Download - Fig. 1 Kuo et al
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1 Fig. 1 Kuo et al.
p-Si substrate
Si buffer layer 50 nm
Si spacer 60 nm
Ge quantum dot
Ge wetting layer
100 nm Si cap
Pt or AlLPD oxide
(a) (b)
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0 1 2 310-12
1x10-10
1x10-8
1x10-6
1x10-4
1x10-2
1x100
Al Ge QD
Pt P-Si
Pt Ge QD
Al P-Si
LPD-SiO2 25A
Cu
rren
t (A
)
Gate Voltage (V)Fig. 2 . Kuo et al.
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3 Fig. 3 . Kuo et al.
Pt
4.7 eVAl3.15 eV
5.85 eV4.3 eV
3.2 eV
4.7 eV
EF
(a) (b)
3.2 eV
4.7 eV
Pt
4.7 eV
4.3 eV
EF
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4
-8 -6 -4 -2 010-14
10-12
1x10-10
1x10-8
1x10-6
1x10-4
1x10-2 Pt gate
C
urr
ent
(A)
Gate Voltage (V)
Bulk pSi 300K Bulk pSi 40K SiGe QD 300K SiGe QD 40K
Fig. 4 . Kuo et al.
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-80 -60 -40 -20 0 20 40 60 80 100 120
-4
-2
0
2
4
6
8 Pt gate
4.7 eV
3.2 eV
4.3 eV
4.7 eV
Efm
T=40KVg=-4V
En
erg
y
Position (nm)Fig. 5 . Kuo et al.
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Schottky diode
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TEM of epi Ge before PMA :
After PMA :
Pt Germanide
Ref :IEEE ELECTRON DEVICE LETTERS
JohnY. Spann, Student Member, IEEE, Robert A. Anderson, Student Member, IEEE, Trevor J. Thornton, Member, IEEE,Gari Harris, Member, IEEE, Shawn G. Thomas, Member, IEEE, and Clarence Tracy
32 Å
91 Å
79 Å125 Å
175Å
16 Å43 Å
29 Å
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Pt SB w/ epi Ge/Si From MinHung
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EFn
EFm N-type Si
EFnEFm
N-type Si
kT
qVwheneeTAeeTAJ kT
qVkTBnqkT
qVkTBnq 3
~]1[
Emission" Thermionic" From
)/(2*)/(2* ))(
ln(2*
sBn J
TSiorGeA
q
kT
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kT
qVwheneeTAeeTAJ kT
qVkTBnqkT
qVkTBnq 3
~]1[
Emission" Thermionic" From
)/(2*)/(2* ))(
ln(2*
sBn J
TSiorGeA
q
kT
0.00 0.04 0.08 0.12 0.16 0.201E-8
1E-7
1E-6
1E-5
1E-4
1E-3
0.01
0.1
1
10
100
Bulk nSiepi nGe
Bulk nGe
6.95e-71.93e-6
0.00185
J
Vg (V)
nSi FBn 0.81 eV nGe FBn 0.59 eV N2679 FBn 0.77 eV
0.00 0.04 0.08 0.12 0.16 0.20
0
1
2
3
4
5
n-id
eality
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0.00 -0.04 -0.08 -0.12 -0.16 -0.201E-8
1E-7
1E-6
1E-5
1E-4
1E-3
0.01
0.1
1
5.48373333e-7
2.770155e-6
0.00262312
J
Vg (Reverse bias)
Bulk nSi FBn 0.82 eV Bulk nGe FBn 0.58 eV epi nGe N2679 FBn 0.76 eV
Calculating ΦBn by Reverse current :
Sze : ref )kT
qexp(-TA
/3
Bn2*
qkTVforJJ RSR
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I-V curves
-3 -2 -1 0 1 2 31E-8
1E-7
1E-6
1E-5
1E-4
1E-3
0.01
0.1
1
10
100
epi Ge
nGe
nSi
J (A
/cm
2 )
Vg (V)
nSi nGe epi Ge
Thermionic emission
V/cm104 4Thermionic-field emission (Tunneling)
thermionic emission
tunneling current
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Thermionic emission Thermionic-field emission (Tunneling)
V/cm104 4
nSi E-field~ 2e4 V/cm Epi Ge E-field~ 3e6 V/cm
From Simulation :
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C-V calibration :
C R
Cp
Rp
Rs
22222
2
222
222
1
1
1
1
1
)1(
pp
p
pp
pp
pp
s
pp
ppps
RCCC
RC
RC
C
RC
RpRR
C
jR
RC
RCjRR
2
4
C 1
22
2
p22
p
pp
p
RCC
RCCC由
-3.0 -2.5 -2.0 -1.5 -1.0 -0.5 0.0
0.0
1.0x10-7
2.0x10-7
3.0x10-7
4.0x10-7
5.0x10-7
6.0x10-7
C (
F/c
m2 )
Vg (volt)
C100K C500K
-3.0 -2.5 -2.0 -1.5 -1.0 -0.5 0.0
0.0
1.0x10-7
2.0x10-7
3.0x10-7
4.0x10-7
5.0x10-7
6.0x10-7
after calibration
2679N die1
So I just show the C-V before -2V for epi Ge with cap Pt SBD.
