Ш.results and discussion Ш. results and discussion a) w composition b) stress and mechanical...

1
Ш Ш . . Results and discussion Results and discussion a) W Composition b) Stress and Mechanical Properties c) TEM-microstructures 0 2 4 6 8 10 12 14 1.2 1.5 1.8 2.1 2.4 2.7 3.0 3.3 R es id u a l s tre s s (G Pa) W /(W +C ) (at.% ) Ш ІІ І C Si substra te Ar W W incorporated carbon nanocomposite films prepared by hybrid ion beam deposition Ai-Ying Wang Ai-Ying Wang a a , , * * ([email protected]) ([email protected]) , Hyo-Shin Ahn , Hyo-Shin Ahn a a , Kwang-Ryeol Lee , Kwang-Ryeol Lee a a , Jae-Pyou , Jae-Pyou ng Ahn ng Ahn b b a Future Technology Research Division, Korea Institute of Science and Technology, Seoul, 130-650, South Korea Future Technology Research Division, Korea Institute of Science and Technology, Seoul, 130-650, South Korea b b Nano-Materials Research Center, KIST, South Korea Nano-Materials Research Center, KIST, South Korea І І . Introduction . Introduction Significant progress in understanding the growth behavior and a Significant progress in understanding the growth behavior and a tomic bond structure of diamond-like carbon (DLC) film has been tomic bond structure of diamond-like carbon (DLC) film has been achieved in the last three decades. Nevertheless, high residual achieved in the last three decades. Nevertheless, high residual stress and poor adhesion are still the main barriers to its app stress and poor adhesion are still the main barriers to its app lications. In the present work, we employed a hybrid deposition lications. In the present work, we employed a hybrid deposition method to prepare W incorporated DLC films in a wide range of W method to prepare W incorporated DLC films in a wide range of W concentration from 2.4 to 12.5 at.%. concentration from 2.4 to 12.5 at.%. We observed a stress jumpi We observed a stress jumpi ng behavior as the W concentration increased from 2.4 to 5.0 at. ng behavior as the W concentration increased from 2.4 to 5.0 at. %. Beyond 5.0 at.%, gradual decrease in the residual stress was %. Beyond 5.0 at.%, gradual decrease in the residual stress was observed as in the previous work. observed as in the previous work. High resolution TEM analysis High resolution TEM analysis showed that the stress jumping was closely related to the chang showed that the stress jumping was closely related to the chang e in the W incorporation behavior from atomic scale incorporati e in the W incorporation behavior from atomic scale incorporati on into the amorphous carbon matrix at low W concentration to f on into the amorphous carbon matrix at low W concentration to f ormation of a nanosized ormation of a nanosized -W -W 2 C phase at higher W concentration. A C phase at higher W concentration. A b initio calculation of the excess energy by atomic bond distor b initio calculation of the excess energy by atomic bond distor tion suggested that the stress reduction with atomic scale W in tion suggested that the stress reduction with atomic scale W in corporation was due to the reduction of the directionality of corporation was due to the reduction of the directionality of W-C bonds. W-C bonds. П П . Experimental . Experimental Working gas: Ar + C 6 H 6 (tot al: 12sccm) Base pressure : 2.0 10 -6 Torr Substrate bias : - 200 V Power density of target: 4.2 ~7.3 W/cm 2 Deposition Pressure : 0.6 ~ 1 10 -4 Torr Thickness: 350±50nm Substrate: P-type Si(100), 50 0m, 100m W n+ H + , C m+ 0.55 0.60 0.65 0.70 0.75 0.80 0.85 0.90 0.95 0 2 4 6 8 10 12 14 16 W co n cen tratio n (at.% ) A r fractio n in th e g as m ixtu re b ias -200V 0 2 4 6 8 10 12 14 15 20 25 30 35 40 120 130 140 150 160 170 180 190 200 H a rd n e s s (G Pa) W /(W +C ) at.% E la s tic m o d u lu s (G Pa) 21±3 GPa 170±15 GPa !! Stress jumping occurred with increasing W concentration. The mechanical properties also showed the same dependence, although the variation is not as significant as that of the stress. (e ) 4 nm -W 2 C (102) -W 2 C (101) 4 nm ( c ) -W 2 C (101) 4 n m (b ) (a ) 4 nm 4 nm (d ) -W 2 C (102) -W 2 C (101) І П Ш Region І : nanosized W embedded in carbo n matrix. Region П : Segregation of tungsten star ted. Region Ш : crystalline carbides phase pr esented (a) 3.0, (b) 4.2, (c) 5.1, (d) 8.7, (e) 12.5 at.% d) GIXRD-phase identification. e) Raman and EELS- atomic bond structure f) Ab Initio Calculation – energy increase due to bond distortion g) Stress Jumping and Atomic Bond Structure І П Characteristic of amorphous structure. Weak crystallinity of carbides. Ш High crysallinity and fraction of carbides. 20 30 40 50 60 70 80 90 -W C 1-x -W 2 C -W 2 C (311) (220) (200) (1 11 ) (112) (103) (002) (002) 3.0 4.2 W 12.5 at.% 2 degree) In te n s ity (a .u .) 8.5 5.1 (1 00 ) (002) (102) (110) (103) (200) (112) (112) (103) (210) (222) (400) (2 06 ) (117) (506) (530) (444) WC x 400 600 800 1000 1200 1400 1600 1800 2000 2 4 6 8 10 12 14 1540 1545 1550 1555 1560 1565 1570 G -peak position (cm -1 ) W /(W +C)at.% 5.1 4.2 W 3.0 at.% 8.5 6.7 In ten sity (a.u .) W ave num b er (cm -1 ) 12.5 No change was observed in the carbon network with the W incorporation. The less significant change in the mechanical properties can be understood in terms of the unvaried amorphous carbon network. 90 100 110 120 130 0.00 0.08 0.16 0.24 0.32 0.40 0.48 0.56 0.64 To ta l e n e rg y va ria tio n s , (e V ) B o n d an g le (d eg ree ) C -C bond W -C bond 0 2 4 6 8 10 12 14 1.2 1.5 1.8 2.1 2.4 2.7 3.0 3.3 R esid u a l s tre s s (G Pa) W /(W +C ) (at.% ) Ш ІІ І Region І : W essentially ac ts as a relaxation site of nea rby carbon network, resulting i n a significant stress reductio n as W is incorporated. Region Π: Segregation of W as a preliminary form of carbid e seems to enhance the distorti on of nearby carbon network. Region Ш : Formation of the large crystalline W 2 C phase rel ieves the distortion of the bon ds. C-W bonds has more flexibility to accommodate the distortion of the surrounding carbon network comparing with the rigid C-C bonds. . . Conclusions Conclusions W-C:H nanocomposite films prepared by hybrid ion beam deposition. The significant stress reduction by W incorporation. The stress is reduced by 50% at 4.2 at.% W, while hardness is only reduced by 20%. W essentially acts as a relaxation site of surrounding carbon network via forming more flexible C-W bond, which proposed a generic origin of the stress reduction with W incorporation. Evolution of crystalline carbides plays a subsidiary role on the stress reduction in case of higher W concentration. W concentration is varied by the Ar fraction i n gas mixture. Defined by stress jumping 250 300 350 400 450 500 0.0 0.2 0.4 0.6 0.8 1.0 N o rm alize d In ten sity E n erg y (eV ) W 3.0 at.% 4.2 5.1 12.5 * *

