EUROPEAN
European Polymer Journal 41 (2005) 771–781
www.elsevier.com/locate/europolj
POLYMERJOURNAL
A novel type of Si-containing poly(urethane-imide)s:synthesis, characterization and electrical properties
Huseyin Deligoz *, Tuncer Yalcınyuva, Saadet Ozgumus
Istanbul University, Engineering Faculty, Chemical Engineering Department, Chemical Technologies Group,
34320 Avcılar-Istanbul, Turkey
Received 31 March 2004; received in revised form 4 November 2004; accepted 5 November 2004
Available online 13 January 2005
Abstract
A novel type of a Si-containing poly(urethane-imide) (PUI) was prepared by two different methods. In the first
method, Si-containing polyurethane (PU) prepolymer having isocyanate end groups was prepared by the reaction of
diphenylsilanediol (DSiD) and toluene diisocyanate (TDI). Subsequently the PU prepolymer was reacted with pyro-
mellitic dianhydride (PMDA) or benzophenonetetracarboxylic dianhydride (BTDA) in N-methyl pyrolidone (NMP)
to form Si-containing modified polyimide directly. In the second method, PU prepolymer was reacted with diaminodi-
phenylether (DDE) or diaminodiphenylsulfone (DDS) in order to prepare an amine telechelic PU prepolymer. Finally,
the PU prepolymer having diamine end groups was reacted with PMDA or BTDA to form a Si-containing modified
polyimide. Cast films prepared by second method were thermally treated at 160 �C to give a series of clear, transparent
PUI films. Thermogravimetric analysis indicated that the thermal degradation of PUI starts at 265 �C which is higher
than degradation temperature of conventional PU, confirming that the introduction of imide groups improved the ther-
mal stability of PU.
To characterize the modified polyimides and their films, TGA, FTIR, SEM and inherent viscosity analyses were car-
ried out. The dielectrical properties were investigated by the frequency–capacitance method. Dielectric constant, dielec-
tric breakdown strength, moisture uptake and solubility properties of the films were also investigated.
� 2004 Elsevier Ltd. All rights reserved.
Keywords: Poly(urethane-imide); Poly(amic acid); Thermal imidization; Dielectric properties
1. Introduction
Polyurethane (PU) is a versatile polymer and can be
easily prepared by a simple polyaddition reaction of pol-
0014-3057/$ - see front matter � 2004 Elsevier Ltd. All rights reserv
doi:10.1016/j.eurpolymj.2004.11.007
* Corresponding author. Present address: Universitat zu
Koeln, Institute fur Physikalische Chemie, Luxemburger
str.116, D-50939 Cologne, Germany. Tel.: +49 221 470 4485/
+90 212 591 2479; fax: +49 221 470 7300/+90 212 591 1997.
E-mail addresses: [email protected], H.Deligoz@
uni-koeln.de (H. Deligoz).
yol, isocyanate and a chain extender. PUs have excellent
abrasion resistance and some properties of both rubber
and plastics [1–3]. They are becoming increasingly
important as engineering materials. Unfortunately, the
conventional PUs are known to exhibit poor thermal
stability which limits their applications. For example,
their mechanical properties rapidly deteriorate above
80–90 �C and thermal degradation takes place at tem-
peratures above 200 �C [4]. Researches focused on
improving the thermal stability of PU have attempted
in various ways. The most accepted approach for the
ed.
772 H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781
improvement of thermal stability of PUs is a chemical
modification in the structure by introducing thermally
stable heterocyclic polymers like polyimides [5–13].
Polyimides (PI) are the most important members of het-
erocyclic polymers with remarkable heat resistance and
excellent mechanical, electrical, chemical and durability
properties. The term of ‘‘polyimides’’ is used for a vari-
ety of polymers containing the imide structure in the
backbone. PI has been used widely in the microelec-
tronic industry as a dielectric layer because of its low
dielectric constant and high dielectric strength [14–16].
Moreover, PI can be used as films, gas separation mem-
branes with high permeability and surface coating mate-
rials [14,16].
