UNIVERSITY CHAPTER NEWS

used old baby bottles as glassware, andmade optical equipment with pieces of oldcompact disks. The two students, alongwith Freedhoff, the current Chapter presi-dent, decided to contact local industriesand universities in addition to all scienceand engineering departments at their uni-versity in order to solicit equipment andmonetary donations. Thus far, publicityfor the event has been secured on campus,locally, and nationally, and the grouphopes to be able to contribute to every sci-ence and engineering department at theAteneo. The students find gratification inbeing able to encourage research and edu-cation in less-developed countries, plus theproject provides an environmentallyfriendly way of recycling equipment thatdonors no longer use.

The group is soliciting glassware, solarcalculators, pipettes, top-loading bal-ances, centrifuges, circulating pumps,ultraviolet lamps, thermometers, heatingmantels, heating tapes, chromatographs,spectrometers, refractometers, polarime-ters, microscopes, simple optics and elec-tronics, voltmeters, computer equipment(PC), technical journals, and other low-maintenance laboratory equipment.Monetary donations are also accepted tohelp cover shipping expenses and thepurchase of disposable items such as pH

To donate equipment or money for the Philippines projectContact Michal Freedhoff at 716-275-2980, e-mail: frem@uhura.cc.rochester.edu; KristenKulinowski at 716-244-1778, e- mail: krsk@DBl.cc.rochester.edu; or Sean Moran at 716-275-3027.

Checks and money orders can be made payable to the "University Outreach Society" andsent to one of the students listed above, c/o Department of Chemistry, University ofRochester, 404 Hutchinson Hall, Rochester, NY 14627; receipts and bank statements areavailable upon request.

Contact the students involved before sending equipment to ensure that the particular items are needed.

paper, batteries, and pipettes.The shipment date is tentatively sched-

uled for early July 1995.MICHAL FREEDHOFF

UC—Berkeley Chapter Preparesfor Exceptional Teaching Award

For the third semester, the MRS Chapterat the University of California— Berkeleyis gathering information and distributing aCourse Evaluation Guide providing detailson each class offered in the Department ofMaterials Science and Mineral Engineer-ing. Both undergraduate and graduate stu-dents participate in the evaluation project.The Chapter further uses the informationin order to choose a faculty member for theExceptional Teaching Award. TimothySands was the most recent (and first) recip-ient of the Award.

The evaluation includes an overall rat-ing for the course, the professor's teach-ing ability and clarity, the teaching assis-tants' instructing qualities, the textbook,and the homework assignments andexams. Recipients are chosen by tallyingup scores based on the evaluation foreach professor. Each recipient's name isengraved in a plaque the Chapter createdthat hangs in the department office. Therecipient for the Spring semester willreceive the award this Fall. •

Send MRS University Chapter andSection News to: Editor, MRSBulletin, Materials Research Society,9800 McKnight Road, Pittsburgh,PA 15237-6006. Fax: (412) 367-4373;e-mail: Bulletin@mrs.org.

CONFERENCE REPORT

International Workshop Illustrates Progress in Determination of 2-D Dopant ProfilesThe third international workshop on

the Measurement and Characterization ofUltra-Shallow Doping Profiles in Semi-conductors was held at Research TrianglePark, North Carolina on March 20-22,1995. The workshop was chaired by JimEhrstein of the National Institute ofStandards and Technology (NIST), RajivMathur of Intel, and Gary McGuire ofMicroelectronic Center of North Carolina(MCNC). The meeting was attended by135 people from 10 countries, and 51papers and posters were presented.Refereed versions of the papers willappear in a single issue of Journal ofVacuum Science and Technology, as has thepapers from the previous two workshopsin this series.

This workshop, which has been heldbiennially since 1991, has the special char-acter that it focuses on a single topic,dopant distributions in ultra-thin layers insemiconductor materials, in a manner that

is deeper than a general session on semi-conductor characterization and yet broad-er than the coverage in specialty meetingsthat are focused on a single family of ana-lytical techniques, such as the meetings onsecondary ion mass spectrometry (SIMS)or atomic force microscopy (AFM).

In addition to many detailed papers onthe use of SIMS, transmission electronmicroscopy (TEM), spreading resistanceprofiling (SRP) and capacitance-voltagemeasurements, progress was also report-ed in the use of AFM-based probes,analysis of secondary electron emissionfrom doped junctions, and time-resolvedsurface photovoltage measurements. Themeeting was significantly enhanced bysessions on process modeling and tech-niques for extraction of doping profilesfrom transistor characteristics for deep-sub micron CMOS devices.

