influence of lamellae thickness on the corrosion behaviour of multilayered pvd tin/crn coatings
TRANSCRIPT
In¯uence of lamellae thickness on the corrosion behaviour of multilayeredPVD TiN/CrN coatings
Maria Nordina,*, Merja Herranenb, Sture Hogmarka
aDepartment of Materials Science, The AÊ ngstroÈm laboratory, Uppsala University, Box 534, 75121 Uppsala, SwedenbDepartment of Inorganic Chemistry, The AÊ ngstroÈm laboratory, Uppsala University, Box 538, 75121 Uppsala, Sweden
Received 20 October 1998; accepted 20 January 1999
Abstract
The corrosion behaviour of two multilayered TiN/CrN coatings with different chemical modulation period (10 and 125 nm, respectively)
have been investigated in a 0.1 M H2SO4 solution. Single layered TiN and CrN have been included in the investigation and used as reference
coatings. All coatings have been deposited on single crystalline Si in commercial PVD equipment.The multilayered coating with thin
lamellae showed superior corrosion resistance as compared to the coating with thicker lamellae. This is concluded from the following; it was
observed that TiN oxidised to a solid passivating Ti(N,O), whereas CrN was oxidised and dissolved. Furthermore, it has been shown that the
oxidation rate of the multilayered coatings is determined by the rate of CrN dissolution. The rate is directly related to the number of lamellae
since the dissolution of CrN lamellae propagates laterally, rather than the vertically. From this it can be concluded that the higher the number
of lamellae in the multilayered coating, the lower the oxidation rate, in the present H2SO4 solution. q 1999 Elsevier Science S.A. All rights
reserved.
Keywords: Corrosion behavior; Multilayer; Physical vapor deposition; TiN/CrN
1. Introduction
Increased automation together with higher cutting speeds
demand reliable performance and increased lifetime of the
cutting tool. For this reason cutting inserts made of cemen-
ted carbide are usually coated with thin (3±6 mm), hard,
mechanically and thermally stable coatings. Much research
has been performed on CVD (chemical vapour deposition)
coatings but during the last decades more and more interest
has been subjected to PVD (physical vapour deposition)
coatings. There are two main reasons for this; the possibility
to deposit PVD coatings at a lower temperature (100±
5008C) which may result in a possibility to use a sharper
cutting edge, and the presence of compressive residual
stress which may prohibit thermo-mechanical cracking.
However, the corrosion protection of a PVD coating on a
steel substrate is generally worse than the same coating
deposited using CVD. This is partly due to a high defect
density and a columnar microstructure often present in a
PVD coating [1]. A columnar structure can allow pores/
pinholes to run all through a coating. This can be detrimen-
tal to the lifetime of the insert, since when a coated material
is subjected to a corrosive medium, a galvanic cell can be
formed and the current can be constricted to very small
areas, i.e. almost entirely through the pores [2]. In order to
increase the corrosion resistance of a PVD coating it is
therefore of great interest to inhibit the columnar growth.
It has been shown that by layering a nitride with a metal,
i.e. Ti/TiN [3,4], the columnar structure of the nitride is
inferred at regular intervals during deposition and the corro-
sion resistance is improved. Knotek et al. have shown that
the corrosion protection from a ceramic coating on a steel
substrate can be improved by using a metallic starting layer
under the ceramic coating [5]. Furthermore, it has been
found that, by testing in a 0.5 M Na2SO4 solution with pH �4 and scan rate of 1 mV/s, that the corrosion properties of a
steel substrate (AISI 304) coated with a (Ti,Cr)N coating is
superior to the same substrate coated with single layered
TiN [6]. The positive effect of Cr addition to a TiN coating,
up to a potential of 0.5 V vs. SSE (0.9 V vs. SCE) in a 0.5 M
sulfuric acid, has also been observed by Massiani et al. [7].
Also (Ti,Al)N has shown superior corrosion properties as
compared to single layered TiN in a 3.5% NaCl solution [2].
Furthermore, multilayered coatings have shown other inter-
esting properties such as increased hardness together with
Thin Solid Films 348 (1999) 202±209
0040-6090/99/$ - see front matter q 1999 Elsevier Science S.A. All rights reserved.
