Carter Research GroupOverview Talk October 2012UMass

Non-Traditional High Resolution Patterning

Nanoimprintand

Roll-to-Roll Fabrication

Carter Research GroupOverview Talk October 2012UMass

UMass Nanoimprint Lithography Laboratory

Molecular ImprintsMI-55 SF-IL Tool Nanonex NX-2000

Nanoimprinter

Trion SystemsICP Etch Tool

One‐of‐a‐kind

NanoimprintLithography Facility

Carter Research GroupOverview Talk October 2012UMass

CdSe Nanowire Fabrication

1) spin coat w/ NOA 60 2-3) Soft lithography 4-5) Patterned NOA 60 w/ residual layer 6) ICP/ RIE etch to remove the residuallayer & create free-standing features 7) CdSe electrodeposition 8) NOA 60 lift-off &CdSe nanowire formation

PHOTORESIST

1PDMS

ITO

2

3

UV

5 4

6

87

Erenturk, B.; et al., Chemistry of Materials, 2011, 23(14), 3371–3376.

Carter Research GroupOverview Talk October 2012UMass

(A) (B)

• (A‐B) Effective photoresist removal without damaging the CdSe structures achieved by using Microposit MF‐319 (TMAH‐based aqueous developer, 4h development time)

• (C) The hexagonal CdSe crystal structure was unaffected by the template removal as confirmed by XRD analysis ( diffraction peaks at 2 = 23.5o, 25.5o, 26.9o, 41.9o and 45.0 o )

20 30 40 50 60 70 80

Inte

nsity

(a.u

.)

2

ITO substrate

Electrodeposition

Template removal

(100

)(0

02)

(101

)

(103

)

(110

)

CdSe Nanowire Fabrication

Erenturk, B.; et al., Chemistry of Materials, 2011, 23(14), 3371–3376.

Carter Research GroupOverview Talk October 2012UMass

Colloidal Assembly on Fibers

Carter Research GroupOverview Talk October 2012UMass

Colloidal Assembly on Fibers

Carter Research GroupOverview Talk October 2012UMass

Templated Electrodeposition of PEDOT

Carter Research GroupOverview Talk October 2012UMass

2D Nano/Microporous CdSe from Bilayer Templates

Park, J. Y.; Hendricks, J. L.; Carter, K. R. Submitted, 2011.

Carter Research GroupOverview Talk October 2012UMass

CHM Test Bed: Roll-to-Roll Process Facility• UMass NanoEmboss R2RNIL Tool has been constructed and installed• Tool is unique and is designed for coating and imprinting with nanoscopic precision• CHM will leverage our expertise in ordered BCP systems to fabricate a number of technologically

useful materials and devices.• Efforts includes the development of functionalized materials to target specific active surfaces &

coatings, electronic, mechanical and optical properties.• As our capabilities grow, the complexity of end-products will increase.• To realize our goal, the CHM has augmented it skill base and assembled a world class team with

experts from academia, government, and industry.

Carter Research GroupOverview Talk October 2012UMass