photonics asia - spie · communications, displays, defense and aerospace, entertainment and...

12–14 October 2016

Beijing International Convention Center

Beijing, China C2016 Call for Papers

CONNECTING MINDS. ADVANCING LIGHT.

Call for Papers Submit Abstracts by 16 May 2016 www.spie.org/pa16call

PHOTONICS ASIA•

2016Photonics Asia.Asia’s premier event on nanophotonics, biophotonics, lasers, optical design, plasmonics, sensors, optoelectronics, infrared/ terahertz, and more.

C.Call for Papers.

DATES 12–14 October 2016

LOCATIONBeijing International Convention Center Beijing, China

SUBMIT YOUR ABSTRACT TODAY!www.spie.org/pa16call

IMPORTANT DATESAbstracts Due: 16 May 2016Author Notification: 18 July 2016Manuscripts Due: 12 September 2016

CALL FOR PAPERS

CONTENTSPA101 High-Power Lasers and Applications

VIII (Li, Singh, Walter) . . . . . . . . . . . 6

PA102 Semiconductor Lasers and Applications VII (Zhu, Hofmann) . 6

PA103 Advanced Laser Processing and Manufacturing (Zhong, Lawrence, Hong, Liu) . . . . . . . . . . . . . . . . . . . . . . 7

PA104 Optoelectronic Devices and Integration VI (Zhang, Li, Yu) . . . . 7

PA105 Optoelectronic Imaging and Multimedia Technology IV (Dai, Shimura) . . . . . . . . . . . . . . . . . . . . . . . 8

PA106 Virtual Reality and Display Technologies (Luo, Hu) . . . . . . . . . . 8

PA107 Optical Design and Testing VII (Wang, Kidger, Tatsuno) . . . . . . . . . 9

PA108 Holography, Diffractive Optics, and Applications VII (Sheng, Yu, Zhou) 10

PA109 Optical Metrology and Inspection for Industrial Applications IV (Han, Yoshizawa, Zhang) . . . . . . . . . . . . . . 11

PA110 Optics in Health Care and Biomedical Optics VII (Luo, Li, Gu, Tang) . . . . . . . . . . . . . . . . . . . . . . . . . . 12

PA111 Advanced Sensor Systems and Applications VII (Liu, Jiang, Landgraf) . . . . . . . . . . . . . . . . . . . . . . 13

PA112 Real-time Photonic Measurements, Data Management, and Processing II (Li, Jalali, Goda, Tsia) . . . . . . . . . . 13

PA113 Nanophotonics and Micro/Nano Optics III (Zhou, Wada) . . . . . . . . . .14

PA114 Plasmonics II (Xu, Kawata, Bergman, Zhu) . . . . . . . . . . . . . . . . . . . . . . . . . . .14

PA115 Quantum and Nonlinear Optics IV (Gong, Guo, Ham) . . . . . . . . . . . . . . . 15

PA116 Infrared, Millimeter-Wave, and Terahertz Technologies IV (Zhang, Zhang, Tani) . . . . . . . . . . . . . . . . . . . . 15

2016 PLENARY SPEAKER

Jannick P. RollandUniversity of RochesterRochester, New York, (USA)

Additional speakers to be confirmed soon.

Sponsored bySPIECOS—Chinese Optical Society

Cooperating OrganizationsTsinghua UniversityPeking University University of Science and Technology of ChinaZhejiang UniversityTianjin UniversityBeijing Institute of TechnologyBeijing University of Posts and TelecommunicationsNankai UniversityChangchun University of Science and TechnologyUniversity of Shanghai for Science and TechnologyCapital Normal UniversityHuazhong University of Science and TechnologyBeijing Jiaotong UniversityShanghai Institute of Optics and Fine Mechanics,

CASChangchun Institute of Optics, Fine Mechanics and

Physics, CASInstitute of Semiconductors, CASInstitute of Optics and Electronics, CASInstitute of Physics, CASShanghai Institute of Technical Physics, CASChina Instrument and Control SocietyOptoelectronics Technology Committee, COSSPIE-China CommitteeJapan Optical SocietyKorea Optical SocietyAustralia Optical SocietySingapore Optical SocietyEuropean Optical Society

Supported byChina Association for Science and Technology

(CAST)Department of Information of National Nature

Science Foundation, China (NSFC)

General ChairsRobert Lieberman, SPIE President, Lumoptix (USA)

Guangcan Guo, COS President, University of Science and Technology of China (China)

General Co-ChairsArthur Chiou, National Yang-Ming University

(Taiwan, China) Jianlin Cao, China Ministry of Science and

Technology (China) Junhao Chu, Shanghai Institute of Technical Physics,

CAS (China)

Technical Program ChairsSonglin Zhuang, University of Shanghai for Science

and Technology (China)Xingde Li, Johns Hopkins University (USA)

Technical Program Co-ChairsBingkun Zhou, Tsinghua University (China)Qiming Wang, Institute of Semiconductors, CAS

(China) Tianchu Li, National Institute of Metrology (China) Wei Huang, Nanjing University of Technology

(China)Ying Gu, PLA General Hospital (China) Huilin Jiang, Changchun University of Science and

Technology (China)

Local Organizing Committee ChairQihuang Gong, Peking University (China)

Local Organizing Committee Co-ChairsXu Liu, Zhejiang University (China) Daoyin Yu, Tianjin University (China) Guoqiang Ni, Beijing Institute of Technology (China) Shusen Xie, Fujian Normal University (China) Xiaomin Ren, Beijing University of Posts and

Telecommunications (China)

General SecretaryYan Li, COS and Peking University (China)

Local Organizing Committee Zhiping Zhou, Peking University (China) Changhe Zhou, Shanghai Institute of Optics and Fine

Mechanics, CAS (China) Qingming Luo, Huazhong University of Science and

Technology (China) Chongxiu Yu, Beijing University of Posts and

Telecommunication (China) Hongda Chen, Institute of Semiconductors, CAS

(China) Yongtian Wang, Beijing Institute of Technology

(China) Yiping Cui, Southeast University (China) Xuping Zhang, Nanjing University (China) Feijun Song, Daheng Corp.(China) Cunlin Zhang, Capital Normal University (China) Yanting Lu, Nanjing University (China) Yuejin Zhao, Beijing Institute of Technology (China) Chunqing Gao, Beijing Institute of Technology

(China) Tiegen Liu, Tianjin University (China) Xiaocong Yuan, Nankai University (China) Weimin Chen, Chongqing University (China) Zhongwei Fan, Academy of Optoelectronics, CAS

(China) Hanyi Zhang, Tsinghua University (China) Lan Wu, Zhejiang University (China) Yongsheng Zhang, University of Science and

Technology of China (China) Hong Yang, Peking University (China) Xiaoying Li, Tianjin University (China) Wei Xiong, Chinese Optical Society (China)

SHOWCASING PHOTONICS AND OPTICAL TECHNOLOGIES AND APPLICATIONS

SPIE/COS Photonics Asia showcases the power of photonics technologies and applications. Photonics and optical science and engineering are becoming increasingly important as society gradually moves from electron-based to photon-based technologies and industries. Specifically, photonics is becoming increasingly important in health care and medicine, nanotechnologies, environment and energy, manufacturing, information systems and communications, displays, defense and aerospace, entertainment and multimedia, energy and green lighting, etc. China is the fastest growing market for the global optics and photonics industries.