Among the many dramatic examples ofthe recent progress which has been made

in the determination of two-dimensionaldopant profiles, one of the most beautifulwas the work of Roger Alvis and his co-workers at AMD and Stanford whichused a combination of cross-section TEMand AFM, chemical etching, SIMS andprocess modeling to show the details ofthe effects ion energy and beam incidenceangle on the characteristics of source/drain junctions on the implanted andshadowed edges of poly-silicon gatestructures. The two-dimensional dopinglevels for As implants were determinedover a concentration range from 1020 to1018 cm"3 with a spatial resolution of afew run.

The workshop was sponsored byAmerican Vacuum Society, Intel, MCNC,NIST, and Sematech with corporate sup-port from Evans East and Varian. It isanticipated that this workshop will beheld again in two years.

MICHAEL CURRENT

58 MRS BULLETIN/JUNE 1995https://www.cambridge.org/core/terms. https://doi.org/10.1557/S0883769400037003Downloaded from https://www.cambridge.org/core. IP address: 65.21.228.167, on 20 Mar 2022 at 15:41:23, subject to the Cambridge Core terms of use, available at

PERFORMANCE

PROPERTIES

MaterialsSynthesis andProcessing

SYNTHESIS/PROCESSING

Journal of Materials Research (JMR) will feature a specialsection of original research papers on materials synthesisand processing in the April 1996 issue.

Since at least the time of the National Academy of Sciences'1989 study "Materials Science and Engineering for the 90's" ithas been generally recognized that in materials synthesis andprocessing there is *a serious weakness in the U.S. researcheffort* and There are opportunities for progress in areas rangingfrom the basic science of synthesis and processing to materialsmanufacturing, that, if seized will markedly increase U.S.competitiveness."'

MRS has sponsored several symposia on processing issues,but while JMR has accepted papers it has not until nowfocused in that area.

The April 1996 issue will focus on synthesis and processing ofengineered materials. For the purpose of this call for papers wewill use the 1993 Federal Coordinating Council for Science,Engineering and Technology (FCCSET) definition of synthesisand processing as the conversion of materials in their natural,atomic or molecular states to advanced materials suitable forspecific intended uses, featuring precisely tailored propertiesand enhanced performance."2 Papers on all aspects of synthe-sis and processing as defined above are solicited. Atomic andmolecular level engineering of materials processes, modeling ofprocesses, fundamental understanding of generic processessuch as plasma processing, chemical vapor deposition, sinter-ing, etching, etc., are all suitable topics. Studies of yield andreliability of manufacturing processes as they are connected toprocessing of high-technology materials are appropriate.Papers on synthesis and processing of semiconductors,ceramics, composites and other "high-technology" materialswould be of particular interest. Dr. Peter Esherick of SandiaNational Laboratories will serve as editor for Ihese papers.

To be considered for this issue, manuscripts must bereceived at the USA Editorial Office by August 1,1995.No extensions of the deadline will be granted.

STRUCTURE/COMPOSITION

All manuscripts submitted for this special section of the April1996 issue will be reviewed in a normal but expedited fashion.The top 15-20 manuscripts of all those accepted will bescheduled for publication in the April 1996 issue of JMR,appearing in the standard JMR format in a separate section ofthe issue. Any manuscripts that are accepted for publicationbut cannot be included in the group scheduled for publicationin the April issue will be scheduled to appear in the nextavailable issue of JMR.

Send your manuscript (one original plus three copies) forconsideration to:

Dr. Robert A. Laudise, Editor-in-ChiefJournal of Materials ResearchMaterials Research Society9800 McKnlght RoadPittsburgh, PA 15237

Telephone 412/367-9111Fax 412/367-4373

For Information:

E-mail: miller@mrs.orgMRS Homepage on World Wide Web: http://dns.mrs.ofg/

Indicate that the manuscripts are intended for the JMR April1996 special section on Materials Synthesis and Processing.

1. 'Materials Science and Engineering tor the 1990* - MaintainingCompetitiveness in Ihe Age of Materials,' p. 3, National Academy Press,Washington, 1989.

2. 'Advanced Materials and Processing: The Fiscal Vkar 1(103 Pnyap InMaterials Science and Technology/ P-10. FCCSET Canttnttt M M h t f yand Technology, NIST, Gatthflrsburjj, MO, 1982.

• .5https://www.cambridge.org/core/terms. https://doi.org/10.1557/S0883769400037003Downloaded from https://www.cambridge.org/core. IP address: 65.21.228.167, on 20 Mar 2022 at 15:41:23, subject to the Cambridge Core terms of use, available at