nanoscience and nanotechnology: taiwan’s...

Jyuo-Min ShyuIndustrial Technology Research Institute

Jan. 6, 2006

Nanoscience and Nanotechnology: Taiwan’s Approach

Nanotechnology

“Research and technology development at the atomic, molecular or macromolecular levels, in the length scale of approximately 1 – 100 nm range…”

- U.S. National Nanotechnology Initiative (2000)

VLSI -- Already a Nanotechnology?!

MOSFETMOSFET gate stack

A “catch-all” term for a broad range of technologies that work with

nanometer-scale materials

Already being used in many industrial applications such as FPD,

semiconductor chips, UV cut, and stain-proof textiles

Increasing safety concerns on uncertain toxicities of nano-particles

➪ Those who can incorporate nanotech breakthroughs into new

manufacturing techniques or finished products will be the winners

Status of WW Nanotechnology Development

Source: The Royal Society & The Royal Academy of Engineering (Jul. 2004)

Nanoscience : The study of phenomena and manipulation of

materials at atomic, molecular and macromolecular scales, where

properties differ significantly from those at a larger scale

Nanotechnology : The design, characterization, production and

application of structures, devices and systems by controlling shape

and size at the nanometer scale

Nanoscience and Nanotechnology

➪ “Valley of Death” exists between Science and Technology

Taiwan’s National Nanotechnology Program

Steering Committee

Program Program LeadersLeaders

Advisory Advisory CommitteeCommittee

Consulting Consulting ExpertsExperts

Promotion

Projects

Educational Programs

Core Facilities

Academic Research

Industrial Technology Development

Projects Review

Industrial Applications

International Collaboration

Administrative Support

Focus on Industrialization

Total program size: US$ 620 million over six years (2003 – 2008)

Industrialization62%

Education1%

AcademicResearch

21%

Core Facilities16%

Education and Training Programs

K-12 ProjectK-12 Project Collegiate Development Center

Collegiate Development Center

Industrial PersonnelTraining Center

Industrial PersonnelTraining Center

Stimulating children’s interest Cartoon

─ Nano Blaster Man─ A Fantastic Journey

for Nana and Nono(animated video)

Popular Science Books─ Nanotechnology Symphony

Under-/post- graduate e-Learning/c-Learning

Workshops

Southern Taiwan Nanotechnology Research Center

Research Tools for Nano-science and Technology

Microscopy and Nano-Analysis

Nano Fabrication and Nano Characterization

ITRI Common Laboratory

Nanolaboratory for Kaohsiung and Pin-Tung Area

Nanolithography and Nanobiotechnology

Nanoscience and Technology Center in Central Taiwan

Common Core Facilities

NDHU

Nanoscience and Technology Center in Eastern Taiwan

Academic Research

奈米物理

奈米化材

奈米機電

奈米能源

奈米生技

檢測與特殊儀器

環境/健康/安全

Industrialization of Nanotechnology in ITRI

ITRI Nanotechnology Center

MEMS, NanoFabrication

International Linkages

Industry & Academia Outreach

Open Laboratory SpaceExperimental FacilitiesNano Scale Characterization SupportModeling SupportEducation & TrainingOther Support

Open Laboratory

New Company

startup

International Collaboration

Academia Collaboration

Industry Collaboration

Novel Applications Projects

Nano-Material

Nano-Electronics

Nano-Photonics

Nano-Biotech

Nano-Chemicals ….