Since 2001, SPIE/COS Photonics Asia has been the must-attend event for the global photonics community who need to keep current with what is happening in the Asian optics and photonics industries, and for developing new partnerships and new markets within and around China. Many Asian countries are investing heavily to transition from microelectronics-dominated to photonics-based industries. Asian economies are becoming more and more important to the health of the global economy in the 21st century, and Asian Photonics markets are rapidly expanding. SPIE/COS Photonics Asia 2016 will provide a unique forum for the reporting and review of new developments in photonics and optoelectronics ranging from material and devices to advanced systems and applications. Cutting-edge technologies, applications, product announcements and demonstrations, market analysis and investment opportunities will be discussed in various conference sections and product exhibitions. SPIE/COS Photonics Asia will include plenary sessions with visionary speakers, parallel technical sessions, social banquet, and an interactive poster session/reception. This year’s event will be held at the Beijing International Convention Center, in the heart of Beijing in a very convenient location.

SPIE/COS Photonics Asia is a pivotal technical event for the optics and photonics technical community. You are encouraged to participate.

GENERAL CHAIRS:

PLAN TO PARTICIPATE•

Robert Lieberman

SPIE President, Lumoptix (USA)

Guangcan Guo

COS President, University of Science and Technology of China (China)

6 SPIE/COS PHOTONICS ASIA 2016 • www.spie.org/pa16call

PHOTONICS ASIA 2016

High-Power Lasers and Applications VIII (PA101)Conference Chairs: Ruxin Li, Shanghai Institute of Optics and Fine Mechanics (China); Upendra N. Singh, NASA Langley Research Ctr. (USA); Robert F. Walter, Schafer Corp. (USA)

Program Committee: Willy L. Bohn, BohnLaser Consult (Germany); Robert L. Byer, Stanford Univ. (USA); Dianyuan Fan, Shanghai Institute of Optics and Fine Mechanics (China); Tomoo Fujioka, Tokai Univ. (Japan); Mali Gong, Tsinghua Univ. (China); Shibin Jiang, AdValue Photonics, Inc. (USA); Do-Kyeong Ko, Gwangju Institute of Science and Technology (Korea, Republic of); Zejin Liu, National Univ. of Defense Technology (China); DeYuan Shen, Fudan Univ. (China); Yi Su, Institute of Applied Electronics (China); Shuangchun Wen, Shenzhen Univ. (China); Zuyan Xu, Technical Institute of Physics and Chemistry (China); Jianquan Yao, Tianjin Univ. (China); Tai Hyun Yoon, Korea Univ. (Korea, Republic of); Jirong Yu, NASA Langley Research Ctr. (USA); Heping Zeng, East China Normal Univ. (China); Xiaomin Zhang, China Academy of Engineering Physics (China); Shouhuan Zhou, North China Research Institute of Electro-optics (China)

Papers on the following and related topics are solicited for this conference: • high-average-power laser • ultra-short and super-intense lasers • high-power DPL and ceramic lasers • high-power fiber laser • high-power gas, excimer, and chemical laser • laser system for ICF • high-power laser beam propagation and

beam quality • design and simulation for high-power laser • lasers in material processing and

manufacturing • lasers development and qualification for

space applications • pump diodes and reliability • high-power laser development for space-

based lidar remote sensing applications • other applications.

Semiconductor Lasers and Applications VII (PA102)Conference Chairs: Ninghua Zhu, Institute of Semiconductors (China); Werner H. Hofmann, Technische Univ. Berlin (Germany)

Program Committee: Minghua Chen, Tsinghua Univ. (China); Xiangfei Chen, Nanjing Univ. (China); Nan Chi, Fudan Univ. (China); Brian Corbett, Tyndall National Institute (Ireland); Jian-Jun He, Zhejiang Univ. (China); Qianggao Hu, Accelink Technologies Co., Ltd. (China); Weisheng Hu, Shanghai Jiao Tong Univ. (China); Yongzhen Huang, Beijing Univ. of Posts and Telecommunications (China); Jimin Li, Institute of Semiconductors (China); Ming Li, Institute of Semiconductors (China); Wei Li, Institute of Semiconductors (China); Xianjie Li, China Electronics Technology Group Corp. (China); Jianguo Liu, Institute of Semiconductors (China); Ning Liu, Huawei Technologies Co., Ltd. (China); Wenhan Liu, Univ. of Science and Technology of China (China); Yong Liu, Univ. of Electronic Science and Technology of China (China); Xiaoyu Ma, Institute of Optics and Electronics (China); Frank Hudson Peters, Tyndall National Institute (Ireland); Edwin Yue-Bun Pun, City Univ. of Hong Kong (Hong Kong, China); Hong-Bo Sun, Jilin Univ. (China); Lijun Wang, Changchun Institute of Optics, Fine Mechanics and Physics (China); Shawn Wang, General Photonics Corp. (USA); Yixin Wang, Institute for Infocomm Research (Singapore); Guang-Qiong Xia, Southwest Univ. (China); Kun Xu, Beijing Univ. of Posts and Telecommunications (China); Zhaowen Xu, Institute for Infocomm Research (Singapore); Lianshan Yan, Southwest Jiaotong Univ. (China); Jinlong Yu, Tianjin Univ. (China); Siyuan Yu, Univ. of Bristol (United Kingdom); Li Zeng, Huawei Technologies Co., Ltd. (China); Baoping Zhang, Xiamen Univ. (China); Guo-yi Zhang, Peking Univ. (China); Xinliang Zhang, Huazhong Univ. of Science and Technology (China); Zhiping Zhou, Peking Univ. (China); Hongliang Zhu, Institute of Semiconductors (China); Xihua Zou, Southwest Jiaotong Univ. (China)

Recent advances in semiconductor lasers are resulting in improvements in power, spatial brightness, spectral brightness, and wavelength ranges from the UV to the mid-IR. These advances led to better performance and reduced cost in diode pumped laser systems and opened the door for new direct diode applications including materials processing, metrology, printing, display, bio-medical, imaging, Raman spectroscopy, remote sensing, etc. This conference intends to cover the following, and related topics: • laser diode reliability and test • integrated optoelectronic devices • narrow linewidth lasers • frequency-stabilized lasers • high-speed lasers • optical frequency comb • fabrication and packaging technologies • vertical-cavity surface-emitting laser (VCSEL)

sources and their applications • device physics and simulation • modeling and design • characterization technologies for laser diodes • high brightness laser diodes • quantum cascade lasers • subsystem using laser diodes • blue-green laser technology • novel lasers and devices • applications of laser diodes.