PII: S0040-6090(99)00192-3
* Corresponding author. Tel.: 1 46-18-471-7266; fax: 1 46-18-471-
3572.
E-mail address: [email protected] (M. Nordin)
high fracture toughness resulting in an enhanced wear resis-
tance as compared to singe layered coatings [8].
TiN and CrN are well established PVD coatings and have
been used for several years by the industry. Both have been
thoroughly investigated with respect to high temperature
and electrochemical oxidation. The mechanism of electro-
chemical oxidation has been the subject of several investi-
gations performed on TiN, and only a few are presented here
[5,7,9±13]. The mechanism of electrochemical oxidation of
CrN has not been as extensively investigated [7,10,12,14±
16]. However the high temperature oxidation of CrN has
been more thoroughly investigated (see e.g. [4,17±19]).
When it comes to multilayered coatings, many authors
have studied the mechanical properties of multilayered coat-
ings in recent years [8,20±23], but limited information about
oxidation mechanisms in such structures can be found in the
literature. High-temperature oxidation of a TiN/CrN multi-
layered coating was recently reported [19]. Furthermore,
Jehn et al. and Massiani et al. have shown results from
electrochemical oxidation of multicomponent (Ti,Cr)N
coatings [6,7].
In this work, two multilayered PVD TiN/CrN coatings
have been evaluated with respect to the corrosion properties
in a 0.1 M sulfuric solution and compared to single layered
TiN and CrN. The in¯uence of lamellae thickness has been
evaluated. All coatings were deposited on silicon substrates
which remain passive in the sulfuric acid electrolyte used
for the electrochemical measurements. This is done to
ensure that only the inherent corrosion properties of the
coatings are investigated without any contribution from
the substrate, in order to evaluate the effect of lamellae
thickness in a multilayered coating, on the corrosion resis-
tance.
2. Experimental
2.1. Coating deposition
Smooth single crystalline (100)-Si was used as substrate
material.
All coatings were deposited in a commercial Balzers BAI
640R apparatus with high plasma density ®tted with an
electron beam evaporation source (Ti) and a planar magne-
tron sputtering source (Cr). Prior to coating deposition, the
substrates were heated to 4508 C for 60 min. They were then
Ar-ion cleaned for 1 min. with a negative substrate bias of
200 V. The depositions, performed at a pressure of 1.7 £1023 mbar for TiN, 3 £ 1023 mbar for CrN and 2 £ 1023
mbar for the multilayered coatings on substrates on ¯oating
potential, started with growth of a thin metallic adhesion
layer (30 nm Ti for the TiN and the multilayered coatings
and 30 nm Cr for the CrN coating). Prior to the multilayer
depositions a 150-nm thick TiN layer was deposited with
the substrates held stationary above the e-gun simulta-
neously as the Cr target was sputter cleaned. The multi-
layered coatings were deposited by alternately expose the
substrates to the Ti-source and the Cr-source, respectively,
and to admit reactive nitrogen gas in the chamber. The
chemical modulation period, i.e. the thickness of one TiN
lamella together with one CrN lamella, was varied by chan-
ging the rotational speed of the substrate holder. Two coat-
ings with approx. 10 nm (coating denoted TiN/CrN(L10))
and 125 nm (coating denoted TiN/CrN(L125)) were depos-
ited. A total coating thickness of 1 mm was aimed at in all
cases. After the deposition the substrates were cooled in He
at a pressure of 2 £ 1022 mbar.
2.2. Coatingcharacterisation
The ®lm thickness was determined using FEG-SEM (®eld
emission gun scanning electron microscopy). The chemical
modulation period, i.e. the thickness of one lamella of TiN
together with one of CrN, in TiN/CrN(L125) was deter-
mined using FEG-SEM and in TiN/CrN(L10) using trans-
mission electron microscopy (TEM).
The surface morphology, prior to and after the corrosion
tests, was studied using SEM and AFM (atomic force micro-
scopy).The surface roughness, Ra-value, was determined
using AFM on a representative area of 100 mm2.
