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Page 1: DEPT OF CHEMISTRY F/B 7/4 INTERNATIONAL …AAOT133 wISONSIN UNIV-MILWALR(EE DEPT OF CHEMISTRY F/B 7/4 INTERNATIONAL SUMMER INSTITUTE IN SURFACE SCIENCE (4TH), IISISS--ETC(U) UNC

AAOT133 wISONSIN UNIV-MILWALR(EE DEPT OF CHEMISTRY F/B 7/4INTERNATIONAL SUMMER INSTITUTE IN SURFACE SCIENCE (4TH), IISISS--ETC(U)

UNC . 80 R VANSELOW N0001479-6-0035NRCLASSIFIED NL

~ EEEEEEEEEE

Page 2: DEPT OF CHEMISTRY F/B 7/4 INTERNATIONAL …AAOT133 wISONSIN UNIV-MILWALR(EE DEPT OF CHEMISTRY F/B 7/4 INTERNATIONAL SUMMER INSTITUTE IN SURFACE SCIENCE (4TH), IISISS--ETC(U) UNC

-ECU',ITY CLASSIFICATION OF THIS PAGE (W61hen Data Entered)

REPORT DOCUMENTATION PAGE r1001F-oRE COMPLETING FORM

I. REPORT NUMBER OVT ACCESSION NO. 3. RECIPIENT'S CATALOG NUMBER

N0014-79-G-00354. TITLE (and Subtitle) S. TYPE OF REPORT A PERIOD COVERED

Fourth International Summer FinalInstitute in Surface Science (ISISS 1979:6PEFRIGO.RPRTNMR6. PERFORMING ORG. REPORT NUMBER

7. AUTHOR(s) 8. CONTRACT OR GRANT NUMBER(e)

Professor Ralf Vanselow NOO 4-79-G-0035

S. PERFORMING ORGANIZATION NAME AND ADDRESS 10, PROGRAM ELEMENT. PROJECT. TASK, 11 AREA a WORK UNIT NUMBERS

University of Wisconsin-Milwaukee A O N

Milwaukee, Wisconsin 53201 NR 392-030

it. CONTROLLING OFFICE NAME AND ADDRESS 12. REPORT DATE

9 July 1980Office of Naval Research 1, NUMBER OF PAGESArlington, VA 22217 16

14. MONITORING AGENCY NAME & ADDRESS(If different from Controlling Office) 15, SECURITY CLASS. (of this report)

ONR Branch Office - Chicago Unclassified536 So. Clark StreetChicago, IL 60605 ,s. DOECLASSIFICATION/DOWNGRADING

ChicgoIL 6605SC EDULEN/A16. DISTRIBUTION STATEMENT (of this Report)

Distribution of this document is imited.

rC17. DISTRIBUTION STATEMENT (, 1 20, If different from Repo

C

Distribution of the abstract is unlimited.

IS. SUPPLEMENTARY NOTES

To be published in: CRC-Critical Reviews in Solid State andMaterials Sciences

19. KEY WORDS (Continue on reverse aide if necessary and identify by block number)

ISISS 1979, Chemisorption, Catalysis, Surface Diffusion, SurfaceReconstruction, Surface Crystallography, Semiconductor and Metal

Surfaces, Surface Analytical Techniques, Plasma Etching, Crystal,Melt Interfaces

20. ABSTRACT (Continue on reverse aide It necessary and Identify by block number)

At the Fourth International Summer Institute in Surface Science,twJy leading so!ontieto p~ ~ tutorial review talks

on gas-solid and gas-liquid interfaces. -'Paper topics: "Develop-ment of Kinetic Aspects in Catalysis R~search", "ReactionMechanisms in Catalysis by Metals", "Diffusion in Surface Lay-

.~j aers", "Chemisorption-Induced Surface Reconstruction", "IonScattering for Surface Structure Determination", "Molecular

DD FRM 1473 EDITION OF I NOV65 IS OBSOLETEDD t JN 73 $/N 0102-LF-014-6601

-1 SECURITY CLASSIFICATION OF THIS PAGE (When Date Ent

' r o ,~80 Pe2

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SECURITY CLASSIFICATION OF THIS PAGC (When baews aI.eEJ

20. (continued)

