ferroelectric and magnetic properties of fe-doped batio3...
TRANSCRIPT
Ferroelectric and magnetic properties of Fe-doped BaTiO3 thin films grownby the pulsed laser depositionE. Venkata Ramana, S. M. Yang, Ranju Jung, M. H. Jung, B. W. Lee et al. Citation: J. Appl. Phys. 113, 187219 (2013); doi: 10.1063/1.4801965 View online: http://dx.doi.org/10.1063/1.4801965 View Table of Contents: http://jap.aip.org/resource/1/JAPIAU/v113/i18 Published by the American Institute of Physics. Additional information on J. Appl. Phys.Journal Homepage: http://jap.aip.org/ Journal Information: http://jap.aip.org/about/about_the_journal Top downloads: http://jap.aip.org/features/most_downloaded Information for Authors: http://jap.aip.org/authors
Ferroelectric and magnetic properties of Fe-doped BaTiO3
thin films grown by the pulsed laser deposition
E. Venkata Ramana,1,a) S. M. Yang,2 Ranju Jung,3 M. H. Jung,4 B. W. Lee,1 and C. U. Jung1,b)
1Department of Physics, Hankuk University of Foreign Studies, Yongin, Gyeonggi-do 449-791, South Korea2ReCFI, Department of Physics and Astronomy, Seoul National University, Seoul 151-747, South Korea3Department of Electrophysics, Kwangwoon University, Seoul 139-701, South Korea4Department of Physics, Sogang University, Seoul 121-742, South Korea
(Received 30 September 2012; accepted 5 January 2013; published online 8 May 2013)
Fe-doped BaTiO3 thin films were grown on (001) oriented SrTiO3 substrates using pulsed-laser
deposition technique. These films had a single-phase character and good epitaxial relationship with
the substrate. Polarization-electric field (P-E) hysteresis revealed saturated polarization with
remnant polarization (Pr) of 13.5 lC/cm2 for 10 mol. % Fe-doped BaTiO3 films. Further increase
of composition resulted in the large leakage currents and reduction of polarization. The
piezoelectric domain switching in the films was confirmed by local hysteresis using piezoelectric
force microscopy measurements. The Fe-doped BaTiO3 thin films exhibited room temperature
ferromagnetism, and the magnetization value increased with increasing Fe concentration. Our
results demonstrate that the addition of Fe �10 mol. % in BaTiO3 induces the ferromagnetism and
a switchable ferroelectric state. VC 2013 AIP Publishing LLC [http://dx.doi.org/10.1063/1.4801965]
I. INTRODUCTION
Multiferroics are functional materials that exhibit more
than one functionality. In particular, ferroelectricity and ferro-
magnetism have attracted considerable interest in the last few
years due to their interesting physical properties and wide
range of potential applications in magnetic data storage, sen-
sors, non-volatile memories, actuators, etc.1,2 Ferroelectricity
requires a non-centrosymmetric structural distortion, which is
usually not compatible with the presence of partially filled d-
level ions required for magnetic ordering.3 BiFeO3 is the only
known single-phase multiferroic material that exhibits both fer-
roelectricity and ferromagnetism, with coupling between the
two at room temperature.4 BiFeO3 is an interesting alternative
in this respect because it is lead free. Recently, researchers
have demonstrated that ferromagnetism can be achieved in
semiconducting and insulating oxides by the introduction of
transition metal (TM) ions. Cobalt ions implanted in polycrys-
talline layers of LiNbO3 ferroelectrics exhibited ferromagnet-
ism.5 Based on ab initio total energy calculations, Yoshida
et al.6 suggested that Cr, Mn, Fe, and Co are the most promis-
ing candidates in ferromagnetism for TM-doped BaTiO3
(TM¼Sc, V, Cr, Mn, Fe, Co, Ni, and Cu). Similarly, Co-
doped Ba(Sr,Ti)O3 thin films exhibited ferromagnetism.7 The
objective of the present work was to observe both ferroelectric-
ity and ferromagnetism in TM-doped BaTiO3 thin films.