+1 360 676 3290 • [email protected] • #PhotonicsAsia 7

CALL FOR PAPERS

Advanced Laser Processing and Manufacturing (PA103)Conference Chairs: Minlin Zhong, Tsinghua Univ. (China); Jonathan Lawrence, Univ. of Chester (United Kingdom); Minghui Hong, National Univ. of Singapore (Singapore); Jian Liu, PolarOnyx, Inc. (USA)

Program Committee: Xue-Chun Lin, Institute of Semiconductors (China); Rongshi Xiao, Beijing Univ. of Technology (China); Jianhua Yao, Zhejiang Univ. of Technology (China); Xiaoyan Zeng, Huazhong Univ. of Science and Technology (China)

Laser processing and manufacturing is becoming a wide spread technique both in research and indus-tries. It offers unprecedented versatility and range in terms of feature size (nano to macro), material type (from metals and ceramics to organics), phase (bulk to porous, homogenous to graded composi-tions), and processing options (from ablative to sintering and physical to chemical modification).During the last decade there have been significant advances on laser processing and manufacturing research and development including laser welding of both similar or dissimilar materials; laser additive manufacturing of metals and ceramics; laser drilling and cutting of glasses and metals; laser surface mi-cro-structuring for blackening and hydrophobicity/hydrophilicity, and laser nano-fabrication of bulk material and surfaces (polymers, semiconductors, glasses, and metals). The primary goal of this conference is to provide a forum for professionals in materials science, laser processing physics/chemistry, mechanical engineering, design tools, software modeling, char-acterization and metrology to share and discuss the latest advances in the field of laser processing and manufacturing. Papers are solicited on the following topics: • laser-material interaction (from long pulses to

ultrashort pulses), modeling and simulation • advanced laser welding • advanced 2D and 3D laser additive

manufacturing • advanced laser micro-nano fabrication • advanced ultrafast laser processing • applications of advanced laser manufacturing

technologies in photonics devices, consumer electronics, medical devices, mechanical & aerospace industries, etc.

Optoelectronic Devices and Integration VI (PA104)Conference Chairs: Xuping Zhang, Nanjing Univ. (China); Baojun Li, Sun Yat-Sen Univ. (China); Changyuan Yu, National Univ. of Singapore (Singapore)

Program Committee: Dayan Ban, Univ. of Waterloo (Canada); Seth Bank, The Univ. of Texas at Austin (USA); Zhongping Chen, Beckman Laser Institute and Medical Clinic (USA); Ho-Pui A. Ho, The Chinese Univ. of Hong Kong (Hong Kong, China); Jan Ingenhoff, Ionexphotonics Inc. (Canada); Zhong-cheng Liang, Nanjing Univ. of Posts and Telecommunications (China); Xuejun Lu, Univ. of Massachusetts Lowell (USA); Hai Ming, Univ. of Science and Technology of China (China); Bikash Nakarmi, Korea Advanced Institute of Science and Technology (Korea, Republic of); Gang-Ding Peng, The Univ. of New South Wales (Australia); Yuan Shi, Agilecom Photonic Solutions Inc. (USA); Yuejiang Song, Nanjing Univ. (China); Anna K. Swan, Boston Univ. (USA); Frank Vollmer, Max-Planck-Institut für die Physik des Lichts (Germany); Guanghui Wang, The Chinese Univ. of Hong Kong (Hong Kong, China); Daniel M. Wasserman, Univ. of Illinois at Urbana-Champaign (USA); Lixin Xu, Univ. of Science and Technology of China (China)

Optoelectronic devices are being used in a wide ar-ray of applications in telecommunications, solar cells, scientific instrumentation, data storage, automotive, and military applications. Photonic design and simu-lation methods are a prerequisite for a fundamental understanding of advanced photonic structures as well as for the development of new photonic devices and applications. Research on new materials, processes and design are giving rise to optoelectronic devices with higher efficiencies, denser integration, and better reliabilities. With the new breakthroughs in organic photonic devices, vertical-cavity surface-emitting lasers, semiconductor photodetectors and optoelec-tronic integrated circuits, new package designs and reliability methodologies must be developed as these devices increase in functionality and integration. This conference is intended to provide a forum for the interchange of ideas on optoelectronic device at different levels, including design, simulation, fabrica-tion, integration, and applications. The topics of this conference are broad and will cover, but not limited to, the following topics: • physics and simulation of optoelectronic devices • devices for photonic applications • fiber and guided-wave lasers and amplifiers • organic photonic materials and devices • terahertz and gigahertz electronics and photonics • synthesis and photonics of nanoscale materials • emerging optoelectronic applications • vertical-cavity surface-emitting lasers • polarization maintained/scrambled laser • semiconductor photodetectors • reliability of optical fiber components, devices,

systems, and networks • micro-optics and photonic interconnects • multifunctional components, and arrayed devices • optoelectronic hybrid and monolithic integration • integrated optics and photonic integrated circuits • photonics packaging and integration • surface plasmon nanolithography, plasmonic

waveguide and devices.

New


PHOTONICS ASIA 2016

Optoelectronic Imaging and Multimedia Technology IV (PA105)Conference Chairs: Qionghai Dai, Tsinghua Univ. (China); Tsutomu Shimura, The Univ. of Tokyo (Japan)

Program Committee: Moshe Ben-Ezra, MIT Media Lab. (USA); Xudong Chen, National Univ. of Singapore (Singapore); Ya Cheng, Shanghai Institute of Optics and Fine Mechanics (China); Jinwei Gu, Huawei Technologies Co., Ltd. (USA); Yo-Sung Ho, Gwangju Institute of Science and Technology (Korea, Republic of); Bormin Huang, Univ. of Wisconsin-Madison (USA); Matthias B. Hullin, Univ. Bonn (Germany); Ivo Ihrke, INRIA Bordeaux (France); Yoshiaki Kanamori, Tohoku Univ. (Japan); Chun-Chieh Jay Kuo, The Univ. of Southern California (USA); Kyros Kutulakos, Univ. of Toronto (Canada); Wanqing Li, Univ. of Wollongong (Australia); Yuan Luo, National Taiwan Univ. (Taiwan); Imari Sato, National Institute of Informatics (Japan), Tokyo Institute of Technology {Japan); Yoichi Sato, The Univ. of Tokyo (Japan); Yoav Yosef Schechner, Technion-Israel Institute of Technology (Israel); John T. Sheridan, Univ. College Dublin (Ireland); Guangming Shi, Xidian Univ. (China); Lei Tian, Univ. of California, Berkeley (USA); Feng Wu, Univ. of Science and Technology of China (China); Bo Yang, Univ. of Shanghai for Science and Technology (China); Jingyi Yu, Univ. of Delaware (USA); Xiaolin Zhang, Shanghai Institute of Microsystem and Information Technology (China); Zhenrong Zheng, Zhejiang Univ. (China)

The areas of optoelectronic systems for image/video acquisition and their applications have expanded rap-idly in recent years. Advanced optoelectronic sensors, novel programmable optical modulators, combined with smart computational theories and algorithms, produce novel optoelectronics imaging systems that expand the spatial and temporal dimension for image/video acquisition. Multimedia and data acquired by these new optoelectronic systems impose new chal-lenges in analysis and processing. This conference will provide an international forum for the discussion of the state-of-the-art techniques of optoelectronic system and multimedia processing. Invited talks will be presented by leading scientists in the relevant fields. We are soliciting papers in all relevant areas including, but not limited to, the following: • advanced sensing systems and applications • high-speed and high-resolution imaging • multidimensional multiscale imaging • multispectral and hyperspectral imaging • ultra-sonics, PET, MRI, X-ray imaging • micro- and nano-optical imaging • adaptive optics system • 3D Image/video system • novel display technique and applications • computational imaging • tomographic imaging • time-of-flight imaging • ghost imaging • scattering robust imaging • optical information processing • image/video analysis, processing, and retrieval • machine vision methods, architectures, and

applications • advancement in shape-from-x method.

