1Put Polaroid's experience and expertise to work for you.

Contract Coating&

Product/ Process Development

Organic Roll Coating to Form Interference Layers

Ken McCarthy

Polaroid Corporation

Chem Prep Area

Outline

• Product

• Chemical Make

• Dispensing

• Coating

• Web Speed

• Drying

NCR Layer

• Polaroid has for many years added an anti-reflection (NCR) layer to the outside of its integral film. The primary purpose of this layer is to reduce glare reflecting from the outside surface, thereby enhancing the customer’s visual experience.

NCR Layer

Product Structure

NCR Layer

PET Base

Receiver Layer

Negative

Reagent

NCR Layer

NCR Layer

PET

If waves are 180 deg out of phase cancellation

NCR Layer

• ¼ Wave Thickness

• Index of refraction 1.41

• 550 nm

• Thickness 0.0975 u

NCR Layer

NCR Layer

NCR Layer

NCR Coverage

1.14

1.16

1.18

1.20

1.22

1.24

1.26

1.28

1.30

1.32

1 4 8 12 16 20 24 28 31 35 39 43 47 51 55 59 62 65 69 73 77 81 85 90 92 96 100

104

108

Roll

Cut1

Cut7

Cut14

Average

Refl.

Dens.

Chemical Make

• Batch Process

• Recipe driven

• Computer control

• Operator interaction

Chemical MakeRecipe

• PMIX_1131• SOLVENT• !• ! NCRMA - RUN 72XXX• ! Integral Sheet (XX KGS)• !• INITIALIZE PROCESS• REPLY HIGH [I]NSURE TCM HAND...• VALVES ARE OPEN• CONDENSER ON• REPLY HIGH [V]ERIFY CONDENSER IS...• ON CONTINUE WHEN READY• INERT FROM -10.5 TO 5.0 PSIG...• FOR 3 CYCLES• TEMP_CTRL TO JACKET/AUTO AT 25 DEG_C• PRESSURE TO -10.0 PSIG• PR_WAIT FOR TK_PRESS EQ -10.0 PSIG...• +/- 0.5 PSIG• PRESSURE OFF• !• ! MPK ADDITION• ! (XX KG)• !• VACUUM_ADD XXXX KG MPK AT...• -10.0 PSIG• INERT FROM -10.5 TO 5.0 PSIG...• FOR 1 CYCLE• AGITATE TO XX RPM• REPLY HIGH [E]NSURE AGITATION AT SETPT• PRESSURE TO -5.0 PSIG• PR_WAIT FOR TK_PRESS EQ -5.0 PSIG...• +/- 0.5 PSIG• PRESSURE OFF• !• ! DF3 ADDITION (XX KG)• ! LOT #• VACUUM_ADD XX KG OF DF3 AT...• -5.0 PSIG• INERT FROM -10.5 TO 5.0 PSIG...• FOR 1 CYCLE• PRESSURE TO -5.0 PSI

Chemical Make

Dispensing

• Uniform Flow

• Filtration

• Batch-to-batch

Dispensing

Dispensing

Coating

• Coating Line Layout

Coating Line Layout (3 and 3)

7

Rewind 1

Corona Treat

Unwind Splicer

Corona Treat

Unwind Splicer

Class 400Rewind 2

Coating

• Q=2/3(P1-P2)B3W/uL BSL, p.62

• (B+d)3= B3 + 2B2d + 2Bd2 + d3

• For a six mil slot and 3% flow variation,

d < 0.06 mils

Coating

0 10 20 30 40 50 60-10

-8

-6

-4

-2

0

2

4

6

8

10Coverage Uniformity for Applicator HEL-L09A

Distance from Left Edge of Coating (inches)

Co

vera

ge D

evi

atio

n f

rom

Me

an (

%)

range: 3.3 %

rms: 0.57 %

Predicted Measured (1)Measured (2)

Web SpeedOn-going

web speed, fpm 70.000spatial

frequency or wavenumber,

inch^-1

repeat distance,

inchesfrequency,

Hz Power, avg.

0.198 5.040 2.778 35.81

0.892 1.121 12.488 57.72

5.550 0.180 77.700 7.81

7.240 0.138 101.360 4.87

8.226 0.122 115.164 12.06

8.524 0.117 119.336 16.065

Fourier Analysis of Downweb SIFTER Scans

Web Speed

• Single Event

Drying

• LFL Considerations

L/min flow

• Blushing

Extenders, if needed

• Drying Curve

Orange peel

Benard Cells

Recap

• Product

• Chemical Make

• Dispensing

• Coating

• Web Speed

• Drying

Thank You

BACK TO LIST