The coating composition was determined using AES
(Auger electron spectroscopy) and an electron beam energy
of 10 keV after sputtering with Ar1-ions to an approximate
depth of 200 nm.For the Ti-containing coatings the techni-
que of Dawson and Tzatzov to subdivide the intensity from
the overlapping signals of Ti and N at about 382 eV into
separate components [24] was assessed. The sensitivity
factors used for quanti®cation were determined from nitride
reference powders. AES has also been used for depth pro®l-
ing using 10 keV electron beam energy and no sample rota-
tion. Between each measurement of the peak intensities,
contributing to the depth pro®les, 2 nm was sputtered
away using Ar1-ions.
The phase composition was investigated by XRD (X-ray
diffraction) using Cu Ka radiation. The total texture coef®-
cients, TChkl, of the (hkl)-planes are determined using Eq. 1.
TChkl � I 0hkl=Ihkl
1=nXn
i�1
�I 0hikili=Ihikili
��1�
where Ihkl0 is measured intensity, Ihkl is standard intensity
and n the number of re¯ections.
2.3. Corrosion tests
The sample preparation procedure for the electrochemi-
cal measurements has been reported elsewhere [3]. The
experimental set-up consisted of a conventional three-elec-
trode cell. The working electrode was a disc rotating at 1000
rpm. A saturated calomel electrode (SCE) was used as refer-
ence electrode and a platinum spiral served as counter elec-
trode. The coatings were corroded by potentiodynamic
M. Nordin et al. / Thin Solid Films 348 (1999) 202±209 203
scans in 0.1 M H2SO4 electrolyte prepared from reagent
grade chemicals and Millipore water. The electrolyte was
deaerated by a 30-min nitrogen purge, immediately before
the sample was immersed. All experiments were performed
at 25 ^ 18C. Before recording the anodic polarisation curve,
the corrosion potential was registered for about 3 h or until it
had reached a stable value. The anodic polarisation curves
were recorded up to 3 V, with a scan rate of 1 mV/s. To
prevent the access of air into the solution a nitrogen purge
was used during the experiments.
3. Results
3.1. Coating characterisation
The total coating thickness, chemical modulation period
and the chemical composition of the coatings prior to corro-
sion tests are presented in Table 1.
The b -Ti adhesion layer displays a (200) preferred
growth orientation for the single layered TiN and the multi-
layered coatings. The TiN single layered coating has a cubic
NaCl-structure and displays a 100% (111) preferred growth
orientation.
The TiN/CrN(L10) displays low intensity peaks indicat-
ing a smaller grain size as compared to the other coatings. It
consists of a mixed (200) and (111) preferred growth orien-
tation with a majority of (200), see Table 1.
The TiN/CrN(L125) also displays a (200) and (111)
mixture of preferred orientation but with a majority of
(111), see Table 1. This indicates that the lamella thickness
of the TiN layers in this coating is above the critical thick-
ness for transformation from a preferred growth orientation
of (200) to (111).
The single layered CrN displays a (200) peak from the Cr
adhesion layer and a (200) peak from the CrN; however, it is
dif®cult to distinguish whether it is the hexagonal Cr2N or
the cubic CrN phase due to a peak overlap. It is likely a
mixture of these since the chemical composition indicates a
slightly understoichiometric CrN or an overstoichiometric
Cr2N.
3.2. Corrosion properties
Typical anodic polarisation curves of the different coat-
ings are presented in Fig. 1. The TiN coating displays a
passive behaviour up to about 1.2 V, where an anodic peak
is found. The CrN and both the multilayered coatings show
the typical behaviour of a passive material, with a passivation
current (,1 mA/cm2) up to the transpassive potential (above
0.9 V). The current density above 1.1 V remains high (.10
mA/cm2) when increasing the potential for the CrN and
TiN/CrN(L125). In contrast, TiN/CrN(L10) shows an
anodic peak at 1.1 V and thereafter a decrease in current
density. The current density for this coating above 1.1 V is
about two orders of magnitude lower than the current densi-
ties for the CrN and the TiN/CrN(L125). As the potential is
even further increased, at 1.2±1.3 V, a current density rise is
observed for TiN/CrN(L10) which is probably associated to
oxidation of TiN to oxide and/or oxynitride.