Beam Epitaxy-Surface and Kinetic Effects", "Determinationof Crystallography Habit, and Epitaxial Orientation ofNanometer-Size Particles by TEM", "Computer Simulation andTheory of Interfaces", "Mechanisms of Chemisorption andOxidation", "Abinitio Cluster Model Studies of Chemi-sorption: Utility and Limitations", "Electronic Structureof Semiconductor and Transition Metal Surfaces", "Deter-mination of Atomic and Electronic Structures of SurfacesUsing Synchrotron Radiation in the XUV Region", "SurfaceVibrations - EELS", "Surface Enhanced Raman Spectroscopy","Extended X-Ray Absorption Fine Structure Studies on Sur-faces", "Application of IR-Spectroscopy to Chemisorptionand Catalysis on Metals", "Surface Structural Sensitivityof Angle Resolved UPS and EELS", "Recent Progress inSIMS", "Plasma Etching of Surfaces", "Structure andProperties of Crystal-Melt Interfaces", and "Molecularand Atomic Beam Scattering from Surfaces".

DDCTA

JU'itifiLcation

By

SE T C AF L I /or

SECURITY CLASSIFICATION OF TI4IS pAGE(1When bate Enferu

Page 4: DEPT OF CHEMISTRY F/B 7/4 INTERNATIONAL …AAOT133 wISONSIN UNIV-MILWALR(EE DEPT OF CHEMISTRY F/B 7/4 INTERNATIONAL SUMMER INSTITUTE IN SURFACE SCIENCE (4TH), IISISS--ETC(U) UNC

Report N0014-79-G-0035

FOURTH IN TERNATIONAL SUMMER INSTITUTE IN SURFACE SCIENCE(

(ISISS 1979)0

Professo alf/Vanselowl DirectorDep aitL; e stry

University of Wisconsin-MilwaukeeMi lwaukee

Final Report for the period 1 April 1979 - 31 March 1980

Prepared for

OFFICE OF NAVAL RESEARCHArlington, VA 22217

ONR BRANCH OFFICE - CHICAGO536 So. Clark StreetChicago, IL 60605

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The academic goals of ISISS were outlined in the editorial

comments of "Surface Science: Recent Progress and Perspectives

(ISISS 1975)"1:

"The favorable acceptance of ISISS was gratifying, butdid not exactly come as a surprise. During the recentdecade, advanced ultrahigh vacuum technology has madethe achievement of pressures < 10-10 Torr a routine oper-ation so that surfaces, once freed from impurities, canbe kept clean over a sufficient length of time and adsor-bates then can be admitted at well-dosed amounts. Tech-niques for surface analysis were more and more refined;with the atom probe we are now able to analyze even singlesurface atoms or chemical complexes. Progress in thetheory of the solid state subsequently allowed some fruit-ful dealing with the theoretical aspects of solid surfaces.All these developments combined with the demand for databy vital branches of our modern technology, caused an in-creasing flood of publications especially in the field ofgas-solid interfaces. It became hard to catch up with theliterature in one's own narrow area and it appeared nearlyimpossible to keep track of the developments in neighboringfields. As in other fast developing parts of the naturalsciences, one consequently observes some isolationism andthe appearance of communication problems. It is quiteclear that such a tendency, where one no longer learnsfrom progress or setbacks in neighboring areas, would bevery much to our disadvantage. To counteract this tendency,ISISS was organized. Leading experts from various sub-divisions of surface science - we chose to restrict thetopics to gas-solid interfaces - presented tutorial reviewtalks in which recent progress was summarized and futuretrends were pointed out."

In order to keep ISISS 1979 at a level of highest quality all

former ISISS speakers were invited to suggest names of suitable

lecturers. To avoid duplication, none of the lecturers of the 1977

Summer Institute were invited to present a paper. The final list

showed twenty-one internationally known experts in the field of

gas-solid (liquid-solid) interfaces. The speakers came from France,

Germany, Sweden, the United Kingdom, and from the U.S.A.

The following list shows their names, their affiliations,

topics, and short summaries of the papers presented.

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Farid F. Abraham, IBM, San Jose, California

Computer Simulation and Theory of Interfaces

We describe the Monte Carlo method for simulating, on thecomputer, the thermodynamics and structure of model systems.The utility of this theoretical tool for studying surface physicsproblems is demonstrated by briefly reviewing selected MonteCarlo simulations of microclusters composed of simple atoms,the planar liquid surface, the solid-liquid interface and thecrystal-glass interface.

