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EECS 427Lecture 3: CMOS review
EECS 427 F09 Lecture 3 1
Reading: 5.4, 6.2
Logistics
• CAD1 due today at 7pm• CAD2 assigned yesterday, due next Monday (9/21) at g y y, y ( )
7pm
• HW1 due next Wednesday (9/23) at the beginning of lecture
• HW1 readings: 3.5, 12.2, 5.4, 6.2.3
• HW2 due in 1.5 weeks– Email zhengya at eecs.umich.edu, subject line [EECS427
P j t G ] 1 il i l d b k d f hProject Group]: 1 email per group, include background of each person: grad/undergrad, area of interest/specialty: circuits, architecture, …
– Good to mix EE and CE, grad and undergrad, foreign and domestic, male and female
EECS 427 F09 Lecture 3 2
2
Outline
• Last time: layouts and design rules
• Register design for CAD2• CMOS inverter• DC and dynamic operations• Propagation delay• Static CMOS gates
EECS 427 F09 Lecture 3 3
• Fast gates design techniques
Register Design
Tri-state bufferTri state buffer
Transmission gate
EECS 427 F09 Lecture 3 4
3
Register Design
• How it worksWhen C is equal to 0, the master latch is transparent, and the salve latch is closed.
Master latch
Slave latch
EECS 427 F09 Lecture 3 5
Register Design
• How it worksWhen C is equal to 1, the master latch is closed, and the salve latch is
transparent When C switches from 0->1 (rising edge of the clock) the register captures the data .
Master latch
Slave latch
EECS 427 F09 Lecture 3 6
4
The CMOS InverterVDD
Vin Vout
EECS 427 F09 Lecture 3 7
CMOS Inverter VTCVout NMOS off
PMOS res
1.5
22.
5
NMOS satPMOS sat
NMOS satPMOS res
EECS 427 F09 Lecture 3 8Vin0.5 1 1.5 2 2.5
0.5
1
NMOS resPMOS off
NMOS resPMOS sat
5
Impact of Sizing
2.5
1
1.5
2V
ou
t(V)
Wider PMOS
Wider NMOS
Symmetrical
EECS 427 F09 Lecture 3 9
0 0.5 1 1.5 2 2.50
0.5
Vin
(V)
Impact of Process Variation2.5
1
1.5
2
Vo
ut(V
)
Fast PMOSSlow NMOS
Fast NMOSSlow PMOS
Nominal
EECS 427 F09 Lecture 3 10
0 0.5 1 1.5 2 2.50
0.5
Vin
(V)
6
MOS Transistor as a Switch
Discharging a capacitorDischarging a capacitor
C
EECS 427 F09 Lecture 3 11
MOS Transistor as a SwitchTraversed path
ID VGS = VDD
VGS ≥ VTRon D
VDS
VDDVDD /2
GS DD
Rmid
R0
S Don
Lecture 3 12
VDDVDD /2
2
112
2
112
21 )(
)(1)(
1))((
t
t D
DSt
ton
tttoneq dt
tItV
ttdttR
tttRavgR
)()(21
21 tRtRR ononeq
7
MOS Transistor as a Switch
VGS ≥ VTRon
ID VGS = VDD
S D
VDS
VDDVDD /2
Rmid
R0
mideq RRR 02
1
Lecture 3 13
21
212
1
DDDSAT
DD
DDDSAT
DDeq VI
VVI
VR
DD
DSAT
DDeq V
IV
R65
143
Gate-Channel CapacitanceG
CGC
G
CGC
G
CGC
S D S D S D
Cut-off Resistive Saturation
CGCB CGCS CGCD
EECS 427 F09 Lecture 3 14
