dsm design and verification flow lecture 21 alessandra nardi
TRANSCRIPT
DSM Design and Verification Flow
Lecture 21
Alessandra Nardi
Outline
• Conventional design flow review
• Emerging problems
• Emerging design flow
• Design methodology challenges– Signal Integrity– Reliability– Manufacturability– Power
Conventional Design FlowFunct. Spec
Logic Synth.
Gate-level Net.
RTL
Layout
Floorplanning
Place & Route
Front-end
Back-end
Behav. Simul.
Gate-Lev. Sim.
Stat. Wire Model
Parasitic Extrac.
Verification at different levels of abstraction
BehavioralHDL
System Simulators
HDL Simulators
Code Coverage
Gate-level Simulators
Static Timing Analysis
Layout vs Schematic (LVS)
RTL
Gate-level
PhysicalDomain
Ver
ific
atio
n
Verification Techniques
• Simulation (functionalfunctional and timingtiming)– Behavioral– RTL– Gate-level (pre-layout and post-layout)– Switch-level– Transistor-level
• Formal Verification (functionalfunctional)• Static Timing Analysis (timingtiming)
Goal:Goal: Ensure the design meets its functional and timing requirements at each of these levels of abstraction
Classification of Simulators
Logic Simulators
Emulator-based Schematic-basedHDL-based
Event-driven Cycle-based Gate System
Conventional Design FlowFunct. Spec
Logic Synth.
Gate-level Net.
RTL
Layout
Floorplanning
Place & Route
Front-end
Back-end
Behav. Simul.
Gate-Lev. Sim.
Stat. Wire Model
Parasitic Extrac.
Emerging challenges Wire load model
• Synthesis flow involves the use of statistical wire-load models:– Wire load models available in the library are a statistical
average based on several previous designs– Wire length is a function of the fanout: far from accurate
given that fanout are largely design specific
• Long and painful to achieve timing convergence between pre-layout and post-layout
• The problem of timing convergence can be addressed by using wire-load models specific to the design (aka custom wire-load models)
• Custom wire-load model can be obtained by parasitic estimation:– Perform initial placement – Generate estimated loads– Use these to generate custom models
• Notice that parasitic estimation is not based on actual routing data (as in the case of parasitic extraction)
Emerging challenges Wire load model
• Need to achieve timing convergence with minimal number of iterations– Routing in general is an extremely computationally expensive
task– Delays are increasingly dominated by interconnects
• Transition to a timing-driven placement and route approach
• Router must adhere to signal integrity, electromigration, power and other such specifications
Emerging challengesFloorplan, Place&Route
• As design get larger, and process geometries smaller than 0.35mm, the impact of wire resistance, capacitance and inductance (aka parasitics) becomes significant– Need to model them
• Parasitic extraction follows layout– Large run time involved (trade-off for different
levels of accuracy)– Large sizes of files generated (Reduced Order
Modeling)
Emerging challengesParasitic Extraction
DSM design flow
More emerging issues
• Signal IntegritySignal Integrity (SI) : Ensure signals travel from source to destination without significant degradation– Crosstalk: noise due to interference with
neighboring signals– Reflections from impedence discontinuity– Substrate and supply grid noise
• ReliabilityReliability– Electromigration– Electrostatic Discharge (ESD)
• ManufacturabilityManufacturability– Parametric yield– Defect-related yield
More emerging issues
• PowerPower– Power reduction at RTL level and at gate level
• Library-level: use of specially designed low-power cells
• Design technique
– It is critical that power issues be addressed early in the design process (as opposed to late in the design flow)
– Power tools:• Power estimation: (Design Power - Synopsys)
• Power optimization: take into consideration power just as synthesis uses timing and area (Power Compiler - Synopsys)
More emerging issues
Overview Emerging Challenges
• Conventional design flow Emerging design flow– Higher level of abstraction– More accurate interconnect model– Interaction between front-end and back-end
• Signal Integrity• Reliability• Power• Manufacturability
Paradigm: Issues must be addressed early in the design flow – no more clear logical/physical dichotomy
New generation of design methodologies/tools needed
The Role of Interconnects in DSM Designs
Outline
• Interconnects parameters description
• Circuit models for interconnects
• Technology scaling and its impact on interconnects
Introduction
• Interconnect: conductive path
• Ideally: wire only connects functional elements (devices, gates, blocks, …) and does not affect design performance
• This assumption was approximately true for “large” design, it is unacceptable for DSM designs
Introduction
• Real wire has: – Resistance
– Capacitance
– Inductance
• Therefore wiring forms a complex geometry that introduces capacitive, resistive and inductive parasitics. Effects:– Impact on delay, energy consumption, power distribution
– Introduction of noise sources, which affects reliability
To evaluate the effect of interconnects on design performance we have to model them
Interconnects - Resistance
L
W
H
HW
L
A
LR
Material Resistivity [-m]
Silver (Ag) 1.6x10-8
Copper (Cu) 1.7x10-8
Gold (Au) 2.2x10-8
Aluminium (Al) 2.7x10-8
Tungsten (W) 5.5x10-8
Interconnects - Capacitance
• Parallel Plate CapacitanceL
W
H
DielectricSubstrate
tdi
WLt
Cppdi
di
Keep in mind:– C is proportional to the overlap between conductors– C is inversely proportional to their separation
Interconnects - Capacitance
• Fringing Capacitance
DielectricSubstrateCpp
Cfr
DielectricSubstrate
H
LHt
Cdi
difr )/log(
2
Interconnects - Capacitance
• Total Capacitance
DielectricSubstrate
+
H w
Keep in mind:– C is proportional to the overlap between conductors– C is inversely proportional to their separation
2
HWw
Fringing versus Parallel Plate
(from [Bakoglu89])
Taken from “Digital Integrated Circuits”, 2nd Edition, Jan M. Rabaey, Anantha Chandrakasan, and Borivoje Nikolic Copyright 2002 J. Rabaey et al.
