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GenSys75
Other activities include on-site process implementation, training and tuning
GENCOA products cover 3 sputtering related areas
Reactive gas controller & endpoint detector
Linear ion sources
planar & rotatable Magnetron Sputter
Cathodes and Magnetic Systems
GENCOA Key Company Facts
• GENCOA is a private limited company (Ltd)
• Founded 1995 by Dr Dermot Monaghan
• Located in Liverpool, UK
• Employs 34 people 6 design (Pro E 3D CAD) 4 process development & simulation 14 assembly & test 4 sales & tech support (2 Asia based) 3 administration & accounts 3 hardware & software (Speedflo) • > 3000 magnetrons in the field
• > 500 speedflo systems in the field
GENCOA Key Company Advantages
• 8 types of magnetic systems for rotatable magnetrons • 3 tube size formats for rotatable: 152mm, 100 and 75mm OD • Unique dry target cooling • 10 types of planar magnetic designs • On-site process implementation • Unique PDF+ algorithm for reactive gas process control • In-situ and ex-situ* PEM, lambda sensor, target voltage • Key IPR covering dual rotatable magnetrons and magnetic anode assisted rotatable processes.
• GENCOA provide process solutions by supplying components and know-how that exceeds your expectations:
GenSys75 – 3” OD rotatable target magnetron
Gencoa Rotatable System - patent pending design
Combines all the advantages of rotatable magnetrons without the problems of breaking water seals, dynamic seal and power contact wear.
• All static water to vacuum sealing – 10-8 mbar l/s He leak tight, no wear. • Clean-room compatible. • In-direct target cooling – no water seal break during target change.
GenSys75
• 75mm & 100mm OD tube formats with same end-block. • Optimized magnetic fields to get the best possible target use & target cleanliness. • DLIM type magnetics for AC operation. • Magnetically balanced or unbalanced designs for different applications. • Auxillary magnetically active anodes for process stability and enhanced plasma control. • Integral gas delivery systems for reactive sputtering and uniformity control. • On-site process support and tuning for all rotatable applications.
• GENCOA have developed a new type of small tube magnetron – The Gencoa Rotatable System (GRS) is ‘dry,’ in-directly target cooled, with no rotating water seals and no rotating power contact.
GenSys75 – 3” OD rotatable target magnetron - fits into planar magnetron ports
• The Gensys75 has been developed primarily to allow conversion of existing planar magnetron sputter systems to use rotatable technology. This is achieved by the narrow end-block ensuring the target length and uniformity matches the existing planar target length
• Fits into confined spaces – can directly replace any planar magnetron with equivalent target length and target to substrate separation.
• >70% target use from flat targets >85% from dog-boned design.
• Fast target change – no need to break water seal - full clean-room compatibility.
• Bonded or mono-block targets. • Lower target material costs.
Fast target change – no need to break water seal - full clean-room compatibility
High coolant capacity – 15mm Ø water connections – allows upto 2m target length
Multi-power mode compatible - DC, DC pulsed, Hipims, RF and AC
Only rotating element is a ferro-fluidic type feed-through for the motor drive belt
GenSys75 double cathode assembly can fit into 220mm flange port widths
Single, dual, triple or quad sources can be configured to customer flange requirements with Gencoa standard anode and gas delivery options.
Standard, unbalanced, focused & DLIM magnetic options available for dual cathodes
GenSys75 - 400mm long with standard type DLIM magnetics and 16kW AC oxygen plasma
Plasma control by Double Low Impedance Magnetics - DLIM
Adjustment of angle relative to substrate position
DC
AC
This shows a typical DLIM design for reactive SiO2, TiO2 Nb2O5, AZO and ITO
GenSys75 – 3” OD rotatable target magnetron in DLIM configuration for AC power
Angular position of racetracks options
Focused option gives a narrower coating flux profile. Heat and plasma load will be higher on the substrate compared to standard magnetics – can be adjusted by tilting the magnetic arrays towards each other.
Unbalanced (PP type) and linked magnetics are also available for plasma bombardment
Varying the angle changes the plasma bombardment
GenSys75-360 – I/V for standard magnetics with aluminium target and DC power
Target length 360mm
GenSys75, 360mm long single at 3.1 mTorr DC (single) test
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All magnetic designs are carefully optimized to provide high target use and
optimum plasma and layer properties
This shows a standard magnetic field for a single cathode
Gencoa offer 3 tube OD formats – the standard 152mm with SCI end-blocks and
75mm OD and 100mm OD targets with the GenSys75
*SCI end-blocks require an additional adaptor flange for 75mm OD targets
Conversion of an SCI MM side mount mini type end-block to the
75mm OD target is also an option
Gas bar options and magnetically guided anodes are available to further enhance
the performance of your process
Supplementary magnetic anodes for rotatable cathodes with DC & DC pulsed power
More stable environment to avoid process drifts
The introduction of an optional magnetically guided hidden auxiliary anode and gas bar offers the following benefits: • lower plasma heating of the substrate – x3 power possible for web coating •reduced substrate movement influence on the plasma impedance • lower discharge voltages – lower impedance – lower TCO resistivity • less drift of plasma impedance and instability for non-conducting layers • more consistent uniformity •gas injected uniformly and protects hidden anode surface
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0 2 4 6 8 10 12
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tivity,
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Sample position
Resisitivity conventional (BOC) & DLIM at room temperature (every 25 mm)
resistivity BOC
resistivity DLIM
Comparison of reactive AZO in-front of a double AC rotatable magnetron
Comparing the 2 different magnetic designs
Gencoa Rotatable Magnet Bar Products
GRS75
Applications Component parts supplied
LS Low strength
Low strength for higher voltage sputtering
RF Radio frequency
Strength optimized for RF power modes with active anode
SSF Standard Strength
Focused
Standard field strength of 550 Gauss over the target with balanced field design
PP-RT Unbalanced ion assist processes
Single and multi-cathode unbalanced magnetic designs for high levels of ion assistance for deco and hard coatings
TCO Transparent
conduction oxide films
Single cathode magnetics with active anode for reduced resistivity TCO layers for DC and DC pulsed operation (patented)
LH/Web Single cathode with
lower heating of substrate
Single cathode magnetics with active anode for reduced heat loads during vacuum web coating for DC and DC pulsed operation – allows up to 3 x the power level compared to conventional magnetics (patented)
DLIM For better dual
cathode AC discharges
Double cathode Low Impedance Magnetics for high rate reactive deposition of oxides with lower substrate heating and plasma interference (patented)
DLIM-DC-TCO Single anode shared between 2 cathodes
for TCO
Double cathode low TCO resistivity magnetics for DC powered double magnetrons with an additional active anode (patented)
Gencoa have developed a wide range of magnet bar options for the GenSys75
magnetrons in order to control the plasma better
Magnet pack
Active magnetically
guided anode
The shorter GenSys75 with modular designs are the ultimate in flexibility for process
development – any process can be handled
• Single or dual configurations can be used with RF, DC, DC pulsed, AC & Hipims power configurations.
• Optional magnetic anodes for better plasma control.
• Various magnetic designs available and all
easily interchangeable for different layers development from one process module.
• The addition of a Speedflo gas controller, sensors and gas bars for reactive processes.
Sales agents / distributors located around the world and 95% of output is exported from the UK Main markets are USA, EU, Japan, Taiwan, Korea & China Local Gencoa based staff for technical support in USA, EU & Asia
GENCOA worldwide company presence