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Spin-dependent transport inlayered magnetic metals
Patrick BrunoMax-Planck-Institut für Mikrostrukturphysik, Halle, Germany
Summary:
introduction: what is spin-electronics
giant magnetoresistance (GMR)
tunneling magnetoresistance (TMR)
hot-electron spin-transistor
magnetization switching due to spin-injection
ab initio calculations of perpendicular current GMR
domain wall magnetoresistance
theory of TMR
introduction: what is spin-electronics ?
what is an electron ?
particle with negative electric charge q = - e
and spin 1/2 (magnetic moment m = µ B )
-----
- ------
- - + =
-----
- -electron as seen by an electronician:
electronics = manipulation of electronsby using their charge for storage andprocessing of information
the spin is (almost) completely neglected
principal electronic device: MOSFET
inconvenients: volatility of the information
energy consumption
limited density of information
application:logic gates
random access memory
semi-conductor (Si)
oxide(SiO2)metallic gate
conducting channel(2D electron gas)
source drain
transistor blocked
+- metallic gate
-----
- -electron as seen by a magnetician:
purpose of magnetism: develop materials in which the electron spinstend to align parallel to each (magnets)
the charge of the electrons plays a secondary role
application: mass storage of information
(magnetic disks and tapes)
advantages:non-volatility
high storage density
no energy consumption
inconvenients:mechanical access to information
Purpose of spin-electronics: ``Teaching electrons new tricks´´
combine electronics and magnetism in order to make new devicesin which both the charge and the spin of the electron play an active role
new fundamental physical questions
new phenomena
new devices and applications
giant-magnetoresistance
Giant magneto-resistance (GMR)
current perpendicularto the plane (CPP)
current in-plane(CIP)
ferromagnetic metal (Fe, Co, ...)
non-magnetic metal (Cu, Ru, ...)
Baibich et al., PRL 61, 2472 (1988)
Binasch et al., PRB 39, 4828 (1989)
definition conventions for the magnetoresistance ratio
P
PAPR
RRA
−=
AP
PAPR
RRA
−=
PAP
PAPRRRR
A+−=
H
R
``optimistic´´ definition
``pessimistic´´ definition
reasonable definition
Ni80Co20 / Ru / Ni80Co20
Parkin and Mauri, PRB 44, 7131 (1991)
interlayer exchange coupling
Parkin et al., PRL 64, 2304 (1990)
Co / Ru / Co
Barnas et al., Vacuum 41, 1241 (1990)
Co / Au / Co / Au(111)
GMR without interlayer exchange coupling
T = 130 K
T = 80 K
FM
FM
NM
AF
interfacial exchangeinteraction
Exchange biasing to an antiferromagnet
Diény et al., PRB 43, 1297 (1991)
FeNi
FeNi
Cu
FeMn
artificial AFstrong AFcoupling
weakcoupling
pinned FM layer
free FM layer
Biasing by artificial antiferromagnet
Applications of GMR: reading head for magnetic disks
1 GByte drive
Evolution of magnetic storage density
ferromagnetic (F) configuration
RF < RAF
antiferromagnetic (AF) configuration
mechanism of GMR: spin-dependent scatteringtwo-current model
FAF
FAFRRRR
A+−≡ can be larger than 50%
spin-dependent scattering probability
DOS
E
P↓ > P↑
DOS
E
P↑ > P↓
Fe1-xVx / Au / Co
x = 0
x = 0.18
x = 0.3
x = 0.3
Renard et al., PRB 51, 12821 (1995)
tunneling-magnetoresistance
θ
insulating barrier
ferromagnetic electrodes
Jullière, Phys. Lett. 54A, 225 (1975)Moodera et al., PRL 74, 3273 (1995)
Tunneling magneto-resistance (TMR)
Mechanism of tunneling magneto-resistance
parallel (P)configuration
antiparallel (AP)configuration
GP > GAP
"word" lines
"bit" lines
FM electrodes
tunnel barrier
Applications of TMR: magnetic random access memories (M-RAM)
hot-electron spin-transistor
hot-electron spin-transistor
Monsma et al. PRL 74, 5260 (1995)Science 281, 407 (1998)
magnetization switchingdue to spin-injection
Magnetization switching due to spin-injection
current density
differentialresistance
AF
F
Myers et al., Science 285, 867 (1999)Katine et al., PRL 84, 3149 (2000)
ab initio calculations of perpendicular current GMR
model considered:
L
M
M
ideal lead ideal leadcentral region (disorder, ...)
