C a r l Z e i s s S M T – N a n o T e c h n o l o g y S y s t e m s D i v i s i o n

ZEISS EVO® SERIES

Stepping forward to new horizons in evolving versatile and upgrowing imaging solutions to increase yield for today’s and future requirements

E n a b l i n g t h e N a n o - A g e W o r l d ®

M O V E T O A H I G H L E V E L O F

O P E N A R C H I T E C T U R E

EVO® SeriesOpening new horizons in the fieldof versatile imaging solutions – for materials analysis, life sciences, semiconductor orhealthcare applications

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EVO® Series

ZEISS heritage in quality optics delivers a

positive contribution to the performance of your

enterprise

Class leading imaging and analysis meets the

requirements of the most demanding imaging

professional

Future Assured upgrade paths ensure effective

adaptation to evolving requirements

Modular design contributes towards high

throughput, reliability, always-on availability,

and ease of use

SmartSEMTM graphical user interface for ease of

use combined with power in reserve

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Future Assured – Move to a High Level of Open Architecture

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EVO®Series

EVOlution – naturally driven by the quest for per-

fection. An almost unnoticeable set of changes that

improve functionality, performance and enhance

quality. Occasionally a step-change occurs that con-

fronts the status quo with a new, radically different

design.

– The EVO® series has arrived.

Building on the successful formula of its acclaimed

predecessors, the new EVO® range sets even higher

standards. As visually appealing as it is supremely

competent, the EVO® series delivers on all fronts:

image quality, versatility, simplicity in use, throughput,

upgradeability and style. With power in reserve, EVO®

is ready to meet the new challenges posed by

advancing technologies, materials and analytical

requirements.

Three variants, with each microscope purposely

adapted to match each application’s niche.

The latest expression of Carl Zeiss SMT’s mastery of the

nanoworld.

– That’s EVOlution

Vacuum Mode Samples

HV

<10-3Pa

XVP®

10-750 Pa

EP

750-3,000 Pa

Conductive Non-

Conductive

Hydrated Natural

State

Extreme

Out-gassing

High

Resolution

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Application fields of EVO® vacuum modes

● Featuring three imaging modes – High Vacuum,

eXtended Variable Pressure, and Extended Pressure –

covering the pressure range up to 3000 Pa, EVO®

overcomes the restrictions imposed by simple VP

and LV instruments. The EVO® series’ unique

‘Future Assured’ upgrade routes ensure that today’s

imaging excellence can be adapted to future

imaging needs.

● Versatile and upgradeable, this microscope does

what no other instrument can. The all-new, high

resolution multi-mode column and high performance

conical objective lens, combined with a range of

large, multi-ported chambers, accepts the widest

range of applications whilst imaging to perfection.

● The latest SmartSEMTM task-oriented software

provides the perfect partner to this cutting edge

microscope technology. It places every aspect of

the microscope’s operation within a mouse click

of the operator for unsurpassed productivity and

ease-of-use.

● Turbo pumping provides the cleanest specimen

environment. All users notice the features: clean

column, clean apertures, clean detectors, clean

ultra thin EDS windows, clean specimens.

The benefits are fast pump down times, excellent low

voltage performance and long intervals between

service visits.

Altogether a better user experience.

● Secondary electron detection opportunities feature

for all EVO® microscopes under all conditions.

From the exceptional Everhart-Thornley SE detector,

through the established VPSE detector for charge

compensation, and to the innovative EPSE detector

for very high extended pressures, EVO® imaging

means true secondary electron detection.

Key Benefits

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Many industrial applications typify the core attributes

expected in a scanning electron microscope – fine

detail, high contrast, great depth of field and ele-

mental analysis. The EVO® series is, by design, a

superb high vacuum SEM. Thanks to its OptiBeam®

control, all-new objective lens and comprehensive

range of optional equipment and detectors, each

instrument can be configured to your specific

requirements.

Failure analysis, quality control, and forensics

specialists rely upon the SEM for quality high

resolution imaging and analysis. In each case, the

new EVO® series leads the field in image quality and

analysis. The perfect positioning of the EDS and EBSD

detectors, and the availability of LaB6 for those

requiring a high brightness source, guarantee the

applicability of the EVO® series to leading edge

materials analysis.

When the specimen is insulating, the EVO®’s XVP®

mode provides the highest quality imaging using a

combination of our unique BeamSleeveTM (see page 22)

and variable pressure secondary electron detector

(VPSE).