Although they have some superior properties as
listed above, their applications are limited since they
have high Tg and Tm values. In other words, processing
of PIs is difficult and has many problems. An effective
way for improving solubility and processibility of PI is
the introduction of some flexible groups which come
from either the diamine or the dianhydride component
(ether, carbonyl, etc.) into the polymer backbone [17].
Another possible choice is the preparation of some
copolymers such as poly(ether-imide) [12], poly(urea-
imide) [18], poly(amide-imide) [19], poly(urethane-
imide) [5–13].
PIs are typically chosen for high temperature applica-
tions such as coating materials and insulators for elec-
tronic parts [16]. This is due to their good thermal
stability, their high planarization, low leakage current
density, high dielectric breakdown strength, good pro-
cessibility and high glass transition temperatures. The
method generally used for lowering the dielectric con-
stant, is the incorporation of fluorine atoms or other
groups into the polyimide backbone [20,21]. Another
alternative is the copolymerization of PIs with other
polymers [20]. There is only one literature that gives lim-
ited information on the electrical properties of PUIs [22].
Various attempts have been made to prepare
poly(urethane-imide) (PUI). Reaction of an isocyanate
terminated PU prepolymer with acid dianhydride is
the most widely utilized method (direct method) [5–
12]. Another method is blending of an isocyanate termi-
nated PU prepolymer with poly(amic acid) [5,6,9,12,13].
Intermolecular Diels–Alder (DA) reaction of 4-methyl-
1,3-phenylenebis(2-furanyl carbamate) with various
bismaleimides is also reported to give poly(urethane-
imide) [23–25]. Recently, it was reported that an imide
function was introduced into PU backbone through a
different synthetic strategy. This route involves reaction
of an amine telechelic PU prepolymer with dianhydride
and cyclodehydration of the intermediate polyamic acid
in a sequential way [8]. Ghatge and Jadhav have re-
ported that preparation of Si-containing polymers can
lead to an improvement of the thermal stability of the
polymers due to incorporation of a silicon–carbon bond
in the polymer backbone [26]. Moreover, although there
are lots of paper on the synthesis of PUI, no study has
been reported on dielectric properties of Si-containing
PUI by now.
In this work, for the first time, Si-containing
poly(urethane-imide)s were synthesized by using two dif-
ferent methods. In the method 1, isocyanate terminated
PU prepolymer was directly reacted with tetracarboxylic
dianhydride. In order to prepare isocyanate terminated
PU prepolymer, diphenylsilanediol (DSiD) compound
was reacted with TDI. This method has some disadvan-
tages such as moisture sensitivity of the isocyanate
groups and side reactions such as the trimerization of
isocyanate compounds or amide formation. In the
method 2, reactions were carried out in two steps over
amine telechelic precursor and poly(amic acid) forma-
tion in order to avoid these problems. The chemical
and physical properties of Si-containing poly(urethane-
imide) films produced by the direct method with those
obtained by the two step method are compared. Further,
preliminary studies on the electrical properties such as
dielectric constant and dielectrical breakdown strength
of silicon containing PUI films have been carried out.
2. Experimental
2.1. Materials
Diphenylsilane diol (DSiD) was synthesized by C.A.
Buckhard�s method (mp: 147 �C) [27]. Toluene diisocya-nate (TDI, mixture of 2,4- and 2,6-isomer), diaminodi-
phenylether (DDE), diaminodiphenylsulfone (DDS),
pyromellitic dianhydride (PMDA) and benzophenone
tetracarboxylic dianhydride (BTDA) were used as re-
ceived from Merck, Germany. N-Methyl pyrolidone
(NMP) and dimethyl acetamide (DMAc), were supplied
from Merck-Germany and then were purified by distilla-
tion under reduced pressure, and NMP was stored over
5 A molecular sieve. Methylene chloride (MeCl2) was
used as received from Merck-Germany, toluene was
used as received from Carlo Erba-Italy and petrol ether
was used as received from Riedel de Haen.