epi Ge with cap :
From I-V
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-2.0 -1.5 -1.0 -0.5 0.00.00E+000
5.00E-008
1.00E-007
1.50E-007
2.00E-007
2.50E-007
3.00E-007
Pt SBD
C (
F/c
m2 )
Vg (volt) - reverse bias
NSi epi Ge with cap epi Ge w/o cap
SBD C-V :
Epi Ge with cap for SBD has higher C than Bulk nSi and epi Ge w/o cap.
EFn
EFm N-type Si
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Floating gate Memory :
Flating gate
Control gate
Tunnel Oxide
Interpoly Dielectric
SourceDrain
p-substrate
Leakage path
Nano-crystals memory
(Freescale) :
Source Drain
Gate
Control Oxide
tunnel oxide
nano-crystals
Leakage path
Smaller dot size for scaling.Scaling (SiO2 gap between dots must exceed 5 nm)
Charge loss in full floating gate. Thick tunnel oxide.Trade-off between erase speed and tunnel oxide thickness – charge leaks off from the floating gate.The reliability issue when scaled down to deep submicron.
Disadvantage :
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ConventionalSONOS(15Å~30 Å)
NROM(>40 Å)
Bit-per-cell 1 bit/cell 2 bits/cell
Program FN CHE
Erase FN BTBT
Trap Memory
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Advantage : Trap size = atom for scaling
∆VT can be large if trap density is height
After annealing, Si implanted into the SiO2 separates from the oxide phase and form the Si-NCs.
Trap Memory :
Oxide
Substrate
Metal
defect
implantation
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Schematic energy band diagram under program/erase
oo
Ev
Ev
Ec
Ec
Eraseprogram
JelectronJ
electron
Jhole
Jhole
Al2O
3SiO2
Al2O
3
p-Si SiO2 HfO
2 high-p-Si SiO
2 HfO
2 high-
SiO2
TaN
TaN
Program/erase performance is enhanced using high-k blocking oxide.
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TEM characteristics
All high-k films are deposited by ALD.
After annealing treatment (1000oC, 10s) in N2 ambient, HfAlO
film shows partial crystalline, while HfO2 film shows fully
crystalline. The Al2O3 film shows also partial crystalline.
p-SiSiO2~3.6 nm
Al gate
Al2O3~10 nm
HfO2~5.2 nm
10 nm
Glue
Al2O3~10nm
SiO2~3nm
p-Si
HfAlO~10nm
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C-V hysteresis memory window
-2 0 2 4 60
1
2
3
memory window ~5.7V
Cap
acit
ance
(fF
/m
2 )
Gate voltage (V)
sweeping voltage: 3V 12V
Structure:
SiO2(3nm)/HfO2(10nm)/Al2O3(10nm)
Al gate electrode
Frequency: 100kHz
Ramp rate: 0.1V/s
A good C-V hysteresis memory window of high-k charge trapping layers is observed with high gate voltage. The memory window is slightly lower (7-8V@Vg=15V) as compared with
reported data (~10V@Vg=12V) on TaN/AlLaO3(12nm)/AlGaN(10nm)/SiO2
(2.7nm)/p-Si [A. Chin et al., 2005 IEDM Tech. Dig. P. 165].