isir tanaka lab. tatsuya hori 層状鉄酸化物を用いた電子相変化デバイスの...
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ISIR Tanaka lab.Tatsuya Hori
層状鉄酸化物を用いた電子相変化デバイスの応用に向けた研究
Differences between semiconductor device andElectronic phase transition device (EPT device).
・ Semiconductor device Current control is main feature.
・ EPT device Transition induce drastic changing of physical property. Unprecedented almost all new device. (Not only current control)
Semiconductor EPT devices
・ Scaling merit
( 電子相変化デバイス )
What are EPT devices?
Stimulation(T, H, E, N)
H2O: Ice
Electrons: Insulator
Water
Metal
Applying the transition of stable electronic phase for electronics
Necessity for invention of EPT device
Considerable expectations…But only few device works in RT has invented
Conceivable applications
・ Optical switch・ Photochromic devices・ Magnetic modulators・ ESD protection devices・ etc…
Candidate material for EPT device
240 320 350 500KCharge order 3D charge-ordering 2D charge-ordering Dielectricity anti-ferroelectric paraelectric Magnetic property
ferrimagnetic paramagnetic
Fe/O double layerFe3+:Fe2+=1:1
Re/O
?
+ −Interaction
+or
c ab
ReFe2O4
(Re = Dy, Ho, Er, Tm, Yb, Lu, Y)
We can get the charge-ordering in room temperature. (= the state electrons are frozen)
Electronic field induced resistive switching in RT
L. J. Zeng et al., EPL 84, 57011 (2008).
Electronic phase transition Resistive switching
Motivations
・ Fabricating the ReFe2O4 thin films, then observing the resistive switching phenomenon.
・ For the electronics applying, investigate the switching phenomenon
What is PLD method?
Substrate
Target
Heater
Plasma plume
Gases
Feature・ Suitable for high-melting-point materials.・ Easy to control thickness.・ In situ RHEED observation.・ etc…
Lase
rRecipeLaser medium: ArF (l = 193nm)Tsub = 950˚C, pO2 = 1×10−4 PaPost-annealing: 800˚C, in vacuum (b.p. ~ 1×10−5 Pa)
I could fabricate LuFe2O4 and YbFe2O4 thin films.
1/2Re2O3+2Fe+5/2O2 ReFe2O4
10 20 30 40
HoFe2O4 ErFe2O4 YbFe2O4 LuFe2O4
Inte
nsity
(ar
b. u
nit)
2 (deg.)
10-7
10-6
10-5
10-4
10-3
log(
PO
2/(P
a))
Ho Er Tm Yb LuY
Out-of-plane 2q/q scan
Achievable in our chamber
** ***
* *
(003
)
(006
)
(009
)
I succeeded in fabrication of LuFe2O4 and YbFe2O4 thin film.The orientation is ReFe2O4[001]//YSZ[111]
T = 1470 K
*
*
*
Revelation of charge-ordering
2.5 3 3.5 4 4.5 51
10
102
103
104
105
1000/Temperature (K-1)
Res
istiv
ity (
cm)
2.5 3 3.5 4 4.5 5
100
101
102
103
104
Res
istiv
ity (
cm
)
1000/Temperature (K-1)
Electron transport properties are same as that of bulks’. Existence of charge-ordering confirmed.
LuFe2O4 YbFe2O4
Resistive switching phenomenon was observed
Vsample
-50 -40 -30 -20 -10 0 10 20 30 40 50-1
-0.5
0
0.5
1
Voltage (V)
Cur
rent
(m
A)
-50 -40 -30 -20 -10 0 10 20 30 40 50-1
-0.5
0
0.5
1
Voltage (V)
Cur
rent
(m
A)
At 285 K 1st
-50 -40 -30 -20 -10 0 10 20 30 40 50-1
-0.5
0
0.5
1
Voltage (V)
Cur
rent
(m
A)
At 285 K 1st 2nd
-50 -40 -30 -20 -10 0 10 20 30 40 50-1
-0.5
0
0.5
1
Voltage (V)
Cur
rent
(m
A)
At 285 K 1st 2nd 3rd
Interrelation between charge-ordering and switching
250 300 350 400
104
T (K)
Eth
(V
/cm
)3D 2D
250 300 350 400104
105
T (K)
Eth
(V
/cm
)
3D 2D
40
0.4
0 V (V)I (
mA
)
310K
40
0.4
0V (V)
I (m
A)
300K
LuFe2O4YbFe2O4
Resistive switching phenomenon is observed under 3D charge-ordering region
Conclusion
・ I successfully fabricated ReFe2O4 thin films and observed resistive switching phenomenon in two systems.
・ I got the data which imply switching phenomenon is observable under 3D charge-ordering region.
From the above, I revealed this kind of switching phenomenon is common property of these charge-ordering systems.
Fe/O double layer in ReFe2O4