2.2. Reactions
2.2.1. Preparation of PU prepolymer
Reaction was carried out in a 250 ml five necked
round bottomed flask equipped with a thermometer,
condenser, magnetic stirrer, oil bath and nitrogen
inlet–outlet system. TDI (0.13 mol) was added onto di-
phenyl silane diol (0.065 mol) and reacted for 9 h at
80 �C under nitrogen atmosphere. TDI and DSiD were
mixed vigorously. After 1 h, 100 ml toluene was added
to the mixture. The temperature was kept constant at
80 �C and the reaction was followed by the determina-
Table 1
Formulation and viscosity of a prepolymer with isocyanate end
groups
Product DSiD
(mmol)
TDI
(mmol)
Isocyanate
content (%)
gred (dl/g)a
Calc. Theo.
I 130 60 13.9 14.9 0. 1
I: isocyanate end group having prepolymer.a 0.5 g/dl in NMP at 30 �C.
H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781 773
tion of the –NCO content with the dibutyl amine meth-
od [ASTM D1638-74] and found to be closed to the ex-
pected theoretical value. At the end of the reaction, the
PU prepolymer was purified by precipitation in petro-
leum ether, then filtered and dried in a vacuum oven
at 50 �C for 4 h. Characterization of PU prepolymer
was carried out by FTIR spectroscopy, –NCO end
group analysis and inherent viscosity. Results are given
in Table 1.
2.2.2. Preparation of Si-containing poly(urethane-imide)
film by direct method (method 1)
The PU prepolymer was placed into a 100 ml three
necked round bottomed flask equipped with a thermom-
eter, magnetic stirrer, oil bath and nitrogen inlet–outlet
system. PU prepolymer (1 g) was dissolved in dry
NMP under nitrogen atmosphere. An equivalent
amount of dianhydride (PMDA) (0.18 g) was added step
by step in 5 min by stirring at 0 �C and temperature was
kept at 0 �C for 30 min. Then the temperature was in-
creased stepwise to 40 �C and held there for 2.5 h, subse-
quently it was heated to 90 �C for 2 h for evaluation of
carbon dioxide. Finally the reaction mixture was heated
to 130 �C and held there for 20 h. The brownish polymer
was precipitated by pouring the solution into cold water.
Precipitated polymer was filtered and washed twice with
methanol and dried in a vacuum oven at 110 �C. Thesolution of the resulting mixture was spread onto a
well cleaned glass in order to obtain modified polyi-
mide film. Then it was dried at 80 �C for 5 h to remove
the solvent. Finally free standing modified PI film
was obtained by immersing the glass plate into the boil-
ing water. The chemical structures are depicted in
Scheme 1.
2.2.3. Preparation of Si-containing poly(urethane-imide)s
by using amine telechelic precursors (method 2)
2.2.3.1. Preparation of diamine terminated PU. The sim-
ilar reaction system described in Section 2.2.2 was used.
Amine terminated PU was prepared by the reaction of
an equivalent amount of isocyanate terminated PU pre-
polymer with aromatic diamine in DMAc (isocyanate–
amine equivalent ratio:1/2). Isocyanate terminated PU
prepolymer was added within 1 h into aromatic diamine
solution dissolved in DMAc. The reaction was carried
out at 10 �C under nitrogen atmosphere. After the addi-
tion of the PU prepolymer, the temperature was slowly
raised to 40 �C and held at this temperature for another
1 h to complete the reaction. Amine terminated PU pre-
polymer was isolated by precipitation in water, and then
it was filtered and dried at 60 �C for 2 h in a vacuum
oven. The product was characterized by FTIR spectros-
copy, amine content analysis and inherent viscosity
determination. The results are presented in Table 2
(Scheme 2).
2.2.3.2. Preparation of poly(urethane-amic acid) (PU-
AA). PU-AA was prepared by the reaction of an equiv-
alent amount of dianhydride with diamine terminated
PU prepolymer in DMAc at 10 �C under nitrogen atmo-
sphere (isocyanate–amine equivalent ratio:1/2). An
equivalent amount of PMDA (0.064 g) was added into
diamine terminated PU (1.5 g) solution in DMAc for
2 h under nitrogen atmosphere. After the addition of
PMDA, the temperature was increased to 40 �C and
held there for another 1 h to complete amic acid forma-
tion. The readily prepared amic acid (PU-AA) solution
was kept in a refrigerator to prevent the imidization
and hydrolysis reactions for long term usage. Polymer
was isolated by precipitation with methanol. The precip-
itated polymer was washed with methanol and dried
under vacuum at 60 �C for 2 h. The dried PU-AA was
characterized by FTIR spectroscopy.