Stig Andersson, Chalmers University of Technology, G~teborg, Sweden

Surface Vibrations - EELS

High-resolution electron energy loss spectroscopy (EELS) hasbecome a useful probe of the vibrational states of atoms andmolecules adsorbed on single cyrstal surfaces. The spectra yieldfrequencies of characteristic modes over a wide frequency rangewhich provide a relatively straightforward and detailed insightin the structure of the adsorbed species and in certain casesalso the adsorption site. In order to interpret the intensitiesof the vibrational loss lines one must know the interactionmechanism between the incident electron and the vibrational mode.The intensity data provides information related to the concentrationand the orientation of the adsorbate and to the electronic propertiesof the adsorbate-substrate bond.

Paul S. Bagus, IBM, San Jose, California

Ab Initio Cluster Model Studies of Chemisorption: Utility and Limit-ations

This paper will focus on the application of cluster modelstudies to various properties of chemisorbed systems. In thecluster model approach a small number of atoms representing thesurface plus a chemisorbed atom or molecule are considered as aquasi-molecule. Wave functions are determined for this quasi-molecule and its properties interpreted in terms of processeson an extended real surface. The paper will be divided into threemajor sections.

I. Determination of the Equilibrium Properties of Chemisorbed Atoms.

The principle properties of interest are the equilibrium bond

Li

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distance from the surface, the vibrational energies of theadatom, and the binding energy for adsorption. These prop-erties may be, and usually are, computed for differentsites on the surface. Thus, bonding mechanisms and prop-erties for different sites may be compared. The interactionof F and Cl atoms with a Si surface will be discussed in de-tail. It will be shown that F atoms can penetrate into theSi lattice by going over a relatively small barrier. Bycontrast, the barrier for Cl penetration is very high. Theseresults are consistent with the observed different reactivityof F and Cl with Si. They provide a model for understandingreactions relevant in plasma etching.

II. Analysis of Photoemission Spectra of Chemisorbed Molecules.

the shifts between the photoemission spectra of free andchemisorbed molecules can provide information related tothe nature of the chemisorption bond. Simple clustermodels will be applied to both the core and valence levelspectra. For the valence levels, in particular, bindingenergy shifts can be used to demonstrate similarities anddifferences between the bonding of different adsorbedmolecules on transition metal surfaces. Cluster studiesof the core levels have made possible a better understandingof the anomalously large satellite structure observed inmany cases. The relationship between bonding (and bonddistance) and the relative intensities of fully screenedand partially screened core level satellites will bedescribed.

III. Limitations of the Cluster Model Approach.

The limitations to be discussed here are those which appear,to the author, to be inherent in the use of finite clustersrather than in any particular implementation of the model.The limitations relate to the ability to describe propertiesprincipally related to the substrate.

Gert Ehrlich, University of Illinois at Urbana-Champaign

Diffusion in Surface Layers

Surface diffusion has only recently become a topic of wideinterest. This neglect is surprising, as diffusion plays animportant role in surface processes. It has long been appreciatedthat the movement of reaction intermediates over catalysts particlesis one of the significant steps in heterogeneous catalysis; thisIs well-illustrated in Professor Ertl's review. Studies of sur-

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face diffusion can also provide insights into the nature of thebonding at an interface. Finally, in crystal and thin film growthas well as in sintering, material transport by self-diffusion overthe surface is all-important. That despite all this, surfacediffusion has not received more attention must in large measurebe ascribed to experimental difficulties inherent in such studies.Only recent developments in analytical techniques have made itpossible to carry out measurements of surface diffusion with con-fidence and relative ease.

In this review the emphasis is primarily upon diffusion inchemisorbed layers. Migration-of both electronegative gases andof metal atoms will be surveyed, with the latter serving as anexample of the detailed insights that can now be achieved. Sur-face self-diffusion will be neglected, however, as it has beendiscussed at one of the previous Summer Institutes. Although theatomic processes in diffusion on crystals are of primary interesthere, the central role of techniques will be strongly reflectedin the material covered and in the order of presentation.

Peter Eisenberger, Bell Laboratories, Murray Hill, New Jersey

Extended X-Ray Absorption Fine Structure Studies on Surfaces

As early as the 1930's, it had been observed that the absorptioncross-section in the x-ray regime had a complex structure as afunction of energy extending as far as 1000 electron volts abovean absorption threshold. These measurements were made by using alow-power conventional x-ray tube, a dispersive Bragg spectrometer,and film as a detector. After some correct and incorrect speculationconcerning the origin of this extended x-ray absorption finestructure (EXAFS), the field remained essentially dormant throughthe 1950's. In the late 1960's the measurements were revived, thistime using modern counting and automation techniques. The previousinterpretation of the structure as arising from the backscatteringof the ejected photoelectron from the atoms near the absorbing sitewas strongly supported. The idea that this phenomenon might be usedas local structural probe was born. However, even with the experi-mental advances the measurements were difficult and time-consumingbecause of the low power of the x-ray source. This limited theapplication of the technique to highly concentrated systems and alsoinhibited the systematic study of the phenomenon that was necessaryto turn the semiquantitative interpretations into quantitativeevaluations.

