silicon nitride research

19
Silicon Nitride-From Powder Synthesis to Ceramic Materials By Horst Lange,” Gerhard Wotting, and Gerhard Winter Dedicated to Professor Karl Heinz Biichel on the occasion of his 60th birthday Silicon nitride is a ceramic material of great interest to advanced engine construction and mechanical engineering owing to an outstanding combination of favorable properties like high mechanical strength at high temperatures, corrosion and wear resistance, great hardness, and low density. The material is based on high-quality Si,N, powders, which are shaped and sintered to the ceramic component. This overview outlines the properties required for Si,N, powders suitable for advanced ceramics. Processes in commerical use and those under devel- opment for the production of high quality Si,N, powders are discussed as well as material manufacturing processes and material properties. By steadily improving powder quality, ma- terial properties, and the economy of powder and component production, chemistry and chemical technology play a major role in recent efforts to create a solid fundament for broad applications of silicon nitride ceramics. “If one would surrender to geological phantasies, one could imagine that during the formation of our planet, when elements combined to the compounds making up its crust and mountain ranges, silicon reacted with nitrogen, and the still red-hot nitrogen-silicon, on contact with wa- ter, may have decomposed to silicic acid and ammonia. Thus, ammonia may have been formed originally and nitrogen thereby introduced into the forming organic compounds when living nature first started to appear.” H. Sainte-Claire Deville and F. Wohler[**’ 1. Introduction Following speculations by Deville and Wohler,“’ silicon nitride attracted attention for the first time as a possible raw material for the technical synthesis of ammonia. A series of patents from the period 1909- 1918describes the synthesis of ammonia by heating Si,N, with solutions or dispersions of basic oxides, hydroxides, or salts, by treatment with hot water vapor, or by heating it in hydrogen Because of the concurrent development of the Haber-Bosch process, these methods never gained any importance. It is not surprising, therefore, that this early interest in silicon nitride soon declined. However, silicon nitride saw a remarkable renaissance af- ter the discovery that it can be converted into a ceramic [‘I Dr. H. Lange PK-F, Bayer AG W-4150 Krefeld-Uerdingen (FRG) Dr. G. Wotting Cremer Forschungsinstitut W-8633 Rodental (FRG) Prof. Dr. G. Winter Hermann C. Starck Berlin GmbH + Co KG W-3380 Goslar (FRG) [*‘I “Ueber die directe Bildung des Stickstoffsiliciums” in: Ann. Chem. Phurm. 34 (1 859) 248: “If one would surrender to geological phantasies, one could imagine that during the formation of our planet, when elements combined to the compounds making up its crust and mountain ranges, silicon reacted with nitrogen, and the still red-hot nitrogen-silicon, on contact with water, may have decomposed to silicic acid and ammonia. Thus, ammonia may have been formed originally and nitrogen thereby introduced into the forming organic compounds when living nature first started to appear. material. Silicon nitride ceramics significantly extend the limits of metallic materials under combined thermal and me- chanical stress in corrosive environments. 2. Silicon Nitride as Ceramic Material Silicon nitride is of great interest as a heavy-duty material for applications in chemical engineering, wear technology, metal working, energy technology, and especially in engine and turbine construction.[’ 2-241 This broad interest arises from a favorable combination of great hardness, wear resis- tance, chemical stability, low density, and high mechanical strength at temperatures up to 1300 “C. The application of Si,N, ceramic parts in combustion engines and gas turbines promises advantages like higher efiiciency and better fuel use due to higher combustion temperatures, faster response of oscillating or rotating engine components (valves, pistons, turbocharger, and turbine rotors) due to low density, and longer service intervals due to a generally improved wear behavior. Silicon nitride ceramics are produced either by nitriding silicon powder compacts or by sintering Si,N, powder com- pact~.[~~*~~l The first method produces a porous, reaction- bonded material (RBSN, reaction-bonded silicon nitride) with almost negligible shrinkage; this material is used either directly or may be densified by a following sintering step (SRBSN, sintered RBSN).12’- 301 The second method, which is covered comprehensively in this article, leads to Si,N, ceramics of superior quality. These are of special interest to Angew. Chem. Int. Ed. Engl. 30 (199i) 1579-1597 0 VCH Verlugsgesellschuft mbH. W-6940 Weinheim, 1991 0570-0833/91/1212-iS79 S3.50-k ,2510 1519

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Page 1: Silicon Nitride Research

Silicon Nitride-From Powder Synthesis to Ceramic Materials

By Horst Lange,” Gerhard Wotting, and Gerhard Winter

Dedicated to Professor Karl Heinz Biichel on the occasion of his 60th birthday

Silicon nitride is a ceramic material of great interest to advanced engine construction and mechanical engineering owing to an outstanding combination of favorable properties like high mechanical strength at high temperatures, corrosion and wear resistance, great hardness, and low density. The material is based on high-quality Si,N, powders, which are shaped and sintered to the ceramic component. This overview outlines the properties required for Si,N, powders suitable for advanced ceramics. Processes in commerical use and those under devel- opment for the production of high quality Si,N, powders are discussed as well as material manufacturing processes and material properties. By steadily improving powder quality, ma- terial properties, and the economy of powder and component production, chemistry and chemical technology play a major role in recent efforts to create a solid fundament for broad applications of silicon nitride ceramics.

“If one would surrender to geological phantasies, one could imagine that during the formation of our planet,

when elements combined to the compounds making up its crust and mountain ranges, silicon reacted with nitrogen, and the still red-hot nitrogen-silicon, on contact with wa-

ter, may have decomposed to silicic acid and ammonia. Thus, ammonia may have been formed originally and nitrogen thereby introduced into the forming organic

compounds when living nature first started to appear.”

H. Sainte-Claire Deville and F. Wohler[**’

1. Introduction

Following speculations by Deville and Wohler,“’ silicon nitride attracted attention for the first time as a possible raw material for the technical synthesis of ammonia. A series of patents from the period 1909- 1918 describes the synthesis of ammonia by heating Si,N, with solutions or dispersions of basic oxides, hydroxides, or salts, by treatment with hot water vapor, or by heating it in hydrogen Because of the concurrent development of the Haber-Bosch process, these methods never gained any importance. It is not surprising, therefore, that this early interest in silicon nitride soon declined.

However, silicon nitride saw a remarkable renaissance af- ter the discovery that it can be converted into a ceramic

[‘I Dr. H. Lange PK-F, Bayer AG W-4150 Krefeld-Uerdingen (FRG) Dr. G. Wotting Cremer Forschungsinstitut W-8633 Rodental (FRG) Prof. Dr. G. Winter Hermann C. Starck Berlin GmbH + Co KG W-3380 Goslar (FRG)

[*‘I “Ueber die directe Bildung des Stickstoffsiliciums” in: Ann. Chem. Phurm. 34 (1 859) 248: “If one would surrender to geological phantasies, one could imagine that during the formation of our planet, when elements combined to the compounds making up its crust and mountain ranges, silicon reacted with nitrogen, and the still red-hot nitrogen-silicon, on contact with water, may have decomposed to silicic acid and ammonia. Thus, ammonia may have been formed originally and nitrogen thereby introduced into the forming organic compounds when living nature first started to appear.

material. Silicon nitride ceramics significantly extend the limits of metallic materials under combined thermal and me- chanical stress in corrosive environments.

2. Silicon Nitride as Ceramic Material

Silicon nitride is of great interest as a heavy-duty material for applications in chemical engineering, wear technology, metal working, energy technology, and especially in engine and turbine construction.[’ 2 - 2 4 1 This broad interest arises from a favorable combination of great hardness, wear resis- tance, chemical stability, low density, and high mechanical strength at temperatures up to 1300 “C. The application of Si,N, ceramic parts in combustion engines and gas turbines promises advantages like higher efiiciency and better fuel use due to higher combustion temperatures, faster response of oscillating or rotating engine components (valves, pistons, turbocharger, and turbine rotors) due to low density, and longer service intervals due to a generally improved wear behavior.

Silicon nitride ceramics are produced either by nitriding silicon powder compacts or by sintering Si,N, powder com- p a c t ~ . [ ~ ~ * ~ ~ l The first method produces a porous, reaction- bonded material (RBSN, reaction-bonded silicon nitride) with almost negligible shrinkage; this material is used either directly or may be densified by a following sintering step (SRBSN, sintered RBSN).12’- 301 The second method, which is covered comprehensively in this article, leads to Si,N, ceramics of superior quality. These are of special interest to

Angew. Chem. Int. Ed. Engl. 30 (199i) 1579-1597 0 VCH Verlugsgesellschuft mbH. W-6940 Weinheim, 1991 0570-0833/91/1212-iS79 S3.50-k ,2510 1519

Page 2: Silicon Nitride Research

advanced engine construction and advanced mechanical en- gineering.

To demonstrate their technological benefits reliably, Si,N, components require a perfect and economical control of the entire manufacturing process, from the synthesis of the Si,N, powder, its processing, forming, sintering to the precise finishing of the structural component (Fig. 1).