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Page 1: Ш.Results and discussion Ш. Results and discussion a) W Composition b) Stress and Mechanical Properties c) TEM-microstructures ШІІІ C Si substrate Ar W

ШШ .. Results and discussionResults and discussiona) W Composition

b) Stress and Mechanical Properties

c) TEM-microstructures

0 2 4 6 8 10 12 141.2

1.5

1.8

2.1

2.4

2.7

3.0

3.3

Re

sid

ua

l s

tre

ss

(G

Pa

)

W/(W+C) (at.%)

ШІІІ

C

Si substrate

Ar

W

W incorporated carbon nanocomposite films

prepared by hybrid ion beam deposition

Ai-Ying WangAi-Ying Wanga a ,,**([email protected])([email protected]), Hyo-Shin Ahn, Hyo-Shin Ahnaa, Kwang-Ryeol Lee, Kwang-Ryeol Leeaa, Jae-Pyoung Ahn, Jae-Pyoung Ahnbb

aaFuture Technology Research Division, Korea Institute of Science and Technology, Seoul, 130-650, South KoreaFuture Technology Research Division, Korea Institute of Science and Technology, Seoul, 130-650, South KoreabbNano-Materials Research Center, KIST, South KoreaNano-Materials Research Center, KIST, South Korea

ІІ . Introduction. IntroductionSignificant progress in understanding the growth behavior and atomic bond structure of diamonSignificant progress in understanding the growth behavior and atomic bond structure of diamon

d-like carbon (DLC) film has been achieved in the last three decades. Nevertheless, high residud-like carbon (DLC) film has been achieved in the last three decades. Nevertheless, high residu

al stress and poor adhesion are still the main barriers to its applications. In the present work, we al stress and poor adhesion are still the main barriers to its applications. In the present work, we

employed a hybrid deposition method to prepare W incorporated DLC films in a wide range of employed a hybrid deposition method to prepare W incorporated DLC films in a wide range of

W concentration from 2.4 to 12.5 at.%. W concentration from 2.4 to 12.5 at.%. We observed a stress jumping behavior as the W conceWe observed a stress jumping behavior as the W conce

ntration increased from 2.4 to 5.0 at.%. Beyond 5.0 at.%, gradual decrease in the residual stress ntration increased from 2.4 to 5.0 at.%. Beyond 5.0 at.%, gradual decrease in the residual stress

was observed as in the previous work.was observed as in the previous work. High resolution TEM analysis showed that the stress ju High resolution TEM analysis showed that the stress ju

mping was closely related to the change in the W incorporation behavior from atomic scale incmping was closely related to the change in the W incorporation behavior from atomic scale inc

orporation into the amorphous carbon matrix at low W concentration to formation of a nanosizeorporation into the amorphous carbon matrix at low W concentration to formation of a nanosize

d d -W-W22C phase at higher W concentration. Ab initio calculation of the excess energy by atomic C phase at higher W concentration. Ab initio calculation of the excess energy by atomic

bond distortion suggested that the stress reduction with atomic scale W incorporation was due tbond distortion suggested that the stress reduction with atomic scale W incorporation was due t

o the reduction of the directionality of W-C bonds.o the reduction of the directionality of W-C bonds.