BaTiO3 (BTO) is a classical ferroelectric material with a
relatively low Curie temperature, (TC)¼ 120 �C, in bulk. It can
be grown epitaxially on a (001)-oriented perovskite SrTiO3
(STO) substrate. Because its in-plane lattice constant,
a¼ 3.992 A, is larger than that of STO, (a¼ 3.905 A), a large
(2.2%) lattice mismatch exists between BTO and the cubic
STO substrate. Thus, BTO thin films grown on the STO sub-
strates usually have misfit dislocations near the hetero interface
to relax misfit strains. Such misfit dislocations and the strain
fields around the defects often have considerable effects on the
physical properties of the thin films.8 Recently, Mn-doped BTO
films grown on STO (001) substrates exhibited ferroelectricity
and ferromagnetism for doping up to 2 mol. %.9 Rajamani
et al.10 found ferromagnetic behavior and Faraday rotation in
Fe-doped BTO thin films grown on MgO (100) substrates using
a pulsed-laser deposition method for typical compositions of
Fe� 15 mol. %.10 In a similar study, Maier et al.11 estimated
the magnetic Curie temperature to be greater than 450 �C for
BaTi0.5Fe0.5O3 thin films grown on STO (001) substrates.
In this study, we grew Fe-doped BTO thin films using
pulsed-laser deposition to investigate their phase, micro-
structure, ferroelectricity, and ferromagnetic behavior at
room temperature. We used Fe-doping up to 20 mol. %; our
results indicate that the films with 10 mol. % Fe doping
exhibited the best multiferroic physical properties.
II. EXPERIMENTAL
Polycrystalline ceramic targets of Ba(Ti1�xFex)O3
(BTFO) with x¼ 0.0 (BTO), 0.1 (BTFO10), and 0.2
(BTFO20) were synthesized according to the regular ceramic
route. High purity (99.9%) BaCO3, TiO2, and Fe2O3 were
used as starting materials. Stoichiometric amounts were cal-
cined at 1200 �C for 10 h and sintered at 1300 �C for 4 h as
ceramic targets. Thin films of BTFO were grown on (001)-
oriented single-crystalline STO substrates using pulsed-laser
deposition.12,13 The conductive SrRuO3 (SRO) layer was
first grown on STO substrate, which serves as the bottom
electrode for electrical measurements. Polycrystalline BTFO
and SRO targets were ablated by a KrF excimer laser
(k¼ 248 nm) with an energy density of 2 J/cm2 at a repetition
rate of 2–4 Hz. The target-to-substrate distance was kept at
5 cm. A SRO layer (�50 nm) was grown on the STO with a
a)Presently at I3N-Aveiro, Department of Physics, University of Aveiro,
Aveiro-3810-193, Portugal.b)Author to whom correspondence should be addressed. Electronic mail:
0021-8979/2013/113(18)/187219/5/$30.00 VC 2013 AIP Publishing LLC113, 187219-1
JOURNAL OF APPLIED PHYSICS 113, 187219 (2013)
substrate temperature (TS) of 750 �C and an oxygen partial
pressure (PO2) of 100 mTorr. BTFO films were grown on
SRO/STO and STO substrates at TS¼ 750 �C and
PO2¼ 20 mTorr. After deposition, the films were post-
annealed at 500 �C for 1 h in ambient oxygen (�0.6 atm).
The thickness of the films was estimated using a high-
resolution transmission electron microscope (HRTEM,
Tecnai 20F). All BTFO films were 15–20 nm thick.
Structural analysis was performed using a four-circle high-
resolution X-ray diffractometer (D8, Bruker). The surface
morphology of the films was examined by atomic force mi-
croscopy (AFM, PSIA). To measure the electrical properties
of the BTFO/SRO/STO (001) heterostructures, we fabricated
square-shaped Pt capacitors with areas of 40� 40 lm using
an electron-beam evaporation process. Polarization was
measured as a function of the electric field (P–E loops) at
2 kHz using a TF analyzer 2000 equipped with FE-module
(HV) (aixACCT). The switching of the local ferroelectric
polarization was studied using piezoresponse force micros-
copy (PFM, XE-100, Park Systems) and Au–Cr-coated Si
tips with a spring constant (k) �0.65 N=m. The amplitude
(R) and phase (h) of the piezoelectric signals were measured
using a lock-in amplifier (SR830). The magnetic properties
were determined using a superconducting quantum interfer-
ence device (MPMS SQUID VSM).
III. RESULTS AND DISCUSSION
Fig. 1(a) shows the X-ray h-2h scan patterns of the
BTFO films grown on SRO-buffered STO (001) substrates.