2.2.3.3. Preparation of Si-containing poly(urethane-
imide) film by cyclodehydration of poly(urethane-amic
acid). PU-AA solution was cast on a well cleaned glass
plate by doctor blade to form a thin film. It was heated
in an oven under nitrogen atmosphere. The films
obtained by method 2, were cured at 160 �C for 10 h
in order to remove solvent and to cure PAA. All pre-
pared films were obtained as clear, light brown to yellow
colored and transparent. Thicknesses of all films are in
the range of 5–30 lm. All chemical structures are shown
in Scheme 2.
2.3. Measurements (instruments)
Inherent viscosities of modified polymers and inter-
mediates were determined for solutions of 0.5 g/dl in
NMP at 30 �C with an Ubbelohde viscometer. Thermal
analyses were carried out with Linseis thermal analyzer
with a heating rate of 5 �C/min in air. The sample mass
was approximately 10 mg. Infrared spectra of the sam-
ples were recorded on a Perkin Elmer Spectrum 2000
model with an ATR (attenuated total reflectance) unit
in the range of 400–4000 cm�1. Dielectric constants
and loss factors were measured using HP 4192 A LCR
meter Impedance Analyzer at various frequencies and
at room temperature. After coating both surfaces of
Table 2
Formulation and viscosity of a prepolymer with amine end
groups
Product Precursor
(g)
DDE
(g)
DDS
(g)
Amine
content (%)
gred(dl/g)a
Calc. Theo.
A-1 I (1.5) 0.6 – 61.6 58.4 0.11
A-2 I (1.0) – 0.5 52.4 54.5 0.12
A: amine end group having intermediates.a 0.5 g/dl in NMP at 30 �C.
CH3
NCO
NCO
+Si OHOH2
NH CO Si O CO NH
Toluene diisocyanate Diphenylsilanediol
polyurethane prepolymer with isocyanate end group
C
O
CCC
C
O
OO
O
Benzophenonetetracarboxylic dianhydride (BTDA)
- CO2
at 90 OC for 2 hours and
at 130 OC for 20 ho
Silicon containing poly(urethane-inide)
urs .
CH3
NCOOCN
3HC
NH CO Si O CO NH
CH3
N
3HC
C
O
C
C
O
O
N
n
O O
CC
O
O
N
O
O
Scheme 1. Synthesis of PUI by method 1.
774 H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781
the specimen films with gold, the contacts were applied
using indium oxide. The dielectric constant were calcu-
lated from the measured capacitance data as follow:
e1 ¼Cde0A
where C is the capacitance, e1 is the dielectric constant,
eo is the permittivity of the free space (8.85 · 10�12
MKS unit), d is the film thickness and A is electrode
area. Dielectric breakdown strengths of the films were
measured with an Electrotechnic Laboratorium D-7015
‘‘Insulation Breakdown Tester’’ UH 270, Resolution
50 V for 2.5 kV and 100 V for 5 kV. Thicknesses of the
films were measured with Mitutoyo Model, 0–25
micrometer with 0.001 mm resolution. Moisture uptake
properties were investigated by the following method:
films firstly were dried at 80 �C for 10 h and kept in a
confined container under a humidity of 55% for a week.
Following this procedure, the weight changes were
determined. SEM analyses were carried out by using a
Jeol JXA 840A Scanning Electron Microscope. The sol-
ubility tests were carried out by immersing the films in
various solvents for one week at room temperature.
Hardness values of the films coated on a glass were
determined by Konig Pandulum [DIN 53 157] and the
results were given as Konig second in Table 6. Adhesion
test of the films performed by cross-cut technique
[ASTM 3359-76]. For –NCO and amine analysis, we re-
peated the measurements at least two times. The differ-
ences are in the range of 1–5%.