In 1972 the bremsstrahlung radiation produced by a conventionalx-ray tube was replaced in the experiments by synchrotron radiationproduced by high-energy storage rings. The increase in flux of

approximately 10i to 106 provided by the Stanford storage ring SPEARsignaled the beginning of a virtual revolution in the quantitativeunderstanding of EXAFS. In the last 3 years EXAFS has been success-fullyIpplied to determining the structural arrangement of as fewas 101 atoms on a single-crystal surface and of complex, dilute,

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and disordered systems that were previously inaccessible. Thesestudies have spanned the scientific disciplines of biology,chemistry, and solid-state and surface science. In this articlewe summarized the current quantitative understanding of EXAFS anddescribe how the measurements are made. We then give some re-presentative examples of the initial applications of the techniqueto the study of structural problems in zurface science.

Gerhard Ertl, Universittt Minchen, Germany

Reaction Mechanisms in Catalysis by Metals

The rate of a heterogeneously catalyzed reaction will be de-termined by the nature, concentrations as well as energetic anddynamic properties of the species present on the surface, wherebythe structure of the surface itself is an additional parameter.Studies with well-defined single crystal surfaces by means ofvarious surface spectroscopic techniques may serve to elucidatethe microscopic steps involved as is illustrated by reviewing tworeactions, namely the oxidation of carbon monoxide on Pd and thesynthesis of ammonia on Fe catalysts.

Peder J. Estrup, Brown University

Chemisorption-Induced Surface Reconstruction

1. Introduction: Adsorption on an Unperturbed Substrate.

Two-dimensional (2D) order due to adsorbate-adsorbateand adsorbate-substrate interactions. Phase diagramsfor 2D-gas and lattice-gas models. Examples fromphysisorption and chemisorption. Comparison with theW{100/H and Mo{100)/H phase diagrams.

2. Reconstruction of W{1001 and Mo{1001

Direct evidence for lattice distortions: LEED data,ion scattering measurements, and electron energy lossspectra. Reconstruction of the clean substrates.Superlattices induced by chemisorbed hydrogen.Correlation with surface electronic properties.Speculations concerning the mechanism of the structuralchanges.

3. Concluding Remarks

Possible importance of reconstruction in chemisorptionphenomena.

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L. C. Feldman, Bell Laboratories, Murray Hill, New Jersey

Ion Scattering for Surface Structure Determination

In the last few years a number of groups around the worldhave been using energetic ion beam scattering from.solids as asurface structure tool. These studies have been with energeticparticles of greatek than 0.1 MeV where scattering cross-sectionsand the flux distribution of the beam in the solid are well-under-stood. Low energy ion scattering,--lKeV, which is very surfacesensitive, continues as an important structural probe. However,the physics of the atomic collisions and the method of extractionof information are sufficiently different in these two regimesfor each to obtain an individual character.

In this paper we discuss the use of high energy ion beamsas a surface structure probe. The second section is a briefreview of MeV ion scattering in solids (non-single crystal).The third section considers the special flux distribution of thebeam that occurs in an aligned single crystal and explains theorigin of the sensitivity to surface structure. In the fourthsection we describe a number of recent examples of surfacestructure investigations using high energy scattering and finallydiscuss, in more detail, the comparison of this surface probeto low energy scattering and other structural probes.

Currently, high energy ion scattering is at an importantstage of development. It is still being calibrated as a techniqueand, simultaneously, attacking a number of important surfacephysics problems.

C. T. Foxon, Philips Research Laboratories, Redhill, United Kingdom

Molecular Beam Epitaxy-Surface and Kinetic Effects

A detailed understanding of the mechanisms of growth bymolecular beam epitaxy can be obtained from modulated molecularbeam measurements combined with diffraction studies. At presentthe mechanisms controlling the growth of binary compounds arereasonably well-understood but the growth of alloy films withboth mixed gp. III and gp. IV elements has been studied in muchless detail. In particular the factors controlling the relativeincorporation rates of gp. V elements remain to be determined.Some of the kinetic problems associated with dopant incorporationare known but a number of obvious n type dopants such as S, Se andTe have been rejected on the basis of insufficient data and shouldbe studied in more detail. Whether MOE will become a widely usedtechnique for thin film preparation is still uncertain but there

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is no doubt that it provides the surface scientist with anexcellent means of preparing well-characterized surfaces insitu free from the constraints hiterto imposed by working oncleaved or argon ion bombarded surfaces.