The EVO® series accommodates a wide range of

tensile, heating, and bending stages, which, in combi-

nation with the option to record direct AVI files,

permits dynamic processes to be recorded during mate-

rials testing. The dynamic interaction of water vapour

with paper, foodstuffs, and textiles can also be investi-

gated and recorded, leading to new insights into many

industrial processes.

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Materials Analysis

Inconel (orientation contrast). 20 kV; 4QBSD detector

Glass fibre. 20 kV; high vacuum; coated

Polished alloy. 20 kV; 4QBSD detector

87

Saw diamond abrasive. VPSE detector

Filter. 20 kV; coated

Copy paper. 20 kV 4QBSD detector; 50 Pa

Fabric. 20 kV; SE detector

Cement. 20 kV; VPSE detector; 40 Pa

Materials Analysis

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Life Sciences

The EVO® series delivers a unique imaging experience

for the life scientist. From butterfly to bacteria, flora to

fauna, the EVO® series opens up a new world of easy-

to-use, high powered imaging for those investigating

how our natural world is put together.

The images here typify the SEM challenge in the life

sciences – fragile and hydrated.

XVP® provides for the introduction of water vapour

to the specimen environment giving fine control of

humidity. Dehydration is prevented so that speculation

over the possible presence of artefacts is avoided.

For higher water vapour pressures and higher tempera-

tures, Extended Pressure mode offers imaging close

to room temperature.

Specimens do not need to be coated, fixed, frozen or

freeze dried before they can be imaged in the EVO®.

As the specimen is untreated, it can be imaged

repeatedly in great detail.

Flower. VPSE detector; 25 kV; 100 Pa air

Bacteria. 15 kV; ET detector; coated

Ciliate. 15 kV; EPSE detector; 600 Pa water vapour

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Mildew fungus. 15 kV; EPSE detector; 700 Pa; water vapour

Caterpillar eggs. 10 kV; VPSE detector; 50 Pa

Mildew fungus. 15 kV; EPSE detector; 700 Pa; water vapour

Caterpillar egg. 15 kV; EPSE detector; 700 Pa; water vapour

Stachybotrys. 20 kV; SE detector

Life Sciences

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The evolution of consumer electronics towards smaller,

faster devices continues to produce demanding ima-

ging challenges. From plasma screens to phones the

race is on to improve both quality and performance

whilst reducing costs.

The excellent low beam energy performance of the

EVO® series columns permits imaging on beam sensi-

tive specimens and those of limited conductivity.

Best of class performance is delivered on insulating

specimens such as photo masks and glass structures,

when the unique BeamSleeveTM, XVP®, and VPSE detec-

tor technologies are combined.

The EVO®’s range of operating modes, from HV via

XVP® to EP presents users with the ultimate in imaging

options. EVO® puts you in control of the imaging pro-

cess, quickly, repeatedly and effortlessly.

From small MEMS to large LCDs the EVO® series offers

a chamber and stage handling capability to suit.

Increasingly the constant drive for quality control

is presenting the industry with characterisation

challenges that the EVO® series is best placed to

answer.

Semiconductor

Integrated circuit. 1.5 kV; high vacuum

Bonding wires. 20 kV; 4QBSD detector; high vacuum

MEMS sensor. 12 kV; high vacuum; dynamic focus

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Bond pads and wires. 20 kV; 4QBSD detector Integrated circuit.

Integrated circuit. Slider head. 20 kV; 4QBSD detector

Circuit on silicon.

Semiconductor

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Healthcare

Healthcare enterprises require a range of imaging

solutions that provide high quality information, allo-

wing them to reach their own targets on technology

and productivity. With the increasing expectations

upon drug delivery systems for efficient and controlled

delivery of the active material there is a matching need

for analytical tools to provide accurate information on

these mechanisms. The EVO® series of microscopes

have unique capabilities to provide high resolution

images.

The need to characterise pharmaceuticals under FDA

Part 21 procedures, has led to an increased emphasis

towards monitoring and measuring aspects of drugs

manufacturing. The EVO® series sets a new standard

for the industry, providing the most comprehensive

range of analytical solutions of any SEM.

From analysing the distribution of active ingredients

on carrier particles to hydration and dissolution studies

of tablets, EVO®’s operating modes guarantee

effectiveness today and ensure that future require-

ments can be met.

With the addition of the scanning transmission elec-

tron microscope (STEM) detector option, any EVO®

microscope can provide transmission images of thin

sections. Such sections are imaged with very good

contrast at 30 kV or lower.

Lyophilized drug powder. 20 kV; VPSE detector

Lyophilized drug powder. 20 kV; VPSE detector; higher magnification

Cell thin section. 15 kV; STEM detector

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The real-time interaction of water with tablets can

be recorded to an AVI file for later analysis.

