no. 12 pcb processing using laser-doped selective the ... · layers, and b) 160 mm thick...

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Crystalline-Silicon (c-Si) solar cells continue to be a leader amongst the various competing solar cell technologies. Reasons for this include stable supply of silicon, well-developed manufacturing processes, and, of course, the high and growing conversion efficiencies that can be achieved. Here, we report on Laser Doped Selective Emitters (LDSE) – a relatively straightforward, laser-based manufacturing process that has been demonstrated that it can increase cell efficiency by up to 1–2% points over conventional cells. A conventional p-type wafer c-Si solar cell has a thin but heavily-doped n ++ region of silicon on the front surface. This region, generated via high-temperature phosphorus gas furnace diffusion, forms a p-n junction, directing current flow into a grid pattern of thin conducting strips on the cell surface. These are referred to as finger lines, and consist of a metallic paste material that is screen printed onto the cell surface and subsequently “baked-in” at high- temperature, creating electrical contacts to the heavily-doped n ++ , or emitter, region of the Laser-Doped Selective Emitters (LDSE) with a Green CW Laser Application Focus Application Focus Industrial Laser Applications Lab No. 12 PCB Processing Using the Mosaic Laser The growing trend towards miniaturization and cost reduction in the production of electronics products and devices has led to the ever increasing demand for laser micromachining applications. With innovations in laser technology – as nanosecond pulsed Q-switched laser sources become more compact, robust, reliable and affordable – more micromachining applications have become commercially viable. The use of lasers in the printed circuit board (PCB) manufacturing processes is one example. The driving factor for the use of laser technology as a solution is its ability to process small, high-precision features in a non-contact manner at high speed in a cost effective way. Lasers are routinely used in a variety of PCB manufacturing processes including via drilling, depaneling, profiling (cutting), laser direct imaging (LDI), repair, trimming, marking, and skiving processes. We have investigated the use of our new generation of Q-switched DPSS nanosecond pulsed Mosaic 532-11 laser for some of the rigid PCB and flexible PCB (FPCB) processes and have demonstrated that the Mosaic laser is a good candidate. a) b) c) Microscope picture showing a) rigid PCB panel with individual boards linked together, b) entrance side cut quality of depaneled thin rigid PCB, and c) cross-section of a cut a) b) 1 2 Copper Epoxy or glass fiber Solder mask Example of Rigid PCB a) Rigid PCB and b) schematic cross-section of rigid PCB showing 1) blind via and 2) through via Laser Depaneling of Thin Rigid PCB The thin rigid PCB sample consisted of 300 mm thick PCB resin material without copper or stiffening material. Operating the Mosaic 532-11 laser at high pulse repetition frequency (PRF) of 150 kHz with 64 mJ energy was found to be optimal to achieve good quality cuts and low carbonization. Multiple scans were used to achieve higher throughput, resulting in an average cutting speed of 50 mm/s. a) b) 2 1 Copper Polyimide Example of Flexible PCB a) Flexible circuit board and b) schematic cross-section of flexible PCB showing 1) blind via and 2) through via

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Page 1: No. 12 PCB Processing Using Laser-Doped Selective the ... · layers, and B) 160 mm thick all-insulator FPCB structure of polyimide-polyimide with acrylic adhesive in between. Using

Crystalline-Silicon (c-Si) solar cells continue to be a leader amongst the various competing solar celltechnologies. Reasons for this include stable supply of silicon, well-developed manufacturingprocesses, and, of course, the high and growing conversion efficiencies that can be achieved. Here, wereport on Laser Doped Selective Emitters (LDSE) – a relatively straightforward, laser-basedmanufacturing process that has been demonstrated that it can increase cell efficiency by up to 1–2%points over conventional cells.

A conventional p-type wafer c-Si solar cell has a thin but heavily-doped n++ region of siliconon the front surface. This region, generated via high-temperature phosphorus gas furnacediffusion, forms a p-n junction, directing current flow into a grid pattern of thin conductingstrips on the cell surface. These are referred to as finger lines, and consist of a metallic pastematerial that is screen printed onto the cell surface and subsequently “baked-in” at high-temperature, creating electrical contacts to the heavily-doped n++, or emitter, region of the

Laser-Doped SelectiveEmitters (LDSE) with aGreen CW Laser

Application FocusApplication FocusIndustrial Laser

Applications Lab

No. 12

PCB Processing Usingthe Mosaic™ Laser

The growing trend towards miniaturization and cost reduction in theproduction of electronics products and devices has led to the everincreasing demand for laser micromachining applications. Withinnovations in laser technology – as nanosecond pulsed Q-switched lasersources become more compact, robust, reliable and affordable – moremicromachining applications have become commercially viable. The use oflasers in the printed circuit board (PCB) manufacturing processes is oneexample. The driving factor for the use of laser technology as a solution isits ability to process small, high-precision features in a non-contactmanner at high speed in a cost effective way. Lasers are routinely used ina variety of PCB manufacturing processes including via drilling,depaneling, profiling (cutting), laser direct imaging (LDI), repair, trimming,marking, and skiving processes.