Virtual Reality and Display Technologies (PA106)Conference Chairs: Yi Luo, Tsinghua Univ. (China); Bin Hu, The Univ. of Tennessee Knoxville (USA)

Program Committee: Donal D. C. Bradley, Imperial College London (United Kingdom); Youmei Dong, BOE Technology Group Co., Ltd. (China); Yanbing Hou, Beijing Jiaotong Univ. (China); Wei Huang, Nanjing Univ. of Posts and Telecommunications (China); Fengyi Jiang, Lattice Power (Jiangxi) Corp. (China); Hoi Sing Kwok, Hong Kong Univ. of Science and Technology (Hong Kong, China); Liang-Sheng Liao, Soochow Univ. (China); Shi-Yong Liu, Jilin Univ. (China); Yunqi Liu, Institute of Chemistry (China); Zhidong Lou, Beijing Jiaotong Univ. (China); Junbiao Peng, South China Univ. of Technology (China); Yong Qiu, Tsinghua Univ. (China); Jun Ruan, China Solid State Lighting Alliance (China); Xiao Wei Sun, Nanyang Technological Univ. (Singapore); Baoping Wang, Southeast Univ. (China); Lixiang Wang, Changchun Institute of Applied Chemistry (China); Xingwei Wu, iFire Technology Ltd. (Canada); Zhiguo Xiao, Luming Science and Technology Group (China); Ningsheng Xu, Sun Yat-Sen Univ. (China); Gang Yu, Cbrite Inc. (USA); Guo-yi Zhang, Peking Univ. (China)

We welcome you to submit abstracts and papers on the following and related topics: • new materials for display applications (including

perovskite light-emitting materials and devices, 2D materials, quantum dots, etc.)

• organic light-emitting diode technology and applications

• third-generation of OLED by thermal activated delayed fluorescence (special session)

• liquid crystal displays and systems • inorganic electroluminescence displays • new-generation display technologies • FPD materials, devices, and modules • display optics, electronics, and systems • thin-film transistor technology for displays • 3D, holographic displays, and virtual reality • flexible/stretchable electronics and wearable

devices • printing electronics and displays.



CALL FOR PAPERS

Optical Design and Testing VII (PA107)We encourage you to submit abstracts and papers on the following and related topics: • aberration theory and image analysis • aspheric fabrication and metrology • astronomical optics • asymmetric optics • computational optics • conformal optics • development in local and global optimization

methods • devices formed by metamaterials • diffractive optics • free form optics: design, fabrication and testing • gradient index optics • illumination optics design • interferometry • liquid optics • lithographic optics • new fabrication and testing developments • micro- and nano-optics • novel display systems • novel devices based on subwavelength

structures • novel lens designs • optical instrument design • plastic and molded optics • polarization and coherence in optical design • spaceborne optics • stray light analysis • testing and alignment of optical surfaces and

elements • tolerance generation and application • UV optics • visualization and virtual-reality optical systems • zoom optics and multi-configuration optics.

Conference Chairs:Yongtian Wang, Beijing Institute of Technology (China); Tina E. Kidger, Kidger Optics Associates (United Kingdom); Kimio Tatsuno, Koga Research Institute, Ltd. (Japan)

Program Committee:Yasuhiro Awatsuji, Kyoto Institute of Technology (Japan); Jian Bai, Zhejiang Univ. (China); Pablo Benítez, Univ. Politécnica de Madrid (Spain); Toshihide Dohi, OptiWorks, Inc. (Japan); Chunlei Du, Chongqing Institute of Green and Intelligent Technology (China); Fabian Duerr, Vrije Univ. Brussel (Belgium); Yi-Chin Fang, National Kaohsiung First Univ. of Science and Technology (Taiwan); Sen Han, Univ. of Shanghai for Science and Technology (China); Qun Hao, Beijing Institute of Technology (China); Hong Hua, College of Optical Sciences, The Univ. of Arizona (USA); Dong Hoon Hyun, Korea Polytechnic Univ. (Korea, Republic of); Byung Yun Joo, Korea Univ. of Technology and Education (Korea, Republic of); Michael Kim, Modern High-Tech Co., Ltd. (Korea, Republic of); Tsuyoshi Konishi, Osaka Univ. (Japan); Yanqiu Li, Beijing Institute of Technology (China); Irina L. Livshits, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation); Osamu Matoba, Kobe Univ. (Japan); Xiang Peng, Shenzhen Univ. (China); Jannick P. Rolland, Univ. of Rochester (USA); Jae Myung Ryu, Kumoh National Institute of Technology (Korea, Republic of); José Sasián, College of Optical Sciences, The Univ. of Arizona (USA); Qiaofeng Tan, Tsinghua Univ. (China); Sandy To, The Hong Kong Polytechnic Univ. (Hong Kong, China); Theo Tschudi, Technische Univ. Darmstadt (Germany); Wilhelm Ulrich, Carl Zeiss AG (Germany); H. Paul Urbach, Technische Univ. Delft (Netherlands); David M. Williamson, Nikon Research Corp. of America (USA)

AHonor your co-workers with an SPIE AwardThe SPIE Awards Program is not only one of the most prestigious ways the Society recognizes excellence, but also one of the longest running SPIE Programs. Since 1959, SPIE has honored the best in optics and photonics for their significant achievements and contributions in advancing the science of light.

www.spie.org/awards

AWARDS

•S P I E .ORG/AWARD

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DEADLINE FOR NOMINATIONS IS 1 JUNE 2016.