Interwire Capacitance
fringing parallel
Taken from “Digital Integrated Circuits”, 2nd Edition, Jan M. Rabaey, Anantha Chandrakasan, and Borivoje Nikolic Copyright 2002 J. Rabaey et al.
Interconnects - Inductance
• It can be evaluated with the aid of its definition: v=Ldi/dt– It is possible to calculate the inductancefrom its geometry
and its enviroment
• A simpler approach relies on the fact that the capacitance c and inductance l (per unit length) are related: cl=( and are the permittivity and permeability of the surrounding dielectric)
Caveat: conductor must be surrounded by a uniform dielectric
Simplifications• Inductive effects can be ignored if the resistance is
substantial (e.g. a long Al wire with small cross-section) or if the rise and fall times of the applied signals are slow
• When the wires are short, the cross-section is large or the material has low-resistivity, a capacitance-only model can be used
• When the separation between neighboring wires is large or when wires only run together for a short distance, inter-wire capacitance can be ignored, and all the parasitic capacitance can be modeled as capacitance to ground
Electrical Wire Model
• Ideal Wire:– Simplistic– Useful for early phase of the design– OK for small components, e.g. gates
• To study the effects of parasitics we need to model them
Electrical Wire ModelLumped vs Distributed
Lumped Distributed
R
C
r
c
r
c
r
c
r
c
Electrical Wire Model – Lumped C
• If resistive component is small and switching frequencies are in the low to medium range, it makes sense to consider only capacitive component– Wire still represents an equipotential region– Only impact on perfomance is the loading effect
• Popular model
C
Electrical Wire Model – Lumped RC
• If wire resistance is significant, a resistive-capacitive model is needed
• Lumped RC model is pessimistic and inaccurate for long interconnect wire– Distributed rc-model is complex and no closed form
solution exists– Elmore delay formula: lumped RC comes to help
R
C
Electrical Wire Model – Lumped RCElmore Delay
Consider an RC-tree:– The network has a single input node– All capacitors between node and ground– The network does not contain any resistive loop
R1
C1
s
R 2
C2
R 4
C4
C3
R3
Ci
Ri
1
2
3
4
i
Electrical Wire Model – Lumped RCElmore Delay
RC-tree property:– Unique resistive path between the source node s
and any other node i of the network path resistance Rii
Example: R44=R1+R3+R4
R1
C1
s
R 2
C2
R 4
C4
C3
R3
Ci
Ri
1
2
3
4
i
Electrical Wire Model – Lumped RCElmore Delay
RC-tree property:– Extended to shared path resistance Rik:
Example: Ri4=R1+R3
Ri2=R1
)])()([( s.t. kspathispathRRR jjik
R1
C1
s
R 2
C2
R 4
C4
C3
R3
Ci
Ri
1
2
3
4
i
Electrical Wire Model – Lumped RCElmore Delay
• Assuming:– Each node is initially discharged to ground
– A step input is applied at time t=0 at node s
• The Elmore delay at node i is:
• It is an approximation: it is equivalent to first-order time constant of the network– Proven acceptable
– Powerful mechanism for a quick estimate
N
kikkDi RC
1
Electrical Wire Model – Lumped RCElmore Delay
• Special case: RC-chain (or ladder)– Shared-path resistance path resistance
N
kkkkDN RC
1
R1
C1
R2
C2
RN
CN
Vin VN
Electrical Wire Model – Lumped RCElmore Delay
Time-constant of resistive-capacitive wire
22
1
2
)1( 22
11
rcL
N
NrcL
NNRCCkRRC
N
N
k
N
kkkkDN
R
C
R
C
R
C
Vin VN
R=r · L/N
C=c·L/N
– Delay of wire is quadratic function of its length– Delay of distributed rc-line is half of lumped RC
Electrical Wire ModelThe Distributed RC-line
Taken from “Digital Integrated Circuits”, 2nd Edition, Jan M. Rabaey, Anantha Chandrakasan, and Borivoje Nikolic Copyright 2002 J. Rabaey et al.
Interconnects – Why do we care?• Technology scaling: miniaturization of devices (scale
L, W, TOX, VTH)• Device Scaling Faster, smaller devices
L[m]=0.35, 0.25, 0.18, 0.12, etc S0.7
• Interconnect Scaling Larger delays!– Local interconnects: Almost constant– Global interconnects:RC delay goes as 1/S or 1/S3
• Also, parasitics give rise to a whole set of signal integrity issues
Design paradigm shift from device-centric to interconnect-centric
Interconnects – Why do we care?
ITRS 2001
Modern Interconnect
Taken from “Digital Integrated Circuits”, 2nd Edition, Jan M. Rabaey, Anantha Chandrakasan, and Borivoje Nikolic Copyright 2002 J. Rabaey et al.
Example: Intel 0.25 micron Process
5 metal layersTi/Al - Cu/Ti/TiNPolysilicon dielectric
Taken from “Digital Integrated Circuits”, 2nd Edition, Jan M. Rabaey, Anantha Chandrakasan, and Borivoje Nikolic Copyright 2002 J. Rabaey et al.
New Interconnect Materials
• Aluminium Copper– Lower resistivity– Higher immunity to Electromigration
• SiO2 Low-k dielectrics
Overview
• DSM challenges– Emerging design flow– Interconnect-centric design paradigm– Signal Integrity– Manufacturability, Reliability– Power Estimation
• Interconnects– Description of parasitics– Wire models– Why do we care– New materials