Nonuniformity of the starting powder-for example, even just a few extraneous particles, ill-defined particle clusters, or particle morphologies such as a mass of disordered, more or less agglomerated lumps, fibers, or whiskers, as well as extra- neous particles or impurities dragged in through powder processing-induce fracture-causing structural defects, which cannot be remedied in the following manufacturing steps. Products of inferior quality and reliability are the re- sult. Since powder-inherent sources of defects can hardly be eliminated by subsequent ceramic processing, the powder producer has a special responsibility to supply extremely well-defined, high-quality powders. To avoid environmental contamination by, say, dust particles, the transfer of powder processing, shaping, and sintering into clean rooms has been discussed.[3 ‘ 9 321 Repeatedly, this measure has been de- scribed to improve fracture strength and reliability.[33, 341

Furthermore, defects also arise during shaping, sintering, and finishing. These nowise trivial problems have to be solved convincingly to allow an economical, large-scale pro- duction of silicon nitride components. Here, chemistry plays an important role, since powder synthesis and component

Powder synthesis, specification

pressure, temperature

J. I Ceramic Component I testing, application

Fig. 1. Manufacturing process from powder to component

manufacturing touch many problems of solid-state chem- istry, surface chemistry, tribochemistry, and chemical engi- neering,IZ6* 351 some of which are fundamental.

3. The Structure of Silicon Nitrideorigin of Hardness, Durability, and Strength

Crystalline silicon nitride exists in two hexagonal modifi- cations, a and /?, which are built up from a three-dimensional

Horst Lange was born in 19.57 in Enkhausen (Sauerland) and studied chemistry from 1975 to 1981 at the Universitat Dortmund. In 1983 he received his Ph.D. under Prof. Nauman for work on perfluoroalkylzinc and -cadmium compounds and then worked for one year as a postdoc with Prof. Shreeve at the University of Idaho. Since 1985 he has worked at Bayer AG (Uerdingen) and since 1989 he has been leader of the engineering ceramics group.

Gerhard Wotting was born in 19.51 in Markredwitz (Oberfranken) and studied Materials Science from 1969 to 1977 at the Fachhochschule SelblRegensburg and the Technische Universitat Berlin with emphasis on glass and ceramics. In 1982 he received his Ph.D. under Prof. Hausner for work on the sintering behavior of silicon nitridepowders. From 1981 to 1987 he worked as a researcher at the Institut fur Werkstoff-Forschung der Deutschen Forschungs- und Versuchsanstalt fur Luft- und Raumfahrt in Cologne. Since t987 he has been involved in developmental work in the area of materials technologylhigh-performance ceramics at the Cremer Forschungsinstitut, Rodental.

Gerhard Winter was born in 1937 in Klein-Mohrau (Sudetenland) and studied chemistry from 1957 to 1963 at the Universitat Tubingen. He earned his doctorate in 1966 with a dissertation on graphite inclusion compounds under Prof. Riidorff. In 1967 he began work at Bayer AG. Since 1986 he has taught at the Universitat-Gesamthochschule Siegen. He currently heads research and development at Hermann C. Starck Berlin in Goslar and is the author of the book “Industrielle Anorganische Chemie ”.

1580 Angew. Chem. Int. Ed. Engl. 30 (1991) 1579-1597

Page 3: Silicon Nitride Research

network of SiN, tetrahedrons.136. 371 Rigid structure and strong covalent bonds are the cause of the extraordinary hardness, durability, and mechanical strength of this ma- terial.

Figure 2 shows the crystal structure of fi-Si,N,, which is built from a Si6N, unit Along the crystallographic c

m

Fig 2 Section of the crystal structure of p-Si,N,, view approximately along c

axis, channels with a diameter of about 0.15 nm play a cer- tain role in the diffusion of atoms, even large ones. a-Si,N, is built from a Si,,N,, unit cell;[241 since no channels occur in this structure, diffusion is much more difficult than in P-Si,N, (Fig. 3).

Fig. 3. Section of the crystal structure of a-Si,N,; view approximately along c.

Early work on the conditions leading to formation of either the a or P phase indicated that the a phase, assumed to be an oxygen-stabilized low-temperature modification with a narrow range of existence, has the empirical formula Si11.4-11,5N1500.3-0,5 (actually an oxinitride phase).[36,40-421 However, the formation of the a phase required significantly less oxygen than presumed.t431 By chemical vapor deposition it was possible to produce a-Si,N, single crystals extremely low in o ~ y g e n . [ ' ~ , ~ ~ - ~ ~ ] Today a- and p-Si,N, are regarded as polymorphic modifications; a-Si,N, is the stable low-tem- perature modification, since the a-Si,N, content of a powder increases as the temperature of synthesis decreases and since CI -+ transformation occurs only at temperatures exceeding 1650 "C. Probably for kinetic reasons, a p -+ c( transforma- tion has not yet been observed.

The C I / ~ ratio of commercially available powders is usually determined by X-ray 491 but also IRtsO- 521 and 29Si MAS NMR spectroscopy may be applied.[53-55] 29Si MAS NMR spectroscopy is particularly useful since it can be employed to distinguish and quantify not only the crystalline phases but also amorphous Si3N4.Is41 This method is also suitable for the study of sintering phenomena.[56* 571

4. The Synthesis of Si,N, Powders

For the technical synthesis of high-quality Si,N, powders the three following methods are important (see Sections 4.2 to 4.4): nitridation of silicon powder [Eq. (a)],[58-611 car- bothermal reduction of SiO, in the presence of nitrogen [Eq. (b)] or ammonia,t62-661 and ammonolysis of reactive silicon compounds [Eqs. (c) and (d)]

3 Si + 2N, - Si,N, (a)

3Si0, + 2N, + 6C- Si,N, + 6CO (b)

3SiC1, + 4NH, Si,N, + 12HCI (C)

3SiH, + 4NH, - Si,N, + 12H, (4

- 7 1 1

1 100- 1400°C

1450 - 1600°C

ca. 25-1400°C

600- 1400°C

In contrast to direct nitridation or carbothermal reduc- tion, ammonolysis does not yield crystalline Si,N, directly. The reaction leads initially to extremely moisture-sensitive silicon diimide [Eq. (e)], which is then transformed by pyrol- ysis, via amorphous Si,N,, to a-Si,N, [Eqs. (f) and (g)]-t67-69. 721

ca. 25 "C SKI, + 6NH, - Si(NH), + 4NH,Cl

3 Si(NH), - Si,N, (amorphous) + 2NH,

(e)

( f ) 900 - 1200°C

1300-1500°C 3 Si,N, (amorphous) - a-Si,N,

Several other reactions [Eq. (h),[73-751 (i),[761 (j)[77* 781]

have not gained importance for technological or economical reasons, such as too great expense, too slow reaction kinet- ics, or the development of undesirable particle morpholo- gies.

3SiS, + 4NH, - Si,N, + 6H,S

3SiC + 4NH, -+ Si,N, + 3CH,

3Si0, + 4NH, - Si,N, + 6H,O ti)

Furthermore, there have been numerous attempts to syn- thesize Si,N, by pyrolysis or carbothermical reduction from silazanes [Eq. (k)] or ~ i loxanes . [~~] Because of the compara-

800-1400"C, NH,

-RH, -H2 Si,N, 1 -[SIR, - NR],

tively complicated and costly production and handling of silazanes, this method is less interesting for powder synthesis than for the manufacturing of Si,N, fibers or coatings. Poly- meric silazanes of suitable structure may be processed by spinning to produce fibers or by melt or solution coating; subsequent pyrolysis usually gives a 60-80 YO ceramic yield. There is also some fundamental interest in the use of sil- azanes as binders or plasticizers for silicon nitride powder molding by dry pressing or injection molding, since pyrolysis leaves nothing but Si,N,.

4.1. Required Powder Properties

A Si,N, powder qualified for applications in advanced ceramics has to meet numerous demands regarding chemical

Angebi. Chem. Inr. Ed. Engl. 30 (1991) 1579-1597 1581

Page 4: Silicon Nitride Research

and physical properties. Important criteria for powder qual- ity include purity, crystallinity, particle shape, particle size distribution, degree of particle agglomeration, and cr/P ratio, as well as technological properties like good processing be- havior in different powder shaping techniques and good sin- tering activity.

To minimize shrinkage and to avoid the development of density gradients during sintering, powder shaping has to aim at particle packing densities as high and as homoge- neous as possible. This is achieved by defined particle size distributions, spherical particle shapes, mean particle sizes less than 1 pm, and exclusion of coarse or hard agglomerated particles. These factors, together with defined C and 0 con- tents, exclusion of extraneous particles, and a high crib ratio, are important characteristics of powders with good sintering behavior and favor the development of a homogeneous grain structure during sintering. The spectrum of all these proper- ties influences the general sintering activity of a powder. Roughly, sintering activity increases with decreasing particle size. However, powder processing becomes increasingly dif- ficult (dust generation, bad densification behavior in dry pressing, high sintering shrinkage) as particle sizes decrease. Therefore, the search for universally applicable powders often requires a compromise between opposing demands. These circumstances, in turn, offer possibilities for special “powder designs”, that is, tailor-made powders with special advantages in certain manufacturing processes. A free-flow- ing granulated Si,N, powder, which will not crumble into dust particles but which is easy to densify, is favorable for charging automated dry presses and may illustrate this point.

Some powder properties, like the c r / j ratio, have to be adjusted during the Si,N4 synthesis; others, like particle size, particle size distribution, or C and 0 content, may be influ- enced subsequently by suitable powder processing (e.g., milling, screening, or annealing). In order to minimize the efforts spent on powder processing, it is advantageous to adjust as many of the required properties as possible during the synthesis. To what extent this approach is technologically feasible and economically appropriate depends on the syn- thetic method chosen.

