fabrication of microheater and inter- digited electrodes on silicon platform for low power...
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8/13/2019 FABRICATION OF MICROHEATER AND INTER- DIGITED ELECTRODES ON SILICON PLATFORM FOR LOW POWER IN-TE…
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ISSN: 2321-2667 Volume 2, Issue 4, July 2013 6
Journal of Research in Electrical and Electronics Engineering (ISTP-JREEE)
FABRICATION OF MICROHEATER AND INTER - DIGITED
ELECTRODES ON SILICON PLATFORM FOR LOW POWER IN-
TEGRATED GAS SENSOR APPLICATIONS
Mr. Santanu Maity1 , Assistant Professor, ECE, NIT,AP, e-mailID: [email protected]; Mr. Abhishek Kumar2, Assistant Professor, EEE, NIT,AP
e-mailID: [email protected], Mr. Sahadev Roy3, Assistant Professor, ECE, NIT,AP, e-mailID: [email protected], Mr. Vinay Kumar Dwive-
di4, MNNIT, e-mailID: [email protected], BalajiTripathi5,Student, ECE, NIT,AP, Ashmit Sharma6, Student, ECE, NIT,AP, Dayasagar Agra-
hari7 Student, ECE, NIT,AP
Abstract
Power consumption and sensing material selection is the most
important issue for gas sensor realization. MEMS based MetalOxide Sensors using micro-machining structure can be used forlow power consumption. In this paper we are proposing a novel
coplanar micro heater structure along with two Inter Digited
Electrodes (IDE) for different gas sensing purpose on thin Sili-
con dioxide membrane for an operational tem perature of ≤200oC
with <50mW power consumption.
Introduction
Battery power consumption for a hand held electronic instrument
is the primary requirement of gas sensor application. Micro elec-
tro mechanical system (MEMS) based technology is very much
applicable for reduction of consumed power. A study on piezore-
sistive Micro-Electro-Mechanical Systems (MEMS) cantileverfor a chemical sensitive - mass based sensor has been carried out
to enhance sensor sensitivity by Subhashini et al.[1]. The sensi-
tive region attracts the CO2 molecules.Huge work reported so far
deal with the design of either platinum [1] or polysilicon [2] mi-
croheater particularly applicable in the higher temperature range
(400-700ºC) [3]. MEMS based devices those produced through a
combination of standard CMOS technology and MEMS post-
processing as described in the several literature [4]-[10]. Varietyof heater based devices has been demonstrated such as resistive
temperature sensors [11], resistive heaters [12], thermal actuators
[13], thermoelectric sensors [14] and also conductometric gassensors have also been designed and fabricated by several groups[15]. Micromachining technique is best and established technique
for getting different MEMS structure. Wang et al. [16] con-
structed an array of sensor elements fabricated on silicon mem-
branes, which provided improved thermal isolation of the active
area Using micromachining techniques. Advances in thin film
processing, and micromachining techniques, have made this an
extremely attractive approach which are Ikegami et al. [17] fabri-
cated a uniformly heated array of six elements on an alumina
substrate, and used this array to identify gases such as ammonia
methanol, and hydrogen sulfide. Individual heater element with
sensor fabricated using silicon integrated structure and use of
thin film techniques have also been described by Chang et al
[18]. Inter digitated electrodes (IDEs) for sensing application areimplemented in various sensing devices including surface acous
tic wave (SAW) sensors, chemical sensors as well as curren
MEMS biosensors [19]. Different researchers show that increas
ing electrode thickness yielded an increase in current and overalsignal with small increases in signal noise. This increase in cur
rent is thought to be due to increased surface area [20]. Radke eal. in [18] also optimize another type of IDE for better perfor
mance. Gas sensors based on solid-state property have been used
by the semiconductor industry for both life safety and proces
applications [21].
In our study we have taken two identical electrodes with differ-
ent sensing layer for identify different gasses by using singleheater as a result it consume low power. And the heater can pro-
duce more than 350oc at low voltage (1.5v).
Fabrication and result analysis:
Device structure:
The device structure is shown in figure 1 is the single cantilev
er based structure. Where within one die there are one heater and
one electrode. It is considered the electrode as the Inter DigitedElectrode from which it can measure the gas sensing property
Silicon substrate of <100> orientation and resistivity is 1-5 ohm
cm is taken as the platform for making micro machined structure
The die size of the micro heater is 3mm X 3mm because it re
duces the power consumption. In figure 2 it is showing fabricated
gas sensing device where yellow portion is electroplated gold
and black portion is Ti/Pt.
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(a)
(b)Figure 1:(a)Top view of micro heater, (b) colour code
Fabrication and discussions:
Sensing layer is the most important part of gas sensor. By chang-
ing sensing different parameters like material properties, thick-
ness of sensing materials, crystal orientation, and also deposition
procedure it is possible to get different sensing result. Here it is
shown the alignment of sensing material as it is needed to depositon the electrode. Activation of sensing layer is also one of theimportant parts of gas sensor fabrication.
