jan m. yarrison-rice physics dept. miami university/university of cincinnati raith 150 user meeting...
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Jan M. Yarrison-RiceJan M. Yarrison-RicePhysics Dept.Physics Dept.
Miami University/University of Miami University/University of CincinnatiCincinnati
Raith 150 User MeetingStanford University
September 29 & 30, 2003
A Novice’s View of E-Beam A Novice’s View of E-Beam LithographyLithography
w/ Sebastian Mackowski & Scott Masturzo -- UC
Brief History of Raith 150 at Brief History of Raith 150 at University Of CincinnatiUniversity Of Cincinnati
• NSF MRI Grant funded August 2002
• Instrument installed July 2003
• Initial training sessions July 7-11
• Small groups (2-3) begin design & exposure July to present
2 micron squares exposed on silicon w/ 100 nm PMMA
Research InterestsResearch Interests• Surface Enhanced
Microscopies, e.g. SERS
• Pickup Coils for Magnetic Field Sensing
• Electrochemical Sensing
• Photonic Bandgap (PBG) Structures Exposure Schedule for Dimers
Lithographic RequirementsLithographic Requirements
• 50 to 200 nm feature sizes
• Inter-feature spacing as small as
50 nm
• Pattern on ITO glass, silicon, or silicon nitride/dioxide
Exposure and ProcessingExposure and Processing
Silicon Dioxide
PMMA
Silicon
a) b)Exposed Resist
c)d)
Developed Resist Etched Silicon Dioxide
Evaporated Metal Completed Co-planar Electrodes
e)f)
Prepared Silicon Wafer
E-beam SourceE-beam Source
Source PropertiesSource Propertiessource type brightness
(A/cm2/sr)source size energy spread
(eV)vacuum
requirement(Torr)
tungsten thermionic
~105 25 um 2-3 10-6
LaB6 ~106 10 um 2-3 10-8
thermal (Schottky) field emitter ~108 20 nm 0.9 10-9
cold field emitter ~109 5 nm 0.22 10-10
Block Diagram of E-beamBlock Diagram of E-beam
E-Beam ColumnE-Beam Column
Charging on SampleCharging on Sample
Exposure MatricesExposure Matrices
Proximity EffectProximity Effect
Evidence of ProximityEvidence of Proximity
Methods around Methods around ProximityProximity
Other MethodsOther Methods
Surface Enhanced Surface Enhanced SpectroscopySpectroscopy
Nanoscale sample
SIL lens
Microscopeobjective
Spectrometer
Ag nanoparticlearray
Bottom view of SILlens with nanoparticle array3 axis
Stage
Laser
CCD
View of Entrance Slit(rotation of etalon shiftsrows of spectra into slit)
800 pixels
2000 pixels
View of CCD camera
Surface Enhanced MicroscopiesSurface Enhanced Microscopies• Dimers – sharp edged
doublets
• Ag or Au - on glass for optical access
• Size determined by plasmon frequency of nonlinear system
Challenges..Challenges..– Sharp corners– Closely spaced
nanoparticles 100 nm square dimers separated by 50 nm
Pick-Up CoilsPick-Up Coils• Contact Pads (~200 m)
• Coil lines (300 - 400 nm)
• Challenges:– Sharp corners– Proximity effect of multiple
lines– Overlap of write-fields
Pick-up coil from a Distance
Pick-Up Coil – Close UpPick-Up Coil – Close Up
Electro-Chemical SensorsElectro-Chemical Sensors• Interdigitated Arrays
– Long 100 to 500 nm thick fingers w/ ~50 nm separation
– Large contact Pads separated by mm
– Au or Ag on glass
Top: 500 nm digits, Bottom: 200 nm digits
Interdigitated Array #1Interdigitated Array #1• 200 nm digits
• Separation 200 nm
• 495 PMMA A12 on Silicon ~100 nm thick
Challenges -Challenges - – Strong proximity effect– Write field overlap– Very different sized
structures combined
Interdigitated Array #2Interdigitated Array #2• 150 nm digits
• Separated by 400 nm
• ITO on Glass
• 495 PMMA A12 to 100 nm thick
PBG StructuresPBG Structures• 2D arrays of etched
pores
• Particular Structures of Interest include:– De-multiplexer– Polarization Switching– Microcavity for
Sensing
Oxide cover layer (75nm)
Nitride core (250 nm)
Oxide buffer (1.8m)
Substrate
nm
nm
nm
nm
y
x
PBG Structure PBG Structure RequirementsRequirements
• 2D Triangular arrays of 150 nm etched holes• Pitch ~ 250 nm• Silicon nitride/silicon dioxide planar waveguide
substrate
Challenges -Challenges - – Large field patterning – write field overlap &
registration– Two-step etching process
Lithography ChallengeLithography Challenge• Best practices to make small,
closely spaced features – Design of structure– Dosage choices– Aperture choice– Resist
• What we have tried to date– Dosage schedules within feature for proximity– Lines around area features to sharpen edges– Dots and their use to sharpen corners
Other Challenges..Other Challenges..
EVERYTHING else!!
- from making contacts, to metallic coatings, to liftoff
All advice is welcome!All advice is welcome!