4.2. Si,N, Synthesis by Direct Nitridation of Elemental Silicon

Direct nitridation of elemental silicon-the process used more than 80 years ago to show the correct stoichiometry of silicon nitride to be Si,N,[801-is still the dominant proce- dure for the industrial synthesis of silicon nitride pow- d e r ~ . [ ~ ~ - ~ ~ ] The main processing steps are nitridation of sil- icon powder, milling, and finally purification of the crude product (Fig. 4).

The selection of silicon powders of different purities strongly influences the impurity level of Si,N4. Besides com- mercially available, low-cost, metallurgical-grade silicon of different levels of purity, it is possible to use semiconductor- grade silicon as starting material of extremely high purity.[”]

For the actual synthesis, piles of silicon powder are al- lowed to react with nitrogen either discontinuously in cham- ber furnaces or continuously in conveyor-type pusher fur-

Si Powder U NRridation

Drying

E5 a-Si3N4 powder

Fig. 4. Process for Si,N, synthesis by direct nitridation.

naces according to Equation (a) (AH = - 750 kJ mol- ’). The reaction proceeds at a reasonable rate only above 1100 “C. Reaction rates strongly depend on particle size and chemical purity of the silicon powder.[60. 61, ”3 831 Especially traces of Fe catalyze the nitridation.[82. 841 Ow’ ing to its strong exothermal character the reaction has to be controlled carefully. Generally, low temperatures and the presence of hydrogen in the nitriding gas favor the formation of cr-phase material.[60. 61* 851 Too high temperatures cause not only the formation of undesired P-Si,N4 but also strongly sintered agglomerates of Si,N, primary particles, which finally re- quire a more intensive milling process. Careful control of the exothermic reaction is also necessary to avoid an uncon- trolled temperature rise exceeding the melting point of sili- con in the powder bed.[60,61- 82] The evolution of heat can be reduced by lowering the concentration of nitrogen in the nitriding atmosphere after onset of the reaction (“exother- mal control”r861). It may also be linited by a suitable, often empirically determined temperature control depending on nitridation kinetics, powder packing density, depth of pow- der bed, charge size, and type of furnace.[60. 61, 821

After synthesis the sintered product is crushed and finally milled to the desired particle size. Depending on the powder processing, possible metallic impurities due to milling wear are removed by subsequent acid leaching.

A variation of the direct nitridation described here is the so-called SHS synthesis (self-propagating high-temperature synthesis[” - 901 ). Here the reaction proceeds very fast (“thermite-like”) after local ignition under increased N, pressure.t91 -”I Und er these conditions the reaction zone moves with a speed of up to 0.1 msec-’ through the powder bed with temperatures often exceeding 1700 “C. The product is a high-/3-phase material (/3 > 95%), which requires the usual processing by milling and acid leaching.[951 So far the question whether high-P-phase Si,N, powder is suitable for manufacturing advanced silicon nitride ceramics has been answered positively only sporadically;[96. 971 further investi- gation is required.[951 Other open questions in the further development of SHS synthesis, which may also be used for the production of other refractory corn pound^,[^^-^^^ 941

concern the control of the cr/P ratio and the mastery of cost- efficient, large-scale production. Whether SHS synthesis will

1582 Angew. Chem. h i . Ed. Engl. 30 (1991) 1579-1597

Page 5: Silicon Nitride Research

- T I O C I 1800 11001200 1000 800

I -, allow direct manufacturing of high-quality sintered compo- nents is another interesting issue.

4.3. Si,N, Synthesis by Carbothermal Reduction

This method uses the reaction of SiO, powder with carbon at temperatures of about 1500 "C in a N, atmosphere, pro- ducing Si3N4 via a series of reactions [e.g., Eqs. (a), (I), and (m)]. The overall reaction is given by Equation (b).

SiO, + C - SiO + CO (1)

(m) SiO + C - Si + CO

3Si + ZN, --* Si,N,

3Si0, + 6 C + 2 N 2 - Si,N, + 6CO

Since cheap and readily available silicate raw materials may be used, carbothermal reduction attracted early interest during the first attempts to synthesize Si,N4 as starting ma- terial for industrial-scale ammonia synthesis.15 - l l , "] There was no concern about chemical purity or particle morpholo- gy; reaction mixtures of quartz sand, silicates, carbon, and coke were even compounded with metal oxides to decrease the reaction temperature. Purification of the product from metallic impurities and nonreacted carbon was first achieved by acid leaching and oxidative treatment."

Modern procedures ensure chemical purity by careful con- trol of the purity levels of the starting materials. Besides high-purity, synthetic materials from pyrolysis[621 or sol-gel reactions,[632 99, '''I natural products like quartz sand[981 and clay[1oL1 may also be used, although at the expense of purity. Though stoichiometry requires a SiO,/C ratio by weight of just 1 :0.4 for a complete reaction, a considerable excess of carbon is required in practice. Usually, SiO,/C ratios of 1 :2 to 1 :I0 are employed.[62-66. 1oz,1031Very good results yield extremely fine SiO, and C powders from, for example, gas-phase pyrolysis.[62* lo3, An intensive ho- mogenization of the powders is necessary to ensure that the reaction is homogeneous and proceeds to completion. A very good alternative is provided by sol-gel-type methods, in which polycondensation of silicon halides with alcohols prone to polymerization (e.g., furfurol) yield easy-to-handle polymeric granules containing Si, 0, and C in ultradisperse distribution. Thermal cracking yields an extremely homoge- neous SiO,/C mixture, which undergoes ready carbothermal reduction.[' 0 5 ]

Because carbothermal reduction may also proceed re- versibly, CO formed in the course of the reaction has to be removed. In practice, the reaction is carried out either con- tinuously in conveyor-type pusher furnaces or in chamber kilns, where the CO partial pressure is kept low by flowing N, . Though Si,N4 formation generally increases with in- creasing temperature, increasing amounts of Sic, depending on CO partial pressure, are formed at temperatures exceed- ing 1450 "C; the S ic is practically inseparable from the

Particle size and particle morphology may be controlled by adding either crystalline spheroidal Si,N4 particles or Si,N4 whiskers as nuclei to the reaction Since carbon acts also as a nucleation center for Si,N4 formation, its particle size influences Si3N, powder characteristics as

(Fig. 5). Si N C65.99. 1061 3 4

12- ii . S I ~ N ~ I S ) + Clsl C l

dl 8 -

I L I lg PN, -

0-

- l - SIClSI + Clsl

0 5 0 6 0 7 0 8 0 9 1000~ T-'[K-'I -

Fig. 5. Stability diagram for the system SiC/Si,N,/SiO,/C under varying CO partial pressures (1061. All compounds are present as solids. pco: a) 1 atm. b) 0.345 atm, c) 0.1 atm, d) 0.01 atm.

well. Very fine, high-surface carbon powders favor the for- mation of spheroidal Si,N4 particles; coarse, low-surface powders favor whisker formation.[99, 1021

After synthesis the reaction product is milled to adjust the desired particle size and the particle size distribution (Fig. 6).

SOp Powder 0- Mixing Q

I Carbothermal Reduction I 1450 - 1550 "C, Nz

1

HCllHF Acid Leaching

Drying

I a-Si3N4 Powder I ~~ ~

Fig. 6. Process for Si,N, synthesis by carbothermal reduction.

By tempering in air,[661 NH,, or chlorine-containing atmo- spheres['". loS1 at temperatures in the range of 600-800 "C excess carbon is removed. If required, incompletely reacted SiO, may be removed by HF leaching.

4.4. Ammonolysis of Reactive Silicon Compounds

4.4.1. Si, N4 Synthesis by Liquid-Phase Reaction of SiCI, and NH,

The work on the liquid-phase reaction of SiCI, and NH, dates back to 1830, when P e r ~ o z [ ' ~ ~ ~ isolated a white precip-

Angen. Chem. Int. Ed. Engl. 30 (1991) 1579-1597 1583

Page 6: Silicon Nitride Research

itate, which he considered to be silicon tetraamide, Si(NH,), . Subsequently, however, this precipitate was iden- tified as silicon diimide, Si(NH), Th ough this reaction may be described in its most simple form by Equation (e), further investigation showed a very complex

- 69* ' ' -

SiCI, + 6NH, --t SI(NH), + 4NH4CI (e)

process, which led to differently polymerized, extremely moisture-sensitive [Si(NH),], .[' "1 Subsequent high-temper- ature pyrolysis leads to stable, processable a-Si3N4 via sever- al intermediates and amorphous Si,N, accompanied by NH, or N,/H, liberation [Eq. (n)].[67-69s112-1171 The transformation of amorphous silicon nitride to crystalline a-Si,N, proceeds above 1200 "C in a diffusion-controlled manner with an activation energy of 306 kJ mol-l.[l 1 8 ]

3 1200-1400°C -[Si(NH),], - a-Si,N, + N, + 3 H,

It is remarkable that NH,C1 still present from the Sic],/ NH, reaction [Eq. (e)] influences the Si(NH), pyrolysis.[' 15] In the absence of NH,CI, Si(NH), is stable to 200 "C; it gradually loses NH, with increasing temperature, until final- ly amorphous Si,N, is formed. However, thermal decompo- sition in the presence of NH,CI results in reaction of Si(NH), and HCI to give a compound of the composition Si,N3H,CI, which decomposes to amorphous silicon nitride above 800 "C.

