semiconductor processing: lithography part i...300 nm pmma, si substrate 10 nm beam diameter 10 kev...
TRANSCRIPT
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Semiconductor Processing:Lithography Part I
Professor Benjamín AlemánDepartment of PhysicsUniversity of Oregon
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Planar Processing with Semiconductors (Silicon):Course Map
• Crystal growth (semiconductors)• Wafer doping (in situ)• Wafer characteristics• SiO2 growth*• Defects and impurities
• SiO2 growth*• LITHOGRAPHY• Masked diffusion doping• Vacuum Systems• Thin Films: CVD, MBE,
PVD, ALD• Implantation• Wet and Dry Etching• Integration
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Diffraction through a single slit
𝑊 =2𝐿𝜆
𝑏
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Resolution and Depth-of-focus of an optical system
𝑙𝑚 = 𝑘1𝜆
𝑁𝐴𝐷𝑂𝐹 = 𝑘2
𝜆
(𝑁𝐴)2𝑁𝐴 ≡
𝐷
𝑓≡ 𝑛 sin 𝜃
Resolution Depth of field Numerical aperture
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The challenges of registration illustrated by the 7 nm transistor
(Gatan, 2003)
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An example of registration in e-beam lithography
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An example of registration in e-beam lithography
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Phase Shifting
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Optical Proximity Correction (OPC)
Mask Wafer
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Electron-beam lithography
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An example of electron-beam lithography
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Simulating proximity effect with CASINOmonte CArlo SImulation of electroN trajectory in sOlids
300 nm PMMA, Si Substrate
10 nm beam diameter
10 keV 100 keV
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The proximity effect limits e-beam resolution
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Extrem UV (100 eV) lithography
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Double Patterning
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Roadmap
wikipedia
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Photoresist Materials
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Exposure-Response Curves of Photoresist
𝑆𝑒𝑛𝑠𝑖𝑡𝑖𝑣𝑖𝑡𝑦 ∝1
𝐷0𝛾 =
1
log𝐷100𝐷0
(𝐶𝑜𝑛𝑡𝑟𝑎𝑠𝑡)
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An example of calculating γ
𝐷0 = 0.6𝐷100 = 1.8
𝛾 = 1/ log1.8
0.6
= 2.1
𝐷0 𝐷100
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Exposure-Response Curves of Photoresist:Sensitivity and Contrast
Sensitivity
Contrast
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Resist contrast determines resolution, sidewall angle and line width (minimum feature size)
High Contrast
Low Contrast
High Contrast
Low Contrast
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SU-8 is a negative tone resist with high contrast
Microchem
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Critical resist Modulation Transfer Function (CMTF) and the Modulation Transfer Function (MTF)
𝐶𝑀𝑇𝐹 =𝐷100 − 𝐷0𝐷100 + 𝐷0
=10 1 𝛾 − 1
10 1 𝛾 + 1
𝑀𝑇𝐹 =𝑀𝑖𝑚𝑎𝑔𝑒
𝑀𝑚𝑎𝑠𝑘
𝑀 =𝐼𝑚𝑎𝑥 − 𝐼𝑚𝑖𝑛
𝐼𝑚𝑎𝑥 + 𝐼𝑚𝑖𝑛
𝑀𝑇𝐹 = 𝑀𝑖𝑚𝑎𝑔𝑒 =𝐼𝑚𝑎𝑥 − 𝐼𝑚𝑖𝑛
𝐼𝑚𝑎𝑥 + 𝐼𝑚𝑖𝑛
No image is formed if 𝑪𝑴𝑻𝑭 > 𝑴𝑻𝑭.
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Modulation Transfer Function
Mask
Image
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SU-8 Thickness vs. spin-speed curve
Microchem