frank labortory of neutron physics ion beam analysis
DESCRIPTION
1. Diale Boitshoko Phenyo (UWC) 2. Sefage Amanda (UZ) 3. Nkosi Steven (CSIR) Republic of South Africa Supervisor: A.P. Kobzev (JINR, Dubna ). FRANK LABORTORY OF NEUTRON PHYSICS ION BEAM ANALYSIS. VAN DE GRAAFF ACCELERATOR EG-5. Main Characteristics - PowerPoint PPT PresentationTRANSCRIPT
FRANK LABORTORY OF NEUTRON PHYSICS
ION BEAM ANALYSIS
1. Diale Boitshoko Phenyo (UWC)
2. Sefage Amanda (UZ)
3. Nkosi Steven (CSIR)
Republic of South Africa
Supervisor: A.P. Kobzev (JINR, Dubna)JINR Summer Practice 2009
VAN DE GRAAFF ACCELERATOR EG-5
Main Characteristics
•Energy region 0.9-3.5 MeV
•Energy spread less than 500eV
•Beam intensity 10µA for He and
30µA for H.
Types of ions used
•4He+ and H+
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ACCELERATOR EG-5
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ANALYTICAL METHODS
• Rutherford Backscattering Spectrometry (RBS)
• Elastic Recoil Detection Analysis (ERDA)
• Particle Induced X-ray Emission (PIXE)
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2
12
121
21
22
0
12
cos)sin(
MM
MMMEE
m
PRINCIPLE OF RBSKINEMATIC FACTOR
Atomic mass of target. ZJINR Summer Practice 2009
2122
12
24
2
22
2122
12
222
21
)sin(sin
)]cos)sin[(4)4
(),(
MMM
MMME
eZZER
SCATTERING CROSS SECTION
Z1 - Atomic number of incident particle
Z2 - atomic number of target
M1 – Atomic mass of incident particle
M2 – Atomic mass of target
Ѳ - Scattering angle
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PRINCIPLE OF RBS
1
x+
θ1ΔX
θθ2
ΩDetector
outinm EEEKE )( 021
E0, Z1, M1
E1, Z2, M2
21 смэВdxdE
N
Stopping cross section
N-Number of particles in the layer
dxdE -Energy loss per unit length
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RBS EXPERIMENTAL RESULTS
A = σΩ .Q . Nt
A – total number of detected particlesQ – total no. of inc. ParticlesNt – no. of target atoms per unit area
Layer Element Conc. (at.%)
1 Niobium 100
2
Titanium 79Oxygen 21
3 Silicon 100
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Channel number
Layer Element Thickness (nm)
1 Titanium 418
2 Niobium 254
3 Silicon 2 mm
RBS EXPERIMENTAL RESULTS
Channel number
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RBS EXPERIMENTAL RESULTS
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200 400 600 800 1000 12000
500
1000
1500
2000
2500
3000
3500
4000
Yie
ld S
c.
Channel number
CO
TiSi
Si-Substrate
Energy = 2.01 MeV, H+ Detector Layer Element Conc.at% Thickness (nm)
1 Titanium 80Carbon 10 180Oxygen 10
2 Titanium 4042.3Silicon 50
Oxygen 103 Silicon 100 2 mm
PRINCIPLE OF ELASTIC RECOIL DETECTION ANALYSIS
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ERDA-RESULTS
200 400 600 800 1000 12000
500
1000
1500
2000
2500
3000
3500
4000
Bac
kSca
tterin
g In
ters
ity
Channel number
experimental simulated
Silicon
Carbon
Energy = 2.297 MeV, 4He+
Detector = 135
Thickness = 2600E+15 at./cm2
Element Conc. (%)
H ydrogen 35
C arbon 35
Silicon 30
Cou
nts
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ERDA – RESULTS cont,d
Element Conc. (%)
H ydrogen 26
C arbon 60
O xygen 14
Channel number
Channel number
Thickness = 1570E+15 at./cm2
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PRINCIPLE OF PIXE
Characteristics X-rays
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PRINCIPLE OF PIXE
Characteristics X-rays
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PRINCIPLE OF PIXE
Moseley law
• Rc – Rydberg’s constant• Z – atomic number• Sn – screening constant• n – main quantum number• ν - frequency of X-ray
quantum
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200 400 600 800 1000 1200 1400 16000
10
20
30
40
50
60
70
80
90
26.35
16.8420.12
17.7513.94
11.893.35
Inte
nsity
Channel number
CALIBRATION
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AEROSOL ANALYSIS BY PIXE & RBS
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550 600 650 700 750 8000
500
1000
1500
2000
2500
3000
3500
4000B
acks
catte
ring
yiel
d
Channel number
Aerosol E
p=2.005 MeV
=1350
S
Na AlSi
Ca Fe
F
O
NC
AEROSOL ANALYSIS BY PIXE & RBS
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Element Concen. At. % Method Element Concen. At. % Method
C 41
RBS K 0.1 PIXE
N 20.5 RBS Ca 0.53 RBS
O 28 RBS Mn 0.007 PIXE
F 2.6 RBS Fe 0.14 RBS
Na 2.5 RBS Cu 0.002 PIXE
Mg 1.3 RBS Zn 0.01 PIXE
Al 1.3 RBS As 0.001 PIXE
Si 1.8 PIXE Sr 0.0006 PIXE
S 0.2 RBS Zr 0.005 PIXE
Cl 0.01 PIXE Ba 0.01 PIXE
AEROSOL ANALYSIS BY PIXE & RBS
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CONCLUSION
• Non-destructive methods ( Different fields i.e. Electronic devices , Multi layer-structures,
geologist, archaelogist etc)
• Determine structure and composition of materials
• Elemental analysis
• Elemental concentration, depth profile in thin films ( < 1 at.%)
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ELEMENT Ti Nb
MINIMUM THICKNESS, nm
30 10
MAXIMUM THICKNESS, nm
1800 1500
REAL THICKNESS, nm
264 169,5
SENSITIVITY, at/cm2 2x10xx16 1x10xx16
CONCLUSION cont.d
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Siyabonga
JINR Summer Practice 2009