Off/Lin Cgate = Cox·W·Leff
Textbook: page 109
Sat Cgate = (2/3)·Cox·W·Leff ox
oxox t
C
8
Gate Overlap CapacitancePolysilicon gatePolysilicon gate
xd xd
L d
Top view
Gate-bulkoverlap
Source
n+
Drain
n+W
xd xd
L d
Top view
Gate-bulkoverlap
Source
n+
Drain
n+W
tox
n+ n+
Cross section
L
Gate oxidetox
n+ n+
Cross section
L
Gate oxide
EECS 427 F09 Lecture 3 15
doxO xCC
Top viewTop view
Off/Lin/Sat CGSO = CGDO = CO·W
Diffusion Capacitance
Side wall
NA+
Bottom
Side wallChannel
Source
Substrate
W
LS
ND
xj
EECS 427 F09 Lecture 3 16
NA
Cdiff = Cbottom + Csw
= Cj · AREA + Cjsw · PERIMETER
Off/Lin/Sat Cdiff = Cj·LS·W + Cjsw·(2LS+W)
9
Computing the Capacitances
VDD
VDD
13
Miller effect
M3
M4
M1
M2
Cw Cg3Cdb1
Cg4
Vout2
Cdb2
VinVout
Cgd12
2
3
Reverse
Off Sat (M4)
Lin (M3)
4
No Miller
EECS 427 F09 Lecture 3 17
FanoutVoutVin
CL
SimplifiedModel
biased junction
No Miller effect
Propagation Delay(Approach 1)
VDD
Vout
CLI
tpHL = CL Vswing/2
Iav
CL
kn VDD
~
EECS 427 F09 Lecture 3 18
Vin = VDD
CLIav kn VDD
10
Propagation Delay(Approach 2)
VDD
Vout
R
CL
tpHL = f(Ron.CL)
= 0.69 RonCL
Vout
VDD1
ln(0.5)
EECS 427 F09 Lecture 3 19
Vin = VDD
Ron
t
DD
RonCL
0.5
0.36
Transient Response
3 ?
1
1.5
2
2.5
Vo
ut(V
)
tpHL = 0.69 CL Reqn
tpLH = 0.69 CL Reqp
?
tpLHtpHL
EECS 427 F09 Lecture 3 20
0 0.5 1 1.5 2 2.5
x 10-10
-0.5
0
0.5
t (sec)
11
Delay as a Function of VDD
5.5
2 5
3
3.5
4
4.5
5
t p(n
orm
aliz
ed
)
EECS 427 F09 Lecture 3 21
0.8 1 1.2 1.4 1.6 1.8 2 2.2 2.41
1.5
2
2.5
VDD
(V)
Device Sizing
3.6
3.8x 10
-11
(for fixed load)
2.6
2.8
3
3.2
3.4
3.6
t p(s
ec)
( )
Self-loading effect:Intrinsic capacitancesdominate
EECS 427 F09 Lecture 3 22
2 4 6 8 10 12 142
2.2
2.4
S
dominate
12
PMOS/NMOS Ratio
5x 10
-11
4
4.5
t p(s
ec)
tpLH tpHL
tp = Wp/Wn
EECS 427 F09 Lecture 3 23
1 1.5 2 2.5 3 3.5 4 4.5 53
3.5
Input Rise Time0.35
t pH
L(n
sec
)
0.3
0.25
0.2
EECS 427 F09 Lecture 3 24
0.15
trise (nsec)10.80.60.40.20
tp = tstep(i) + tstep(i-1)
13
Static CMOS Circuits
At every point in time (except during the switching transients) each gate output is connected to eithertransients) each gate output is connected to eitherVDD or Vssvia a low-resistive path.
The outputs of the gates assume at all times the value of the Boolean function, implemented by the circuit (ignoring, once again, the transient effects during switching periods).
This is in contrast to the dynamic circuit style which
EECS 427 F09 Lecture 3 25
This is in contrast to the dynamic circuit style, which relies on temporary storage of signal values on the capacitance of high impedance circuit nodes.