Figure 2: Top view of micro heater
Figure 3: Top view of micro heater (bad alignment)
It shown in figure 3 is that the zinc oxide sensing layer max
imally placed on the top of the micro heater but partially on theIDE. So there is an alignment problem. The deposition was done
by using tensile mask. The alignment problem can be overcome
by using lithography technique where pattern can make on the
top of the electrode by using positive photo resist.
Figure 4: Top view of micro heater (better alignment)
Figure 5: Deposited ZnO on SiO2 substrate
But it increases the fabrication steps. As a solution it may be
consider tensile mask of Si substrate (2” Si wafer) by using tetra
methyl ammonium hydroxide (TMAH) solution which shown infigure 4. ZnO sensing layer is also very much important for
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sensing application. The FE-SEM image of deposited ZnO is
shown in figure 5.
Fig. 6: fabrication process steps
Fig. 6 shows the proposed process flow for fabricating the mi-
croheater die. As the lift off process considered for (Ti/Pt etchant
is not friendly) making heater and IDE then adhesion is the vital
issue. So different ratio of Ti/Pt can be deposit where 40nmTi100nm Pt is good adhesive composite. Selective gold plating of
the contact pads is needed for proper wire bonding shown in fig-
ure 7. Etched out of Si from the back of the Die (micro heater) by
using TMAH is the very good technique to reduce power con-
sumption. Micromachining technique (shown in figure 8) is very
much critical because in a two inch wafer it can fabricated 30devise, so for separation of all devices scribe line can be used. In
a 25% solution of TMAH at 90oc temperature is the better con-
trolled solution for making MEMS structure the etch rate de-
creases with increasing TMAH concentration.
Fig 7. : Fabrication process steps
Fig 8. : Micromachined back surface
New proposed structure:
In the present work it is proposed to fabricate a micro heater
element for low temperature integrated gas sensors. In this pro
posal a thin 1 μm Silicon dioxide cantilever is used for housing
the heater structure and the IDE.
Figure 9: Modified die for two different types’ gases (top view)
In practical the maximum temperature of around 200 oC with a
uniform distribution over the entire micro heater membrane re
gion has been achieved with 1.5V excitation.
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1 2 3
0
100
200
300
T e m p a r a t u r e ( o c )
Applied voltage (Volt)
Temparature
0 1
0
1
Figure 10: Temperature distribution of a Single microheater by
applying different voltages
Conclusion
In this paper it is mainly focused on power factor so by using
single heater and also tried to reduce power consumption. A
3mm X 3mm micro heater die with coplanar IDE has been de-
signed and the fabrication process has been initiated to sense two
different types of gases by using single device. By decreasingthe electrode spacing and increasing no of electrodes the effec-
tive electrode area is increased as a result an increase in the sen-
sitivity of the device. This device may further be miniaturized
and modified to achieve even lower power consumption and bet-ter performance.
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Biographies
Santanu Maity, obtained his M.Tech in Radiophysics and Elec-
tronics from Calcutta University, Rajabazar Science college and
perusing Ph.D. in Solar photovoltaics from Center of Excellence
for Green Energy and Sensor Systems(CEGESS),kolkata. Heworked on RF MEMS based switch, MEMS based gas sensor,
Crystalline solar cell etc. He has three years on laboratory re-
search experience. Now he is Assistant professor of ECE de-
partment in National Institute of Technology, Arunachal Pradesh.
Abhishek Kumar received his B.Tech (EEE) degree from
Pondicherry university (Central University, under MHRD, GOI)in year 2009 and M.Tech degree in Power System Engineering
from NERIST Deemed University (Autonomous Institute, underMHRD, GOI), Nirjuli, India in the year 2012. He is currently
working as an Assistant Professor with department of Electrical
& Electronics Engineering, National Institute of Technology,Arunachal Pradesh, India. His areas of intrest are Power Elec-
tronics, Electrical Machine, Power Quality, Power system,
Hybrid Energy Technologies, Distributed Generation
&Renewable Energy. Mr. Kumar is a member of Institute of
Electrical & Electronics Engineer (IEEE) USA, Institute of En-
gineering Technology (IET) UK and SCIEI. [email protected]
Vinay Kumar Dwivedi is currently pursuing his M.Tech de-
gree in Power Electronics & ASIC design from Motilal Nehru
national institute of technology (MNNIT), Allahabad, U.P., In-
dia and graduated from Uttar Pradesh technical university,
Lucknow, U.P., India in year 2008. He was a Faculty member
with Dr. K. N. Modi institute of engineering & technology,Ghaziabad, U.P. for about two years and then was with the MIT,
Ghaziabad for about one year. His areas of interest are Power
electronics, Power Quality, Network and Control system. Mr.
Dwivedi is a student member of Institute of Electrical & Elec-tronics Engineer (IEEE). [email protected]
Sahadev Roy is currently working as an Assistant Professor in
ECE Department at NIT, Arunachal Pradesh, India. He has more
than 9 years Experience in research and teaching field. He re-
ceived his B.Tech degree in ECE and M.Tech, in Mechatronics
from Bengal Engineering and Science University, Shibpur, India
He perusing PhD in VLSI from NIT,AP. He has published a
number of scientific papers in National and International Jour
nals. His research interest includes Robotics, Microwave Solid
State Device and VLSI design.