The peaks corresponding to (00l) reflections, but without
secondary phases in the sensitivity range of HRXRD, indi-
cate highly textured epitaxial growth. The position of the
(002) peak shifted systematically toward lower angles with
increasing Fe content in BTO, suggesting that the Fe was
doped at the B-site. The out-of-plane lattice parameters cal-
culated from the (002) reflections were 4.186 A, 4.213 A,
and 4.233 A for BTO, BTFO10, and BTFO20, respectively.
The c-axis lattice constant of the BTO film was larger than
that of bulk BTO (4.036 A) by �4%, which may have been
due to the compressive strain.14 The increase in the lattice
constant with increasing Fe content in the BTO was similar
to a previous study of BTFO films grown on MgO sub-
strates.10 Such an increase in unit cell parameters is expected
due to the volume expansion and the formation of oxygen
vacancies that occur when large Fe3þ(64.5 pm) ions replace
Ti4þ(60.5 pm) ions.15 From the earlier work on these com-
pounds with Fe� 15 mol. % (grown on MgO and STO sub-
strates),10,11 it can be understood that the expansion of lattice
is independent of lattice mismatch.
The epitaxial relation of the BTFO films was verified by
the X-ray reciprocal space mapping measured around the
(103) reflection of STO (001). Fig. 1(b) shows that the peaks
corresponding to the BTO, SRO, and STO lie on the same
horizontal line, indicating that the film was grown coherently
with the STO substrate and had the same in-plane lattice
parameter.
From the cross-sectional HRTEM image (Fig. 2), it can
be seen that the BTFO thin films have highly oriented growth
on the STO (001) substrate with a single crystalline quality.
A sharp interface between film and the substrate clearly con-
firms the Fe doping into the BTO lattice. Figure 3 shows the
surface morphology of the BTFO10/SRO/STO (001) thin
films. The step-terrace structure of the films following post-
annealing was seen in the atomic force microscopy image.
The BTFO and SRO had the similar surface morphology as
the STO substrate. The line profile confirmed that the steps
likely had a height of one unit-cell, and the terraces were
atomically smooth (RMS roughness of the BTFO films was
0.4–1 nm).
The ferroelectric polarization of the BTFO/SRO/STO
(001) heterostructures with Pt top electrode is shown in
Fig. 4. Here, it can be noted that the SRO buffer layer
(50 nm) on STO (001) serves as lattice-matched bottom elec-
trode. According to the Tagantsev and Stolichnov’s model,16
FIG. 1. (a) h-2h XRD scan of the BTFO thin films grown on the SRO/STO
(001) substrate for x¼ 0.0, 0.1, and 0.2. (b) X-ray reciprocal map for BTO/
SRO/STO(001) film measured around (103) Bragg reflection.
FIG. 2. (a) Cross-sectional bright field TEM image showing the thickness
and (b) HR-TEM image at the interface for the BTFO10 film grown on STO
(001).
187219-2 Venkata Ramana et al. J. Appl. Phys. 113, 187219 (2013)
SRO with good conductivity decreases the thickness of inter-
facial dielectric layer between the ferroelectric and electrode
layers, thereby improving ferroelectric limits. Fig. 4 depicts
that the BTO films had a typical ferroelectric nature, whereas
the BTFO10 exhibited switchable polarization, with a trend
of saturation within the applied voltage range. However, the
BTFO20 film exhibited leaky dielectric behavior with unsat-
urated polarization. The inset of Fig. 4 clearly shows the
peaks in the polarization current for BTFO10 confirming the
existence of a switchable ferroelectric state that was absent
in the BTFO20. The remnant polarizations (Pr) for the BTO
and BTFO10 films were �22 lC/cm2 and 13.5 lC/cm2,
respectively; decreased polarization as the Fe content
increased. The Pr for the BTO film was slightly smaller than
that of the bulk BTO (26 lC/cm2)17 and comparable to that
of the BTO/SRO/STO(001) films with NiFe electrodes
reported by Zhang et al.18 The most significant result in the
present study is that the Pr for 10 mol. % Fe-doped BTO
films was much larger (with lower leakage current) than
those of 2 mol. % Mn-doped BTO films (Pr¼ 3.7 lC/cm2).9
These results clearly indicate that the films (BTO and
BTFO10) were insulated in an electric field up to �5 MV/cm
without causing dielectric breakdown. To confirm the
ferroelectric behavior of the BTFO10 and BTFO20, the PFM
response was recorded. As shown in Fig. 5(a), the hysteresis
loops for phase vs. bias voltage indicate 180� phase reversal
for both films, confirming the existence of ferroelectric
switching. The piezoresponse hysteresis loops (Fig. 5(b))
show that the BTO and BTFO10 films had switchable pie-
zoresponse by the external bias, whereas that of BTFO20
film was not saturated within the applied voltage range. The
decrease in the piezoresponse with increasing Fe content
clearly indicates that the polarization decreased with increas-
ing Fe doping. The increase of leakage current due to the for-
mation of oxygen vacancies during the growth and the
existence of multiple Fe valences (Fe3þ$Fe4þ) may have
played a vital role in the decrease in polarization. In general,
the polarization and piezoelectric strength of the ferroelec-
trics is known to decrease with the addition of acceptor ions
to the host lattice. The oxygen vacancies created as part of
the charge compensation have a clamping effect on the
motion of domain walls.19 Such effects associated with the
appearance of oxygen vacancies could suppress the degree
of modulating spontaneous polarization, which is obvious
from the results of Figs. 4 and 5.
