hybrid organic-inorganic for integrated optics: electro-optic filters and modulators support:...
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Hybrid Organic-Inorganic for Integrated Optics:
Electro-Optic Filters and Modulators
Support: NSF-STC CMDITR
Mahmoud FallahiCollege of Optical Sciences, Universit
y of [email protected]
Group Research Activities
Semiconductor Lasers and Integrated Photonics
High Power SemiconductorLasers
Integrated Opticsand WDM
High Power Optically Pumped VECSEL
1300-1560 nmInGaAsP/InP
Sol-gel Integrated Optics
EO sol-gel/polymerSLM
High Power Tunable VECSEL and SHG
400 500 600 700 800 900 1000 1100-100
-80
-60
-40
-20Fundamental (~976 nm) and SHG (~488 nm)
Sp
ectr
um
(lo
g s
ca
le)
Wavelength (nm)
Fundamental~976nm SHG~488 nm (1.3 W)
EO Hybrids and Applications
Objective: Development of High-Speed, Low-Voltage, low-Cost Special Light Modulators, Tunable Filters and Switches arrays.
Applications:• Optical Communications and Network security• Optical Correlators and recognition system• Optical Cross-Bar Switching• Real-time beam steering• Holographic Data Storage• 3-D Imaging
Competing Technologies and our approach
• Liquid Crystal: Issues: Slow, retain image, variable contrast and sensitivity across device
• Semiconductor EA in MQW Stark effect: Fast, Issues: difficult to make in large array, poor contrast and high voltage, high loss
• Magneto-optic of Aluminum Garnet: Low efficiency, High powered drive current
• Deformable mirrors (MEMS): Expensive, non-flat, slow (ms)
• EO Polymers/Hybrids-based strtucture: Our approach
Combine high chromophores with Improved hybrid poling method
Polymers or hybrid organic-inorganic sol-gel as the host
Fabry-Perot Etalon with high finesse and sensitivity
Transparent electrodes inside the cavity for low voltage
2-D Pixelation of SLM
Hybrid Organically-Modified Sol-Gel
Sol-gel: Chemical route for production of glass material from Metallorganic precursor.Advantages:• Low Temperature Processing (<250 C)• Crack Free Thick Film Deposition • Refractive Index Tuning• Low Loss Waveguides• Photo-Patternable• High Tg and High Stability • Low Cost• Electro-Optic Components by Chromophore Doping
Sol-gel Synthesis of organoaluminosilicate
1.480
1.485
1.490
1.495
1.500
0 5 10 15 20 25
Molar Ratio Zr/Si, %
Re
fra
ctiv
e I
nd
ex
UV+HB(2 h)
H 2C= C(CH3)CO2(CH2 )3Si(OCH3 )3
+ 0.01M HCl (R=1) Stir 30
minStir 30 min Al(C
4H
9O)
3
H2O (R=2)Stir 30 min
StirAge 24 hrs
C10H12O2
Spin coatBake at 100o
C
UV/Develop
(MAPTMS)
metal-alkoxides
organically modifiedsilicon-alkoxide
Hydrolysis & Cross-linking
photoinitiator
Hard Bake
Nonlinear Chromophores
NOO
Si Si
S
O
NC
NC
NC
CF3 AJL833 pm/V in APC
S
NC
NC
NC
CN
O
OH
NOHHO
TCBD36 pm/V in sol-gel
AJLs10278 pm/V in APC
DR1 DR13 DR19
Fabry-Pérot Étalon: Design
Glass
Epoxy
ITO
DBR
EO Polymer
In2O3
V
VStructure 1
Structure 2
VStructure 3
Better TCO
Light Path
Review: EO Sol-gel Tunable Filter
-10 -5 0 5 10
-8
-6
-4
-2
0
2
4
6
8
Wav
elen
gth
Shi
ft (n
m)
Applied Voltage (V)
1530 1540 1550 1560
0.0
0.2
0.4
0.6
0.8
1.0
-10V10V
Inte
nsity
(a.
u.)
Wavelength (nm)
0 2 4 6 8 10
0
5
10
15
20
25
30
35
Isol
atio
n R
atio
(dB
)
Applied Voltage (V)
-10 -5 0 5 10
0.0
0.2
0.4
0.6
0.8
1.0
Nor
mal
ized
Inte
nsity
(a.
u.)
Applied Voltage (V)
1520 1540 1560 1580
0
2
4
6
8
-30V
-20V-10V
0V10V
20V
30V
Inte
nsi
ty (
a.u
.)
Wavelength (nm)
Source
Appl. Phys. Lett. 89 (2006), 041127.
EO polymer: TCBD coupled hybrid sol-gel Étalon structure 1 with ITO electrodes Large tunability (0.75 nm/V), high finesse (~235), wide tunable range (>50 nm) 35 dB isolation ratio with10 V
Review: Hybrid Fabry-Pérot Étalon
-10 -8 -6 -4 -2 0 2 4 6 8 10
1540
1542
1544
1546
1548
1550/V = -0.3946 nm/V
Wav
elen
gth
(nm
)
Voltage (V)
-10 -8 -6 -4 -2 0 2 4 6 8 10
0.0
0.2
0.4
0.6
0.8
1.0
Applied Voltage (V)No
rma
lize
d In
ten
sity
(a
.u.)
0
4
8
12
16
20
Iso
latio
n R
atio
(d
B)
Drive voltage Vp=5V
Modulation depth = 10%
Appl. Phys. Lett. 89 (2006), 141113.
154015421544154615481550
10V -10V
Inte
nsity
(a.
u.)
Wavelength (nm)
EO polymer: AJL8/APC Étalon structure 2 with ITO & In2O3
Large tunability (0.4 nm/V), high finesse (~234), low insertion loss (~4 dB) 10 dB isolation ratio with 5 V 10 % modulation with 5 V at 200 kHz
SLM - Photomask Design
* Applicable pattern ranges from 4×4 to 16×16 each 1cm × 1cm.
SLM - Substrate Fabrication
Patterned 8×8 ITO substrate Patterned 16×16 ITO substrate
Patterned 4×4 ITO substrate w/DBR coated & wires attached
Patterned 8×8 ITO substrate w/EO polymer AJL8/APC spin-coated
SLM - Integration & Testing
Patterned 8×8 ITO/DBR SubstrateElectrically poled
In-house fabricated 8×4 SLM
Optical testing set-up
4x8 SLM - Testing Results
Transmission through part of SLM (part of 4 pixels) with a broadband source (~1550 nm ± 25 nm)
Resonance transmission through 4 pixels with a 1558 nm laser with no applied voltage.
Modulated image under biased voltage
Field applied to all pixels
4 x 8 SLM with ITO outside electrodes