layout design rule

112/04/07 1

VLSI Design and Layout PracticeVLSI Design and Layout PracticeLect5 – Stick Diagram & Scalable Lect5 – Stick Diagram & Scalable

Design RulesDesign Rules

VLSI DESIGN112/04/07 2

IC Layout Concept and Examples

I. Stick Diagram II. Design Rules III. Layout Verification


A. Basic Concept 1. Based on the view point of IC layout, the

stick diagram can help us understand the circuit function and its geometrical location relative to other circuit blocks.

Legend:

contact

metal 2

metal 1

poly

ndiff

pdiff

VDD

in

VSS

out

■


A. Basic Concept 2. Although the stick diagram is an abstract

presentation of real layout, it can use graphical symbols or legend to allocate the circuit to 2-diomensional plane and reach the aim same as the physical layout does.

3. The stick diagram is similar to a backbone of the real layout but without the real size and aspect ratio of the devices, it still can reflect the real condition to layout of the silicon chip.


B. Notations of the stick diagram


Stick Diagram Intermediate representation

between the transistor level and the mask (layout) level.

Gives topological information (identifies different layers and their

relationship) Assumes that wires have no width. It is possible

to translate stick diagram automatically to layout with correct design rules.


Stick Diagram

1. When the same material (on the same layer) touch or cross, they are connected and belong to the same electrical node.

2. When polysilicon crosses N or P diffusion, an N or P transistor is formed. Polysilicon is drawn on top of diffusion. Diffusion must be drawn connecting the source and the drain. Gate is automatically self-aligned during fabrication.


Stick Diagram

3. When a metal line needs to be connected to one of the other three conductors, a contact cut (via) is required.


Stick Diagram 4. Manhattan geometrical rule: When we use only

vertical and horizontal lines In orthogonal to describe circuitry.

Boston geometrical rule: The stick diagram also allows curves to describe circuitry.

5. In order to describe N/PMOS more completely, to add n-well 、 P+ select 、 well contact and substrate contact are optional for 4-terminal

notation.


Conclusion

1. Stick diagram is a draft of real layout, it serves as an abstract view between the schematic and layout.

2. Stick diagram uses different lines, colors and geometrical shapes to present circuit nodes, devices, and their relative location.

3. Stick diagram doesn’t include information about the accurate coordinates and sizes of device, the length and width of conductors and the real size of well region.


CMOS Inverter Stick Diagrams

Basic layout

․ More area efficient layout


CMOS inverter described in other way.

VDD

in

VSS

out

CMOS Inverter Stick Diagrams


CMOS Transmission Gate

The transmission gate Circuit schematic Stick diagram


CMOS Stick DiagramsNAND/NOR


CMOS Stick DiagramsNAND


< Exercise 1 >

To draw the following circuitry by using a stick diagram


< Exercise 2 > To draw the stick diagram and the schematic for the following layout

NWELL

NSELECT

PSELECT

POLY

ACTIVE

METAL1

NWELL

NSELECT

PSELECT

POLY

ACTIVE

METAL1


CMOS Stick DiagramsNOR


CMOS Inverter Mask Layout

Min. spacing andline width consideration


Lambda-based Design Rules

Lambda design rules are based on a reference metric λthat has units of um.

All widths, spacing and distances are written in the form Value = m λ

Where m is scaling multiplier.<e.g.> λ= 1um w = 2 λ=2um s = 3λ=3um


Lambda based design: half of technology since 1985. As technologychanges with smaller dimensions, a simple change in the value of canbe used to produce a new mask set.

All device mask dimensions are based on multiples of , e.g., polysilicon minimum width = 2. Minimum metal to metal spacing = 3

6

2

6

3

3

Lambda-based Design Rules


Active Contact and Surround Rule


Potential Problem - Misalignment


Potential Problem – Short between Source and Drain


Design Rule (0)

Due to the photo resolution, concentration, temperature and reaction time of the chemical reagents, the layout should tolerate some errors caused by process environment.

In order to avoid the influence from process variation, the layout of the circuit schematics should follow the design Rule。


The purpose of design rules

Ref. Jan M. Rabaey, et. al, © Digital Integrated Circuits 2nd Edition

Interface between designer and process engineer

Guidelines for constructing process masks

Unit dimension: Minimum line width scalable design rules: lambda parameter absolute dimensions (micron rules)


Design Rules(1)

Layout rules are used for preparing the masks for fabrication. Fabrication processes have inherent limitations in accuracy. Design rules specify geometry of masks to optimize yield and

reliability (trade-offs: area, yield, reliability). Three major rules:

Wire width: Minimum dimension associated with a given feature.

Wire separation: Allowable separation. Contact: overlap rules.