Pyrolysis of Si(NH), at temperatures below 1200 K leads to the formation of an extremely fine, moisture-sensitive, amorphous Si,N, powder showing primary particle sizes of about 10-30 nm and BET surfaces greater than 100 mz per g. Prolonged heating at temperatures of 1200 to 1400 "C induces crystallization of or-Si,N, accompanied by particle coarsening. At temperatures exceeding 1500 "C mainly p- Si,N, is formed.[691 Particle morphology, particle size, and

organic solvent

-30 to 0 "C

NH4CI Filtration NH,CI Separation

I t

I Si(NH)Z 1

Amorphous Sb y

i Crystallization

Fig. 7. Process for Si,N, synthesis by SiCI,/NH, liquid-phase reaction.

1584

a/p ratio are influenced by temperature, retention time, and impurities.[' 1 9 3 '*O]

Since SiCI,/NH, liquid-phase reaction allows the synthe- sis of a very pure and fine Si,N, powder from easily purified and readily available starting materials, this method (often referred to as the diimide process) has been developed on a pilot scale (Fig. 7). The SiCI,/NH, reaction is carried out in a two-phase system consisting of an organic solvent and liquid NH3[72* 116 ,117 .1211 or by reacting SiCl, vapor with excess liquid NH, ,I' thus dissolving the by-product NH,CI. The Si(NH), precipitate is filtered and washed with liquid ammonia to remove residual NH,Cl and finally cal- cined and crystallized to give a-Si,N,. In contrast to thermal NH,CI separation by sublimation, this procedure offers the technological advantage that no corrosive NH3/HCI vapors are generated. However, upscaling has to take into consider- ation the large amount of NH,CI by-product, generated ac- cording to Equation (0). An economically favorable and ecologically safe application or disposal has yet to be found for this by-product.

(0) 3SiC1, + 16NH, --t Si,N4 + 12NH4CI

4.4.2. Si,N4 Synthesis by Gas-Phase Reactions of SiC14 or SiH, with NH,

Owing mainly to homogeneous nuclei formation, gas- phase reactions have a great potential for the production of extremely tine powders.[' z 3 1 After formation and growth of nuclei in the reaction zone, particles cluster to aggregates and agglomerates, which may be separated as fine dust (Fig. 8).

reactants

tube reactor

:=::t:.:t*..:::;:::: zone of reaction and i. *.. . . . *.**. j ) nuclei formation

:..*.***. **Pi it* . . . 2.::) nuclei growth

Fig. 8. Particle formation in gas-phase reactions [123].

For economical and technical reasons gas-phase reactions of SiCI, or SiH, with NH, are of special interest. From a technological point of view the use of cheap SiCl, requires the separation of the corrosive NH,CI by-product through either hot-gas filtration, extraction, or sublimation. Because of spontaneous ignition of SiH, in contact with air, however, the use of expensive SiH, requires extensive safety precau- tions. A technological advantage, though, is the formation

Angew. Chem. Int. Ed. Engl. 30 (1991) 1579-1597

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of hydrogen as gaseous by-product, which is easily separat- ed. If SiCI, is used, reaction parameters may be adjusted to approach the stoichiometry of the reaction [Eq. (p)], thus

SiCl, + 2NH, - Si(NH), + 4HCI (P)

keeping the amount of solid NH,CI by-product low com- pared to the corresponding liquid-phase reaction. Instead of using expensive pressure vessels, gas-phase reactions are run at atmospheric pressure in heated tube reactors (Fig. 9). Sim-

electrical heaters

Si(NHh, amorphous Si3N4

filtering system for separation of solid products

Fig. 9. Setup of a gas-phase reactor for the synthesis of Si,N, from SiCI, and NH,.

ilar to industrial-scale synthesis of SiO, and TiO, powders, these reactions represent a good technological basis for a continuous, large-scale production of fine powders. As liquid-phase reactions, SiH,/SiCI,-NH, gas-phase reactions also yield amorphous Si,N, precursors because of the short retention times of gas and particle streams in the hot reaction zone. These amorphous precursors have to be crystallized separately in a subsequent step.

The reaction of SiH, and NH, in the temperature range of 500-900 "C yields amorphous powders with particle sizes of 30-200 nm and BET surfaces up to 26 m2 g- ' .[", '11 Our investigations on SiCI,/NH, gas-phase reactions at tempera- tures of 300-1700 "C showed the formation of extremely

Fig. 10. a-Si,N, powder by crystallization of amorphous Si,N, from SiCl,/ NH, gas-phase reaction.

fine, spheroidal and amorphous particles with BET surfaces up to 300 m2g- ' 12'] Crystallization of these precursors induces particle coarsening; thus, the BET surface may be adjusted in the range of 2-20 m2g-1.[70, 12']

Strict control of impurities, temperature, and retention time is important for the generation of very fine, uniform, high-a-phase Si,N, particles by crystallization of amor- phous Si,N, (Fig. 10). The powders from SiCl,/NH, gas- phase reactions require significantly less processing (Fig. 11) than products from direct nitridation or carbothermal re- duction because of their inherent fine particle size and weak agglomeration. They are characterized by high chemical pu-

Gas-phase Reaction 300 - 1600 "C

Sublimation 500 - 1000 "C NHpCl Separation

Amorphous Sit$

~~

Fig. 11. Process for Si,N, synthesis by SiCIJNH, gas-phase reaction.

rity, good manufacturing properties, and high sintering ac- tivity.

4.5. Si,N, Synthesis by Laser-Induced and Plasmachemical Reactions

The work on laser-induced" 26- 291 and plasmachemical reactions" 3 0 - 341 as alternatives to "usual" thermal gas- phase reactions tries to avoid any heterogeneous nuclei for- mation due to contact of the reacting gases with hot reactor walls; thus, an extremely high degree of particle fineness and uniformity is guaranteed. Characteristic properties of both processes, which are based on chemical reactions already described above, are extremely fast heating and cooling rates of about 10' to lo6 K s-' and fast reaction rates on the order of about s. Figures 12 and 13 show experimental setups for laser-induced and plasmachemical Si,N, synthesis from reactions of SiH, or SiCl, with NH,. Particle size, crys- tallinity, a/p ratio, and stoichiometric composition of the reaction product are influenced by mass flow, pressure, stoi- chiometric ratio of reactants, and laser or plasmagenerator power output. A major problem of laser-induced synthesis is the small reaction diameter of the laser beam, which allows only product formation rates on the order ofjust a few grams per hour. Because of the extreme temperatures of several

Angew. Chem. i n t . Ed. Engl. 30 (1991) 1579-1597 1585

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filter

n

water-cooled

da :le

*

\

- laser beam

.window

I I "--ilowing gas inlet reaction gas

inlet (SiH, , NH3)

Fig. 12. Reactor for laser-induced Si,N, synthesis from SiH, and NH, [126].

thousand K in plasmachemical reactions, the reactants are broken apart to different radicals, which may recombine in various ways in the temperature gradients of the reaction zone. Since fluid dynamics is also very important, it is very difficult to control the reaction precisely. Both laser-induced

induction coil .

SiCI, __c

pon for temperature measuring

H20 H20

c plasma gas =+ stabilization gas

3 + cooling gas

fquenching gas

*'

quenching zone +filter

sedimentation ii Fig. 13. Reactor for plasmachemical synthesis of Si,N, from SiCl, and NH, [133].

and plasmachemical synthesis allow the generation of ex- tremely fine powders with particle sizes of just 10-30 nm and BET surfaces greater than 100 m'g-'. However, the products often show incorrect stoichiometric composition, are amorphous, or possess changing, not exactly repro- ducible a//3 ratios. Furthermore, they may contain free sili- con as an undesired by-product from decomposition reac- tions. Because of these difficulties, laser-induced and plas-

machemical reactions are not yet of importance to large- scale synthesis of Si,N, powders, despite intense research.

5. Silicon Nitride Whiskers

After the discovery that crystal whiskers show unusual mechanical strength!' 351 interest in the properties, produc- tion, and applications of ceramic whiskers grew."363 13']The use of whiskers to reinforce metallic or ceramic materials aims at improving fracture toughness or, more generally, mechanical properties of the matrix material. In spite of the strong general interest in ceramic whiskers, there are still problems in producing pure and uniform whiskers on a large scale in an economical way. The development of whisker production and processing methods especially has to take into account health precautions in order to exclude a poten- tial hazard like that arising from asbestos fibers." 38, 1 3 9 1

Chemically, the same methods as in the synthesis of spheroidal Si,N, powder particles are used for the produc- tion of Si,N, whiskers. However, additional measures are required in order to apply general techniques like vapor- phase transport or crystallization by vapor-liquid-solid (VLS) mechanisms to favor whisker formation.

5.1. Whiskers from the Reaction of Si and N,

In direct nitridation of elemental silicon, Si,N, whiskers are formed by reaction of silicon vapor and N, . Figure 14 shows a simple experimental setup for this production method. Silicon is evaporated from a crucible at the bottom;

N, inlet

.1 n n v gas outlet h

reaction and

nucleation zone

carrier gas

Fig. 14. Reactor for Si,N, whisker synthesis from a Si/N, gas-phase reaction [140].

a stream of inert carrier gas is used to guide the Si vapor into a reaction zone in the upper part of the apparatus where it reacts with N, or NH,. The Si,N, whiskers precipitate onto graphite baffles from where they may be collected.