The electrolyte turned yellow as electrochemical oxida-
tion was performed for CrN and TiN/CrN(L125), indicating
that Cr(VI)-ions are present in the solution. During corro-
sion of TiN/CrN(L125) golden coloured ¯akes, likely
lamellae of TiN, were observed in the electrolyte.
3.3. Coating characteristics prior to and after corrosion
tests
All coatings exhibited a mirror-like ®nish and did not
reveal any topographical features as deposited, whereas
the surface roughness increased as a result of the corrosion
for all coatings, see Table 2.
The CrN coating corroded uniformly above 1.1 V, see
M. Nordin et al. / Thin Solid Films 348 (1999) 202±209204
Table 1
Coating thickness, t, chemical modulation period, L, the chemical compo-
sition (measurement error about 10%) and the texture coef®cient for the
111, TC111, and the 200, TC200, direction
TiN CrN TiN/CrN(L10) TiN/CrN(L125)a
T (nm) 800 ^ 40 1400 ^ 70 1130 ^ 50 1140 ^ 50
L (nm) ± ± 9 ^ 1 125 ^ 10
at% Ti 51 ± 45 57TiN
at% Cr ± 59 15 52CrN
at% N 49 41 40 43TiN/48CrN
TC111 1 0 0.89b 1.11
TC200 0 1 1.77b 0.23
a TiNin the TiN lamellae, CrNin the CrN lamellae.b Part of the intensity from the (111) peaks originates from the 90 nm TiN
adhesion layer, why the value of TC111 is lower if only the multilayered
structure contributed to the value.
Fig. 1. Anodic polarisation curves of the different coatings.
Fig. 2a, while the TiN displayed a much smoother surface
with a number of pits, uniformly distributed on the surface,
see Fig. 2b.
During corrosion testing of the TiN/CrN(L125) a lot of TiN
lamellae coating was found as ¯akes in the electrolyte, and
parts of the TiN lamellae were still found on the surface after
corrosion attached to the substrate by uncorroded CrN lamel-
lae, see Fig. 2c. The surface roughness increased for TiN/
CrN(L10) as a result of corrosion, see Table 2 and Fig. 2d.
During the corrosion tests the TiN single layered coating
was oxidised to a passivating Ti(N,O) to approx. 10 nm
depth, see Figs. 3a and b. The CrN single layered coating
did not form any passivating oxide and its surface composi-
tion did not change as a result of the corrosion and therefore
the corresponding depth pro®les will not be shown here. The
multilayer with thicker lamellae did not contain any Cr at
all, after corrosion, indicating that all the CrN had oxidised
and dissolved. In fact, only the starting layer of Ti and TiN
(30 and 150 nm, respectively) was present at the surface
after corrosion, see Fig. 3c,d. The coating had lost its origi-
nal mixed silver-golden colour and exhibited a pure golden
colour, typical for stoichiometric TiN. The multilayer with
thinner lamellae, on the other hand, still possessed the origi-
nal silver-golden colour. The composition of this coating
was unchanged, except for the near surface region to a
depth of approximately 15 nm, see Fig. 3e,f (observe that
the AES depth pro®ling technique without sample rotation
can only resolve the top few individual TiN and CrN lamel-
lae of TiN/CrN(L10) due to the degrading depth resolution
with analysis depth).