Static CMOSVDD
I
F(In1,In2,…InN)
In1
In2
InN
In1
In2
InN
PUN
PDN
PMOS only
NMOS only
EECS 427 F09 Lecture 3 26
PUN and PDN are dual logic networksPUN and PDN functions are complementary
14
Threshold DropsVDD
PUNVDD
VS D
VDD 0PDN
0 VDD
CL
0 VDD - VTn
CL
VDD
VDD |VTp|
D SVGS
V
EECS 427 F09 Lecture 3 27
CLVDDCL
S
SD
D
VGS
NAND Gate
EECS 427 F09 Lecture 3 28
PDN: G = AB Conduction to GND
PUN: F = A + B = AB Conduction to VDD
G(In1,In2,In3,…) ≡ F(In1,In2,In3,…)
15
NOR Gate
EECS 427 F09 Lecture 3 29
Complex CMOS Gate
B
OUT = D + A • (B + C)
A
D
AC
EECS 427 F09 Lecture 3 30
D
B C
16
CMOS Properties
• Full rail-to-rail swing; high noise margins• Logic levels not dependent upon the relativeLogic levels not dependent upon the relative
device sizes; ratioless• Always a path to Vdd or Gnd in steady state;
low output impedance• Extremely high input resistance; nearly zero
steady-state input current
EECS 427 F09 Lecture 3 31
• No direct path steady state between power and ground; no static power dissipation
• Propagation delay function of load capacitance and resistance of transistors
Input Pattern Affects Delay
• Delay is dependent on th tt f i tthe pattern of inputs
• Low to high transition– both inputs go low
• delay is 0.69 Rp/2 CL
– one input goes low• delay is 0.69 Rp CL
CL
B
Rn
A
Rp
B
Rp
R
EECS 427 F09 Lecture 3 32
• High to low transition– both inputs go high
• delay is 0.69 2Rn CL
A
Rn Cint
17
Delay Dependence on Input Patterns
3Input Data Delay
0.5
1
1.5
2
2.5 A=B=10
A=1, B=10
A=1 0, B=1
Vol
tage
[V
]
Input Data
Pattern
Delay
(psec)
A=B=01 67
A=1, B=01 64
A= 01, B=1 61
A=B=10 45
EECS 427 F09 Lecture 3 33
-0.5
00 100 200 300 400
time [ps]
A=1, B=10 80
A= 10, B=1 81
NMOS = 0.5m/0.25 mPMOS = 0.75m/0.25 mCL = 100 fF
Transistor Sizing
R R R
CL
B
Rn
A
Rp
B
Rp
R
B
Rp
A
Rp
R R C
Cint
2
2 2 4
4
EECS 427 F09 Lecture 3 34
A
Rn Cint
A
Rn
B
Rn CL21
1
18
Transistor Sizing
OUT = D + A • (B + C)
D
A
B
C
4
4
8
8
EECS 427 F09 Lecture 3 35
D
A
B C
1
2
2 2
Transistor Sizing
OUT = D + A • (B + C)
D
A
B
C
6
3
6
6
EECS 427 F09 Lecture 3 36
D
A
B C
1
2
2 2
19
Fan-In Considerations
DCBA
C
B
A CL
C3
C2
Distributed RC model(Elmore delay)
tpHL = 0.69 Reqn(C1+2C2+3C3+4CL)
EECS 427 F09 Lecture 3 37
D C1
pHL eqn( 1 2 3 L)
Propagation delay deteriorates rapidly as a function of fan-in – quadraticallyin the worst case.
Fast Gates Design Technique
• Transistor sizing– as long as fan-out capacitance dominates
• Progressive sizing
InN CLMNDistributed RC line
M1 > M2 > M3 > … > MN(the FET closest to the
EECS 427 F09 38
C3
C2
C1In1
In2
In3
M1
M2
M3
(the FET closest to theoutput is the smallest)
Can reduce delay by more than 20%; Be careful: input loading, junction caps, decreasing gains as technology shrinks
20
Fast Gates Design Technique
• Transistor ordering
C2In2
In3
M2
M3 CL
C2In2
In1
M2
M3 CL
critical path critical path
charged1
charged1
1
01 charged
discharged
EECS 427 F09 Lecture 3 39
C1In1 M1 C1
In3 M101
charged
delay determined by time to discharge CL, C1 and C2
delay determined by time to discharge CL
1 discharged
Fast Gates Design Technique
• Alternate logic structures
F = ABCDEFGH
EECS 427 F09 Lecture 3 40
21
Fast Gates Design Technique
• Isolating fan-in from fan-out using buffer insertion
CLCL
EECS 427 F09 Lecture 3 41
Fast Gates Design Technique
• Reducing the voltage swing
– linear reduction in delay– also reduces power consumption
B t th f ll i t i h l !
tpHL = 0.69 (3/4 (CL VDD)/ IDSATn )
= 0.69 (3/4 (CL Vswing)/ IDSATn )
EECS 427 F09 Lecture 3 42
• But the following gate is much slower!• Or requires use of “sense amplifiers” on the
receiving end to restore the signal level (memory design)
22
Summary
• CMOS is the dominant circuit family due to:N i i– No static power consumption
– Ease of design
– Robust to variations and noise
• CAD2 due next Monday at 7 pm
• HW1 due next Wednesday at 1:30 pm
EECS 427 F09 Lecture 3 43
• Form a group. Email zhengya at eecs.umich.edu