Feb-2007Hot N2 1

Hot N2

Feb-2007Hot N2 2

1.Overview

Hot N2 System has been developed as a solution for the problem of

piping choke caused during the process of diffusion/CVD, etching, etc.

Hot N2

Emitting hot (100-200℃)swirling N2 gas into the piping.

Extending maintenance period

Productivity improvement !

Feb-2007Hot N2 3

HEATER & TRANSFER

SENSOR

HEATER

N2 GAS

CONTROLLER

2.Configuration

Hot N2 unitHeating N2 gas.

Piping with heater integrated.

Controller

Controlling amount of N2 gas flow and

temperature of the gas supplied.

3 channels are available.

Powder transfer

Emitting heated swirling N2 gas

along the wall of piping.

PUMP Exhaust(gas + powder)

Hot swirlingN2 gas flow

N2 gas

Feb-2007Hot N2 4

3. Installation example

Exhaust outlet of

vacuum pump – Scrubber

①. Immediately above the exhaust outlet of vacuum pump

②. Switching valve section

Effective length of one unit:approx. 4 – 6m

(varying according to actual use conditions)

HOT N2 CONTROLLER

HOT N2 UNIT #2

HOT N2 UNIT #1 (SWITCHING VALVE)

(MAIN TOOL)

①

②

Feb-2007Hot N2 5

4. Effect of the installation (1)

-CVD PSIN process

Maintenance period 1 month→8 – 12months

-Metal etching process

Maintenance period 2 months→12 months

Additional effect by putting thermal insulator on piping.

Feb-2007Hot N2 6

5.Specifications (1)

HOT N2 Unit & Transfer : 200(w) x 173(d) x 150(h) (mm), 3 Kg

PID controlcontrol

type-Kthermo couple

4 – 6m/uniteffective length

50l/min. (adjustable)amount of flow

200℃ or less (adjustable)temperature setting

500W／800Ｗwattage

AC 220V／100V 1P 2A／5A 50／60Hzinput power

Ni-Crheater

Controller : 275(w) x 275(d) x 160(h) (mm), 4 Kgunit size

SUS316piping materials

SpecificationsItems

Feb-2007Hot N2 7

Example of useProduct shape

separated type

combined type

5.Specifications (2)

Feb-2007Hot N2 8

6. Safety device

- Leakage breakerElectric leakage

- Heater cut off at 1kgf/cm2N2 gas pressure drop

- Circuit breaker - Fuse

Over current

-Thermostat to prevent overheat (standard setting: 200℃)

Temperature anomaly

MeasuresTroubles

＊ Red light on in case of above troubles.＊ Please contact for additional safety function.

Feb-2007Hot N2 9

7. Test results of Hot N2 system (1)

Contaminant caused in many processes of semiconductor manufacturing is condensed in the piping. < trouble >exhaust piping chokevalve lock/malfunction

vacuum pump: performance degradation and malfunction increased down time and increased parts maintenancedecrease in production volume

Before using the system

(30 days later)

significant decrease of contaminant adhesionAfter using the system

(180 days later)

RemarksPiping inside (photo)

Feb-2007Hot N2 10

Piping above silencer(2)

Piping above silencer(1)

Before usingHot N2 system

(30 days later )

After usingHot N2 system

(60 days later )

Piping above silencer(2)

Piping above silencer(1)

7. Test results of Hot N2 system (2)

Feb-2007Hot N2 11

8.Delivery record (1)Semiconductor

61616months-ALCATELTELTi-TiN

46

4

2012months2monthsLOT

EDWARDMATTSON

ARC

CVD

412months2monthsLOTNOVELLUS

12

6

76

6

70

27

90

33

3

24

Number of the systems delivered

2months

1month

1month

2months

2months

1month

1month

before installation

Maintenance period of piping

12months

6months

12months

8months

8months

8months

8months

after installation

27

LOT

EDWARDNOVELLUS

PSIN

Pump manufacturer

Equipment manufacturer

AMAT

AMAT

AMAT

AMAT

GENUS

AMAT

LOT

ALCATEL

EDWARD

LOT

LOT

EDWARD

LOT

EDWARD

EDWARD

436

6HDP

97BW

123WSiX

76BPSG

Total

Process

Feb-2007Hot N2 12

Semiconductor

16166months1monthEBARATELNITRIDE

DIFF556months1monthEDWARDKE

11118～12months2monthsALCATELLAM

POLY

51518～12months2monthsALCATELAMAT

12128～12months2monthsEDWARDHITACHI

15158～12months2monthsEDWARDIPS

METAL

3615

218～12months2monthsEDWARD

ALCATELLAM

69698～12months2monthsEDWARDAMAT

12128～12months2monthsEDWARDIPS

W-ETCH BACK

Total

after installation

before installation

254

ETCH

Process

POLY

LAM

Equipment manufacturer

EDWARD

Pump manufacturer

2months

Maintenance period of piping

8～12months 324

Number of the systems delivered

27

8.Delivery record (2)

Feb-2007Hot N2 13

Semiconductor (300mm)

5912months2monthsAMATTi TiN

2412months2monthsLAMAL METAL

ETCH 312months2monthsAMATW BL ET

212months2monthsLAMMETAL

312months2monthsLAMW EB

212months2monthsAMATPE-CVD

T/F

412months2monthsGENUSWSiX

612months2monthsTELTEOS

112months2monthsTELHTO

212months2monthsAMATSA-CVD

112monthsmonthsAMATTOINBDIFF

1412months2monthsAMATP-HDP

412months2monthsNOVELLUSCVD-W

Total 159

1512months2monthsAMATSTI-HDP

512months2monthsTEL

16months1month TEL(Fomura)

D-POLY

after installationbefore installationProcess

NITRIDETEL(303i)

Equipment manufacturer

1month

Maintenance period of piping

12months 13

Number of the systems delivered

8.Delivery record (3)

Feb-2007Hot N2 14

LCD

96months1monthEDWARDAKTP-Si CVD

LCD

863months1monthEBARA

EDWARDS

KASHIYAMA

AKTCVD

Pump manufacturerEquipment manufacturer before installation

Maintenance period of piping

after installation

95Total

Number of the systems

deliveredProcess

8.Delivery record (4)