PHOTONICS ASIA 2016

Holography, Diffractive Optics, and Applications VII (PA108)Conference Chairs: Yunlong Sheng, Univ. Laval (Canada); Chongxiu Yu, Beijing Univ. of Posts and Telecommunications (China); Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China)

Program Committee: Liangcai Cao, Tsinghua Univ. (China); Linsen Chen, Soochow Univ. (China); Chunlei Du, Chongqing Institute of Green and Intelligent Technology (China); Min Gu, RMIT Univ. (Australia); Byoungho Lee, Seoul National Univ. (Korea, Republic of); Junchang Li, Kunming Univ. of Science and Technology (China); Ai Qun Liu, Nanyang Technological Univ. (Singapore); Hai Ming, Univ. of Science and Technology of China (China); Xiang Peng, Shenzhen Univ. (China); Ting-Chung Poon, Virginia Polytechnic Institute and State Univ. (USA); Ching-Cherng Sun, National Central Univ. (Taiwan); Xiaodi Tan, Beijing Institute of Technology (China); Chinhua Wang, Soochow Univ. (China); Baoli Yao, Xi’an Institute of Optics and Precision Mechanics (China); Toyohiko Yatagai, Utsunomiya Univ. (Japan); Xiaocong Yuan, Nankai Univ. (China); Jianlin Zhao, Northwestern Polytechnical Univ. (China)

Papers are solicited on, but not limited to the fol-lowing topics. We look forward to seeing you in the historical and beautiful city of Beijing, China.Topics: • holographic optics • diffractive and micro-optics • digital holography • 3D imaging and 3D display • optical metrology • holographic interferometry • phase unwrapping • polarization imaging • document and product anti-counterfeiting • volume holograms, optical memory and storage • sub-wavelength optics • plasmonics optics • information optics • photonics crystals and photonics crystal fibers • optical holographic tweezers • optics for life science applications • 3D holographic microscopy • 3D optical remote sensing • spatial light modulators.

www.spie.org/proceedings

Proceedings

PRESENT TO HUNDREDS, PUBLISH TO MILLIONS•Publish your work in SPIE Proceedings.


CALL FOR PAPERS

Optical Metrology and Inspection for Industrial Applications IV (PA109)

This conference will focus on methods, analysis, and applications of optical metrology and inspection as applied to various industries, with particular empha-sis on manufacturing. The field of optical metrology and inspection has grown to wide acceptance for many applications of inspection and measurements in industrial applications. The advances in machine/robot vision have provided compact, smart camera systems, new cameras and lighting systems, and bet-ter ways of communicating with the outside world. Two- and three-dimensional methods have seen wide use in the electronics industry, but have also made advances in traditional manufacturing areas such as automotive and aerospace manufacturing. These methods are being used for defect inspection, precision measurements, and the detection of flaws. Modern computing power has made analysis methods such as phase shifting a viable tool for fast on-line inspection for process control and metrology applications. This conference is intended to address the latest advances and future developments in the areas of optical inspection and metrology as they are applied to practical applications of industry. Imaging and image processing techniques are also welcome to this conference. We welcome you to submit papers on the following and related topics: • machine/robot vision methods, architectures

and applications • lighting methods and systems for inspection • surface inspection methods and applications • special optical systems for inspection and

measurements • 2D and 3D machine vision methods and

applications • 3D data manipulation • micro- and nano-scale measurement methods • structured light methods and applications • interferometric techniques applied to industrial

inspection of non-optical parts • phase shifting methods applied to industrial

inspection of non-optical parts • optical methods for dimensional and surface

metrology • mechano-optics and photonics for metrology

and inspection • system calibration and error analysis • color metrology of manufactured goods • on-line and process control measurements • web inspection applications • reverse engineering applications • on-machine tool measurements of shape and

finish • high-resolution and high-speed inspection

applications.

Conference Chairs: Sen Han, Univ. of Shanghai for Science and Technology (China), Suzhou H&L Instruments LLC {China); Toru Yoshizawa, Tokyo Univ. of Agriculture and Technology (Japan), 3D Associates {Japan); Song Zhang, Purdue Univ. (USA)

Program Committee: Masato Aketagawa, Nagaoka Univ. of Technology (Japan); Yasuhiko Arai, Kansai Univ. (Japan); Xunde Bao, The Univ. of Arizona (USA); James H. Burge, College of Optical Sciences, The Univ. of Arizona (USA); Yuanshen Cao, National Institute of Measurement and Testing Technology (China); Dong Chen, Bruker Nano Inc. (USA); Garrett D. Cole, Crystalline Mirror Solutions GmbH (Austria); Yuegang Fu, Changchun Univ. of Science and Technology (China); Qingying Jim Hu, QUEST Integrated, Inc. (USA); Ming Jiang, Suzhou Univ. of Science and Technology (China); Zhihua Jiang, Shanghai Institute of Measurement and Testing Technology (China); Kazuhide Kamiya, Toyama Prefectural Univ. (Japan); Katsuichi Kitagawa, Independent Consultant (Japan); Malgorzata Kujawinska, Warsaw Univ. of Technology (Poland); Chao-Wen Liang, National Central Univ. (Taiwan); Yuxiang Lin, ASML (USA); Yasuhiro Mizutani, Osaka Univ. (Japan); Yukitoshi Otani, Utsunomiya Univ. (Japan); Giancarlo Pedrini, Institut für Technische Optik (Germany); Xiang Peng, Shenzhen Univ. (China); Kemao Qian, Nanyang Technological Univ. (Singapore); Guohai Situ, Shanghai Institute of Optics and Fine Mechanics (China); H. Philip Stahl, NASA Marshall Space Flight Ctr. (USA); John C. Stover, The Scatter Works Inc. (USA); Takamasa Suzuki, Niigata Univ. (Japan); Toshitaka Wakayama, Saitama Medical Univ. (Japan); Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China); Jiangtao Xi, Univ. of Wollongong (Australia); Jing Xu, Tsinghua Univ. (China); Lianxiang Yang, Oakland Univ. (USA); Dawei Zhang, Univ. of Shanghai for Science and Technology (China); Hao Zhang, Tianjin Univ. (China); Heng Zhang, National Institute of Metrology (China); Qican Zhang, Sichuan Univ. (China); Zonghua Zhang, Hebei Univ. of Technology (China); Ping Zhong, Donghua Univ. (China); Ping Zhou, The Univ. of Arizona (USA); Weihu Zhou, Academy of Opto-Electronics (China)



PHOTONICS ASIA 2016

Optics in Health Care and Biomedical Optics VII (PA110)Conference Chairs: Qingming Luo, Huazhong Univ. of Science and Technology (China); Xingde Li, Johns Hopkins Univ. (USA); Ying Gu, Chinese PLA General Hospital (China); Yuguo Tang, Suzhou Institute of Biomedical Engineering and Technology (China)

Conference Co-Chairs: Dan Zhu, Huazhong Univ. of Science and Technology (China)

Program Committee: Jing Bai, Tsinghua Univ. (China); Stephen A. Boppart M.D., Univ. of Illinois at Urbana-Champaign (USA); Wei R. Chen, Univ. of Central Oklahoma (USA); Yu Chen, Univ. of Maryland, College Park (USA); Linhong Deng, Chongqing Univ. (China); Zhihua Ding, Zhejiang Univ. (China); Qiyong Gong, West China Hospital (China); Hui Li, Fujian Normal Univ. (China); Hong Liu, The Univ. of Oklahoma (USA); Hui Ma, Tsinghua Univ. (China); Atsushi Maki, Hitachi, Ltd. (Japan); Yingtian Pan, Stony Brook Univ. (USA); Paras N. Prasad, Univ. at Buffalo (USA); Yuwen Qin, National Natural Science Foundation (China); Junle Qu, Shenzhen Univ. (China); Qiushi Ren, Shanghai Jiao Tong Univ. (China); Jie Tian, Institute of Automation (China); Valery V. Tuchin, N.G. Chernyshevsky Saratov State Univ. (Russian Federation); Lihong V. Wang, Washington Univ. in St. Louis (USA); Ruikang K. Wang, Univ. of Washington (USA); Xunbin Wei, Shanghai Jiao Tong Univ. (China); Xujie Xia, Shanghai Jiao Tong Univ. (China); Da Xing, South China Normal Univ. (China); Kexin Xu, Tianjin Univ. (China); Yudong Zhang, Institute of Optics and Electronics (China); Zhenxi Zhang, Xi’an Jiaotong Univ. (China)