1586 Angew. Chem. In!. Ed. Engl. 30 (1991) 1579-1597

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5.2. Whiskers from Carbothermal Reduction of SiO,

This process, which may be run continuously in conveyor- type pusher furnaces, yields whiskers from the gas-phase reaction of SiO and N, or NH, in CO-containing atmo- s p h e r e ~ . [ ' ~ ~ - 1431 By adjusting stoichiometry, particle size, homogeneity, and packing density of the reaction mixture of silica and carbon raw materials, addition of silicon or metal oxides, and control of the reaction temperature, the amount of SiO generation and, consequently, Si,N, whisker forma- tion is optimized. Whisker formation is also favored if Si3N4 whiskers are added to the reaction mixture as growth nu- clei.['431

5.3. Whiskers from the Reaction of SICI, with NH,

As described above, the reaction of SiCl, with NH, leads to Si(NH),, which yields amorphous Si,N4 on calcination. If small amounts of Fe or SiO, are added to this material and the resulting mixture is heated to 1200-1500 "C in the absence of oxygen, Si3N4 whiskers are formed by a vapor- liquid-solid mechanism from Fe- or silicate-containing eutec- tic melt droplets[72* 1431 (Fig. 15).

Fig. 15. r-Si,N, whiskers by crystallization of amorphous Si,N, [72].

5.4. Whiskers from the Reaction of SiS, with NH,

Originally intended to produce high-purity Si,N4 powder, the reaction of SiS, with NH, offers a good way to produce

Fig. 16. Amorphous Si,N, "spaghetti" from thermal decomposition of (Si-S-N-H), polymers [74].

Si,N4 ~ h i s k e r s . [ ~ ~ - ~ ~ I In the first step, SiS, is synthesized by reaction of Si powder with H,S at high temperature [Eq. (q)].

900 "C Si + 2H,S - SiS, + 2H, (n)

The high vapor pressure of SiS, which forms on dissocia- tion of SiS,, leads to SiS, whisker growth by a VLS mecha- nism from eutectic droplets of SiS and sulfur vapor. Reac- tion of SiS, with NH, affords a (Si-S-N-H), polymer, which thermally decomposes under NH , to amorphous silicon ni- tride [Eqs. (r) and (s)]. The amorphous silicon nitride is ob- tained in "spaghetti-like'' morphology (Fig. 16) and may be crystallized to cr-Si,N, with retention of morphology.

NH, SiS, - (Si-S-N-H)wiyme,

ca. 25-9OO'C

NH,

900 - 1500 "C (Si-S-N-H),,,,,,, - Si,N, (amorphous, crystalline) (s)

5.5. Whiskers from the Reaction of SIC and NH,

The reaction of S ic with NH, is remarkable since it leads to Si,N4 particles of unusual morphology. By heating a mix- ture of S i c and Fe powder in NH, to 1440 "C followed by a short-term temperature rise to 1480 "C, Glemser und Horn1761 obtained spiral-shaped a-Si,N, whiskers (Fig. 17, left). Some of these spirals could be seen with the naked eye.

Recently, similar observations have been made in the in- vestigation of vapor-phase deposition of Si3N4 from Si,CI,,

Fig. 17 Left: a-Si,N, spirals from the reaction of Sic and NH, in presence of Fe [76]. Right: a-Si,N, spirals by vapor-phase deposition from a mixture of Si,CI,, NH,, and H, onto a Fe-coated graphite substrate [144].

Angen. Chem. Inr. Ed. Engl. 30 (1991) 1579-1597 1587

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NH,, and H, at 1200 “C onto a graphite substrate coated with Fe-containing compounds.r144. 1451 The spiral-shaped whiskers (Fig. 17, right) are about 0.5-1.0 pm thick and consist of a-phase Si,N, slightly contaminated by carbon and oxygen. They show a quite uniform morphology with a regular pitch of 3-5 pm, a spiral diameter of 5-10 pm, and a length of 50- 100 pm. Obviously, spirals are formed only in a narrow fiber-diameter range of about 0.1 -5 pm.

5.6. Properties of Si,N, Whiskers

Some properties of commercially available Si,N, whiskers are shown in Table 1. The principal problems in whisker production are the requirements of high chemical purity and uniform whisker morphology. Because of technological dif-

Table 1. Properties of commercially available Si,N, whiskers.

Product Tateho SNW [a] Ube SN-W [b] ~~~~~~ ~ ~ ~ - - - ~ ~ ~

Synthetic method carbothermal reduction from amorphous Si,N, Crystal phase U U Diameter d 0.1 - 1.6 pm 0.1 -0.4 pm Length I 5 - 200 pm 5-20 pm

Density 3.18 g ~ m - ~ 3 . 1 8 g ~ m - ~ Fe max. 1000 ppm 4000- 5000 ppm A1 rnax. 2000 ppm < 100 ppm Ca max. 5000 ppm < 100 ppm Mg max. 2000 ppm not specified

Aspect ratio / / d 3 - 2000 10-200

0 not specified 2-3%

[a] Tateho Chem. Ind.. Japan [143]. [b] Ube Ind., Japan [72].

ficulties in producing a homogeneous distribution of Si,N, whiskers in a matrix material, fracture-causing structural defects are often induced during material processing; in these cases, the originally intended toughening of the matrix actu- ally turns out to be a ~eakening .1’~~. Fu ndamental prob- lems in whisker processing are often connected with shaping and sintering, since heaps of needlelike particles are much more difficult to compact by, say, dry pressing than heaps of spheroidal particles.

6. Remarks on the Procedures for Synthesis of Si3N4 Powders

A comparison of chemical and physical characteristics of powders from commercially used synthetic methods shows that direct nitridation, carbothermal reduction, and am- monolysis of reactive silicon compounds are principally able to furnish very fine, high-purity Si,N, powders for applica- tions in advanced ceramics (Table 2). Often variations of particle sizes, particle size distribution, and particle surface properties, which are important to ceramic processing, may be carried out after Si,N, synthesis by suitable powder pro- cessing. Direct nitridation and carbothermal reduction use cheap raw materials and yield crystalline Si,N, directly. However, the reaction products require extensive subsequent processing. On the other hand, ammonolysis of reactive sili- con compounds yields moisture-sensitive products which re- quire further thermal treatment for crystallization to yield

a-Si,N,. Because of their inherent fine particle size and only weak particle agglomeration, the extent of subsequent pow- der processing is considerably reduced compared with direct nitridation and carbothermal reduction. Direct nitridation and SiCl,/NH, gas-phase reactions seem to offer the best chances to furnish economically high-quality powders for the manufacturing of broadly applicable silicon nitride ce- ramics.

Table 2. Comparison of high-purity Si,N, powders from different synthetic methods.

Powder type DN 1 [a] DN 2 [b] GP [c] FP [dl CT [el

Elemental analysis [wt %] N 38.2 0 1.8-2.1 C <0.2 CI <0.001 Fe <0.008 A1 <0.005 Ca t0.002 a-Si,N, > 92 Yo

Mean particle 0.6 size d,, [pm]

38.2

< 0.2 <O.OOi < 0.03 <0.06 tO.O1

> 94 Y@

0.8

1.7-2.0 38.5 138.0 1.1-1.6 <2.0

<0.05 <0.2 <0.1 <0.01 <0.01 <0.01 <0.004 <0.005 <0.002 <0.005

>90% 295%

0.5 0.5

37.5 2.0 0.9

0.007 0.2 0.01

98 Yo

[fl

0.9

[a] DN 1 =direct nitridation (LC 12 - SX, H. C. Starck, Berlin). [b] DN 2 = direct nitridation (LC 10, H. C. Starck, Berlin). [c] GP = SiCI,/NH, gas-phase reaction (Grade GP, H. C. Starck, Berlin). [d] FP = SiCI,/NH3 liq- uid-phase reaction (SN E 10, Ube Ind., Tokyo). [el CT = carbothermal nitrida- tion (A 200, Toshiba Ceramics, Tokyo). [fl Not determined.

The production of Si,N, whiskers is not yet commercially important, since Si,N, whisker-reinforced materials have not found broad applications because of high costs and a lack of large-scale production methods for reliable compo- nents. For technological and economical reasons, especially carbothermal reduction and whisker growth from amor- phous Si,N, should be suited best to meet an eventually increasing demand.

7. The Manufacture of Sintered Si3N4 Ceramics

7.1. Fundamentals of Sintering and Structure Development

7.1.1. Physical and Chemical Aspects of Si,N, Sintering

“Dry” sintering techniques used in densification of oxide ceramics cannot be applied to the sintering of Si,N, powder compacts. Strong covalent Si-N bonds hinder useful mass transport through grain-boundary or lattice diffusion, The activation of diffusion by simply raising the sintering tem- perature is limited by ever-increasing thermal decomposition [Eq. (91.