AVI files are generated in real-time as the dynamic

process is underway in the microscope.

Gel structure absorbing water and recorded by direct AVI capture. Large volumes of water are absorbed into thestructure of the gel.

The strong interaction of water with freeze dried coffee is recorded in this sequence.

Healthcare

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High Vacuum

eXtended Variable Pressure

Extended Pressure

Our Philosophy

Future Assured

In today’s highly volatile and fast moving world,

emerging imaging requirements are not easy to

anticipate. The EVO® series sets a new standard with

the Future Assured collection of upgrade paths that

enables laboratories to respond rapidly to changing

demands placed upon them. By considering the real

needs of microscope users at the design stage, an

EVO® series microscope can be upgraded, in the

laboratory, from high vacuum to XVP® and from XVP®

to EP. The hardware changes to achieve these upgrade

paths were considered at the design stage so that a

high vacuum EVO® can be transformed into an imaging

solution for insulators and wet life science specimens.

Once a microscope is XVP® enabled, the water vapour

expansion pack and the most appropriate detectors for

the application can then be added.

In today’s environment it is essential that laboratories

can respond to developing challenges.

Upgrade your instruments with:

●● High vacuum to XVP®

●● XVP® to EP

●● Add water vapour introduction

●● Add BSD detectors

●● Add EPSE detector

Future Assured upgrade path

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Your Benefit

Mildew fungus. 15 kV; EPSE detector; 700 Pa; water vapour

Fracture surface

Gel absorbing water. 20 kV; BSD detector; 750 Pa; water

HV imaging

Applications:

●● Conducting specimens

●● Fracture surfaces

●● Automotive parts

●● Metallurgy

XVP® imaging

Applications:

●● Insulators

●● Porous materials

●● Life sciences

●● Cosmetics

●● Pharmaceuticals

EP imaging

Applications:

●● Wet specimens

●● Dynamic processes

●● Materials analysis

●● Contact angle studies

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Our Design

Specimen handling The EVO® series of chambers have been designed to

match the needs of different groups of users.

EVO®40The EVO®40 series may be the smallest instrument

in our new range but is not a cut-down, entry level

version.

With accessory ports ready for EDS, cryo, and EBSD

applications the EVO®40 finds wide use in pharma-

ceutical and life science applications. Despite being

the smallest microscope in the series, the EVO®40 is

able to accommodate specimens up to 100 mm high.

EVO®50The EVO®50 excels in analytical applications.

The microscope has both an EDS port and a large

accessory port on each side of the chamber. This co-

planar geometry provides an ideal EBSD geometry as

the camera and an EDS detector are in the same plane.

The EVO®50 also has a variant that permits a wave-

length dispersive X-ray detector (WDS) to be fitted.

With a stage permitting 100x125 mm of motion, 5 kg

mass carrying capability, and up to 250 mm diameter

specimens, the EVO®50 is able to handle the majority

of specimens.

EVO®60When size really does matter, the EVO®60 series is

built to image the very largest of specimens.

With its super large chamber, the EVO®60 is ideal for

forensic and sizeable manufactured parts. Specimens

as large as 175mm in height, and 5kg in mass, can be

mounted on the stage.

The analytical qualities of the EVO®50 are retained

with the EVO®60, giving the EVO®60 unrestricted

imaging possibilities.

EVO®40

EVO® Cartesian Stage

EVO®50 EVO®60

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Your Benefit

Specimen stagesStraightforward specimen handling and responsive

navigation are essential factors for high SEM produc-

tivity. For this reason, all EVO® microscopes benefit

from our high precision stages which are equipped

with five axes motorisation as standard... the advan-

tages are clear.

By using direct drive motors, together with our high

precision mechanics, a repeatability of 2 µm meets the

needs of the most demanding of applications.

With a large collection of application specific ”quick

fit” specimen holders available, the largest and smal-

lest samples can be easily mounted for examination.

Compucentric operation of a Cartesian stage allows

the tilt, rotation or Y-axis to be moved to a new axis by

employing all five stage motors to manipulate the spe-

Rotate around any featureCompucentric rotation moves the rotation axis to

any feature on the specimen so that the field of view

rotates about this new position.

Tilt at any featureCompucentric ti lt moves the tilt to the selected

feature on the specimen.

Inclined Y-axisWith Compucentric Y specimens can now be inclined

and the surface remains in focus for all Y positions. This

is very useful for applications requiring highly tilted

specimens.