During the last decade there have been significant scientific advances and technology developments in diagnosis, treatment and health care using light. Optical methods are generally noninvasive and sensi-tive to unique tissue contrast (absorption, scattering, birefringence, fluorescence, and nonlinear signal generation etc.) that complements other biomedi-cal diagnostic technologies. Optically based instru-ments/devices can be extremely compact and cost effective, suitable for home, clinic and global health care. The field of biomedical photonics is highly multi-disciplinary and has been attracting more and more researchers from physics, chemistry, electrical engineering, biomedical engineering, computer sci-ence, nanotechnology and many other disciplines. The past few years have also witnessed the integra-tion of biomedical photonics with other technologies, such as photo-acoustics, optics-molecular and nano-techniques, optics and MRI, and optics and positron

emission tomography (PET). Clinical applications of emerging biomedical photonics technologies span many areas including ophthalmology, dermatology, cardiology, gastroenterology, dentistry, urology, and neurology, etc. The objective of this conference is to provide a technical forum for engineers, scientists, clinicians, and health care industry and government agencies to report, share and learn the latest fun-damental, translational, and clinical research and developments in the field of biomedical optics, and promote cross-disciplinary, institutional, and inter-national collaborations. The topics of this conference are broad and will cover (but are not limited to) the following: • tissue optics, light-tissue/cell interaction

(fundamental theories and new methodologies for diagnosis and therapy)

• photon therapeutics (photo dynamic therapy, low-level red light therapy, laser surgery and other photo therapy)

• biomedical spectroscopy (reflectance, fluorescence, Raman, single molecule spectroscopy) fluorescence imaging, multiphoton microscopy, multidimensional microscopy)

• microscopy and imaging (confocal, nonlinear microscopy, super resolution, OCT, endoscopy, multidimensional microscopy)

• advanced optical techniques for clinical medicine (diagnosis devices, implantable devices, care devices, etc.)

• multimodal biomedical imaging (photo-acoustic imaging, optical-MRI, optical PET)

• nano/biophotonics (nano-scale imaging, nano-particles and molecular probes for biomedical applications).



CALL FOR PAPERS

Real-time Photonic Measurements, Data Management, and Processing II (PA112)Conference Chairs: Ming Li, Institute of Semiconductors (China); Bahram Jalali, Univ. of California, Los Angeles (USA); Keisuke Goda, The Univ. of Tokyo (Japan); Kevin K. Tsia, The Univ. of Hong Kong (Hong Kong, China)

Program Committee: Mohammad Hossein Asghari, Univ. of California, Los Angeles (USA); Hongwei Chen, Tsinghua Univ. (China); Xiangfei Chen, Nanjing Univ. (China); Hao Chi, Zhejiang Univ. (China); Yitang Dai, Tsinghua Univ. (China); Christophe Dorrer, Univ. of Rochester (USA); Chanju Kim, Advanced Photonics Research Institute (Korea, Republic of); Yasushi Kondo, Shimadzu Corp. (Japan); Cheng Lei, The Univ. of Tokyo (Japan); Hongpu Li, Shizuoka Univ. (Japan); Yong Liu, Univ. of Electronic Science and Technology of China (China); Asad M. Madni, Univ. of California, Los Angeles (USA); Kayvan R. Niazi, NantWorks, LLC (USA); Tatsutoshi Shioda, Saitama Univ. (Japan); Daniel R. Solli, Univ. Göttingen (Germany); Yikai Su, Shanghai Jiao Tong Univ. (China); Sergei K. Turitsyn, Aston Univ. (United Kingdom); Chao Wang, Univ. of Kent (United Kingdom); Jian Wang, Huazhong Univ. of Science and Technology (China); Ming Wang, Nanjing Normal Univ. (China); Xu Wang, Heriot-Watt Univ. (United Kingdom); Kun Xu, Beijing Univ. of Posts and Telecommunications (China); Lianshan Yan, Southwest Jiaotong Univ. (China); Akio Yazaki, Hitachi, Ltd. (Japan); Changyuan Yu, National Univ. of Singapore (Singapore); Xinliang Zhang, Huazhong Univ. of Science and Technology (China); Xiaoping Zheng, Tsinghua Univ. (China); Xihua Zou, Southwest Jiaotong Univ. (China)

Real-time photonic measurement of fast non-repetitive events is arguably the most challenging problem in the fields of instrumentation and measurement. The challenge is performing fast continuous single-shot measurements for applications ranging from sensing, spectroscopy, and imaging. Some of the examples applications include the study of optical rogue waves, detection of rare cancer cells in blood, industrial inspec-tion and machine vision. Notwithstanding the sensitivity and speed limitations of single-shot real-time measure-ments, such instruments also create a big data problem. Owing to their high measurement rate, they produce a firehose of data that overwhelms even the most advanced computers. This necessitates innovations in data management and in-inline processing techniques. The aim of this conference is to create a forum for presentation of the latest developments in real-time photonic instruments, data management and real-time processing, and to create a forum for exchange of ideas in this new and exciting field of photonic instrumentation.This conference intends to cover the following, and related topics: • real-time optical imaging and spectroscopy • real-time process photonic monitoring • ultrafast optical signal characterization • microwave photonics • real-time photonic data processing systems • computationally efficient algorithms • photonic data compression • photonic techniques for big data visualization and

analytics.

Advanced Sensor Systems and Applications VII (PA111)Conference Chairs: Tiegen Liu, Tianjin Univ. (China); Shibin Jiang, AdValue Photonics, Inc. (USA); Rene Landgraf, Fraunhofer-Institut für Photonische Mikrosysteme (Germany)

Program Committee: Xiaoyi Bao, Univ. of Ottawa (Canada); Rongshen Chen, The Univ. of Birmingham (United Kingdom); Kin-Seng Chiang, City Univ. of Hong Kong (Hong Kong, China); Brian Culshaw, Univ. of Strathclyde (United Kingdom); Xudong Fan, Univ. of Michigan (USA); Claire Gu, Univ. of California, Santa Cruz (USA); Baiou Guan, Jinan Univ. (China); Zuyuan He, Shanghai Jiao Tong Univ. (China); Wei Jin, The Hong Kong Polytechnic Univ. Shenzhen Research Institute (China); Deming Liu, Huazhong Univ. of Science and Technology (China); Niels Neumann, Technische Univ. Dresden (Germany); Li Pei, Beijing Jiaotong Univ. (China); Gang-Ding Peng, The Univ. of New South Wales (Australia); Xueguang Qiao, Northwest Univ. (China); Yunjiang Rao, Univ. of Electronic Science and Technology of China (China); Tobias Schuster, Technische Univ. Dresden (Germany); Anbo Wang, Virginia Polytechnic Institute and State Univ. (USA); Tingyun Wang, Shanghai Univ. (China); Hai Xiao, Clemson Univ. (USA); Steve Yao, General Photonics Corp. (USA); Paul Kit-Lai Yu, Univ. of California, San Diego (USA); Li-Bo Yuan, Harbin Engineering Univ. (China)