ПП . Experimental. Experimental

Working gas: Ar + C6H6 (total: 12sccm)

Base pressure : 2.0 10-6 Torr

Substrate bias : - 200 V

Power density of target: 4.2~7.3 W/cm2

Deposition Pressure : 0.6 ~ 1 10-4 Torr

Thickness: 350±50nm

Substrate: P-type Si(100), 500m, 100m

Wn+

H+, Cm+

0.55 0.60 0.65 0.70 0.75 0.80 0.85 0.90 0.950

2

4

6

8

10

12

14

16

W c

on

cen

trat

ion

(at

. %)

Ar fraction in the gas mixture

bias -200V

0 2 4 6 8 10 12 1415

20

25

30

35

40

120

130

140

150

160

170

180

190

200

Ha

rdn

es

s (

GP

a)

W/(W+C) at.%

Ela

sti

c m

od

ulu

s (

GP

a)

21±3 GPa

170±15 GPa

!! Stress jumping occurred with increasing W concentration. The mechanical properties also showed the same dependence, although the variation is not as significant as that of the stress.

(e)

4 nm

-W2C (102)

-W2C (101)

4 nm

(c)

-W2C (101)

4 nm

(b)(a)

4 nm 4 nm

(d)

-W2C (102)

-W2C (101)

І П Ш

Region І : nanosized W embedded in carbon matrix.

Region П : Segregation of tungsten started.

Region Ш : crystalline carbides phase presented

(a) 3.0, (b) 4.2, (c) 5.1, (d) 8.7, (e) 12.5 at.%

d) GIXRD-phase identification.

e) Raman and EELS- atomic bond structure

f) Ab Initio Calculation – energy increase due to bond distortion

g) Stress Jumping and Atomic Bond Structure

І

П

Characteristic of amorphous structure.

Weak crystallinity of carbides.

Ш High crysallinity and fraction of carbides.

20 30 40 50 60 70 80 90

-WC1-x

-W2C

-W2C

(311)

(220)

(200)

(111)

(112)

(103)

(002)

(002)

3.0

4.2

W 12.5 at. %

2degree)

Inte

ns

ity

(a

.u.)

8.5

5.1

(100)

(002)

(102)

(110)

(103)

(200)

(112)

(112)

(103)

(21

0)

(222)

(400)

(206)

(117)

(506)

(530)

(444)

WCx

400 600 800 1000 1200 1400 1600 1800 2000

2 4 6 8 10 12 141540

1545

1550

1555

1560

1565

1570

G-p

eak

posi

tion

(cm

-1)

W/(W+C) at.%

5.1

4.2

W 3.0 at.%

8.5

6.7

Inte

nsi

ty (

a.u

.)

Wave number (cm-1)

12.5

No change was observed in the carbon network with the W incorporation.The less significant change in the mechanical properties can be understood in terms of the unvaried amorphous carbon network.

90 100 110 120 130

0.00

0.08

0.16

0.24

0.32

0.40

0.48

0.56

0.64

To

tal

en

erg

y v

ari

ati

on

s,

(eV

)

Bond angle (degree)

C-C bond W-C bond

0 2 4 6 8 10 12 141.2

1.5

1.8

2.1

2.4

2.7

3.0

3.3

Re

sid

ua

l s

tre

ss

(G

Pa

)

W/(W+C) (at.%)

ШІІІ

Region І : W essentially acts as a relaxation site of nearby carbon network, resulting in a significant stress reduction as W is incorporated.

Region Π: Segregation of W as a preliminary form of carbide seems to enhance the distortion of nearby carbon network.

Region Ш : Formation of the large crystalline W2C phase relieves the distortion of the bonds.

C-W bonds has more flexibility to accommodate the distortion of the surrounding carbon network comparing with the rigid C-C bonds.

ⅣⅣ.. ConclusionsConclusions

W-C:H nanocomposite films prepared by hybrid ion beam deposition.

The significant stress reduction by W incorporation.

The stress is reduced by 50% at 4.2 at.% W, while hardness is only reduced by 20%.

W essentially acts as a relaxation site of surrounding carbon network via forming more flexible C-W bond, which proposed a generic origin of the stress reduction with W incorporation.

Evolution of crystalline carbides plays a subsidiary role on the stress reduction in case of higher W concentration.

W concentration is varied by the Ar fraction in gas mixture.

Defined by stress jumping

250 300 350 400 450 500

0.0

0.2

0.4

0.6

0.8

1.0

No

rma

lize

d I

nte

ns

ity

Energy (eV)

W 3.0 at.% 4.2 5.1 12.5

*

*