Si,N, (solid) - 3 Si (liquid) + 2N, (gas) - 3Si (gas)

Since a N, partial pressure of 1 bar is reached at about 1900 “C, several precautions have to be taken in order to prevent excessive decomposition during sintering of Si,N, at high temperatures. Most important is the addition of com-

1588 Angew. Chem. Ini. Ed. Engl. 30 (1991) 1579-1597

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pounds that form molten silicate phases and allow densifica- tion by liquid-phase sintering mechanisms. Well-suited addi- tives include alkaline-earth oxides and rare-earth oxides ei- ther alone or in combination with AI,O, or A1N.[148-152]

Above 1300 "C sintering additives react with SiO, or Si,N,O always present in Si,N, powders to yield molten silicate phases. In the case of sufficient wetting and solubility of Si,N,, these silicate melts allow densification by capillary- force-induced particle rearrangements and dissolution/re- precipitation processes.

The efficiency of these mechanisms is illustrated by a model experiment using a presynthesized, nitrogen-saturat- ed Mg-AI silicate glass as sintering additive (Fig. 18). At

2000

I 1800]

I

dSldt SXlO [%]

t [min] - Fig. 18. Dilatometric investigation of Si,N, sintering in the absence (1) and presence ( 2 ) of a nitrogen-saturated glass [153]. Temperature ----. dS/df - shrinkage dS/df in [%min-'].

1300 "C dilatometric monitoring of the process shows densi- fication by capillary-force-induced particle rearrangement, since nitrogen saturation of the silicate glass does not allow further dissolution of N, or Si,N,. With increasing temper- ature Si,N, solubility increases and densification via dissolu- tion/reprecipitation is observed. A Si,N, sample without sintering additives shows a completely unsatisfactory densi- fication.

Another important precaution is sintering under high N, pressure to suppress decomposition according to Equa- tion (t). Figure 19 shows that this technique significantly ex- tends the temperature range of Si,N, sintering.

PSi

pN2 Iatml- 1 0 - 4 1 0 - ~ 1 0 - ~ 1 0 - ~ 1 101 102 lo3

10-2 3

10-3 2

I 10-4 1

1 0

[atml 10-6 -1

lo-' -2

10-8 -3

10-10 10-93:: 1 2 3 4 5 6 7 8

lg PN2-

lg Psi

Fig. 19. Silicon vapor pressure in equilibrium with silicon nitride as a function of N, pressure and temperature (1491. The bold lines show temperature inter- vals of 100 K from 1300 "C to 2200 "C. The hatched region represents the range where sintering of Si,N, takes place. The pressures were measured in Pa.

7.1.2. Structure Development

After particle rearrangement at low temperatures, which increases the packing density almost without influencing particle shape and particle size distribution, true sintering by dissolution/reprecipitation occurs at higher temperatures. At present, structure development is thought to depend on the kind of Si,N, starting powder. Starting from a-Si,N,, reprecipitation of dissolved cc-Si,N, from almost saturated or slightly oversaturated solutions leads to crystallization of needle- or rodlike P-Si,N4 grains far from the energetic min- i m ~ m . [ ' ~ ~ ] Since a fine-grained, needlelike structure has a positive influence on fracture-mechanical properties ("in- situ whisker reinforcement") for numerous applications, this grain morphology is desired.[155, 15@. If P-Si,N, powder is used, dissolution/reprecipitation occurs almost in equilibri- um. The surface energy difference between small and large particles causes a continuous dissolution of small particles and their reprecipitation on large grains. This process allows grain growth with minimization of boundary surface energy

Fig. 20. Structure development in sintering of a Y,O,/Al,O,-doped Si,N, powder [158]. Left: 1800 "C (10 min). Middle: 1800 "C (2 h). then 1820 'C (2 h). Right: SO sintering cycles (see middle for conditions). Additives: 1 5 wt% Y,O, + 3.4 wt% AI,O,.

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leading to the development of approximately globular

Prolonged thermal treatment, far beyond the moment when densification is complete, favors grain growth by min- imization of boundary energy (“Ostwald ripening”) also in needle-grained structures and leads to grain coarsening with growth of spheroidal grains. In this case, structural develop- ment leads to the formation of globular grains, no matter whether a- or P-Si,N, has been used as starting material. A study on structure development on prolonged heat treatment of a-phase Si,N, is shown in Figure 20.

After sintering, all these materials contain an amorphous or semicrystalline secondary phase in between grain boundaries or in grain triple points (Fig. 21). Since especially

Fig. 21. Transmission electron microscopy (TEM) of amorphous secondary phase along grain boundaries in sintered Si,N, [159]. The black lines show the directiop (lOTO),, A a grain triple point, B a grain boundary.

material properties at high temperatures are greatly influ- enced by the secondary phase, the reduction, modification, or complete elimination of this phenomenon is of major importance to the optimization of Si,N, ceramic proper-

7.1.3. Influence of Sintering Additives

The amount and chemistry of the molten silicate phase, which is formed by sintering additives, are of importance to the course of sintering, since they determine sintering kinet- ics. For example, the kinetics of MgO-doped systems are governed by dissolution, whereas the rate of diffusion is crucial in Y,O,-doped The influence of typi- cal additives on sintering behavior is shown in Figure 22. For instance, the densification of Y,O,-doped Si,N,, which sin-

ters at relatively high temperatures, may proceed at the low temperature level of (MgO + Al,O,)-doped materials if AI,O, is added.

r 2 0 20001 1800

{ ] ] ]

20 40 60 80 100

s [%.I

t [min] - Fig. 22. Influence of type of additives on sintering behavior. - ~ - - tempera- ture,-MgO + A1,O,,---YY,O, + A1,O,,---YY,O,.S = shrinkage.

Different additive systems may form compounds of the type a‘-Me(Si,AI),(N,O), or /3’-Si6-xAI,01Ns-, with newly precipitated Si,N, grains.[162. 1631 The expectation that Si,N, ceramics free of secondary grain-boundary phases can be produced by using this principle has only been fulfilled for Be-doped 1601

The amount and kind of additives also influence structure development and thus material properties. Fine-grained Si,N, structures are favored in systems where the molten silicate phase shows a relatively high viscosity at sintering temperatures (e.g., systems doped with rare-earth oxides). The influence of additives is especially clear in the structure development of /3’-SiAION materials, where globular grains are favored. Figure 23 shows a comparison of these materi- als with a material sintered with MgO/AI,O,, which devel- oped a needlelike structure. The exact reasons for this behav- ior are not yet completely understood.

7.1.4. Influence of Powder Characteristics

Besides the kind and amount of additives, the sintering behavior, structure development, and, finally, material prop- erties depend strongly on the powder characteristics of the starting Si,N, powder. Of further importance are the pow- der properties resulting from processing prior to shaping and sintering; in particular, it is necessary to break up particle agglomerates and to produce a homogeneous distribution of sintering additives. Relevant powder properties can be divid-

Fig. 23. Left: Globular structure in a F-Si- AI-0-N material; right: needle-type struc- ture in a MgO/AI>O,-doped material.

1590 Angew. Chem. Int. Ed. Engl. 30 (1991) 1579-1597

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ed into physical, chemical, and technical characteristics, which together determine processing behavior and sintering activity in a complex way.

The influence of ct/P-Si,N, ratio has already been mentioned and is still a subject of intensive discus- ~ i 0 n . I ~ ~ . 1 2 4 * 1 s 5 , 16’] A high a-phase content enhances sintering activity and favors the development of rodlike P- Si,N, grains. With respect to sintering activity, amorphous Si,N, would be of even greater advantage. However, its large-scale use is complicated owing to its sensitivity towards hydrolysis and its low powder-packing density, which results in enormous shrinkage during sintering.

Among chemical powder characteristics, the oxygen con- tent is of special importance, since it influences the softening behavior and the amount and viscosity of the silicate phase formed on reaction with sintering additives. Although a great amount of low-viscosity silicate melt phase enhances sintering, it has a negative effect on the high-temperature properties of the material if the silicate phase remains as an amorphous, glassy grain-boundary phase. Thus, the oxygen content has to be adjusted to the amount of sintering addi- tives required (or vice versa); it is a compromise between beneficial effects on sintering behavior and detrimental ef- fects on high-temperature material properties. Usually, com- mercially available powders possess an oxygen content in the range of 1 -2 %.

Also the distribution of oxygen in the particle itself is of importance. If oxygen is concentrated on particle surfaces, it is directly available for silicate phase formation by reaction with sintering additives. In this way, surface oxygen im- proves sintering activity considerably.[’663 16’] Therefore, high-quality Si,N, powders usually possess oxygen-enriched particle surfaces, which allow fine-tuning of the amount of sintering additives required for complete densification and thereby result in improved material properties. The coating of a Si,N, particle with an amorphous layer rich in oxygen is shown in Figure 24.[’68’

1 300-

200-

a[MPa]

100-

Fig. 24. TEM picture of the coaling of a Si,N, particle with an amorphous layer rich in oxygen [168]. Beam direction (T2TO). The arrows indicate Schottky partial dislocations.

Free carbon has a negative influence on sintering behav- ior, since it reduces the oxygen content of the powder with formation of volatile SiO and CO. The resulting ill-defined variations in silicate phase chemistry may cause incomplete sintering, undesired structure development, and, finally poor

material properties.[’ 539 1691 Chemically bonded carbon in the form of SIC is much less critical. Because of its inherent stability, this material may be considered as inert filler.t108* 1471 The effects of other impurities have to be judged by their behavior in sintering; they may dissolve in the liquid phase with incorporation in the silicate structure or they may remain as particle inclusions with or without reaction with the Si,N, matrix. Metal oxides and metal halides either evaporate during sintering or dissolve in the liquid phase, lowering its viscosity with the already discussed effects on sintering behavior, structure development. and material properties.

