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UNIVERSITY OF ILLINOIS OPTICAL AND DISCHARGE PHYSICS RKINDER_AVS_2000_1 Electron Transport and Power Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L. Kinder and Mark J. Kushner University of Illinois, Urbana-Champaign e-mail : [email protected] [email protected] http://uigelz.ece.uiuc.edu Work Supported by : AMAT, SRC, NSF and DARPA/AFOSR AVS 47 th International Symposium Boston, MA October 2, 2000

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Page 1: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICSRKINDER_AVS_2000_1

Electron Transport and PowerDeposition in Magnetically Enhanced

Inductively Coupled Plasmas

Ronald L. Kinder and Mark J. KushnerUniversity of Illinois, Urbana-Champaign

e-mail : [email protected] [email protected]

http://uigelz.ece.uiuc.edu

Work Supported by :AMAT, SRC, NSF and DARPA/AFOSR

AVS 47th International SymposiumBoston, MA

October 2, 2000

Page 2: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICSRKINDER_AVS_2000_2

AGENDA

l Motivation

l Plasma Modeling - Hybrid Plasma Equipment Model (HPEM)

l Trikon Mori Helicon Sourcel Validationl Effects of TG Mode

l Analysis of Helicon Component

l Non-Collisional Heatingl Axial Accelerationl Phase Matching

l Conclusions

Page 3: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

MOTIVATION FOR MAGNETICALLY ENHANCED ICPs

l In order to maintain process uniformity over large areas (> 300 mm) efficient new plasma sources are being developed.

l It is often desirable to produce plasmas in the “volume” of large reactors. This is difficult to accomplish using ICPs due to their finite skin depth.

PLASMA

SUBSTRATE

SOLENOID

B-FIELD ANTENNAE&M WAVE

l Magnetically Enhanced Inductively Coupled Plasma (ME-ICPs) sources are being investigated due to their high ionization efficiency and their ability to deposit power within the volume of the plasma.

l The location of power deposition can substantially vary depending on the mode of operation and reactor conditions.

RKINDER_AVS_2000_3

Page 4: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

PROPERTIES OF MAGNETICALLY ENHANCED ICPs

RKINDER_AVS_2000_4

l The coupling of electromagnetic fields to the plasma occurs through two channels.

l Helicon Wave l Electrostatic Wave (TG)

l Helicon waves have the property that their parallel phase velocities can be matched to the thermal velocities of 20 - 200 eV electrons.

l Chen and Boswell have suggested Landau damping as a collisionless heating mechanism. If the wave grows fast enough, it can trap thermal electrons and accelerate them to the phase velocity.

l More recently it has been suggested that much of the electron heating comes from the TG component of the wave.

l Here we report on power deposition on MEICPs by these mechanisms.

Page 5: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

HYBRID PLASMA EQUIPMENT MODEL

l The base two-dimensional HPEM consists of an electromagnetics module (EMM), an electron energy transport module (EETM), and a fluid kinetics simulation (FKS).

l A full tensor conductivity was added to the EMM to calculate 3-d components of the inductively coupled electric field based on 2-d applied magnetostatic fields.

l The plasma current in the wave equation is addressed by a cold plasma tensor conductivity.

l Particle transport:Neutrals: Continuity, Momentum, EnergyIons: Continuity, Momentum, EnergyElectrons: Drift Diffusion, EnergyEEDF: Monte Carlo Simulation

l Potentials: Poisson Equation

RKINDER_AVS_2000_5

Page 6: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

HPEM ELECTROMAGNETICS : TG MODE

RKINDER_AVS2000 _6

University of Illinois Optical and Discharge Physics

εερ enq

E∆

==⋅∇ ( )ωω

σ

i

q

E

nDamp

e where,

+

⋅⋅∇−

=∆

• If plasma neutrality is not enforced, the divergence term in the waveequation must be included.

! The divergence of the electric field is equal to the wave perturbedelectron density.

• The gradient of the perturbed electron density, represents an effective current sink due to the TG mode.

EiEEE ⋅−=

∇⋅∇−

⋅∇∇ σωεω

µµ 211

TG Wave Helicon Wave

Page 7: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

TRIKON MORITM 200 PLASMA TOOL

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

l A commercial Trikon Technologies, Inc., Pinnacle 8000 plasma tool was used to validate the model.

RKINDER_AVS_2000_7

Nozzle

Wafer

Coils

Bell Jar

Radius (cm)20 20

50

0

Electromagnet

PumpPort

Location ofReference

B Field

0

Page 8: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

l As static magnetic field increases, the ion saturation current peaks further downstream. Simulations show a similar trend for the ion profile.

l With increasing magnetic field, electric field propagation progressively follows magnetic flux lines and significant power can be deposited downstream.

l Ar, 2.3 mTorr, 1 kW, 50 sccm

ANALYSIS OF TRIKON PLASMA TOOL: VALIDATION

l Ar, 2.3 mTorr, 1 kW (Trikon Technologies, Inc.)

RKINDER_AVS_2000_8

Theoretical Axial Ion Density

25 G 200 G

0 G

1.0

0

0.5

DownstreamBell Jar

Axial Position (cm)-5 0 5 10 15 20-10

Experimental Axial Ion Saturation Profile

0 G

25 G

Axial Position (cm)-5 0 5 10 15 20-10

50

0

10

20

30

40

200 G

DownstreamBell Jar

Page 9: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICSl Ar 10 mTorr, 1 kW, 50 sccm, 300 G

l At 300 G, TG mode is strongly damped at the dielectric-plasma surface. The percent of perturbed electrons in this region can reach 1%.

l The TG mode couples power more efficiently per electron produced. At a constant input power, this results in a higher temperature and lower plasma density.