xy
z
periodic repetition of the supercell in x and y directions
current
↓↑ += CCC
),(1
////
2
//FT
Nhe
C εσσ kk∑=
( ) 1,0)0(0,0
)0(0,00,11 HGGHi −+ −=Γ
[ ]−+ ΓΓ= 1,11// Tr),( NNNF GGT εσ k
(spin-colinear case)
Conductances within the Landauer-Büttiker formalism
transmittance for spin σ, wavevector k// and energy εF :
0 1 N N+1
1,0H 1, +NNH+NG ,1
+++
)0(1,1NNG
+)0(0,0G
recursive calculation ofthe Green’s function
calculation of the surface Green’s function:layer addition (or removal) invariance→→→→ self-consistent (Dyson-like) equation
+
Computational details:
• density functional theory (local density approximation)
• TB-LMTO method (Green’s function)well adapted to surface problems
• imaginary energy for GF calculations: 10-7 Ry
• disordered systems:
- 5 x 5 supercell averaged over 5 configurations, or7 x 7 supercell averaged over 3 configurations
- on-site potential parameters obtained from (layer dependent) CPA method
• k// -integration: 10 000 points in the full fcc(001) SBZ
• definition of GMR ratio:AF
AFFCCC
GMR−≡
0
25
50
75
100
125
0 10 20 30 40 50
GM
R (
%)
Magnetic layer thickness (MLs)
0.0
0.2
0.4
0.6
0.8
1.0
0 10 20 30 40 50Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Magnetic layer thickness (MLs)
AFF↓↓↓↓
F↑↑↑↑
Cu∞ / Co / Cu / Co / Cu∞
variablethickness
5 ML
Cu Co ↑ Co ↓
110
115
120
0 10 20 30 40 50 60 70 80 90 100
GM
R (
%)
Spacer layer thickness (MLs)
0.22
0.23
0.24
0.25
0 10 20 30 40 50 60 70 80 90 100Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Spacer layer thickness (MLs)
AF
F↓↓↓↓
Cu∞ / Co / Cu / Co / Cu∞
5 ML variablethickness
100
125
15.0
175
200
0 2 4 6 8 10 12 14 16 18 20
GM
R (
%)
Number of repetitions
0.0
0.2
0.4
0.6
0.8
1.0
0 2 4 6 8 10 12 14 16 18 20Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Number of repetitions
AF
F↓↓↓↓
F↑↑↑↑
Cu∞ / (Co / Cu / Co / Cu) / Cu∞
5 ML
repeated N+1 times
30
60
90
120
0 2 4 6 8 10
GM
R (
%)
Spacer layer thickness (MLs)
0.0
0.2
0.4
0.6
0.8
1.0
0 2 4 6 8 10Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Spacer layer thickness (MLs)
AF (ideal)
AF (interdiffused)
F↑↑↑↑ (ideal)
F↑↑↑↑ (interdiffused)
F↓↓↓↓ (ideal)
F↓↓↓↓ (interdiffused)
interdiffused
ideal
Cu∞ / Co / Cu / Co / Cu∞
5 ML variablethickness
interfaces with15% interdiffusion
30
60
90
120
0 2 4 6 8 10
GM
R (
%)
Spacer layer thickness (MLs)
0.0
0.2
0.4
0.6
0.8
1.0
0 2 4 6 8 10Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Spacer layer thickness (MLs)
x= 0 (ideal)
x= 15%
x= 50%
AF (ideal)
F↓↓↓↓ (ideal)
F↑↑↑↑ (ideal)
AF (x=15%)
F↓↓↓↓ (x=15%)
F↑↑↑↑ (x=15%)
Cu∞ / Co / Cu(1-x)Pdx / Co / Cu∞
5 ML variablethickness
30
60
90
120
0 2 4 6 8 10
GM
R (
%)
Spacer layer thickness (MLs)
0.0
0.2
0.4
0.6
0.8
1.0
0 2 4 6 8 10Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Spacer layer thickness (MLs)
Co
Co85Ni15
AF (Co85Ni15)
AF (Co)F↓↓↓↓ (Co)
F↓↓↓↓ (Co85Ni15)
F↑↑↑↑ (Co)
F↑↑↑↑ (Co85Ni15)
Cu∞ / Co(1-x)Nix / Cu / Co (1-x)Nix / Cu∞
5 ML variablethickness
30
60
90
120
0 2 4 6 8 10
GM
R (
%)
Spacer layer thickness (MLs)
0.0
0.2
0.4
0.6
0.8
1.0
0 2 4 6 8 10Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Spacer layer thickness (MLs)
Co
Co85Cr15
F↑↑↑↑ (Co85Cr15)
F↑↑↑↑ (Co)
AF (Co)
AF (Co85Cr15)F↓↓↓↓ (Co85Cr15)
F↓↓↓↓ (Co)
Cu∞ / Co(1-x)Crx / Cu / Co (1-x)Crx / Cu∞
5 ML variablethickness
domain wall magnetoresistance
easy axis
Bloch wall
Néel wall
w
KA
w ∝
22 M
Aw
π∝
0
50
100
150
200
250
0 10 20
GM
R (
%)
Domain-wall thickness (MLs)
0.0
0.5
1.0
1.5
2.0
2.5
3.0
0 10 20Con
duct
ance
s / a
tom
(in
uni
ts e
/h)
2
Domain-wall thickness (MLs)
AF (wall)
F (no wall)
Co∞ / Co / Co∞
magnetic wall of variable thickness(linear rotation of magnetization)
electric current
atomic point contact
FM configuration
AF configuration
ferromagnetic wire
Giant magnetoresistance of ferromagnetic atomic point contacts
explaination requires:
• narrow magnetic wall in an atomic point contact
• large resistance due to a narrow wall
-1.0
-0.5
0.0
0.5
1.0
-1.0 -0.5 0.0 0.5 1.0
Mz
/ Ms
x / w0
unconstrained wall
constrained wall
geometrical constriction →→→→ new kind of magnetic wall:
structure (almost) entirely determined by the constriction geometry
energy = (almost) pure exchange energy
width determined by the characteristic size of the constriction
→→→→ wall can be extremely narrow in an atomic point contact
P. Bruno, PRL 83, 2425 (1999)
20 nm X 20 nm
theory of tunnelingmagnetoresistance
simple approach: Jullière modelθ
assumptions: ↓↑ += GGG
)()( 21 FFG ερερσ σσ∝
21 PPGGGG
APAP
PAP =+−≡
)()(
)()(
FF
FFPερερ
ερερ↓+↑
↓−↑≡
DOS
E
with
measurement of the spin-polarization byspin-injection into a superconductor
Soulen et al., Science 282, 85 (1998)
ab initio calculation of tunnel conductance
J. Henk (MPI Halle)
Ni / vacuum / Ni(001)
J. Henk (MPI Halle)
MgO
Fe
Fe / MgO / Fe(001)