ITRI Nanotechnology Projects

Research Infrastructure

Industrial Technology Research Institute (ITRI)

ITRI’s R&D Activities

Information and Communications

Technologies

Advanced Manufacturing and Systems

Biomedical Technology

Nanotechnology, Materials and

Chemicals

Energy and Environment

100 nm

R&D Carried Out in 12 Laboratories

Collaborations and Partnerships (ITRI)

Joint Research Programs— Taiwan: TSMC, AUO, Powerchip, …— USA: Synopsys, Cadence, Corning, Dow Chemicals, AKT, …— Germany: Fraunhofer, BASF— Japan: AIST— Canada: NRC— Russia: Ioffe Institute— …

Joint Research Labs— Domestic: NTU, NCU, NTHU, NCTU, NCKU, NCSU— International: UCB, CMU, MIT, MSU

Strategic Focus

Information and Communications— Nanoelectronics, Flat-Panel Displays, Optical Storage

Traditional Industries— Surface Treatment, Functional Materials, Catalysts

Biotech— Targeting and Triggered Drug Release

Energy— Solar Cells, W-LED, DMFC

- BusinessWeek, Asian Ed (May 16, 2005)

Patents Issued by the US

Source: US Patent and Trademark Office (2005)

2000 2001 2002 2003 2004

USA 100,548 101,619 93,347 99,898 97,913Japan 34,563 34,875 34,954 37,862 37,734Germany 10,978 12,128 11,529 12,361 11,623

Taiwan 5,578 6,766 6,346 6,719 7,376Korea 3,699 3,783 3,755 4,198 4,590

Italy 1,915 2,052 1,945 2,015 2,009

Canada 4,060 4,157 3,809 3,869 3,980

France 4,392 4,576 4,289 4,228 3,846

United Kingdom

4,241 4,425 4,076 4,110 4,044

Northern Taiwan38 IncubatorsHsinchu Science Park IC, ICT Industries

Central Taiwan15 IncubatorsCentral Taiwan Science Park Precision Machinery, TFT-LCD

Southern Taiwan23 IncubatorsSouthern Taiwan Science Park Biotech, Opto-electronics

Eastern area5 IncubatorsTourist Industries

Industrial Infrastructure

A Sampling of R&D Activities in ITRI

• ZnO Nano-Powders

• Nanoclay/PU Leather

• MRAM

• CNT-FED

• Max output: 150kW• Max temp: ~10000oC• Operation pressure: ~1 bar• Throughput: ~ kg/hr

DC Plasma Reactor Size, Shape and Morphology Control

Controlled Growth of ZnO Nano-Powders

Source: ITRI (Aug. 2005)

UV Absorption

200 300 400 500 600 700

0.0

0.2

0.4

0.6

0.8

1.0

A

bsor

bent

wavelength (nm)

Abs

orpt

ion

Wavelength (nm)

Novel Properties of Tetrapod-Shaped ZnO (1)


0 500 1000 1500 2000 25000.0

0.2

0.4

0.6

0.8

1.0

0 500 1000 1500 2000 25000.0

0.2

0.4

0.6

0.8

1.0

0 500 1000 1500 2000 25000.0

0.2

0.4

0.6

0.8

1.0

0 500 1000 1500 2000 25000.0

0.2

0.4

0.6

0.8

1.0

0 500 1000 1500 2000 25000.0

0.2

0.4

0.6

0.8

1.0

Abs

orpt

ion

(A.U

.)

W avelength (nm)

N 2+ H 2plasma

commercial ZnO

50N 2 + 50Ar plasma

100N 2 plasm a

IR shielding properties depending on processing parameters




5.1×102(Ab = 2.7)

1.5×104 (Ab=1.2)

2.6×105

After 3 hrs in the dark

< 10(Ab > 4.1)

9.0×104ZnO-Ag(0.2-0.01 wt.%)

1.7×101( Ab = 3.9)

7.6×104ZnO(0.2 wt.% )

1.4×1051.3×105Reference(DI water)

After 3 hrsvisible

illumination

InitialBacteria # (CFU/ml)

Sample

Anti-microbial Photocatalysis(visible light)


Water droplet

Water/Oil-Repellent ZnO Nanocoating

Contact angle >145°

Water droplet

Sunflower seed oil

textile

Cement substrate


Nanoclay/PU Leather

PU/Nanoclay Leather

Pink: Shoes Blue: SofaLight Yellow: Bag White: Baseball

Sofa Baseball

TEM morphology (932-025)