Design Rules(2)

Two major approaches: “Micron” rules: stated at micron

resolution. rules: simplified micron rules with

limited scaling attributes. may be viewed as the size of minimum

feature. Design rules represents a tolerance which

insures very high probability of correct fabrication (not a hard boundary between correct and incorrect fabrication).

Design rules are determined by experience.


Terminology & Definition

Min. Width : The min. width of the line (layer)

<Example> Wpoly(min.) = 0.5um

Min. Space : The min. spacing between lines with same material

<Example> Spoly-poly(min.) = 0.5um


<Min. Extension : The min. extension over different layers

<Example> Poly-gate extension over diffusion area = 0.55um

Min. Overlap : The overlap between different layers

<Example> Poly1 overlap Poly2 min. = 0.7um




Max. area of the specific region. <Example> Bonding Pad Area, max. =

100um x 100um


Conventional Layer Definition

Layer

Polysilicon

Metal1

Metal2

Contact To Poly

Contact To Diffusion

Via

Well (p,n)

Active Area (n+,p+)

Color Representation

Yellow

Green

Red

Blue

Magenta

Black

Black

Black

Select (p+,n+) Green

Layer

Polysilicon

Metal1

Metal2

Contact To Poly


Via

Well (p,n)

Active Area (n+,p+)


Yellow

Green

Red

Blue

Magenta

Black

Black

Black


Layer

Polysilicon

Metal1

Metal2

Contact To Poly


Via

Well (p,n)

Active Area (n+,p+)


Yellow

Green

Red

Blue

Magenta

Black

Black

Black



SCMOS Design Rules

IntraIntra--Layer Design RulesLayer Design Rules

Metal24

3

10

90

Well

Active3

3

Polysilicon

2

2

Different PotentialSame Potential

Metal13

3

2

Contactor Via

Select

2

or6

2Hole

Ref. Jan M. Rabaey, et. al, © Digital Integrated Circuits 2nd Edition


SCMOS Design Rules

1

2

1

Via

Metal toPoly ContactMetal to

Active Contact

1

2

5

4

3 2

2


SCMOS Design Rules

1

3 3

2

2

2

WellSubstrate

Select3

5


SCMOS Design Rules


MOSIS Layout Design Rules

MOSIS design rules (SCMOS rules) are available at http://www.mosis.org.

3 basic design rules: Wire width Wire separation Contact rule

MOSIS design rule examples


III. Layout Verification

A. Definition DRC – Design Rule Check ERC – Electrical Rule Check LVS – Layout Versus Schematic LPE – Layout Parameter

Extraction


Layout Verification

B. DRC(Design Rule Check) ： => To check the min. line width

and spacing based on the design rules.

C. ERC(Electrical Rule Check) ： => To check the short circuit

between Power and Ground, or check the floating node or devices.


Layout Verification

D. LVS(Layout versus Schematic) ： => To verify the consistency between

Schematic and Layout. For example ： to check the amount of transistor numbers, sizes of W/L.

E. LPE or PEX(Layout Parameter Extraction) ：

=> From the database of layout, to extract the devices with parasitics including effective W/L, parasitic capacitances and series resistance. The extracted file is in SPICE format and can be used for Post-Layout Simulation 。


Layout Verification

F. SimulationsPre-Layout Simulation - before layout workPost-Layout Simulation – after layout work, post layout simulation will reflect more realistic circuit performance.


Layout Verification

The complete design environment of Fill-Custom Design Design database – Cadence Design Framework IICircuit Editor – Text editor/Schematic editor (S-edit, Composer)Circuit Simulator – SPICE,TSPICE, HSPICELayout Editor – Cadence Virtuoso, Laker, L-editLayout Verification Diva, Dracula, Calibre, Hercules


Concluding Remarks Milestones technology in silicon era

Transistor Integrated Circuits CMOS Technology Key weapons in SOC era

Design Automation Design Reuse

Breakthrough techniques in design automation Simulation (e.g., SPICE, Verilog-XL, etc.) Automatic Placement and Routing (APR) Logic Synthesis (e.g., Design Compiler) Formal Verification Test Pattern Generation

It is EDA that pushes the IC design technology forward !

VLSI DESIGN

Design rules and Layout Why we use design rules?

Interface between designer and process engineer

Guidelines for constructing process masks

VLSI DESIGN

Design RulesMinimum length or width of a feature on a layer is 2

Why?

To allow for shape contraction

Minimum separation of features on a layer is 2

Why?

To ensure adequate continuity of the intervening materials.

