nanolitografi
TRANSCRIPT
Nanolitografi
NanolitografiE-beam litografiNano imprint litografi
Mikroskopi
SEM (scanning electron microscope)
F =-e v x BKomponenter i SEMMagnetisk linseSchottky emitter elektronkilde
E-beam litografi- Dedikerede e-beam systemer
- SEM med Raith Gmbh kontrolsystem og pattern generator
DANCHIP
Test of nanowire writingE-beam writing+RIE(Nano 9 Tom+Jeppe)Wires and channels
11
2D grating:Periodicity - 250nm
Optiske strukturerDiffraktive komponenter12
Nano Imprint Lithography (NIL)
Nanowire detektorAppl. Phys. Lett. 89, 153102 (2006)Focused Ion Beam (FIB) System
Focused Ion Beam Writing
As the diagram on the right shows,the gallium (Ga+) primary ion beam hitsthe sample surface and sputters a smallamount of material, which leaves thesurface as either secondary ions (i+ or i-) or neutral atoms (n0). The primary beam also produces secondary electrons (e-).As the primary beam rasters on the samplesurface, the signal from the sputtered ionsor secondary electrons is collected to forman image.
E-beam ~10 nmFIB ~20 nmEDXE-beam og FIB litografiTEM samples
FIB skrivningAAU-logo p et hr
CVD med FIB strle
Shinji MATSUI
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
http://www.nanonet.go.jp/english/mailmag/2006/086a.html
FIB skrivningAAU-logo p et hr