Daniel R. Frankl, Pennsylvania State University

Molecular and Atomic Beam Scattering from Surfaces

It has become commonplace to remark that the field of atomicand molecular beam scattering from surfaces has been growing at arapid pace, and that frequent reviews are amply justified by therate of progress. A few of the most recent reviews are those byCole and Frankl, emphasizing the quantum regime in both itsexperimental and its theoretical aspects, by Goodman, dealingmainly with theory, and by Madix and Benziger on reactive scattering.More general surveys were given by Somorjai and Brumbach at thefirst ISISS and by Ceyer and Somorjai. All of these papers, ofcourse, certain references to the many earlier reviews. In thepresent paper, we shall attempt to achieve a broad coverage ofthe field, with emphasis on only the most recent of developments.

A. Types of Information

The main reason for the growing interest in atom and moleculescattering from surfaces lies in the variety of types of informationit promises. These include:

1. Interaction potentials. This is probably the most highlydeveloped aspect of the field, and is exploited by studiesof elastic scattering in the quantum regime of low-mass,low-energy scattering. The data are of basic importance tophysisorption phenomena, and thus possibly also to chemi-sorption, gas-solid chemical reactions, and heterogeneous cata-lysis.

2. Surface crystallography. Atom diffraction will some day standas an equal partner with LEED in the elucidation of surfacestructure. At present, however, this aspect of the field isbarely out of the pre-natal stage. The reason for the potentialimportance of atom diffraction lies in the virtually completelack of penetration of low-energy atomic beams into crystals.In other words, the atomic beam is much more surface-sensitivethan the electron beam. Thus the problems of interpretationof LEED intensities arising from interplanar scattering willnot be present.

3. Low-energy excitations. Since molecular beams have kineticenergies in the thermal range (i.e., milli-electron-volts),they are ideally suited for probing non-electronic excitationssuch as the surface phonons of the solid. This aspect, too,is only in the early stages of its development but is being

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actively pursued in several laboratories. Experimentally,the difficult study of inelastic scattering is involved.

4. Reactive scattering. This is a highly varied and, from thepractical point of view, highly important area of investigation.The phase-space dissection inherent in the molecular beamtechnique offers the opportunity for the unravelling ofcomplex reactive and catalytic mechanisms.

5. Energy and momentum exchange. Since these processes arereadily measured by beam techniques, this area has possibleapplications to aerodynamics, spacecraft design, plasmareactor vessels, and other gas-solid interaction technology.

William A. Goddard, III, California Institute of Technology

Mechanisms of Chemisorption and Oxidation

First principles calculations using Hartree-Fock (HF) andgeneralized valence bond (GVB) wavefunctions are reported forthe bonding of atomic N, Cl, Na, 0, and S on high symmetry sitesof the Ni{100} face using an Ni 20 cluster as a model. All ofthe adsorbates are found to prefer the fourfold site, with bondenergies (De) of 3.04 (H), 3.9 (Cl), 1.3 (Na), 3.63 (0), and4.34 (S) eV. Bond distances are 0.30 (H), 1.38 (Cl), 2.7 (Na),0.88 (0), and 1.24 (S) A above the surface, which are (exceptfor Na) in excellent agreement with available experimental data.Vibrational frequencies of 73 (H), 17 (C1), 30 (Na), 46 (0), and37 (S) meV are found for these adsorbates. Decreasing site co-ordination is found to increase uniformly vibrational frequencies,while decreasing bond distances and bond energies. For Ni 20 andNi 2 8 chemisorption of H at sites corresponding to {1111 and {1101surfaces is also discussed.

The data are analyzed through the introduction of the con-cepts of site acidity and basicity, and it is found that sitebasicity increases with increasing coordination. This trend is

- responsible for the observed preference of each adsorbate forhigh coordinate sites, and it is expected that donor adsorbates(such as CO) would show a reverse trend. The data for Na are

-- found to be in poor agreement with analogous bulk data, confirminga previous prediction that small particles lead to much weakerchemisorptive bonds for highly electropositive species than dobulk surfaces.