In addition, because the stage and

sample holder are fully indexed it

is possible to return to a saved

point of interest even if it has been

removed from the chamber. Stage movements are

linked to magnification so that navigation is smooth,

accurate and intuitive for all conditions.

cimen. This technique exceeds the specimen handling

capabilities of eucentric stages whilst keeping the

robustness and versatility of Cartesian stages.

Image of tensile stage (Deben)

Bullet comparison stage

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Our Technology

Class leading X-ray geometry

All instruments in the EVO® series boast the same

high resolution, multi-mode column with all new

objective lens. By placing access to the specimen

as a design priority, the optimum geometry for EDS,

WDS, and EBSD has been achieved.

The objective lens features a sharp profile that

allows the best of class working distance of 8.5 mm

whilst retaining a 35 degree take-off angle. These

characteristics apply to both energy and wave-

length dispersive X-ray analysis.

Coplanar geometry forEBSD

In the EVO® series, one plane

contains the column axis, the

EBSD camera, the EDS detector,

and the specimen tilt direction.

This coplanar geometry is

optimum for state of the art

EBSD texture studies when

combined with EDS for elemen-

tal analysis.

EDS detector

20 mm

20 mm

35 degrees

8.5 mm

EBSD camera

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Your Benefit

EDS-mapping of a semiconductor based sensor

High temperature ferritic stainless steel. Orientation map EBSD pattern from one particle grain

Au

FeAlCrAuCr

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Our Optics

OptiBeam®

The sharp, all new, objective lens is controlled

by the latest generation OptiBeam® column

control scheme. These OptiBeam® features are

possible because EVO® microscopes use inde-

pendent supplies for all the column lenses.

To increase productivity, flexibility and ease of

use four OptiBeam® modes are now available

for the EVO® series.

Analysis mode frees the user to concentrate

on problem solving and not on column adjust-

ments. The specimen remains in focus for any

change in probe current.

The diagram shows the optical arrangement for

imaging at a few picoamps, (in deep blue) and

for higher currents (in pale blue).

Large Field mode provides both a larger field

of view for navigation and a very large depth

of field.

Resolution mode continues to guarantee the

smallest probe diameter for a chosen probe

current, whatever the working distance or kV.

Depth mode provides a large depth of field

for a chosen probe current, whatever the

working distance or kV.

One click

Four modes

Hundreds of applications

Unlimited imaging

Analysis Large Field Resolution Depth

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Your Benefit

Analysis Large Field

Analysis mode provides:

● Constant focus● High throughput● Pin sharp imaging

Large Field mode provides:

● Large fields of view ● Massive depth of field● Ease of navigation

Fractured surface imaged at 100 pA using auto video and Analysis mode

Fractured surface imaged at 1000 pA using auto video andAnalysis mode

Micrograph of an M6 screw obtained using Large Field mode. The screw diameter is 6 mm and is located at 8.5 mm analytical working distance

M 8x90 screw. Large Field mode

6mm

90mm

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Our Design

eXtended Variable PressureXVP®

Through the lens pumping

The EVO® introduces through the lens (TTL) pumping to

objective lens design. This design evolution empowers

users with imaging solutions at higher pressures.

An intermediate pumping space within the lens is

independently pumped. The EVO®’s XVP® 750 Pa high

pressure limit supersedes previous VP and LV micro-

scopes.

The EVO® microscopes again raise the standard.

Water Vapour

Water vapour can be introduced to maintain wet

specimens in a fully hydrated form. Hydration is main-

tained so that the specimen is imaged without artefact.

In combination with a cool stage, liquid water is

stable permitting dynamic studies of the interaction

of materials.

BeamSleeveTM

The BeamSleeveTM is a tubular extension that can be

added to the objective lens to ensure maximum iso-

lation of the probe from high pressure gas at the

specimen.

In combination with any of the EVO® detectors, the

BeamSleeveTM provides brilliant images at low voltages,

and accurate X-ray analysis. A new set of imaging

solutions is opened by this innovation from ZEISS.

Beam Gas Path Length

Beam Gas Path Length (BGPL) is the distance over

which the electron beam and chamber gas interact.

The BGPL must be minimised for the very highest

quality imaging and X-ray analysis. All microscopes in

the EVO® series offer a super short BGPL of 2 mm.