Metal particles like Fe, Mn, and Ti react with the Si,N, matrix to form silicides or nitrides.[’701 Compared to origi- nal particle sizes, inhomogeneities due to chemical reactions are larger” and thus generally detrimental to mechanical properties like fracture strength (Fig. 25).

&y pm

scattering range surtacecrack

I I I I I I I I I

200 400 600 800 Size of extraneous particles [pm] -

Fig. 25. Dependence of fracture stress u on size of extraneous particles in Si,N, sintered ceramics (1711.

Granulometric powder properties, which involve particle size distribution, particle morphology, and particle agglom- eration, influence processing behavior and the extent of pow- der processing required to produce an admixture of high sintering activity. Since sintering activity increases with in- creasing surface energy, “sub-pm” powders with a high con- tent of particles less than 1 pm are advantageous. The amount of “coarse grains” attracts special attention, since these particles will dissolve in the silicate phase comparative- ly slowly. Therefore, sintering is slowed down and some par- ticles may survive more or less unchanged to form structure inhomogeneities.

Whisker- or fiberlike Si,N, particles cause similar effects, additionally making powder shaping more difficult. “Coarse grains” greater than 1 pm, as well as deviant particle mor- phologies, usually are not destroyed during powder process- ing to generate the sintering admixture. Powder processing has to guarantee that agglomerates of primary crystallites, which are principally present, are broken apart, since their size and the lack of sintering additives in their cores would induce very large defects and thus limit strength and reliabil- ity of the sintered component. Furthermore, the size and hardness of these agglomerates determine dispersibility and homogeneity of the sintering admixture; these properties are very important quality criteria. A qualitative and quantita- tive description of agglomeration mechanisms and agglom-

Angrn. CIwm. ln l . Ed. Engl. 30 (I9911 1579-1597 1591

Page 14: Silicon Nitride Research

erate properties is steadily gaining importance as a goal of research." 721

The shape-sharp-edged to spheroidal/globular-and the size distribution of primary crystallites determine also the limits of densification and the extent of sintering shrinkage. Green densities (i.e., the densities of the powder-shaped bodies prior to sintering) must be as high as possible to reduce the danger of critical tensions due to high shrinkage; these tensions would otherwise lead to cracks and fissures during temperature treatment.

Physical, chemical, and technological powder properties have a complex influence on sintering behavior, structure development, and final material properties. The relative in- fluence of a single powder property may be estimated by means of statistical ~a1culations.l '~~~ 711

7.2. Technological Aspects

7.2.1. Powder Processing

The processing of a Si,N4 powder to a highly sintering active admixture aims at breaking up particle agglomerates and distributing homogeneously the sintering additives. Wet processing in mills of high-energy density is well-suited for this purpose. However, attention has to be paid to the kind and amount of wear debris from these machines. Oxygen contamination due to partial hydrolysis of Si,N4 and carbon contamination are important if processing is done in either water- or organic-solvent-containing media. The extent of processing depends on starting powder quality, the desired powder shaping and sintering techniques, and the material property profile of the component to be manufactured. Since powder characteristics may vary considerably during pro- cessing, rigorous controls are necessary to ensure the highest possible uniformity of processing from lot to lot.

7.2.2, Powder Shaping

Axial or isostatic dry pressing, extrusion, slip casting, or injection molding is used for powder shaping (Fig. 27). These procedures are well-known to the ceramic industry. Selection criteria depend on component complexity, on eco- nomics and, if required, on the feasibility of large-scale pro- duction. Dry pressing is used mainly for the production of

Powder shaping methods I

I I I I

axial molding

powder product

p. injection

powder powder Droduct

rub&r She,l 'hydraulic liquid

Fig. 27. Ceramic powder shaping methods. p = pressure

gypsum mold

components with simple geometry like plates, tubes, or cylin- ders. Slip casting and injection molding are favored to pro- duce net-shape components of complex geometry on a large scale. All shaping techniques require certain, usually organ- ic, processing additives. Binders ensure the stability of pow- der compacts in dry pressing, dispersion agents allow the pro- duction of highly particle-loaded, stable slips for slip casting, and plasticizers allow injection molding. Since especially in- jection molding promises an economical, large-scale produc- tion of complex components, its development has attracted worldwide attention.r'76-'78] All organic additives have to be burned out quickly and quantitatively prior to sintering without inducing defects like pores, cracks, or fissures. Be- cause of the high amount of plasticizers, usually about 10- 25 weight percent, this step is especially critical in injection molding. Although shaping is finished in a few seconds, plas- ticizer burnout requires several hours to several days de- pending on component thickness and kind of plasticizer. To improve this situation the development of new organic plas- ticizer systems, which may be decomposed either chemically or thermally after powder shaping, is of fundamental impor- tance.

Fig. 26. Y distribution in Y,O,-doped Si,N, sinteringpowder admixture. Left: By mechanical dispersal of Y,O,. Right: By precipitation of Y(OH),.

7.2.3. Sinrering

Extremely homogeneous distribution of sintering addi- tives may be achieved far better by precipitation from solu- tion than by intensive mechanical dispersion. Here, codrying of salt solutions and Si,N, slips['531 has been investigated as well as precipitation of hydroxides from salt solutions[' 731 and precipitation by hydrolysis of metal alcoholates.'' 74, 1751

Figure 26 shows that this approach leads to extremely homo- geneous additive distributions.

The sintering techniques used for the manufacture of Si,N, ceramics are compiled in Figure 28 together with pro- cess characteristics. Axial hot pressing in graphite matrices is used almost only for components of relatively simple geome- try like rods, plates, or cylinders. Hot isostatic pressing (HIP), however, allows sintering of complex compo- nent~.["~] Powder compacts are sealed gas-tight in metals or glasses of high melting point; plastic deformation of the softening material of the capsule results in uniform applica-

1592 Angew. Chem. Inr. Ed. Engl. 30 (1991) 1579-1597

Page 15: Silicon Nitride Research

Method:

Material abbreviation

~ ~~~

starting material

processing steps

conditions T t p(gas)

product

process characteristics linear shrinkage

finishing

Hot Pressing

HPSN

S$t$ sintering admixtures

hot pressing + 1

5 1880°C 2 1 h

2 50 MPa mech.)

1 dense body

only height

very extensive

Sintering normal gas pressure pressure

SSN (GP-)SSN

Si& powder compacts

sintering J.

< 182OOC i-7 < 2100°C

LJ near nel-shape

< 5 h < 5 h 0.1 MPa N2 2 10 MPa N1

component

218%

less extensive

Hot Isostatic Pressing sinter-HIP capsule-HIP

HIP-SSN HIP-SN

Si& powder compacts

presintering encasing A

J. (to 293% th. D.)

HIP +

HIP < 2000°C < 2000°C

< 2 h c 4 h 2 200 MPa (Nt + Ar) 5 200 MPa Ar

decasing G near net-shape

component

5 18%

less extensive extensive

Fig. 28. Sintering processes for the manufacturing of dense Si,N, components. mech. = mechanical, th. D. = theoretical density.

tion of the external gas pressure on the powder compact. Densification occurs with very precise retention of shape. After sintering is complete, the capsule is removed mechani- cally (sandblasting) or chemically (etching). Thus, this so- called capsule-hipping is an expensive and slow procedure not suited for low-cost mass production of ceramic compo- nents. Usually, it is applied for the production of compo- nents which are used under extreme conditions and would otherwise require an even greater effort for However, "hipping" allows the manufacture of Si,N, sin- tered materials with very good high-temperature properties due to the only very small amount-or even absence-of an amorphous grain-boundary phase.["', '"I These develop- ments, to date on laboratory scale, may gain importance for the manufacturing of Si,N, components showing long-term mechanical strength at high temperatures.

industrially employed.['491 In this process a powder compact is heated to sintering temperature in a powder bed consisting of Si,N, and BN. The course of temperature and pressure has to be adjusted to furnace geometry, sintering additives, and powder compact geometry (characteristic data in Fig. 28). Sintering under normal pressure limits the maxi- mum temperature to about 1820 "C owing to the decomposi- tion of Si,N,. However, sintering at increased N, pressure allows a further temperature increase and results in a pres- sure-assisted densification, which is effective only if the stage of closed porosity above 93 % theoretical density was reached by normal pressure sintering. This method shortens the overall time required for complete densification ; it even has a (limited) ability to increase strength and reliability of Si,N, sintered components because of some defect healing. A typical course of temperature/pressure versus time in gas pressure sintering is shown in Figure 29.t'491

-100 7.2.4. Finishing

-Oo t h 2

-60

-40 lbarl

-20 P

i 8.

8. *. I I I I I

20 40 60 80 100 120 t bin1 -

Fig. 29. Temperature-pressure-time profile during gas-pressure sintering of Si,N, 1149).

Cost-efficient mass production of near-finished Si,N4 components is possible by N, gas-pressure sintering, which was developed during the seventies and which is meanwhile

Since sintered components are rarely used as fired, that is, without precise finishing, corrections of shape with adjust- ments of tolerances, as well as high-quality surface finishing, are required, especially for applications as engine or turbine components. Because of high hardness and comparatively high toughness of Si,N, materials, these steps are time-con- suming and expensive. Mainly cutting, grinding, honing, lapping, and ultrasonic erosion are used for finishing. Laser cutting and spark erosion are under d e v e l ~ p m e n t . ~ ' ~ ~ ~ 1841

Ultrasonic erosion is of special interest, since it allows the production of very complex components (e.g., gas turbine rotors) from simple monolithic shapes (Fig. 30). Generally, finishing has to be done extremely carefully in order to avoid strength and reliability deterioration by fracture-causing surface defects like cracks, fissures, and pits.