EFFECTS OF TG MODE ON PROPAGATION

RKINDER_AVS_2000_9

V / cm15 0.15

10-3

107 101

10-7

cm-3 eV3.8 2.0

Eθ (wo / TG) Eθ (w / TG)∆ [e] ∆ [e] / [e] Te (wo / TG) Te (w / TG)

Page 10: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISl Ar 10 mTorr, 1 kW, 50 sccm, 300 G

l Initial studies indicate that the effect of the TG mode is to restructure the power deposition profile near the coils.

l However, the propagation of the helicon component is little affected, particularly at large magnetic fields where the TG modes is damped.

EFFECTS OF TG MODE ON PROPAGATION

RKINDER_AVS_2000_10

[e] (wo / TG) [e] (w / TG)

(cm-3)5 x 1012 5 x 10101.0 0.01(W / cm-3)

Power (wo / TG) Power (w / TG)

Page 11: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

l Ar/Cl2 80:20, 10 mTorr,

1 kW, 50 sccm

l For Ar/Cl2, power deposition, at high magnetic fields, cycles back

upstream, resembling an ICP.

l At high enough magnetic fields, the electric field wavelength is larger than the reactor and is unable to sustain a standing wave pattern.

(cm-3)

(W / cm3)1 0.001

ANALYSIS OF PLASMA TOOL : POWER

B = 0 G

[e]Power

B= 250 G

Power

B= 300 G

Power

B= 150 G

Power

B = 40 G

Power [e] [e] [e] [e]

RKINDER_AVS_2000_11

4 x 1012 4 x 1010

Page 12: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

l Ar/Cl2 80:20, 10 mTorr, 50 sccm

l Neglecting the TG mode, the ability to deposit power downstream is limited by the wavelength of the helicon-like wave.

l For an m = 0 mode,

ANALYSIS OF HELICON COMPONENT: WAVELENGTH

7.6 x 106

Rcmλz (cm) =

Bo (Gauss)

ne (cm-3)( )

0.6

RKINDER_AVS_2000_12

Wavelength (cm)

500

1500

0

1000

100 200

Magnetic Field (G)

300

10

30

60

90

120

Helicon

ICP

ICP

0

5

10

15

20

25

30Radius = 4 cm

6 cm

8.5 cm

1 2 3 4 5 6 7Bo / ne (G/cm-3 x 10-11)

0

5

10

15

20

25

30

Radius = 4 cm 6 cm

8.5 cm

Theoretical

Numerical

Page 13: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

COLLISIONLESS HEATING : AXIAL ACCELERATION

l Ar, 1 kW, 300 G, 2 mTorr

l The electron energy distribution (EED) was obtained from the EMCS. The tail of the EEDF increases with increasing distance from the coil.

l The axial component of the electromagnetic field is responsible for most of the power deposition.

0.5 0.005

0.44.0 V/cm

W/cm-3

IncreasingDistanceFrom Coil

0 10 20 30 40 50

100

10-2

10-4

10-6

Energy (eV)

Power Axial Field

RKINDER_AVS_2000_13

1

3

21

32

Page 14: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICSRKINDER_AVS_2000_14

COLLISIONLESS HEATING : PRESSURE

l Ar, 1 kW, 50 sccm, 300 G

l As the pressure is decreased, the collisionless heating mechanisms become more dominant.

l There is significant heating in the downstream region.

1

10-8

50

0

ENERGY (eV)400 302010

ENERGY (eV)40

RADIALLY AVERAGED EEDF

P = 5 mTorr

302010ENERGY (eV)

40

P = 10 mTorr

302010

P = 2 mTorr

Page 15: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICSRKINDER_AVS_2000_15

PHASE MATCHING

l Ar, 1 kW, 50 sccm, 300 G, 2 mTorr

l The parallel phase velocity of the electric fields is linearly proportional to the input rf frequency.

l As the frequency is decrease non-collisional heating throughout the reactor becomes more prevalent due to better phase matching with thermal electrons.

1

10-8

50

0

ENERGY (eV)400 302010

ENERGY (eV)40

RADIALLY AVERAGED EEDF

f = 13.6 MHz

302010ENERGY (eV)

40

f = 27.1 MHz

302010

f = 1.36 MHz

Page 16: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

27.1 MHz

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

RKINDER_AVS_2000_16

PHASE MATCHING

l Ar, 1 kW, 50 sccm, 300 G, 2 mTorr

50

0Radius (cm) 200

PERCENTAGE OF ELECTRONS IN PHASE

1.36 MHz13.6 MHz

100 %

0.1%

5 %

l Phase matching of the parallel phase velocity with the thermal velocity is required for acceleration.

l At lower frequencies the fraction of electrons in phase with the propagating electric field is larger.

Page 17: Electron Transport and Power Deposition in …uigelz.eecs.umich.edu/pub/presentations/rkinder_avs00.pdf · Deposition in Magnetically Enhanced Inductively Coupled Plasmas Ronald L

UNIVERSITY OF ILLINOISOPTICAL AND DISCHARGE PHYSICS

CONCLUSIONS

RKINDER_AVS_2000_17

l MEICPs are being studied for their ability to deposit power within the volume of the plasma.

l Study effects of TG mode on power deposition and ability for the helicon wave component to produce non-local heating.

l Initial studies indicate that the effect of the TG mode is to restructure the power deposition profile near the coils.

l However, the propagation of the helicon component is little affected, particularly at large magnetic fields where the TG modes is damped.

l For conditions where the TG mode is surpressed, the helicon component deposits the majority of the power within the volume of the plasma.

l At low pressures and rf frequencies, non-collisional heating becomes more prevalent since the thermal velocities match input rf phase velocity.