4. Discussion
It has been shown previously that columnar growth is
M. Nordin et al. / Thin Solid Films 348 (1999) 202±209 205
Table 2
Surface roughness, Ra, prior to and after the corrosion tests
Coating Ra-value (nm)
Prior to corrosion After corrosion
TiN 0.8 ^ 0.1 4.3 ^ 0.4
CrN 4.6 ^ 0.5 44.8 ^ 5
TiN/CrN(L10) 1.2 ^ 0.1 10.9 ^ 1
TiN/CrN(L125) 1.7 ^ 0.2 Flakes
Fig. 2. Typical features of the corroded surfaces. (a) Corroded CrN surface, (b) corroded TiN surface, (c) ¯aking behaviour of the corroded TiN/CrN(L125)
and (d) corroded surface of the TiN/CrN(L10).
detrimental to coatings used in severe corrosion applications
[2,3]. Introduction of a multilayered structure is therefore of
great interest since it is known to provide a more three
dimensional structure and therefore a reduced amount of
pores running through the coating. In this work two multi-
layered coatings consisting of TiN and CrN have been eval-
uated. To ensure that only the inherent corrosion properties
of the coatings are investigated, without any contribution
from the substrate material, all coatings were deposited on
silicon substrates which remain passive in the sulfuric acid
solution used for the electrochemical tests.
Anodic oxidation of TiN leads to the formation of stable,
M. Nordin et al. / Thin Solid Films 348 (1999) 202±209206
Fig. 3. Composition vs.depth as obtained by AES depth pro®ling for (a) uncorroded TiN, (b) corroded TiN, (c) uncorroded TiN/CrN(L125), (d) corroded TiN/
CrN(L125), (e) uncorroded TiN/CrN(L10) and (f) corroded TiN/CrN(L10).
solid, oxides or oxynitrides. This has also been observed in
several other work [7,9±11,13]. Milosev et al. [10] found
that TiN, corroded in a phthalate buffer, pH 5.0, exhibits an
anodic peak centred at 1.3 V vs. standard hydrogen elec-
trode (SHE). They have also shown using electrochemical
and X-ray photoelectron spectroscopy (XPS) that the oxida-
tion of TiN starts with the formation of a mixed oxide/
oxynitride layer in the lower potential range (,1 V vs.
SHE). As the oxidation potential is increased, oxidation to
TiO2 takes place. This is also characterised by an anodic
peak at about 1.6 vs. SHE [10].
Also, the electrochemical oxidation of CrN leads to the
formation of a thin mixed oxynitride/oxide layer. Electro-
chemical measurements in phthalate buffer, pH � 5:0, and
subsequent characterisation of the surfaces using XPS
revealed the formation of a very thin (#2 nm) mixed oxyni-
tride/oxide layer. The formation takes place above 0.456 V
vs. SCE [10]. The corrosion behaviour of CrN is similar to
that of Cr in acid solutions [10,25], except from the fact that
the CrN in our experiments is in the passive state and does
not exhibit an active peak. The formation of a mixed oxyni-
tride/oxide layer could not be detected from this work since
the potential was increased to 3 V before surface character-
isation was performed. However, from the polarisation
curves it was observed that at potentials above 1.0 V vs.
SCE the Cr(III) species present in the passive layer undergo
transpassive corrosion. Furthermore, the electrolyte turned
yellow during corrosion testing indicating that the CrN had
oxidised to Cr(VI) which was dissolved. The CrN corrodes
uniformly over the surface which was also found by Milosev
et al. [10].
The transpassive dissolution of passivated Cr is known to
be a two-stage process [14] and takes place by a sequence of
a permanent Cr(III)-oxide formation, oxidation to Cr(VI),
and dissolution as chromate. To describe the transpassive
dissolution of CrN the following reaction can be considered:
2CrN 1 7H2O � Cr2O227 1 N2 1 14H1 1 12e2 �2�
A rough estimate of the amount of CrN in the coatings that
was oxidised, above the transpassive potential, can be
obtained from the charge transferred. From reaction 2 and
applying Faraday's law (Eq. (3)), using a density of 6.179 g/
cm3 for the cubic CrN and MCrN � 66 g/mol, a theoretical
M. Nordin et al. / Thin Solid Films 348 (1999) 202±209 207
Fig. 4. A schematic representation of the corrosion mechanism of multilayered TiN/CrN. Prior to corrosion (a), the coating may contain some pores running all
the way through the TiN lamellae (and the CrN lamellae; however, this is of minor importance since the CrN is dissolved). When the coating is exposed to the
corrosive solution and the current is applied, new pores are formed in the TiN, at which CrN lamellae are exposed to the corrosive solution and dissolved, see b.