NH CO Si O CO NH
polyurethane prepolymer with isocyanate end group
CH3
NCOOCN
+ NH2-Ar-NH2Ar: O
Diaminodiphenyether (DDE)
NH CO Si O CO NH
CH3
NH - Ar - NH2H2N - Ar - HN
O
H3C
H3C
O
polyurethane prepolymer with diamine end group
C
CCC
O
OO
O
O O
NH CO Si O CO NH
CH3
NH - Ar - NHN
H3C
O
C
CC
CH
OO
O
OHNH
n
O
HO
NH CO Si O CO NH
CH3
NH - Ar -NHN
H3C
O
CCC
C
OO
O
N
n
O
160 oC in Nitrogen
- H2O
poly(urethane amic acid)(PU-AA)
Pyromellitic dianhydride (PMDA)
Silicon containing poly(urethane-inide)
Scheme 2. Poly(urethane-imide) (PUI) synthesis over amine telechelic precursor (method 2).
H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781 775
3. Results and discussion
In this study, the modified polymers in the form of
PUI were obtained by two different methods and the
film properties were compared. One of the methods is
the reaction of a diisocyanate compound with a dianhy-
dride compound at relatively lower temperatures under
evaluation of CO2. The other method and also the most
commonly used route for preparation of polyimides is
the reaction between a diamine and a dianhydride in a
polar solvent to provide a PAA that loses water and
forms the PI structure on subsequent heating. The prep-
aration of the corresponding PI from this precursor
should be conducted at a high temperature that will
evolve the water molecules resulting the formation of
void in the final product. The inherent viscosities of
the prepared PAAs are listed in Table 3.
No gelation or precipitation has occurred in the prep-
aration of modified PI solutions. According to two
different methods, modified PI films 2 (obtained by
Table 3
Formulation of Si-containing PUIs and viscosity of PAA and
PI
Polymer Precursor (g) PMDA (g) BTDA (g) gred (dl/g)a
P1 I (1.0) 0.18 – 0.13
P2 I (1.16) – 0.31 0.15
P3 A-1 (0.6) 0.06 – 0.14
P4 A-1 (0.5) – 0.06 0.15
P5 A-2 (0.5) 0.05 – 0.15
P6 A-2 (0.13) – 0.02 0.16
a 0.5 g/dl in NMP at 30 �C.
776 H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781
method 1) and 4 (obtained by method 2) were obtained
respectively.
Most of the polymer solutions could be cast into flexi-
ble, tough, transparent, films from NMP or DMAc solu-
tions at ambient temperature and under atmospheric
pressure. Many commercially available polyurethanes
start to decompose at 150–200 �C, their decomposition
temperature range is 200–250 �C [4]. Compared with
the conventional PU, the decomposition temperatures
of PUIs prepared by our method were improved. By
using diisocyanate instead of diamine, the formation of
imide groups is achieved at lower temperatures and
4000 3000 2000
Tra
nsm
itta
nce
PU-I prepared by method I
Polyurethane prepolymerhavingisocyanate end group
2259
3354
Wave num
Fig. 1. FTIR spectra of a prepolymer with iso
polymerization occurs under milder conditions. In addi-
tion, the resulting small molecule, CO2 which would eas-
ily get out of the reaction system during the
polymerization (8).
3.1. FTIR spectra
The isocyanate terminated PU prepolymer is charac-
terized by FTIR which shows the characteristic absorp-
tion band at 2259 cm�1 due to the presence of the
isocyanate groups and also exhibits a NH peak at
1660 cm�1. In the method 1, formation of imide groups
is characterized by FTIR. The formation of imide groups
is connected with the disappearance of the characteristic
absorption band of the isocyanate group. Moreover
an IR absorption maximum showed up at 1778 and
1718 cm�1 due to the imide–carbonyl, at 1373 cm�1
due to C–N stretching and at 720 cm�1 due to imide ring
deformation. Furthermore, FTIR spectra of modified
polyimides do not show any peak near 2250 cm�1 which
indicates the absence of isocyanate groups. The spectra
for the products obtained by method 1 are given in
Fig. 1.
In the method 2, Si–urethane prepolymer with
diamine end group is also characterized by FTIR. FTIR
1500 1000
1
,
0
1660
1778
1718 13
73
1660
811
720
ber (cm-1)
650
cyanate end groups and PUI (method 1).