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D. R. Hamann, Bell Laboratories, Murray Hill, New Jersey

Electronic Structure of Semiconductor and Transition Metal Surfaces

I. General aims of electronic structure studiesII. Methodologies for extended surfaces

A. Empirical LCAO1. Slab2. Green's function

B. Self-consistent LCAQC. Plane wave pseudopotentialD. Mixed basis pseudopotentialE. Transfer matrix pseudopotentialF. Linear APW

III. Semiconductor studiesA. Clean surfacesB. ReconstructionC. ChemisorptionD. Interfaces

IV. Transition metal surfacesA. Clean surfacesB. Chemisorption

V. Summary and Conclusions

Klaus Heinemann, Stanford University

Determination of Crystallography, Habit, and Epitaxial Orientationof Nanometer-Size Particles by TEM

The habit faces of various single crystal vapor depositedmetal particles in the 5-15 nm size range were determined by a

* combination of weak - beam dark f.ield (WBDF) transmission electronmicroscopy (TEM), selected-zone dark field (SZDF) microscopy,and multibeam computer calculations of image intensities. Particlesexhibiting square and rectangular shapes in bright field TEM wereoften found to be truncated pyramids with {0011 base and topsurfaces and {111} faces. Sometimes {0011 based cubes with {001}

- - - - faces could be identified. Single crystalline pentagonal particlesS- -- were found frequently and determined 'to have {0011 base and top

surfaces, as well as three '{111) and two {0111 side faces.Particles with.triangular bright field profile had a {111) baseand three {001} faces. Gold crystallites growing on KC1 substrateswere found, under certain conditions during the coalescence stage,to form large, irregularly shaped, very flat islands with {001}top surfaces.

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Boyan Mutaftschiev, Universite Aix-Marseille, France

Structure and Properties of Crystal-Melt Interfaces

After a short recall of some definition equations regardingthe energetic parameters of the interface between two condensedphases, the authors discuss the different expected cases ofsurface melting and their relation to the thermodynamic propertiesof the crystal-melt interface.

-The two next sections are devoted-tO a review of earlierconcepts for the crystal-melt interface, namely the lattice-likemodel and the models assuming unchanged liquid structure up tothe interface.

The next part gives results issued from structural modelsfor the crystal-melt interface of monoatomic solids. The mainpoints are: structure and density of the first liquid layers;potential energy and configurational entropy calculations forinterfaces represented by a singular (0001) face of an h.c.p.solid; estimations of the same parameters for a non-singular(114) face; Wulff-plot and growth mechanism; Monte-Carlo relax-ation of the structural models; mobility in the adjacent liquidlayers.

The discussion contains a comparison with the Monte-Carloexperiments of Abraham et al on the crystal-melt interface(001)-face of an f.c.c. crystal.

Finally are exposed some experimental results on morphologyand energetics of the crystal-melt interface.

J. Pritchard, Queen Mary College, London, United Kingdom

Application of IR-Spectroscopy to Chemisorption and Catalysis onMetals

Transmission infrared experiments with supported metals willbe briefly reviewed in order to illustrate the information thatinfrared spectra can provide about surface species. They alsoserve to demonstrate the applicability of infrared spectroscopyto the study of practical metallic catalysts, even under reactionconditions.

The heterogeneity of supported catalyst surfaces raisesproblems for the interpretation of spectra. Coupled with thelimited wavelength ranges over which support materials are trans-

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parent, this has led to the development of reflection methodsthat can be applied to single crystal surfaces in conjunctionwith LEED, AES, etc. The physical basis of infrared reflection-absorption and ellipsometric spectroscopy will be outlined,together with the experimental methods that have been employedto achieve adequate sensitivity in practice.

Spectra of species adsorbed at well-defined single crystalsurfaces can help in the analysis of transmission spectra fromsupported catalysts, as will be illustrated by spectra of CO oncopper and palladium.

Particularly detailed coverage dependencies of CO spectrahave been recorded on a number of single crystals, and the spectraof mixed isotopes have been used to distinguish frequency shiftscaused by oscillator interactions from those caused by coveragedependent changes in the surface bond. Such studies require thehigher resolution available in infrared spectra in comparison withelectron energy loss spectroscopy.

Reflection infrared spectra have already been obtained atrelatively high pressures, and the talk will conclude with a con-sideration of the prospects for in situ studies of catalyticreactions on single crystals.

Georg-Maria Schwab, Universit°t M~nchen, Germany

Development of Kinetic Aspects in Catalysis Research

Early in this century BODENSTEIN first measured the kineticsof some simple heterogeneous catalytic gas reactions. His inter-pretations were based on the assumption of multilayer adsorptionand rate determining diffusion towards the catalysis surface.