The areas of photonic sensors and their applica-tions have expanded rapidly in recent years. Pho-tonic sensors, especially fiber-optic sensors, are widely used for measurement of various physical and chemical parameters in many fields. Recent developments in fiber gratings, micro-structured optical fibers, specially-doped optical fibers, and planar waveguide devices, etc, provide great potential and solutions for a variety of sensing ap-plications that conventional sensors cannot handle. This topical conference will provide an interna-tional forum for the most recent and interesting technical issues concerning photonic sensors and their applications, including novel sensor devices, advanced sensing methods and sensor systems, innovative sensor integration and multiplexing techniques, and new applications and field tests. There will be a number of invited talks presented by leading scientists in the field of photonic sen-sors. Papers focused on the following and related topics are welcome: • optical sensors based on fiber gratings,

photonic crystal fibers, planar/integrated waveguides, etc.

• optical sensors for chemical, environmental, biological, medical, and other applications

• discrete and distributed optical sensors, as well as optical sensor systems and networks

• new fibers, smart structures, and materials for optical sensing

• passive and active devices for optical sensing • new physics, principles, and modeling related

to optical sensing • applications, field tests, and standardizations

of optical sensing technologies.


PHOTONICS ASIA 2016

Nanophotonics and Micro/Nano Optics III (PA113)Conference Chairs: Zhiping Zhou, Peking Univ. (China); Kazumi Wada, The Univ. of Tokyo (Japan)

Program Committee: Eric Cassan, Institut d’Électronique Fondamentale (France), Univ. Paris-Sud {France); Tao Chu, Institute of Semiconductors (China); David S. Citrin, Georgia Institute of Technology (USA); Min Gu, RMIT Univ. (Australia); El-Hang Lee, Inha Univ. (Korea, Republic of); Ching-Fuh Lin, National Taiwan Univ. (Taiwan); Gong-Ru Lin, National Taiwan Univ. (Taiwan); Yan-Qing Lu, Nanjing Univ. (China); Jurgen Michel, Massachusetts Institute of Technology (USA); Andrew W. Poon, Hong Kong Univ. of Science and Technology (Hong Kong, China); Haisheng Rong, Intel Corp. (USA); Yikai Su, Shanghai Jiao Tong Univ. (China); Hon Ki Tsang, The Chinese Univ. of Hong Kong (Hong Kong, China); Dan-Xia Xu, National Research Council Canada (Canada); Changhe Zhou, Shanghai Institute of Optics and Fine Mechanics (China); Weidong Zhou, The Univ. of Texas at Arlington (USA)

The focus of this conference is on the design, fabrica-tion, and application of micro/nanostructures that facilitate the generation, propagation, manipula-tion, and detection of light from the infrared to the ultraviolet. Papers are solicited on the following and related topics: • tunable, multifunctional, and/or active

nanomaterials and metamaterials • nonlinear nanophotonics including

metamaterials and plasmonics • molecular self-assembly, and other

nanofabrication techniques • nanoparticles and nanoparticulate composite

materials • nanotubes, nanowires, and nanofibers • quantum dots and other low-dimensional

nanostructures • quantum optics and spintronics • nanowaveguides and nanoantennas • sculptured thin films and nanostructured

photonic crystals • nanobiophotonics • near-field optics • light-harvesting materials and devices • nanophotonic detectors • nanoscale optical electronics • silicon photonics • nanophotonic concepts for continued

integration of various optical and/or electronic functions

• optical manipulation techniques, spectroscopies, and scattering techniques

• surface plasmons and nanoplasmonics • ultrashort pulse propagation.

Plasmonics II (PA114)Conference Chairs: Hongxing Xu, Wuhan Univ. (China); Satoshi Kawata, Osaka Univ. (Japan); David J. Bergman, Tel Aviv Univ. (Israel); Xing Zhu, Peking Univ. (China)

Program Committee: Che Ting Chan, Hong Kong Univ. of Science and Technology (Hong Kong, China); Zheyu Fang, Peking Univ. (China), Rice Univ. {United States); Francisco Javier García de Abajo, ICFO - Institut de Ciències Fotòniques (Spain); Min Gu, Swinburne Univ. of Technology (Australia); Minghui Hong, National Univ. of Singapore (Singapore); Zhi-Yuan Li, Institute of Physics (China); Ai Qun Liu, Nanyang Technological Univ. (Singapore); Peter Nordlander, Rice Univ. (USA); Ruwen Peng, Nanjing Univ. (China); Min Qiu, Zhejiang Univ. (China); Din Ping Tsai, National Taiwan Univ. (Taiwan); Jianfang Wang, The Chinese Univ. of Hong Kong (Hong Kong, China); Hong Wei, Institute of Physics (China); Jianbin Xu, The Chinese Univ. of Hong Kong (Hong Kong, China); Lei Zhou, Fudan Univ. (China); Shining Zhu, Nanjing Univ. (China)

The SPIE/COS Photonics Asia 2016 conference on Plasmonics will bring together plasmonics experts from across the globe, both junior and senior, from academia and industry, to share their latest results and set the agenda for future developments in the field. Papers are solicited on the following and related topics: • active plasmonics • plasmonic metamaterials and metasurfaces • plasmonic antennas • graphene plasmonics • quantum plasmonics • thermal plasmonics • plasmonic-enhanced spectroscopy • plasmonic-enhanced light harvesting • near-field optics and related applications • plasmonics in medicine and biology • plasmonic circuits • plasmonic-assisted chemical reactions and hot

electron generations • chiral plasmonics.


CALL FOR PAPERS

Quantum and Nonlinear Optics IV (PA115)Conference Chairs: Qihuang Gong, Peking Univ. (China); Guang-Can Guo, Univ. of Science and Technology of China (China); Byoung Seung Ham, Gwangju Institute of Science and Technology (Korea, Republic of)

Program Committee: Yiping Cui, Southeast Univ. (China); Luming Duan, California Institute of Technology (USA); Qiongyi He, Peking Univ. (China); Osamu Hirota, Tamagawa Univ. (Japan); Hyunseok Jeong, Seoul National Univ. (Korea, Republic of); François Kajzar, Univ. Politehnica of Bucharest (Romania); Jianwei Pan, Univ. of Science and Technology of China (China); Kunchi Peng, Shanxi Univ. (China); Kebin Shi, Peking Univ. (China); Mankei Tsang, National Univ. of Singapore (Singapore); Jingjun Xu, Nankai Univ. (China); Zuyan Xu, Technical Institute of Physics and Chemistry (China); Toyohiko Yatagai, Utsunomiya Univ. (Japan); Victor N. Zadkov, Lomonosov Moscow State Univ. (Russian Federation); Weiping Zhang, East China Normal Univ. (China)

Information security concerns and explosive data transmission and storage have led to exciting new developments and advances in quantum cryptog-raphy, quantum communication, nonlinear optics, optical data storage, optical communication, etc. We encourage you to submit abstracts on the following and related topics: • quantum cryptography and quantum

communication • entanglement photon resource • long-distance quantum network • quantum measurement and quantum

computations • high intensity and relativistic nonlinear optics • novel nonlinear materials and structures • nonlinear optics in waveguides • optical coherent transient phenomena • nonlinear frequency conversion and nonlinear

spectroscopy • optical data storage and associative memories • nonlinear fiber optics • phase-controlled nonlinear optical processes • ultrafast nonlinear optics • nonlinear plasmonics and nano-photonics • quantum sensing and metrology • quantum electrodynamics • matter-light entanglement • slow light and fast light.