Angew. Chem. In i . Ed. Engl. 30 (1991) 1579-1597 1593

Page 16: Silicon Nitride Research

Fig. 30. Left: Manufacturing study for ultra- sonic erosion of a turbine wheel from a hot- pressed Si,N, monolith [ISS]. Right: Turbine wheels made of Si,N, for applications in auto- motive gas turbines [186].

8. Physical and Chemical Properties

8.1. Physical Properties

Table 3 shows a compilation of important properties of completely densified Si,N, ceramics. The scattering range of the data is mainly due to structural differences, which are influenced by starting powder characteristics, amount and kind of sintering additives, powder shaping, and sintering techniques as well as temperature, pressure, and soaking time during sintering. Fracture strength is surely the charac-

Table 3. Physical properties of dense Si,N, material.

Property Value ~~~ -

Decomposition temperature Theoretical density (th. D.)

Material density Thermal expansion coefficient (293 ~

Specific heat Electrical resistance [a] Microhardness (Vickers) Bending strength [a] [b] Fracture toughness [a] Elasticity modulus [a] Thermal conductivity [a] Critical temperature difference

in thermal shock

2173 K a-phase: 3.168-3.118 g ~ m - ~ a-phase: 3.19-3.202 gcm-’ 95-100% th. D.

700JKg-lK-I Rcm

1400-1700 MNm-’ 600-1000 MPa 5-8 MPam”’ 280-320GPa 15-30 Wm-’K-’ 600-800 K

-1473K) 2.9-3.6 10-6K-1

[a] RT = room temperature. [b] Four-point bending

teristic property determined most often; usually it is consid- ered as a key criterion of quality. Some years ago, a signifi- cant dependence of material properties on the method of producing the starting powder was observed.[1871 However, these differences almost vanished as a result of constant ef-

forts to improve Si,N, powder quality and production meth- ods. The influence of sintering techniques on material prop- erties is reflected in the so-called Weibull modulus (a statisti- cal parameter to characterize a property distribution over a manifold of samples), which is used to characterize the scat- tering of fracture strength and thus the reliability of the material. The (limited) ability of a particular sintering pro- cess to anneal defects like pores, bubbles, internal cracks, and fissures is thereby quantified to a certain extent. The following values are typical for Weibull moduli of commer- cial materials: pressureless sintered Si,N, > 10; gas-pres- sure-sintered Si,N, (GP-SSN) > 15; isostatically hot-pressed Si,N, (HIP-SSN), > 20.

A general comparison of fracture strength is difficult, since materials for specialized applications have been devel- oped. Here, the main criteria of quality include not only fracture strength, but also the strength level at temperatures greater than 1000 “C, fracture toughness, and hardness or wear resistance. Today, the state of the art is a strength level of 800- 1000 MPa at room temperature; however, materials with fracture strengths exceeding 1000 MPa have been de-

By controlled structure development (in situ whisker rein- forcement) it is possible to increase the fracture toughness of Si,N, materials from a level of about 7 MPam1j2 to almost 10 MPam1/2;r1901 a conventional material is compared to an “in situ whisker reinforced” material in Fig. 3I . [ l9 l1 The toughness level attained here could formerly be achieved only by reinforcement with extraneous particles (like whiskers or l9,1

At temperatures exceeding 1000 “C a decrease of strength in many materials is caused by slowly softening amorphous grain-boundary glass phases. The amount and kind of these phases determine creep and long-time fracture strength. All modifications of materials or technological processes to im-

scribed.[188. 1891

Fig. 31. Improving fracture toughness Kjc by in situ whisker reinforcement (1911. Left: Structure of a conventional Si,N, material (K,= = 6.5 MPam”*). Right: Structure of an in situ whisker-reinforced material (K,< = 9.5 MPam’’z).

1594 Angew. Chem. Inr. Ed. Engl. 30 (1991) 1579-1597

Page 17: Silicon Nitride Research

prove the dependence of fracture strength on temperature and to improve the strength level at high temperatures aim at reducing the amounts of amorphous grain-boundary glass phases or at generating higher refractory, crystallized grain- boundary phases together with optimization of structure. Recently, a successful realization of these concepts has been reported." 891

An evaluation of a commercially available MgO-doped material is given in Figure 32.[lg4] Here, the failure probabil- ity resulting from Weibull analysis in the range of linear elastic stress up to 900 "C and probable reasons for positive or negative deviations caused by defect annealing or defect induction is shown. Figure 32 also shows the life expectancy of the material below short-time fracture load. To avoid

1200-

1000-

800-

1 600-

400-

0 [MPa]

200-

,rn,,,,y

fast fracture

I I I I I 1 I I I

200 400 600 800 1000 1200 1400 1600 7 ["C] -

Fig. 32. Fracture strength of hot-pressed, MgO-doped Si,N, as a function of temperature and time [164]. u = flexural strength.

premature failure at a given temperature, the material should bear only considerably lower mechanical stresses than short- time fracture strengths would indicate.

8.2. Chemical Properties

Owing to the broad possible applications of sintered Si,N,, its chemical properties have been investigated with special regard to corrosive behavior.['95 - lg8]

Silicon nitride is inert to numerous molten metals (e.g., Al, Zn, Sn, Pb, Cu, Ag, and Cd); however, in contact with molten transition metals like Fe, Co, Ni, V, and Cr, it reacts readily to form metal silicides and N,. In contract with molten salts, oxidic slags, and glasses, only slow corrosion occurs. With the exception of hydrofluoric acid, Si,N, ce- ramics are resistant to mineral acids. Mainly porous Si,N, materials are attacked by hot strong caustic solutions or melts with formation of NH,.

In the use of engine components made of Si,N, (e.g., valves, turbocharger, gas turbines) the oxidation behavior of sintered Si,N, is especially important. Since Si,N, is coated with a thin protective layer of SiO, on heating in air, a good oxidation resistance is shown up to 1400 "C. In high-temper- ature oxidation two fundamentally different mechanisms of damage are observed.['961

The first mechanism is based on the diffusion of sintering additives and impurities along grain boundaries owing to the higher oxygen potential at the surface of the material. Reac-

tion with SiO, at the surface results in the formation of oxidic glass phases of low viscosity, which induce enhanced corrosion accompanied by N, formation. N, pores and modification changes of grain-boundary phases leading to different thermal expansion coefficients between glass phase and matrix material induce defects which lower the fracture strength of the material.

A second mechanism will lead to complete destruction if4epending on sintering additives-crystalline phases are formed during sintering, which are readily oxidized with con- comitant volume expansion. Internal stress may build up so strongly, that the sintered component is completely destroyed in a short time. This phenomenon has been observed primar- ily in some ternary Y-Si-0-N and Ce-Si-0-N phases.['991 A suitable selection of sintering additives, the use of high-puri- ty starting powders, and a reduction of additive and oxygen content are important in the development of high-tempera- ture oxidation-resistant sintered Si,N, materials.

9. Summary

Sintered silicon nitride is a promising material for applica- tions in engine construction, mechanical engineering, wear and chemical technology, where high mechanical strength at high temperatures, corrosion and wear resistance, hardness, and low density are desired. Cutting tools, bearings, mill cladding, bearing gaskets, and engine components like valves, valve guides, turbocharger rotors, and gas turbines are promi- nent examples where this material is already used routinely or where it is being tested as a basic material.

To date, the required high-quality Si,N, powders are com- mercially produced mainly by direct nitridation, to a lesser extent also by SiCI,/NH, liquid-phase reaction (diimide pro- cess). Among processes under development, the SiCIJNH, gas-phase reaction seems to offer the best potential to fur- nish economically high-purity, highly sintering-active Si,N, powders on a large scale.

Chemical and physical characteristics of the starting mate- rial, kind and amount of sintering additives, and sintering technique determine material properties. Their interdepen- dence influences structure development as well as the kind and composition of silicate phases formed at grain boundaries.

Crystallization and reduction of the amount of these sili- cate phases are important to further improve material prop- erties like fracture strength, creep, and corrosion resistance especially at high temperatures.

A flawless manufacturing process from powder synthesis to finished component is required to produce high-quality, reliable ceramic components. Injection molding, as a pow- der-shaping technology using cheap, high-quality, easily processible Si,N, powders, has a great potential for the large-scale manufacturing of very complex components. Pressureless or low-pressure sintering is of great interest for the low-cost production of near-finished components. The development of economical methods for finishing sintered components of this very hard material is still necessary to decrease the very high finishing costs.

The work on economical methods to produce high-quality Si,N, powders, to improve steadily powder and material

Angew. Chem. Inr. Ed. Engl. 30 (19911 1579-1597 1595

Page 18: Silicon Nitride Research

properties, and to manufacture reliably working ceramic components of superior quality should be viewed in its en- tirety as a necessary requirement for a broad application of silicon nitride advanced ceramics in the future.

Received: May 8, 1991 [A 844 IE] German version: Angew. Chem. f03 (1991) 1606

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