Langmuir discovered the chemisorption in unimolecular layersand the displacement in binary adsorption. HINSHELWOOD appliedthese points to the kinetics of many catalytic reactions. To hisLangmuir-Hinshelwood mechani-sm ELEY and Rideal added the Eley-Rideal mechanism.

In the following years numerous theoretical viewpoints wereinvestigated experimentally by kinetic observations. The authorcontributed to this trend during fifty years by studying thequestion of active centers and mainly electron transfers insimple and mixed catalysts.

The balance of kinetic and surface-physical research is.considered.

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David A. Shirley, University of California-Berkeley

Determination of Atomic and Electronic Structures of SurfacesUsing Synchrotron Radiation in the XUV Region

The present status of photoelectron spectroscopy in the50-500 eV range is discussed in relation to its applicationto surface science. Instrumentation aspects of synchrotronradiation sources are reviewed. The direct transition modelis-shown to be applicable in this range with some limitations.Cooper minima and adsorbate sensitivity enhancement for hu > 100 eVare reviewed. A new effect--condensed phase photoelectronasymmetry--is noted. Finally, photoelectron diffraction--anothernew effect--is described and evaluated.

David S. Y. Tong, University of Wisconsin-Milwaukee

Surface Structural Sensitivity of Angle Resolved UPS and EELS

The surface sensitivity of many ultra-high vacuum spectro-scopies comes from the short mean-free-path of either scatteredor emitted electrons. The energy of the electrons ranges froma few electron volts to a few hundred electron volts. In thisenergy range, the wavelength of the electron is about the sameorder of magnitude as atomic spacings in a solid. Hence, as theelectron undergoes strong electron-electron inelastic collisions,which limit its mean-free path, it also diffracts strongly fromthe arrays of ordered or disordered surface atoms.

To analyze measured data involving either scattered oremitted electrons, one must first understand the effects of electrondiffraction. A new technique where electron diffraction effectsplay an important role is angle-resolved photoemission spectroscopy(ARPS). In this review article, we shall investigate the role andapplication of electron diffraction in this technique.

Electron diffraction is the primary process involved in lowenergy electron diffraction (LEED) and by the beginning of 1970,the dynamical theory in terms of a single particle picture withinelastic damping was developed. The major difference in themathematics of a LEED dynamical theory and that of a conventionalband structure calculation is that the former deals with electronswhose kinetic energy is above the vacuum level. Thus, a LEEDelectron is damped while a Fermi-level band-structure electron isnot. The advantage introduced by this damping was cleverlyutilized in perturbation methods of LEED that resulted in sub-stantially faster computation procedures.

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Extension of the mathematics to treat electron diffractionin angle-resolved photoemission spectroscopy was carried outrecently. The extension was mostly done with fast perturbationmethods of LEED.

Richard P. Van Duyne, Northwestern University

Surface Enhanced Raman Spectroscopy

I. INTRODUCTIONA. Current Status of Electrode Surface CharacterizationB. Advantages of surface vibrational spectroscopy for

the characterization of ElectrodesII. RAMAN SCATTERING FROM MOLECULES ON ELECTRODE SURFACES

A. Sensitivity problemsB. Methods for overcoming the sensitivity limitations

III. THE DISCOVERY OF THE SURFACE ENHANCED RAMAN EFFECTIV. SURVEY OF EXPERIMENTAL RESULTS OBTAINED TO DATEV. THEORIES FOR THE UNDERSTANDING OF SURFACE ENHANCED RAMAN

SPECTROSCOPYVI. CONCLUSIONS AND THE PROSPECTS FOR SOLID-UHV STUDIES BY

SURFACE ENHANCED RAMAN SPECTROSCOPY

Harold F. Winters, IBM Research Laboratories, San Jose, California

Plasma Etching of Surfaces

In this discussion of mechanisms we have considered someresults obtained in well-defined (nonplasma) enviroments andhave attempted to relate these results to observations made inplasma systems. Throughout we have used the fluorocarbon etchingof Si and Si compounds as an example to illustrate the conceptswhich have evolved. In conclusion it is appropriate to considerto what extent the Si-F system is unique and to what extent thisuniqueness might influence the validity of these concepts asapplied to other chemical systems.