BeamSleeveTM

Pumping Pumping

BGPL of 2 mm

Analytical WD of 8.5 mm

Through the lens pumping in XVP® and EP mode

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Your Benefit

Water Vapour provides

● Humidity control● Dynamic balance● Dynamic processes

BeamSleeveTM provides

● Accurate X-ray analysis● Brilliant images● 2mm BGPL

Caterpillar. Extended Pressure Secondary Electron (EPSE)detector; 600 Pa. The field of view is 1000 microns

Fractured ceramic. 3 kV; VPSE detector; 50 Pa; BGPL of 2 mm, with BeamSleeveTM

Fractured ceramic. Same field of view, same conditions exceptthat the BGPL is 16 mm, without BeamSleeveTM

SmartSEMTM active control panel for the water vapour pressurecontrol scheme uses the water phase diagram

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EVO® Series

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Technical Data

EVO®40 Essential Specifications EVO®50 EVO®60

Resolution

Acceleration Voltage

Magnification

Field of View

X-ray Analysis

OptiBeam®* Modes

XVP® Pressure Range

EP Pressure Range

Available Detectors

Chamber

5-Axes Motorised

Specimen Stage

Future Assured upgrade paths

Image Processing

Image Display

System Control

Utility requirements

3.0 nm @ 30 kV (SE and W)

2.0 nm @ 30 kV (SE with LaB6 option)

4.5 nm @ 30 kV (BSD - XVP® mode)

5 - 1,000,000 x

365 mm (Ø) x 255 mm (h)

X = 100 mm

Y = 125 mm

Z = 55 mm (35 mm motorised)

T = 0 - 90°

R = 360° (continuous)

Compucentric stage control by

mouse or optional joystick and

controlpanel

3.0 nm @ 30 kV (SE and W)

2.0 nm @ 30 kV (SE with LaB6 option)

4.5 nm @ 30 kV (BSD - XVP® mode)

5 - 1,000,000 x

420 mm (Ø) x 310 mm (h)

X = 100 mm

Y = 125 mm

Z = 123 mm (35 mm motorised)

T = 0 - 90°

R = 360° (continuous)

Compucentric stage control by

mouse or optional joystick and

controlpanel

3.0 nm @ 30 kV (SE and W)

4.5 nm @ 30 kV (BSD - XVP® mode)

0.2 - 30kV

7 - 1,000,000 x

6 mm at the Analytical Working Distance (AWD)

8.5 mm AWD and 35° take-off angle

Resolution, Depth, Analysis, Large Field

5 - 750 Pa with air, or optionally water vapour

5 - 3000 Pa with air

5 - 2000 Pa with water vapour

SE in HV - Everhart-Thornley

SE in XVP® - VPSE

SE in EP - EPSE

BSD in all modes - quadrant semiconductor diode

310 mm (Ø) x 220 mm (h)

X = 80 mm

Y = 80 mm

Z = 35 mm

T = 0 - 90°

R = 360° (continuous)

Stage control by mouse or optional

joystick and controlpanel

HV -> XVP® -> EP

Resolution: Up to 3072 x2304 pixel, Signal acquisition by integrating and averaging

Single flicker-free XVGA monitor with SEM image displayed at 1024 x768 pixel

SmartSEMTM** GUI operated by mouse and keyboard

Multilingual CONCISE GUI, Windows® XP operating system

100 - 240 V, 50 or 60 Hz single phase, No water cooling requirement

iOptiBeam®* – Active column control for highest resolution, largest field of view, or best depth of field

SmartSEMTM** – Fifth generation SEM control Graphical User Interface

C a r l Z e i s s S M T – N a n o T e c h n o l o g y S y s t e m s D i v i s i o n

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Carl Zeiss SMT worldwide

Carl Zeiss SMT

Distributor

Global Solution Provider

The Nano Technology Systems Division of Carl Zeiss

SMT provides its customers with total solutions

featuring the latest leading-edge EM technology.

The company’s extensive know-how, meticulously

acquired over 60 years in the field of E-beam tech-

nology, has brought many pioneering innovations to

the market. Our global applications and service

network guarantees fast, reliable and high quality

support sharply focused on customer requirements.

Combined with dedicated upgrade strategies, this

will protect your investment for its entire lifetime.

The core technology embedded in our innovative

products enables us to provide solutions which add

value to our customers’ business.

Enabling the Nano-Age World®

Carl Zeiss NTS GmbH

A Carl Zeiss SMT AG Company

Carl-Zeiss-Str. 22

73447 Oberkochen

Germany

Tel. +49 73 64 / 20 44 88

Fax +49 73 64 / 20 43 43

info-nts@smt.zeiss.com

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511 Coldhams Lane

Cambridge CB1 3JS

UK

Tel. +44 12 23 / 41 41 66

Fax +44 12 23 / 41 27 76

info-uk@smt.zeiss.com

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One Zeiss Drive, Thornwood

New York 10594

USA

Tel. +1 914 / 747 7700

Fax +1 914 / 681 7443

info-usa@smt.zeiss.com

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Fax +33 1 41 39 92 29

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