-type SiCx being higher than that of TNB.
Fig. 3 displays a typical current–voltage (J–V) characteristic
of the hybrid LED. A clear rectification is confirmed. Inset
shows the double logarithmic plot of the J–V curve at forward
voltages. At low voltages below 8 V, the J–V curve show a
power law, J–Vm+1 with an exponent m of 1.7 close to m of
Fig. 3. J–V characteristic of hybrid LED with p-type a-SiCx. The hybrid LED
was driven by voltages. Inset shows log–log plot of the J–V characteristic for
forward voltages.
Fig. 4. L–J characteristics of hybrid LEDs with p-type mc-SiCx (solid) and a-
SiCx (dotted), respectively.
Fig. 5. J–V (a) and L–J (b) characteristics of hybrid LEDs with a structure of p-
type mc-SiCx/wide-gap a-SiCx/Alq. The hybrid LEDs were driven by current.
The thicknesses of wide-gap a-SiCx are varied [without wide-gap a-SiCx; (*),
2 nm; (&) 3 nm; (~) 5 nm (^)]. Discontinues in luminance occur in changing
measurement ranges.
T. Toyama et al. / Applied Surface Science 254 (2007) 295–298 297
trap-free space-charge-limited current (=1) [11]. Between 8 and
10 V, an apparent negative resistance behavior appears,
suggesting that a hole tunneling process occurs maybe at the
potential height valence band top between SiCx and HOMO
level of Alq as shown in Fig. 1 because light emission starts at
around 10 V. At high voltages over 15 V, another power law
with m = 8.9 appears, indicating that the trapped-charge-
limited current (TCLC) should dominate as the J–V character-
istics of OLED in the light emitting region [10].
Fig. 4 shows the luminance–current (L–J) characteristics of
the hybrid LEDs with p-type a- and mc-SiCx. Fig. 4 clearly
indicates that the use of mc-SiCx is effective for decreasing
operation current as well as for increasing maximum luminance.
The dark conductivity of a-SiCx was 5.3� 10�7 S cm�1, while
that of mc-SiCx was 1.1 � 10�2 S cm�1. High hole concentra-
tion and high hole mobility are usually responsible for the large
dark conductivity of mc-SiCx [3]. Alternatively, concerning
the optical absorption coefficient, a, at a wavelength of 540 nm,
a of a-SiCx was 3 � 104 cm�1, while a of mc-SiCx was
4 � 104 cm�1. Therefore, it is inferred that the dominant
mechanism for improving device characteristics is improving
the hole injection due to the high hole concentration and/or
improving hole transport due to the increased hole mobility
rather than the slight increase in the optical transmittance
through the p-type SiCx.
Besides, inserting highly resistive wide-gap a-SiCx with an
optical bandgap of 3.3 eV into the interface between the p-type
SiCx and Alq is effective for further improving L–J
characteristics, being similar to the a-SiCx-based p–i–n LEDs
[4]. In Fig. 5, the effects of wide-gap a-SiCx are demonstrated;
current–voltage (J–V) and L–J characteristics are depicted as a
function of thickness of the wide-gap a-SiCx layer. Due to
inserting the wide-gap a-SiCx layer, the operation current
decreased, and the exponent of the power law for TCLC also
decreased. The exponent, m, varied with the thickness of the
wide-gap a-SiCx, d; m = 13, 10, 7.2, and 7.6 were estimated for
d = 0 nm (or without the wide-gap a-SiCx), 2, 3, and 5 nm,
respectively. Therefore, as shown in Fig. 5(b), the maximum
luminance is obtained from the hybrid LED with the 3-nm thick
wide-gap a-SiCx of which exponent for TCLC is the minimum
among the samples, indicating a decrease in the trap density at
p-type SiCx/Alq interface. After further optimizations for the
thicknesses of p-type SiCx and Alq, the maximum luminance of
170 cd/m2 has been achieved.
Finally, a primitive lifetime test was carried out. The lifetime
of the hybrid LED until the half to the initial luminance was
measured with the following conditions: constant operating
current, in air atmosphere, and without passivation against
humidity. The lifetime of the hybrid LED was still as low as
220 min, however, it was almost equivalent or slightly longer
than the lifetime of OLED with a structure of ITO/SnO2/TNB/
Alq/Al.
T. Toyama et al. / Applied Surface Science 254 (2007) 295–298298
4. Conclusions
We have investigated on the hybrid LEDs for developing
stable flat-panel light emitting devices. The structure of the
hybrid LED was glass/ITO/SnO2/p-type SiCx/Alq/Al. The UV-
PYS and the activation energy of the dark conductivity revealed
the energy structure of p-type SiCx/Alq heterojunction. Highly
conductive mc-SiCx is effective for decreasing operation
current as well as for increasing maximum luminance. Besides,
inserting highly resistive wide-gap a-SiCx with an optical
bandgap of 3.3 eV into the interface between the p-type SiCx
and Alq is effective for further improving L–J characteristics,
indicating that the p-type SiCx/Alq interface plays a crucial role
in determining the device performance, and that the exponent of
the power law at the TCLC region is a good quality factor for
characterizing the p-type SiCx/Alq interface. Finally, the
maximum luminance of 170 cd/m2 has been achieved employ-
ing the p-type SiCx/wide-gap a-SiCx/Alq structure.
Acknowledgements
The authors would like to thank to Dr. Takahashi for her kind
advices on UV-PYS measurements. The author (TT) would like
to thank to Ms. Shinohara of Kodak Japan Ltd. for providing
organic materials. This work was partially supported by Grant-
in Aids of New Energy and Industrial Technology Development
Organization.
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