Several possibly unique characteristics of the Si-F systemcome to mind. One is the fact that the most commonly used etchgas (CF4 ) does not chemisorb on the etched surface. There aresystems in which the etch gas will chemisorb on the surface beingetched (e.g., Cl etching of Al) and in these cases the availabilityof active speciel is no longer limited by the dissociation rateof the etch gas in the plasma. However, it may be that the ad-sorption rate of atomic chlorine is much faster than that ofmolecular chlorine whereupon the active species are effectivelycreated by gas phase dissociation of C12 . It is difficult to

2'|

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assess the overall consequences of an etch gas which doeschemisorb on the etched surface other than to say either thereaction will proceed spontaneously without a discharge (e.g.,XeFe on Si) or the entire etching process will be radiationassisted (e.g., XeFe2 on SiO 2 ).

Another possibly unique characteristic of the Si-F systemis the spontaneity, at room temperature, of the product formationand product desorption steps in the etching process. Our modelfor the etching anisotropy indicates that, if either of thesetwo steps is not spontaneous (i.e., does not require radiation),no lateral etching (undercut) will be observed. in other words,vertical walls may be more common in plasma etching thansituations showing extensive undercutting. Care must also betaken to avoid confusing thermally induced chemistry withradiation-induced chemistry. In certain etching systems thewafer temperature can be increased substantially above roomtemperature and reactions which do not occur appreciably atroom temperature begin to become important.

Finally, the ability of silicon to abstract fluorine fromcarbon is a property not shared by all other materials. It isnot clear just how important the relative fluorine affinitiesare in plasma etching but when fluorocarbon etch gases are usedthere is a constant competition for fluorine between carbonand the etched material and one would expect a material whichwins this competition to etch differently than a material whichloses.

Since the discussions are an essential part of ISISS, the

Session Chairmen play an important role. At ISISS 1979, the

following surface scientists served as Chairmen:

Dist. Professor W. Keith Hall Professor-Max G. Lagally" Department of Chemistry and r. Materials :Science Center• -Laboratory for Surface Studies University of Wisconsin-Madiso

University of Wisconsin-Milw. Madison, WisconsinMilwaukee, Wisconsin

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Professor David Lichtman Professor Robert G. GreenlerDepartment of Physics and Department of Physics andLaboratory for Surface Studies Laboratory for Surface StudiesUniversity of Wisconsin-Milw. University of Wisconsin-Milw.Milwaukee, Wisconsin Milwaukee, Wisconsin

Professor Avran Many Professor Yehuda GoldsteinThe Racah Institute of Physics The Racah Institute of PhysicsThe Hebrew Univ. of Jerusalem The Hebrew Univ. of JerusalemJerusalem, ISRAEL Jerusalem, ISRAEL

Professor J. Heidberg Dr. James S. MurdayInstitut fur Physik. Office of Naval Researchu. Theor. Chemie Naval Research LaboratoryUniversitit Erlangen Washington, D.C.

Professor Maurice WebbDepartment of PhysicsUniversity of Wisconsin-MadisonMadison, Wisconsin

One hundred and fifty-one scientists from all parts of

the U.S.A., from Canada, France, Germany, Israel, Mexico, Sweden,

The Netherlands, and the United Kingdom participated. They came

from universities (71%), from industry (21%), as well as govern-

ment institutions (8%). The educational value of the conference

is demonstrated by the fact that about 45% of the participants

were Graduate Students and Post-Doctoral Fellows. The registration

fee was kept as low as possible.

The following registration fees were requested:

Registration before July 13, 1979:

$45.00 Regular$33.00 Graduate Students and Post-Doctoral Fellows

Registration after July 13, 1979:

$60.00 Regular$43.00 Graduate Students and Post-Doctoral Fellows

Students in the UW System paid a nominal fee.

i

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Besides the scientific program, a number of social programs

were arranged. They included a family program, dinner tours,

a reception for speakers and participants from foreign countries,

and a banquet. Many participants used the opportunity to visit

the facilities of the Laboratory for Surface Studies at UWM.

In connection with the Summer Institute, an exhibition of surface

science books was organized.

International scientific societies and journals announced

the conference. About 2700 scientists were contacted directly.

As in the case of former ISISS, the papers presented are

published in consecutive issues of CRC-Critical Reviews in Solid

State and Materials Sciences under the title "Surface Science:

Recent Progress and Perspectives (ISISS 1979). As in 1977, the

journal publications will be followed by a CRC Monotopic book

(one volume, hard-bound).

ISISS 1979 was supported by grants from the University of

Wisconsin-Milwaukee and a combined grant from ONR-AFOSR.

- . Dr. Ralf VanselowDirector, ISISS 1979

IT L-