VLSI DESIGN

Design RulesMinimum width of PolySi and diffusion line 2Minimum width of Metal line 3 as metal lines run over a more

uneven surface than other conducting layers to ensure their continuity

Metal

Diffusion

Polysilicon

VLSI DESIGN

Design RulesPolySi – PolySi space 2Metal - Metal space 2Diffusion – Diffusion 3 To avoid the possibility of their

associated regions overlapping and conducting current

Metal

Diffusion

Polysilicon

VLSI DESIGN

Design RulesDiffusion – PolySi To prevent the lines overlapping to

form unwanted capacitorMetal lines can pass over both diffusion and polySi

without electrical effect. Where no separation is specified, metal lines can overlap or cross

Metal

Diffusion

Polysilicon

VLSI DESIGN

Metal Vs PolySi/Diffusion

Metal lines can pass over both diffusion and polySi without electrical effect

It is recommended practice to leave between a metal edge and a polySi or diffusion line to which it is not electrically connected

Metal

Polysilicon

VLSI DESIGN

poly-poly spacing 2

diff-diff spacing 3 (depletion regions tend to spread

outward) metal-metal spacing 2

diff-poly spacing

Review:

VLSI DESIGN

Note

Two Features on different mask layers can be misaligned by a maximum of 2 on the wafer.

If the overlap of these two different mask layers can be catastrophic to the design, they must be separated by at least 2

If the overlap is just undesirable, they must be separated by at least

VLSI DESIGN

When a transistor is formed?

Gate is formed where polySi crosses diffusion with thin oxide between these layers.

Design rules

min. line width of polySi and diffusion 2

drain and source have min. length and width of 2

And

VLSI DESIGN

The polySi of the gate extends 2 beyond the gate area on to the field oxide to prevent the drain and source from shorting.

no overlap overlap

diffusionshort

• Diffusion Problems

PolySi extends in the gate region…

VLSI DESIGN

Depletion TransistorWe need depletion implant

An implant surrounding the Transistor by 2

Ensures that no part of the transistor remains in the enhancement mode

A separation of 2 from the gate of an

enhancement transistor avoids affecting

the device.

2

VLSI DESIGN

Depletion Transistor

Implants are separated by 2to prevent them from merging

2

VLSI DESIGN

Butting Contact

The gate and source of a depletion device can be connected by a method known as butting contact. Here metal makes contact to both the diffusion forming the source of the depletion transistor and to the polySi forming this device’s gate.

Advantage:

No buried contact mask required and avoids

associated processing.

VLSI DESIGN

Butting Contact

n+ n+

Insulating Oxide

Metal

Gate Oxide PolySi

Problem: Metal descending the hole has a tendency to fracture at the polySi corner, causing an open circuit.

VLSI DESIGN

Buried Contact

It is a preferred method. The buried contact window defines the area where oxide is to be removed so that polySi connects directly to diffusion.

Contact Area must be a min. of 2*2to ensure adequate contact area.

2

2

Contact Area

VLSI DESIGN

Buried Contact

The buried contact window surrounds this contact by in all directions to avoid any part of this area forming a transistor.

Separated from its related transistor gate by to prevent gate area from being reduced.

VLSI DESIGN

Buried Contact

Here gate length is depend upon the alignment of the buried contact mask relative to the polySi and therefore vary by .

2

2

Channel length Channel length PolySi

Buried contactBuried contact

Diffusion

VLSI DESIGN

Contact CutMetal connects to polySi/diffusion by contact cut.

Contact area: 22

Metal and polySi or diffusion must overlap this contact area by so that the two desired conductors encompass the contact area despite any mis-alignment between conducting layers and the contact hole

4

VLSI DESIGN

Contact CutContact cut – any gate: 2apart

Why? No contact to any part of the gate.

4

2

VLSI DESIGN

Contact Cut

Contact cut – contact cut: 2apart

Why? To prevent holes from merging.

2

VLSI DESIGN

Rules for CMOS layout

Similar to those for NMOS except No

1. Depletion implant

2. Buried contact

Additional rules

1. Definition of n-well area

2. Threshold implant of two types of transistor

3. Definition of source and drains regions for the NMOS and PMOS.

VLSI DESIGN


To ensure the separation of the PMOS and NMOS devices,

n-well supporting PMOS is 6away from the active area of NMOS transistor.

Why?

Avoids overlap of the associated regions

n-welln+ 6

VLSI DESIGN


2

2

N-well must completely surround the PMOS device’s active area by 2

VLSI DESIGN


2

2

The threshold implant mask covers all n-well and surrounds the n-well by

VLSI DESIGN


2

2

The p+ diffusion mask defines the areas to receive a p+ diffusion.

It is coincident with the threshold mask surrounding the PMOS transistor but excludes the n-well region to be connected to the supply.

VLSI DESIGN

Rules for CMOS layoutA p+ diffusion is required to effect the ground connection to the substrate. Thus mask also defines this substrate region. It surrounds the conducting material of this contact by

4

VLSI DESIGN


Total contact areaTotal contact area == 24

Neither NMOS nor CMOS usually allow contact cuts to the gate of a transistor, because of the danger of etching away part of the gate

layout design rule

Documents

process engineer

cmos stick

scalable design

design rule

basic concept

layout simulation

vlsi design

stick diagram