design of photon beamlines at the european xfeldesign of photon beamlines at the european xfel 24...
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Harald Sinn (THOCI1)FEL 2010 Malmö
August 26, 2010
Design of Photon Beamlines
at the European XFEL
Construction progress at the European XFEL
Injector building at DESY
Experimental Hall
in Schenefeld
www.xfel.eu
Design of Photon Beamlines at the European XFEL
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Harald Sinn, European XFEL
X-ray Beam Transport
Photon Beamlines
SASE 1 photon beamline
Design of Photon Beamlines at the European XFEL
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Harald Sinn, European XFEL
Beamline Layout for SASE1 and SASE2
Design of Photon Beamlines at the European XFEL
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Mirror technology
Problem: Mirrors are too short!
Coherent beams require height-height correlation (absolute
shape error) of less than 2 nm PV over entire length
(Strehl-ratio 0.8)
Currently only two suppliers (JTEC and ZEISS) with proven
record of deterministic polishing to nm-scale
Only few (short) mirrors on nm-flatness scale existing.
Upper length limitation 500 mm-800 mm
support
substrate
atomic removal process
+ metrology
deterministic polishing
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Mirror technology: Finite lengths
4 σ6 σ
≈ 2 nm PV flatness
2 σ
Simulation of beam spot in experimental hall
Measurements of Beam Divergence at LCLS in 2009 (8.3 keV)(Welch, Turner, Emma, Sinn, …)
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Lower Emittance: Higher Divergence
low Q (20pC)
used for beam line
optimization
(1.5×theory)
poster MOPC05 E.
Schneidmiller and
M.V. Yurkov
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Offset mirror geometry (SASE 1)
z_offset2
z_source
x_deflect = 50 mm
z_offset1
425 m
Try to get mirrors as close as possible to
source to maximize beam coverage
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Harald Sinn, European XFEL
Offset mirror geometry (SASE 1)
1.1 mrad
2σ
3σ
4σ
5σ
theoretical divergence (0.1 nC) x 1.5
SASE 1
z_offset2
z_source
x_deflect = 50 mm
z_offset1
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Harald Sinn, European XFEL
Offset mirror geometry (SASE 1)
2.2 mrad 1.5 mrad 1.1 mrad
2σ
3σ
4σ
5σ
z_offset2
z_source
x_deflect = 100 mm
z_offset1
θ – 100 μrad
theoretical divergence (0.1 nC) x 1.5
SASE 1
“ shifting”
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Harald Sinn, European XFEL
Distribution mirror geometry (SASE 1)
XTD 9
425 m 465 m 960 m
1.45 m
Problem: incident angle
cannot be adjusted
angle
adjustment
Design of Photon Beamlines at the European XFEL
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Harald Sinn, European XFEL
Distribution mirror geometry (SASE 1)
focusing (20 km)
defocusing
425 m 465 m 960 m
1.45 m
Solution: focus behind
distribution mirror
XTD 9
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Harald Sinn, European XFEL
Damage at offset mirrors with converging beam
converging beam
Conclusion: focusing behind
distribution mirror does not
lead to increased damage, as
long as footprint on mirror
remains the same
X-ray penetration
remains same
converging beam
(same energy)parallel beam
diverging beam
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Harald Sinn, European XFEL
Ray tracing for SASE 1 (800 mm mirrors)
keV range
SASE1: E =5-20 keV5-18
5-17
5-20
shift: 120 mm
SASE2: E =3-24 keV3-22
3-21
3-24
shift: 150 mm
Design of Photon Beamlines at the European XFEL
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Transmission of proposed SASE1&2 geometries
800 mm (optical length) mirrors, min. 4 σ acceptance
0
5
10
15
20
25
left
SASE 1
center
right
left
SASE 2
center
right
E[k
eV
]
accessible energy
range without
shifting or bending
change mirror angles
and bending
Design of Photon Beamlines at the European XFEL
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Harald Sinn, European XFEL
Special requirements optics at European XFEL
0.1 s
0.6 ms
0.1 ps
30 W
10 kW
20 GW
XFEL pulse pattern: 99.4 % empty
40,000 W/mm2
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Harald Sinn, European XFEL
First offset mirror (SASE2)
water cooling: ± 20 nm
deformation under 22 W load
water cooled copper barindium-gallium
coating
silicon substrate kinematical mount
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Harald Sinn, European XFEL
Beam aperture in front of mirrors
SASE 1. Transient (Hottest Spot Temp ~1050 C)
SASE 1. Steady State (Temp at the cooling channels ~43 C)
Conceptual Design
Blade Geometry and Materials
Possibility to tilt the blades
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Harald Sinn, European XFEL
Diamond Laue Monochromator
collaboration with:
Diamond Materials,
Fraunhofer Institut Freiburg
and Element6
Stress relief:
laser cutting
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Diamond Laue Monochromator
initial
temperature
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Expanded Beam Monochromator
0 m 400 m 800 m 900 m
10 mm
offset and
distribution mirrorsSi (111) mono
0.05 K/shot
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Harald Sinn, European XFEL
Expanded Beam Monochromator
0 m 400 m 800 m 900 m
10 mm
offset and
distribution mirrorsSi (111) mono
0.05 K/shot
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Summary
A beam distribution system is proposed that can
deliver 3-24 keV beam to central and branch
experimental stations based on 800 mm long
mirrors:
Adjustment to beam size by mirror incident angle
Intermediate focusing on distribution mirrors
Nice side effects: Cut-off of higher harmonics
and defocusing at monochromators possible.
For mirrors, water cooled seems sufficient
Monochromators will be diamond or in the
expanded beam silicon (cryo-cooling)
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Acknowledgements
European XFEL Optics group: Shafagh
Dastjani-Farahani, Idoia Freijo-Martin,
Germano Galasso, Jerome Gaudin, Liubov
Samoylova, Antje Trapp and Fan Yang
LCLS commissioning team: Paul Emma,
James Welch + many others
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Harald Sinn, European XFEL
Thank you for your attention!