design and property of directional self-cleaning superoleophobic surfaces

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Design and Property of Directional Self- Cleaning Superoleophobic Surfaces Functional surfaces with self-cleaning property are highly desirable in many applications in the printing industry. In this study, we report the creation of textured surfaces on Si wafer by photolithography, followed by chemical modification, that are superoleophobic and exhibit directional self-cleaning property. The textured surfaces are made of micro grooves which demonstrate interesting anisotropic wetting behavior. In the direction parallel to the grooves, low surface tension testing liquids show very low sliding angle (i.e. directional self- cleaning) which is a key enabler for the self-cleaning effect. Kock-Yee Law and Hong Zhao Xerox Research Center Webster, Webster, New York Work performed at Cornell NanoScale Facility Textured surface obtained by deep silicon etching Droplets of water, Hexadecane, and Xerox colid ink on superhydrophobic surfaces. Daniel C. Ralph, Cornell University, ECCS - 0335765

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Page 1: Design and Property of Directional Self-Cleaning  Superoleophobic  Surfaces

Design and Property of Directional Self-Cleaning Superoleophobic Surfaces

Functional surfaces with self-cleaning property are highly desirable in many applications in the printing industry. In this study, we report the creation of textured surfaces on Si wafer by photolithography, followed by chemical modification, that are superoleophobic and exhibit directional self-cleaning property. The textured surfaces are made of micro grooves which demonstrate interesting anisotropic wetting behavior. In the direction parallel to the grooves, low surface tension testing liquids show very low sliding angle (i.e. directional self-cleaning) which is a key enabler for the self-cleaning effect.

Kock-Yee Law and Hong ZhaoXerox Research Center Webster, Webster, New YorkWork performed at Cornell NanoScale Facility

Textured surface obtained by deep silicon etching

Droplets of water, Hexadecane, and Xerox colid ink on superhydrophobic surfaces.

Daniel C. Ralph, Cornell University, ECCS - 0335765