Fe 2p spectra of BTFO thin films measured by X-ray pho-
toelectron spectroscopy (XPS) are shown in Fig. 6. It can be
seen that the 2p3/2 and 2p1/2 spin-orbit doublet components
were located at about 710 eV and 724 eV, respectively, in both
BTFO10 and BTFO20 film. For BTFO20, a satellite structure
is observed at about 718 eV which is 8 eV away from the 2p3/2
peak. This satellite structure is similar to that of LaFe3þO3.20
It supports that the valence state of Fe in BTFO20 is þ3. In
the case of BTFO10, Fe 2p spectrum is very noisy due to
smaller amount of Fe in BTO. The satellite feature is very
weak or hardly discriminated. This weak satellite present
looks like that of SrFeO3.21 It reveals that the valence state of
Fe in BTFO10 is a mixture of þ3 andþ4, or þ4.
FIG. 3. Atomic force microscopy image for 20 nm thick BTFO10 thin film
grown on SRO/STO (001) substrate.
FIG. 4. Ferroelectric hysteresis loops of BTFO/SRO/STO (001) films meas-
ured at a frequency of 2 kHz. Inset: polarization current (IP) for the BTFO10
and BTFO20 films.
FIG. 5. Piezoforce response for the BTFO/SRO/STO (001) films: (a) phase
vs. bias voltage and (b) piezoresponse vs. voltage.
187219-3 Venkata Ramana et al. J. Appl. Phys. 113, 187219 (2013)
Fig. 7 shows the magnetic hysteresis loops at room tem-
perature for BTFO10/STO (001) and BTFO20/STO (001)
films after subtracting the diamagnetic signal (STO sub-
strate) from the total magnetization [we observed a diamag-
netic signal for the BTO/STO (001) thin film]. The
magnetization had a saturation character with the applied
magnetic field due to the ferromagnetism. The saturation
magnetization (MS) and coercive field (HC) were 4.75 emu/
cc (0.038 lB/Fe) and 50 Oe for the BTFO10 film and
10.3 emu/cc (0.1 lB/Fe) and 40 Oe for the BTFO20 film,
respectively. The value of MS for the BTFO20 film was com-
parable to that for film grown on a MgO substrate (12 emu/
cc).10 The ferromagnetic (FM) nature of Fe-doped BTO films
with Fe content �0.15 was previously reported.10 Present
results for samples with Fe> 10 mol. % confirm the earlier
observation. Small differences in the zero-field-cooled
(ZFC) and field-cooled (FC) magnetizations measured under
H¼ 500 Oe in the temperature range of 5–400 K suggest the
presence of FM behavior.
The observed magnetization in BTFO can be ascribed to
the contribution of Fe valence fluctuation or oxygen vacan-
cies and their interactions with Fe3þ (Fe3þ � Vo � Fe3þ, Vo
is the oxygen vacancy) rather than the impurities. We arrived
at this possibility based on the facts that (a) the HC of Fe2O3-
thin films exceeds 600 Oe at room temperature22 and (b) the
XRD patterns of the films do not show any traces of impur-
ities corresponding to BaFeO3/BaFe12O19 (thin films of
BaFeO3/STO(100) show parasitic ferromagnetism/antiferro-
magnetism, and BaFe12O19 thin films have much larger MS
and HC� 100 Oe),23,24 Fe2O3, or Fe3O4. In addition, the sat-
uration magnetization for Fe2O3 or Fe3O4 as impurities
exceeds 70 emu/cc, which is much higher than the observed
magnetization values of our BTFO films. If the magnetic sig-
nal came only from Fe2O3 or Fe3O4 (if any), the volume per-
cent of these impurities inside the film cannot be negligible,
which is not consistent with the XRD data without a impurity
peak and AFM data with the atomic flatness. Thus, the FM
must have been intrinsic and most likely due to defect com-
plexes from the substitution of Fe3þ for B-site Ti4þ.