Infrared, Millimeter-Wave, and Terahertz Technologies IV (PA116)Conference Chairs: Cunlin Zhang, Capital Normal Univ. (China); Xi-Cheng Zhang, Univ. of Rochester (USA); Masahiko Tani, Univ. of Fukui (Japan)

Program Committee: Peter A. R. Ade, Cardiff Univ. (United Kingdom); Yi Cai, Kunming Institute of Physics (China); Jun-Cheng Cao, Shanghai Institute of Microsystem and Information Technology (China); Hou-Tong Chen, The Ctr. for Integrated Nanotechnologies (USA); Jian Chen, Nanjing Univ. (China); Yuping Cui, Tianjin Jinhang Institute of Technology Physics (China); Jianming Dai, Univ. of Rochester (USA); Haewook Han, Pohang Univ. of Science and Technology (Korea, Republic of); Jiaguang Han, Tianjin Univ. (China); Zhi Hong, China Jiliang Univ. (China); Biaobing Jin, Nanjing Univ. (China); Weiqi Jin, Beijing Institute of Technology (China); Sergei Ark Kozlov, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation); He Li, Shanghai Institute of Technical Physics (China); Jinsong Liu, Huazhong Univ. of Science and Technology (China); Makoto Nakajima, Osaka Univ. (Japan); Chiko Otani, RIKEN (Japan); Ci-Ling Pan, National Tsing Hua Univ. (Taiwan); Jiancheng Shi, Institute of Remote Sensing and Digital Earth (China); Sheng-Cai Shi, Purple Mountain Observatory (China); Alexander Pavlovich Shkurinov, Lomonosov Moscow State Univ. (Russian Federation); Fei-jun Song, China Daheng Group, Inc. (China); Jianmin Yuan, National Univ. of Defense Technology (China); Chao Zhang, Univ. of Wollongong (Australia); Weili Zhang, Oklahoma State Univ. (USA); Yan Zhang, Capital Normal Univ. (China); Zhuoyong Zhang, Capital Normal Univ. (China); Kun Zhao, China Univ. of Petroleum (China); YiMing Zhu, Univ. of Shanghai for Science and Technology (China)

Papers on the following and related topics are solic-ited for this conference: • infrared detectors and focal plane array • uncooled infrared imaging devices and systems • infrared spaceborne remote sensing • hyperspectral airborne remote sensing • infrared image processing • testing and calibration • communication and radar • waveguide and optics • spectroscopy and imaging • novel THz generation and detection • THz photonic devices • interaction of THz radiation with matter • THz for biomedical applications • nondestructive sensing and imaging • bright THz source • remote THz sensing • THz components • THz metamaterials.


PHOTONICS ASIA 2016

VENUE AND TRAVELSPIE/COS Photonics Asia will be held at the Beijing International Convention Center, a well known enterprise in Beijing in a very central and convenient location.

More information about hotel options will be available on the website when the Advance Program is available in July 2016.

CLEARANCE INFORMATIONIf government and/or company clearance is required to present and publish your presentation, start the process now so that you receive clearance if your paper is accepted.

REGISTRATIONConference preregistration will open in August 2016. Paid registration includes access to all sessions, Welcome Reception, lunches, networking events and poster sessions, and conference Proceedings.

All authors (including invited or solicited speakers), program committee members, and session chairs are responsible for registering and paying the reduced author/session chair/program committee registration fee.


CALL FOR PAPERS


By submitting an abstract, I agree to the following conditions:

AN AUTHOR OR COAUTHOR (INCLUDING INVITED, ORAL, AND POSTER PRESENTERS) WILL:• Register at the reduced author registration rate• Attend the meeting.• Make the presentation as scheduled in the

program.• Submit a manuscript (6 pages minimum)

for publication in the SPIE Digital Library, Proceedings of SPIE.

• Obtain funding for their registration fees, travel, and accommodations, independent of SPIE, through their sponsoring organizations.

• Ensure that all clearances, including government and company clearance, have been obtained to present and publish. If you are a DoD contractor in the USA, allow at least 60 days for clearance.

Submit an abstract and summary online at: www.spie.org/pa16call • Please submit a 250-word text abstract for

technical review purposes that is suitable for publication. SPIE is authorized to circulate your abstract to conference committee members for review and selection purposes.

• Please also submit a 100-word text summary suitable for early release. If accepted, this summary text will be published prior to the meeting in the online or printed programs promoting the conference.

• Only original material should be submitted.• Abstracts should contain enough detail to

clearly convey the approach and the results of the research.

• Commercial papers, papers with no new research/development content, and papers where supporting data or a technical description cannot be given for proprietary reasons will not be accepted for presentation in this conference.

• Please do not submit the same, or similar, abstracts to multiple conferences.

REVIEW, NOTIFICATION, AND PROGRAM PLACEMENT INFORMATION• To ensure a high-quality conference, all

submissions will be assessed by the Conference Chairs/Editors for technical merit and suitability of content.

• Conference Chairs/Editors reserve the right to reject for presentation any paper that does not meet content or presentation expectations.

• The contact author will receive notification of acceptance and presentation details by e-mail no later than 18 July 2016.

• Final placement in an oral or poster session is subject to the Chairs’ discretion.

PROCEEDINGS OF SPIE AND SPIE DIGITAL LIBRARY INFORMATION• Manuscript instructions are available from

the “For Authors/Presenters” link on the conference website.

• Conference Chairs/Editors may require manuscript revision before approving publication and reserve the right to reject for publication any paper that does not meet acceptable standards for a scientific publication. Conference Chairs/Editors’ decisions on whether to allow publication of a manuscript is final.

• Authors must be authorized to transfer copyright of the manuscript to SPIE, or provide a suitable publication license.

• Only papers presented at the conference and received according to publication guidelines and timelines will be published in the Proceedings of SPIE and SPIE Digital Library.

• Published papers are indexed in leading scientific databases including Astrophysical Data System (ADS), Chemical Abstracts (relevant content), Ei Compendex, CrossRef, Current Contents, DeepDyve, Google Scholar, Inspec, Portico, Scopus, SPIN, and Web of Science Conference Proceedings Citation Index, and are searchable in the SPIE Digital Library. Full manuscripts are available to SPIE Digital Library subscribers worldwide.

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