This will continue and will result in coating degradation (c) until only the bottom TiN lamella is left, see d. Some undetached ¯akes of TiN were also found on
the surface as also shown in d.
®lm thickness of the dissolved CrN can be calculated. For
the TiN/CrN(L10), a potential scan up to about 1.2 V, i.e. to
the ®rst passive potential, corresponds to 0.018±0.019 C/
cm2 of charge transferred. Assuming a 12-electron oxida-
tion according to reaction 2, this charge corresponds to
oxidation and dissolution of a 3±4-nm thick CrN ®lm.
This is about the same thickness as one CrN lamella in
TiN/CrN(L10).
Faraday's law used for calculation of removed CrN can
be written as:
l � Q £ M
Z £ F £ r�3�
where l is the ®lm thickness, Q is the current density, M is
the molar mass (66 g/mol for CrN), Z is the number of
electrons, F is Faraday's constant and r is the density.
The passive potential is somewhat higher for TiN/
CrN(L125), registered to 1.5 V. The charge transferred
(appr. 0.18 C/cm2) to the passive potential for this multi-
layer corresponds to a CrN thickness of about 30±35 nm, i.e.
also in this coating approx. the same thickness as one CrN
lamella.
An estimate of the oxidised and dissolved CrN ®lm thick-
ness at 3 V, i.e. after the whole corrosion experiment
showed that the dissolved CrN ®lm thickness is approxi-
mately ten times as large at 3 V than at the ®rst passive
potential for the multilayered coatings. This means that
ten CrN lamellae have been dissolved at 3 V, for both
TiN/CrN(L10) and TiN/CrN(L125). This corresponds to
all CrN in TiN/CrN(L125) but only approximately 10% of
the CrN in TiN/CrN(L10).
An estimate of the CrN dissolution for the single layered
CrN corroded up to 3 V, is in good agreement with the
thickness measured on the corroded sample from a FEG-
SEM cross-section. Up to 3 V the charge transferred was
approx. 3.65 C/cm2 which corresponds to a dissolved CrN
®lm thickness of 670 nm. Since the total coating thickness
prior to the experiments is 1400 nm the calculation suggests
a remaining coating thickness of 730 nm. This is in very
good agreement with the coating thickness measured after
corrosion, i.e. 690 nm.
The higher corrosion resistance of TiN/CrN(L10) coating
as compared to TiN/CrN(L125) is due to the larger number
of lamellae in this coating. Likely, the pits formed in the
TiN lamellae are also smaller in this coating, allowing less
electrolyte to penetrate the TiN lamellae to new CrN lamel-
lae and dissolve them. However, for simplicity we will
assume that the pits formed in the TiN lamellae in the two
multilayered coatings during corrosion are of the same size
and at the same distance as the pits formed in the TiN single
layered coating. The latter has been con®rmed from surface
studies using FEG-SEM. The pits in single layered TiN are
at an approximate distance of 5±40 mm, i.e. at an average
distance of 25 mm (see Fig. 2b). The thickness of the CrN
lamellae in TiN/CrN(L125) and TiN/CrN(L10) coating are
approx. 35 nm and 3 nm, respectively, i.e. much thinner than
the distance between two neighbouring pits in both coatings.
This means that it is the lateral dissolution of the CrN lamel-
lae that will determine the removal time of one lamella, see
Fig. 4. The number of CrN lamellae in the multilayered
coating consequently determines the dissolution time. The
number of lamellae is approximately ten times as high in the
TiN/CrN(L10) than in TiN/CrN(L125), which means that
TiN/CrN(L10) is more corrosion resistant in a solution
where one of the lamella materials (here CrN) is dissolved.
Also in this case, where one of the lamella materials
forms a passive oxynitride, as in the case of TiN, it is likely
to be advantageous to have a large number of lamellae since
the more frequent a new fresh TiN surface is exposed to the
solution, the longer is the time for the coating to degrade.
5. Conclusion
The multilayered coating with thin lamellae showed
superior corrosion resistance as compared to the coating
with thicker lamellae. This can be concluded from the
following:
² It was observed that TiN oxidised to a solid passivating
Ti(N,O), whereas CrN was oxidised and dissolved.