Rajamani et al.10 and Maer et al.11 suggested that the magne-
tism in BTFO grown on MgO is due to the presence of Fe3þ
and Fe4þ. In addition the increase in leakage current (from
P-E and I-V) with increasing Fe content in our films indicates
that the doping induced the related defects. Lin et al.9
explained the existence of FM in these systems based on the
defects (cited above) related to the bound magnetic polaron
model proposed by Coey et al.25 for dilute magnetic semi-
conductors (DMS). According to this model, the magnetism
in DMS depends on the cation and the donor polaron concen-
tration, and the local magnetic structure is related to the dis-
tribution of the magnetic polarons. In a recent study, Yao
et al.26 demonstrated that Mn-doped BTO thin films grown
by the PLD under smaller oxygen partial pressure of
10 mTorr exhibited a FM nature while the films under higher
oxygen pressure have the paramagnetic order (100 mTorr)
and related the disparity to the presence of Vo concentration.
In our BTFO films, which are grown at lower oxygen partial
pressure (20 mTorr) oxygen vacancies are expected to form
in the vicinity of Fe ions to maintain charge neutrality, lead-
ing to the formation of bound polarons which overlap with
each other resulting in a long range ferromagnetic order. At
the same time, the Fe3þ ion with 3d5 has unoccupied spin
orbitals in which trappd electron will spin down and the two
neighbors will spin up. The superexchange interaction
between two Fe3þ ions results in antiferromagnetism while
the exchange interaction Fe3þ � Vo � Fe3þ will be a FM. As
the content of Fe in BTO increases, the resulting competition
between the FM and AFM interactions will lead to the
observed magnetic behavior shown in Fig. 7. In a study, by
means of ab initio calculations, Ray et al.27 related the FM
in BTFO single crystals to intrinsic magnetic inhomogene-
ities arising from positional disorder. Overall, the magnetic
behavior in BTFO can be considered to arise due to the
defect complexes such as oxygen vacancies and Fe valence
fluctuations. In BaTiO3, empty d orbitals are necessary to
stabilize the Ti off-centering in order to maintain the long-
range ferroelectric order. Substitution of Fe for some Ti ions
destroys the stability of the off-centering displacement to
FIG. 7. Magnetic hysteresis loops for the BTFO10 and BTFO20 thin films
on STO (001) at room temperature. Inset: ZFC-FC curves of the BTFO10
sample as a function of temperature under H¼ 500 Oe.
FIG. 6. XPS spectra of Fe 2p state of BTFO thin films on STO (001).
187219-4 Venkata Ramana et al. J. Appl. Phys. 113, 187219 (2013)
some extent, resulting in reduced polarization and room tem-
perature ferromagnetism. The present study demonstrated
that the BTFO films (BTFO10 in particular) exhibit FM
behavior with reasonably good ferroelectricity.
IV. CONCLUSIONS
Thin films of 10% and 20% Fe-doped BaTiO3 were
grown on SrRuO3-buffered SrTiO3(001) substrates.
Structural analysis showed that the films had an epitaxial
relationship with the SrTiO3 substrate and the SrRuO3 layer.
All the samples exhibited ferroelectric nature, as confirmed
from the polarization vs. applied voltage and PFM response.
All the films showed nearly 180� phase reversal with the
applied bias voltage, and both films exhibited ferromagnetic
nature. These results indicate that insulating BTFO10 film
with a switchable ferroelectric and ferromagnetic state is a
promising candidate for magnetoelectric applications.
ACKNOWLEDGMENTS
This work was supported by Basic Science Research
Program through the National Research Foundation of Korea
(NRF) funded by the Ministry of Education, Science and
Technology (2012R1A1A2008595 and 2012R1A1A2008845).
C. U. Jung is supported by Hankuk University of Foreign
Studies Research Fund of 2010. R. Jung is supported by
Kwangwoon University Research Fund (2011).