Intercalation

Exfoliation

Source: ITRI (2004)

Anti-Stick Surface (Dry Feeling)

Wear-Resistance Increased: 100%

Far IR Emissivity: 0.89-0.90

Surface Temperature Increased: 3.8~4.0°C

Nanoclay/PU Leather

Source: ITRI (2004)

Wear-resistance Filler wt%Cost

NT$/kgTaber

CyclesWater

resistanceDyeing

capability

Additive Type Siloxane 5~10 500 800~1,000 X X

Reactive Type Siloxane 3~10 1500 800~1,000 O X

Nanoclay 1~3 600 1,000~1,200 O O

Control －－ 300~500 －－

MRAM

OFF

Write Current He

Write Current Hh

Write Read

Fixed-layer

Bit-line

Bit-line

ON

Free-layer

Tunneling Oxide

Sensing Current

M1

M2

M3

M4

D S

G

1Mb MRAM

Source: ITRI (Aug. 2005)Challenges: Scalability and Selectivity

Bank0256Kb

Bank2256Kb

Bank1256Kb

Bank3256Kb

Die Size: 4.71 x 5.49 mm2MTJ Size: 0.36x0.6 um2Technology: tsmc 0.15LV 1P5M

ITRI MTJ BEOLRead access time < 50ns

10F2 20F2 30F2 40F2 50F2 60F2 70F2

SRAM

Flash

DRAM

Speed

4

1

52 3

6

7

4. IBM, VLSI 2004

1. Samsung, IEDM 2003 (8 F2)

5. Renesas, VLSI 2004

2. Motorola, IEDM 20033. SONY, VLSI 2004

6. NEC, IEDM 2004 (6 F2, 250 ns)7. ITRI, IEDM 2004 (6 F2, 50 ns)

MRAM30ns

60ns

90ns

120ns

150ns

180ns

210ns

MRAM Benchmark

Area or Cost

ITRI

Source: ITRI (2004)

ITOPhospher

Gate

CNTElectrode

e-

Dielectric

e- e-

CNT Field-Emission Display

20” CNT Backlight Unit


Challenges: Uniformity and Lifetime

“Nano-Mark” Initiative (2004)

“Nano Products” to certify:

․Critical dimension ≤ 100nm

․New properties/characteristics due to nano-structures

Anti-bacteria TilesDeodorized PaintsAnti-bacteria LampsWear-Resistant PU Synthetic LeathersAnti-Smudge PaintsSelf-cleaning Ceramic TilesAnti-Smudge Toilet

National-Effort: Integration

Linking academia to build core competenciesLeveraging industry entrepreneurship for highly differentiated productsNetworking with international nanotechnology community for win-win partnerships

“Nanotechnology Ranking” (2005)

Source: Lux Research (Sept., 2005)

Source: Lux Research (Sept. 2005)

“Nanotechnology Ranking” (2005-2012)

Nanotechnology: Significance for Taiwan

Many industries have high stakes in nanotechnology— Nanotech-based products will proliferate soon

Since Taiwan can leverage its strength in ICT industry, nanotechoffers unique opportunity

— Application-driven R&D programs will lead to significant positions in selected areas of nanotechnology

— National-level effort is in progress to integrate the strengths of industry, academia and research institutions

Nanoscience and Nanotechnology: Taiwan’s ApproachNanotechnologyVLSI -- Already a Nanotechnology?!Focus on IndustrializationAcademic ResearchIndustrialization of Nanotechnology in ITRIITRI’s R&D ActivitiesStrategic FocusPatents Issued by the USIndustrial InfrastructureMRAM1Mb MRAMCNT Field-Emission Display20” CNT Backlight UnitNational-Effort: IntegrationNanotechnology: Significance for Taiwan

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