We have investigated the use of our new generation of Q-switched DPSSnanosecond pulsed Mosaic 532-11 laser for some of the rigid PCB andflexible PCB (FPCB) processes and have demonstrated that the Mosaiclaser is a good candidate.

a)

b)

c)

Microscope picture showing a) rigid PCB panel with individual boards linkedtogether, b) entrance side cut quality of depaneled thin rigid PCB, andc) cross-section of a cut

a)

b) 1 2

Copper Epoxy or glass fiberSolder mask

Example of Rigid PCB a) Rigid PCB and b) schematic cross-section of rigid PCB showing 1) blind via and2) through via

Laser Depaneling of Thin Rigid PCBThe thin rigid PCB sample consisted of 300 mm thick PCB resin materialwithout copper or stiffening material. Operating the Mosaic 532-11 laserat high pulse repetition frequency (PRF) of 150 kHz with 64 mJ energy wasfound to be optimal to achieve good quality cuts and low carbonization.Multiple scans were used to achieve higher throughput, resulting in anaverage cutting speed of 50 mm/s.

a)

b) 21

Copper Polyimide

Example of Flexible PCBa) Flexible circuit board and b) schematic cross-section of flexible PCB showing1) blind via and 2) through via

Page 2: No. 12 PCB Processing Using Laser-Doped Selective the ... · layers, and B) 160 mm thick all-insulator FPCB structure of polyimide-polyimide with acrylic adhesive in between. Using

PCB Processing Using the Mosaic Laser

q12DS-071203 (11/12)

Spectra-Physics® Lasers Sales1-800-775-5273 [email protected]/spectra-physics

Laser Profiling of Thick FPCBTwo different PCB materials were used: A) 180 mm thick FPCB layeredstructure of polyimide-copper-polyimide with acrylic adhesive betweenlayers, and B) 160 mm thick all-insulator FPCB structure of polyimide-polyimide with acrylic adhesive in between. Using the Mosaic laser, 5 mmcircles were trepan cut in both FPCB materials using multiple passes with anaverage speed of 11.5 mm/s. The optimized setting is low PRF of 20 kHzwhere ~390 mJ pulse energy was available at the work piece. Good qualitycuts were achieved. The results demonstrate that the Mosaic 532-11 is idealfor profiling/cutting of FPCB material consisting of polyimide and coppermaterials.

Laser Drilling of FPCBThe sample drilled was a 180 mm thick FPCB consisting of polyimide-copper-polyimide with acrylic adhesive in between. For this particular materialcombination, the copper layer strongly absorbs 532 nm wavelength andcouples the energy more efficiently into the neighboring polyimide materialresulting in a good quality through vias. The data shows that hole size andthe drill rate achieved depends on the pulse energy and corresponding PRF.

A good compromise between hole quality and throughput is achieved at50 kHz PRF with ~200 mJ energy. With these settings, 65 mm entrance and35 mm exit holes were drilled at the rate of <1 ms/hole.

P r o d u c t s : M o s a i c 5 3 2 - 1 1

The Mosaic 532-11 laser is an innovative new product that unites an arrayof proprietary technologies and solutions to address market pressure forgreater efficiency and lower cost. Its integrated It’s in the Box™ designincludes both the laser head and power supply in a single package, makingit a very compact laser that is simple to integrate into any machine tool. TheMosaic laser is designed specifically for micromachining applications in a24/7 manufacturing environment where system uptime is critical.

© 2012 Newport Corporation. All rights reserved. Spectra-Physics, the Spectra-Physics logo and the Newportlogo are registered trademarks of Newport Corporation. Mosaic is a trademark of Newport Corporation.

Mosaic 532-11Wavelength 532 nm

Average Power >11 W at 50 kHz

Peak Power ~11 kW at 50 kHz~22 kW at 30 kHz

Repetition Rate 0–500 kHz

Pulse Width <15 ns

M2 <1.2

BA

BA

BA

a)

b)

Microscope picture [a) entrance side and b) exit side] showing 5 mm circular trepancuts in FPCB processed at 20 kHz PRF.

Microscope picture shows 50 mm target diameter through vias drilled in 180 mmthick polyimide-copper-polyimide FPCB sample at various PRFs.