1M. Bibes and A. Barth�el�emy, Nat. Mater. 7, 425 (2008).2G. Catalan and J. F. Scott, Adv. Mater. 21, 2463 (2009).3N. A. Hill, J. Phys. Chem. B 104, 6694 (2000).4J. Wang, J. B. Neaton, H. Zheng, V. Nagarajan, S. B. Ogale, B. Liu, D.
Viehland, V. Vaithyanathan, D. G. Schlom, U. V. Waghmare, N. A.
Spaldin, K. M. Rabe, M. Wuttig, and R. Ramesh, Science 299, 1719
(2003).
5C. Song, F. Zeng, Y. X. Shen, K. W. Geng, Y. N. Xie, Z. Y. Wu, and F.
Pan, Phys. Rev. B 73, 172412 (2006).6H. Nakayama and H. K. Yoshida, Jpn. J. Appl. Phys. 40, L1355 (2001).7L. B. Luo, Y. G. Zhao, H. F. Tian, J. J. Yang, H. Y. Zhang, J. Q. Li, J. J.
Ding, B. He, S. Q. Wei, and C. Gao, Appl. Phys. Lett. 92, 232507 (2008).8M.-W. Chu, I. Szafraniak, R. Scholz, C. Harnagea, D. Hesse, M. Alexe,
and U. G€osele, Nat. Mater. 3, 87 (2004).9Y. H. Lin, J. Yuan, S. Zhang, Y. Zhang, J. Liu, Y. Wang, and C.-W. Nan,
Appl. Phys. Lett. 95, 033105 (2009).10A. Rajamani, G. F. Dionne, D. Bono, and C. A. Ross, J. Appl. Phys. 98,
063907 (2005).11R. Maier and J. L. Cohn, J. Appl. Phys. 92, 5429 (2002).12E. V. Ramana, H. W. Park, and C. U. Jung, IEEE Trans. Magn. 46, 2228
(2010).13C. U. Jung, H. Yamada, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett.
84, 2590 (2004).14L. Beckers, J. Schubert, W. Zander, J. Ziesmann, A. Eckau, P.
Leinenbach, and C. Buchal, J. Appl. Phys. 83, 3305 (1998).15R. D. Shannon, Acta Crystallogr. A 32, 751 (1976).16I. Stolichnov, A. Tagantsev, N. Setter, S. Okhonin, P. Fazan, J. S. Cross,
and M. Tsukada, J. Appl. Phys. 87, 1925 (2000).17B. Jaffe, W. R. Cook, Jr., and H. Jaffe, Piezoelectric Ceramics (Academic
Press, London, 1971), p. 78.18Y. Zhang, J. Liu, X. H. Xiao, T. C. Peng, C. Z. Jiang, Y. H. Lin, and C. W.
Nan, J. Phys. D: Appl. Phys. 43, 082002 (2010).19A. J. Moulson and J. M. Herbert, Electronic Ceramic Materials and Their
Applications (Chapman & Hall, London, 1990).20W. Eerenstein, F. D. Morrison, J. Dho, M. G. Blamire, J. F. Scott, and N.
D. Mathur, Science 307, 1203A (2005).21A. E. Bocquet, A. Fujimori, T. Mizokawa, T. Saitoh, H. Namatame, S.
Suga, N. Kimizuka, Y. Takeda, and M. Takano, Phys. Rev. B 45, 1561
(1992).22W. D. Chang, T. S. Chin, H. S. Wu, S. W. Chow, and J. H. Jou, J. Appl.
Phys. 77, 1184 (1995).23T. Matsui, H. Tanaka, N. Fujimura, Y. Itoh, H. Mabuchi, and K. Morii,
Appl. Phys. Lett. 81, 2764 (2002).24A. L. Geiler, S. D. Yoon, Y. Chen, C. N. Chinnasamy, Z. Chen, M. Geiler,
V. G. Harris, and C. Vittoria, Appl. Phys. Lett. 91, 162510 (2007).25J. M. D. Coey, M. Venkatesan, and C. B. Fitzgerald, Nat. Mater. 4, 173
(2005).26Y. Shuai, S. Zhou, D. B€urger, H. Reuther, I. Skorupa,V. John, M. Helm,
and H. Schmidt, J. Appl. Phys. 109, 084105 (2011).27S. Ray, P. Mahadevan, S. Mandal, S. R. Krishnakumar, C. S. Kuroda, T.
Sasaki, T. Taniyama, and M. Itoh, Phys. Rev. B 77, 104416 (2008).
187219-5 Venkata Ramana et al. J. Appl. Phys. 113, 187219 (2013)