H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781 777
results show that the isocyanate terminated PU prepoly-
mer reacted with diamines (diaminodiphenyl ether or
diaminodiphenyl sulfone) which is indicated by the dis-
appearance of the isocyanate band at 2259 cm�1. More-
over, all isocyanate groups have reacted to give the
urea–amine structure which shows characteristic peaks
at 1593 cm�1 (urea–carbonyl) and at 3300–3600 cm�1
(NH-amine stretching vibrations).
Reaction of diamine terminated Si–urethane prepoly-
mer with PMDA results in the corresponding poly(ure-
thane-amic acid) PU-AA which is characterized by
FTIR. The poly (amic acid) shows carboxylic amide
and characteristic amide absorption bands at approxi-
mately 3300 cm�1 and 1500–1600 cm�1. Modified PU-
AAs are turned into the corresponding polyurethane-
3000 20004000
Wave
3250
Prepolymer withisocyanate end group
PAA Intermediates
Prepolymer withdiamino end group
PU-I prepared by method II
Tra
nsm
ittan
ce
3333
2259
3357
Fig. 2. FTIR spectra of a prepolymer with amin
imides by thermal imidization at 100 �C for 1 h, at
200 �C for 1 h and at 300 �C for 1 h. Formed modified
films contain characteristic bands of the imide and ure-
thane groups. The bands at around 1780 cm�1 are due
to the imide–carbonyl group, bands at 1710–1740 cm�1
are due to the imide and urethane carbonyl linkages.
In addition, an N–H stretching band of the urethane
group is observed. The FTIR spectra of PUIs prepared
by method 2 are given in Fig. 2.
3.2. Thermal properties of Si-containing (polyurethane-
imide)
The thermal properties of the polymers were
investigated by TGA under air atmosphere. All TGA
1500 1000 650 0,
1776
,
1
number(cm-1)
1606
1720
1680
1374
720
1593
1776
e end groups, PAA and PUI (method 2).
Table 4
Thermal properties of Si-containing PUI films
Polymer T 10% (�C)a T 50% (�C)b Char yieldc
P1 260 475 16.9
P2 260 490 11.0
P3 260 465 24.8
P4 255 460 8.6
P5 245 415 9.7
P6 240 410 n.d.
a The temperature where 10% weight loss occurred.b The temperature where 50% weight loss occurred.c Weight of residue polymer at 750 �C.
778 H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781
thermograms of PUIs were identical and shown in Figs.
3 and 4. We observed that the decomposition of PUI
films take place in two stages at a heating rate of 5 �C/min in thermogravimetric analysis. All films that are
produced with method 1 and 2 exhibit more or less the
same thermal and oxidative degradation stability. In
addition, PMDA derived films have a higher thermal
stability than those obtained from BTDA. The first
decomposition stage starts at roughly 260 �C, indicatingthe decomposition of the most thermally labile urethane
component. The second stage corresponding to the
decomposition and carbonization of the imide compo-
nents occurs above 400 �C in each TGA curve. These re-
sults are in very good agreement with Refs. [5,13,20,28].
0 100 200 300 400 500 600 700 800 9000
20
40
60
80
100
Wei
ght
(%)
P1(TDI+DSiD+PMDA)P2(TDI+DSiD+BTDA)
Temperature ( C)o
Fig. 3. TGA curves of Si-containing PUIs prepared by method
1 under atmospheric condition.
0 100 200 300 400 500 600 700 800 9000
20
40
60
80
100
Temperature ( C)o
Wei
ght (
%)
P3 (TDI+DSiD+DDE+PMDA)P4 (TDI+DSiD+DDE+BTDA)
Fig. 4. TGA curves of Si-containing PUIs prepared by method
2 under atmospheric condition.
Hence, it can be concluded that PU was introduced into
the main chain of PI. We believe that the introduction of
Si linkages (Si–C bonds) would improve the thermal sta-
bility. However interestingly, we have not observed a
significant improvement effect. Comparing the conven-
tional PU, the decomposition temperature of PUIs pre-
pared by our method increased, showing that this
approach was very efficient. TG curves in all polyimides
show temperature resistant residue due to silicon dioxide
formation and this result was in good agreement with
Ref. [26]. Thermal properties of the Si-containing PUI
films are given in Table 4.
3.3. SEM (scanning electron microscope)
Surfaces of the films were investigated by SEM in
order to characterize surface properties. According to
SEM results, the film surfaces are dense, smooth and
do not show any cracking or delamination.