² It was shown that the oxidation rate of the multilayered
coatings is determined by the rate of CrN dissolution.
² Since the oxidation proceeds by lateral dissolution of
CrN, rather than vertical, the oxidation rate is approxi-
mately inversely proportional to the number of lamellae
in the multilayered coating.
Acknowledgements
The ®nancial support from Sandvik Coromant AB, the
National Swedish Board for Technical and Industrial Devel-
opment (NUTEK) and the Swedish Research Council for
Engineering Sciences (TFR) is gratefully acknowledged
by the authors.
References
[1] B. Elsener, A. Rota, H. BoÈhni, Mater. Science Forum 44/45 (1989) 29.
[2] H. Dong, Y. Sun, T. Bell, Surf. Coat. Technol. 90 (1997) 91.
[3] M. Herranen, U. Wiklund, J.-O. Carlsson, S. Hogmark, Surf. Coat.
Technol. 99 (1998) 191.
[4] B. Enders, H. Martin, G.K. Wolf, Surf. Coat. Technol. 60 (1993) 556.
[5] O. Knotek, F. LoÈf¯er, A. Schrey, J.C. Verhoef, Surf. Modi®ed Tech-
nol. V (1992) 217.
[6] H.A. Jehn, F. Thiergarten, E. Ebersbach, D. Fabian, Surf. Coat. Tech-
nol. 50 (1991) 45.
[7] Y. Massiani, P. Gravier, L. Fedrizzi, F. Marchetti, Thin Solid Films
261 (1995) 202.
[8] M. Nordin, M. Larsson, S. Hogmark, Surf. Coat. Technol. 106 (1998)
234.
[9] I. Milosev, H.-H. Strehblow, B. Navinsek, M. Metikos-Hukovic, Surf.
Interface Anal. 23 (1995) 529.
M. Nordin et al. / Thin Solid Films 348 (1999) 202±209208
[10] I. Milosev, H.-H. Strehblow, B. Navinsek, Thin Solid Films 303
(1997) 246.
[11] A. Delblanc Bauer, M. Herranen, H. Ljungcrantz, J.-O. Carlsson, J.-E.
Sundgren, Surf. Coat. Technol. 91 (1997) 208.
[12] A. SchroÈer, W. Ensinger, G.K. Wolf, Mater. Sci. Eng. A140 (1991)
625.
[13] M. Herranen, M. Nordin, J.-O. Carlsson, J. Vac. Sci. Technol. B 15
(1997) 1865.
[14] P. Schmuki, S. Virtanen, A.J. Davenport, C.M. Vitus, J. Electrochem.
Soc. 143 (1996) 3997.
[15] I. Milosev, B. Navinsek, J. Electrochem. Soc. 140 (1993) L30.
[16] P. Engel, G. Schwarz, G.K. Wolf, Surf. Coat. Technol. 98 (1998)
1002.
[17] I. Milosev, H.-H. Strehblow, B. Navinsek, Surf. Coat. Technol. 74±75
(1995) 897.
[18] B. Navinsek, P. Panjan, Surf. Coat. Technol. 59 (1993) 244.
[19] P. Panjan, B. Navinsek, A. Cvelbar, A. Zalar, J. Vlcek, Surf. Coat.
Technol. 98 (1998) 1497.
[20] K.K. Shih, D.B. Dove, Appl. Phys. Lett. 61 (1992) 654.
[21] K.J. Ma, A. Bloyce, T. Bell, Surf. Coat. Technol. 76±77 (1995) 297.
[22] C. Subramanian, K.N. Strafford, Wear 165 (1993) 85.
[23] R. HuÈbler, et al., Coat. Technol. 60 (1993) 561.
[24] P.T. Dawson, K.K. Tzatzov, Surf. Sci. 149 (1985) 105.
[25] V. Maurice, W.P. Yang, P. Marcus, J. Electrochem. Soc. 141 (1994)
3016.
M. Nordin et al. / Thin Solid Films 348 (1999) 202±209 209