3.4. Electrical properties of Si-containing
(polyurethane-imide)
3.4.1. Dielectric constants of PUI films
The dielectric properties in polymers are most often
studied by the capacitance method. Polyimides are suit-
able for dielectric interlayers in the electronic industry
due to their high dielectric breakdown and low dielectric
constant and dissipation factor (16). Low values of tandare indicative of minimal conversion of electric energy to
heat. It is very advantageous to have low values for both
the dissipation factor and the dielectric constant because
electric signals will loose less of their intensity in the
dielectric medium.
The dielectric constants (e1) of PUI films were calcu-
lated according to the usual parallel plate capacitor for-
mula at different frequencies (1 kHz to 13 MHz). The
dielectric constant dependence on frequency for PUI
films at different frequencies is shown in Fig. 5. One
can see from the figure that e1 decreases with increasing
frequency when temperature is kept constant. Dielectric
constants of PIs, in general, are known to decrease grad-
0,0 0,2 0,4 0,6 0,8 1,0 1,2 1,43,0
3,1
3,2
3,3
3,4
3,5
3,6
3,7
3,8
3,9
4,0
Die
lect
ricC
onst
ant
Frequency (x10 )KHz-3
P3 (TDI+DSiD+DDE+PMDA)P4 (TDI+DSiD+DDS+BTDA)
Fig. 5. Dielectric constant vs frequency for PUI films prepared
by method 2.
H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781 779
ually with increasing frequency [29]. This behavior can
be attributed to the frequency dependence of the polariz-
ation mechanisms. The dielectric constant depends upon
the ability of the polarizable units in a polymer to orient
fast enough to keep up with the oscillations of an alter-
nating electric field. When the frequency increases, the
orientational polarization decreases since the orientation
of dipole moments need a longer time than electronic
and ionic polarizations. This causes the dielectric con-
stant e1 to decrease.
The dielectric constants of PUIs prepared by method
2 are in the range of 3–3.5 at 100 kHz frequency. More-
over, dielectric constant does not exhibit significant
change with a wide range of frequency. The materials
with this properties are highly preferred for devices that
will be used in microelectronic industry. As seen from
Fig. 5, PI 3 and PI 4 contain the polar ether and sulfone
groups. It is observed that sample 4 has a higher dielec-
tric constant than sample 3. This can be explained by the
fact that sample 4 contains the highly polar sulfone
group. These PUIs exhibit lower dielectric constants
Table 5
Solubility tests of Si-containing PUI films
Polymer Solubilitya
NMP THF MeCl2
P1 ++ �� � ��P2 ++ �� � ��P3 +� + �� � ��P4 �� + �� � ��P5 �� + �� � ��P6 �� + �� � ����: insoluble at room temperature; �: insoluble in hot solvent; ++: so
soluble at room temperature; �+: partly soluble in hot solvent.a NMP: N-methyl pyrolidone, THF: tetrahydrofuran, MeCl2: dich
than those prepared by method 1. Dissipation factors
of the films are in the range between 0.014 and 0.07 at
1 kHz and 13 MHz respectively.
3.4.2. Dielectric breakdown strength of PUI films
The dielectric strength is an important parameter for
selecting an appropriate electrical insulation material to
avoid short circuiting, especially at high temperature
operations. In particular, the dielectric breakdown
strength of materials depends on temperature, specimen
thickness, surface condition and humidity. The dielectric
strength of the Si-containing PUI is in the range of 25–
150 kV/mm. The dielectrical breakdown strengths are gi-
ven in Table 6. For comparison, electrical porcelains,
typically have a dielectric strength of 25 kV/mm, sol–
gel ceramics have a dielectric strength of 24–22 kV/mm
while dielectric breakdown strength for the films are
about 40–50 kV/mm.
3.5. Solubility and water uptakes of the Si-containing
(polyurethane-imide) films
Solubility properties of the films were investigated.
The films were immersed into various solvents such as
NMP, THF, MeCl2 and toluene for one week. Results
are shown in Table 5. PI 1 and 2 (obtained by method
1) show better solubility in NMP than PI 3–6. This is
probably due to the strong hydrogen bonding occurs
during thermal treatment at 160 �C.None of the PUI films dissolved or swelled in THF
and MeCl2. Hereby, it is shown that PUI films prepared
by our method have excellent solvent resistance. The
reason for the excellent solvent resistance is considered
to be the formation of network structure between the
PU and PI.
Water absorption of polymers heavily influences their
dielectric constants and limits their application in the
electric and microelectronic industry. Moisture absorp-
tion can increase the conductivity of the dielectric and
promote the corrosion of metal conductors, which can
potentially lead to device failure. For this reason, it is
Toluene Water uptake (%)
� �� �+ 1.22
�+ �� �+ 1.53
� �� � 1.41
� �� � 2.90
� �� � 1.27
� �� � 2.50
luble at room temperature; +: soluble in hot solvent; +�: partly
loro methane.
Table 6
Dielectric breakdown strength and some physical properties of PUI films
Polymer Dielectric
breakdown
strength (kV/mm)
Physical properties
Hardness
(Konig second)
Adhesion
(%)
Appearance
P1 n.d. 242 100 Homogen, transparent and dark brown, brittle
P2 146.6 218 100 Homogen, transparent and dark brown, brittle
P3 62.13 243 100 Homogen, transparent and dark yellow, flexible
P4 58.36 240 100 Homogen, transparent and light yellow, flexible
P5 25.7 245 100 Homogen, transparent and dark yellow, flexible
P6 n.d. 240 100 Homogen, transparent and light yellow, flexible
780 H. Deligoz et al. / European Polymer Journal 41 (2005) 771–781
important to prepare PIs with low water absorption and
this may be managed by chemical structure modifica-
tion. Our modified polyimides have moisture uptakes
in the range of 0.95–2.9%. Moisture uptake data are gi-
ven in Table 5. The modified PI films that were synthe-
sized according to method 1 have lower moisture uptake
than the other films. This may be explained by the fact
that the presence of some flexible groups such as ether
and sulfone in the backbone. BTDA derivated PUI have
exhibited higher water uptake values.
Adhesion of the polyimide films is known to be excel-
lent. Our results indicate that all films exhibit superior
adhesions to the glass substrate. The data are given in
Table 6. For all PUI films adhesion were 100%. The
determined hardness values are very close to glass hard-
ness. The color of final PUI films depends on type of
aromatic diamine component. While the color of
DDE-based PUI film was dark yellow, DDS-based one
was light yellow.
4. Conclusion
In this work, Si-containing poly(urethane-imide)
have been synthesized by using two different methods.
All products were clearly identified by FTIR. TGA anal-
yses showed that all PUI films exhibited two step ther-
mal decomposition pattern. The first stage of the
thermal degradation of Si–PUI was attributed to the
cleavage of labile linkages of urethane groups except
imide groups. The thermo-oxidative stability of the
polyimide was estimated by the initial weight loss of
the polyimide at 350 �C in air. The incorporation of
polyimide into polyurethane backbone was the effective
method for improving its thermal stability. Introduction
of Si into the PUI network, has not significantly im-
proved the thermal stability. Cyclized polymer showed
significant decrease in solubility when compared with
their corresponding noncyclic precursors.
Preliminary studies on the electrical properties of the
silicon containing PUI were carried out. The film that is
produced by method 2 has exhibited lower dielectric
constants. The dielectric constants of PUI films prepared
by method 2 were roughly 3–3.5 at 100 kHz and electri-
cal properties of the PUI were close to the ones of con-
ventional PI. In addition dielectric constant has not
changed with a wide range of frequency. Using the same
technique, we are presently working on the detailed elec-
trical properties including ac, dc conductivity and relax-
ation process of conventional and modified PI films. On
the other hand, the hardness and adhesion properties of
the prepared films were found to be excellent.
Acknowledgments
The authors wish to express their sincere thanks to
Prof. Dr. Christian Mayer, Universitat Duisburg-Ger-
many, for helpful discussions and suggestions. We are
also grateful to Mr. Ismet Cakar, general director of
POLIYA company, for financial support to this project.
We also thank to Dr. Saffettin Yıldırım for his coopera-
tion in the electrical analysis.
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