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1Copyright © Lasertec Corporation All Rights Reserved

August 19th, 2009Lasertec Corporation

(6920 JASDAQ)

Company Profile


Company Profile

New R&D center and HeadquartersSubsidiary in USA Subsidiary in Korea

9,300 million yen for the term ended 2009Sales

240 (at the end of June 2009)Payroll

931 Million YenCapital

Over-the-Counter Issues in 1990, JASDAQ Listing in 2003 (Code 6920)Listing

Development, manufacturing and service of Semiconductor related systems, LCD related systems and Laser Microscopes

Description of business

Head Quarters: 2-10-1 Shin-yokohama, Kohoku-ku, Yokohama JapanConsolidated subsidiaries: United States, Korea Branch: Taiwan

Locations

Tokyo ITV Laboratory was established in 1960Corporate name was changed to Lasertec Corporation in 1986

Foundation


Major Product Fields

LaserMicroscope

Semiconductor related systems

NEWPV Cell related systems(’09.5~)

LCD related Systems

Semiconductor related systems, LCD/PV Cell related systems and Microscopes

Optics ApplicationTechnology


Inspection method in the past

Human eye inspection=Time consuming and low inspection accuracy

Innovation yielded by the automatic defect inspection system

・Achievement of high inspection accuracy ・Defect detection rate → From 10% up to almost 100%・Inspection time → Reduction of about 70%

The product that laid the foundation of businessDevelopment of the world first Automatic Inspection System for LSI Photomask in 1976, providing revolutionary contribution to manufacturing cost reduction by reducing numberof inspection workforce.


Core products by business field

Laser Microscopes■R&D application for semiconductor, FPD,

new materials, metals and such. Also plays an important role as an antenna in the market.

LCD/PV Cell related systems

■Large size photomask inspection systems and color filter defect inspection/repair systems

A mask blanks inspection systemMAGICS

A large size photomaskinspection system for 10G (LI712)

Seamless observation from milli to nano orders

Ultra high-resolution microscope H1200

Semiconductor related systems■Defect inspection systems for photomasks,

wafers and mask blanks

The market share of the mask blanks inspection systems is 100%.

The market share of the large size photomask inspection system is 100%. Commercialized a PV cell conversion efficiency distribution measurement system in May.

The market share of the industrial microscope is about 16%.


Business result progress

Consolidated sales, operating profit and operating profit rate in recent years

△ 5,000

0

5,000

10,000

15,000

20,000

2005 2006 2007 2008 2009 2010(forecast)

△ 10.0%

△ 5.0%

0.0%

5.0%

10.0%

15.0%

20.0%

25.0%

30.0%

35.0%

40.0%

Sales Operating income Operating income margin

¥ Million


Management Philosophy and Vision

Philosophy

VisionMission

Create what is not in the world and create what is beneficial to the world.

Contribute to customers’ problem solving by presenting solutions quicker than anyone else in the field of optics technology.

Become a company customers all over the world contact with at the very first.

“Let’s develop one new product every year, and the one first in the world”

Development spirit from the foundation of the company


New inspection needs raised by technology innovation intensifies as ever.Riding maximally on our strong point, we contribute to customers’problem solving.

２０１２年６月期営業利益率２０％

Medium Term Strategy

Accede the Origin (Management Concept) By concentrating management resources to our strong point (speedy development and differentiation), reinforce business basis/structure.

Accede the Origin (Management Concept) By concentrating management resources to our strong point (speedy development and differentiation), reinforce business basis/structure.

Operating profit ratio of 20% for the term ending June 2009


◆Development based on idea generation capability◆Speedy product commercialization utilizing core technologies

Character and Strong Point

◆Precision Mechanics

・High-precision, High-speed Stage Technology

・Defect Repair, Particle Ablation

◆Image ProcessingTechnology

・Image Processing Technology・Defect detection Technology

◆Electronics・High-speed Image Processing・High-precision analog circuit・High-density digital circuit

・Cofocal Optics・DUV Optics ・Optical Interference Technology

SolutionNeeds

CustomersCustomers

Core Technology


0

2000

4000

6000

8000

10000

12000

14000

16000

18000

1963

年19

65年

1967

年19

69年

1971

年19

73年

1975

年19

77年

1979

年19

81年

1983

年19

85年

1987

年19

89年

1991

年19

93年

1995

年19

97年

1999

年20

01年

2003

年20

05年

2007

年20

09年

百万円

WASAVI SeriesPhotomask

Defect Inspection

SystemMask Blanks Inspection

System

LCD Color Filter Repair

SystemLCD PhotomaskDefect Inspection System

Confocal Color Microscope

Lasertec as the corporate name in 1986

LSI Automatic Photomask Defect Inspection SystemFoundation

X-ray TV

Tokyo ITV Laboratory in 1960

Products developed and introduced taking the lead of the world

Sales

PV Cell Efficiency

Distribution¥ Million


M7360: Defect detection imageon a mask blank(Depth 4.1 nm, Width 57 nm)

５７ｎｍ

M7360: Joint Development with SEMATECH

Product development example utilizing core technologiesProduct development taking in progress of semiconductor miniaturization

57 nm=1/1250 of the diameter of one human hair


Heart of Inspection System:Optics

LI712: Defect detection image,a defect on a photomask for LCD (0.3 μm)

LI712

Response to rapidly growing LCD panel size

57”x 8 panels per mother glass

ｍｍ

Reference ;LCD Color Filter for 10G2850x3050 mm

Product Development Example Utilizing Core Technologies

Realization of higher sensitivity and throughput even under rapid mask area expansion

10 G


Our Major Products in the Semiconductor Manufacturing Processes

Mask Blanks manufacturing

Wafermanufacturing

Maskmanufacturing

Device manufacturing process

Pattern design

Fabrication/Packaging

Mask BlanksDefect inspection systemMAGICS Series

Phase shift/TransmittanceMeasurement System

Pellicle/Photomaskparticle inspection system

Patterned wafer warpage/stress inspection systemWASAVI series SK300Wafer defect inspection/

review system

TSV etching depth inspection system WASAVI Series TSV300

LasertecLasertec

3D stacking device

Through Silicon Via

Front-end Process Back-end Process

New products (Wafer/Device related processes)Major products thus far (Mask related processes)

Wafer processing

Mask sample

300 mm wafer sample

(6inch square, ¼ inches thick)

MATRICS series (mainly for incoming inspection needs)

PhotomaskInspection system

Mura visualization systemWASAVI series MR300


Mask blanks manufacturing

Mask manufacturing

Color Filter manufacturing process

Array manufacturing process

Cell process

Module process

Pattern design

Large size photomasksubstrate inspection system LB

Large size photomaskInspection system LI (for 10G)

Pellicle inspection/mounting system PA/PP

TFT/Color Filter repair systemRAGNAS Series

LCD Color Filter/TFT inspection system

Glass for Color Filter

Our major products in the LCD Panel Manufacturing Processes

Mask Related Products

Panel Related Products

Glass for Array


100%

0%

Lasertec Others

30%

70%

Lasertec Others

【Semiconductor Related System】

Dai Nippon PrintingINTEL (US)MP MASK (US)Samsung (KOREA)Toppan Printing

Mask Maker

Asahi GlassHOYAShin-Etsu ChemicalULVAC Coating

Substrate/Mask Blanks Maker

3 ~ 4 Billion Yen

Mask Blanks Inspection

System

Inquiries from many first tier makers

Semiconductor device makerNew market in the futureWASAVI

series

Semiconductor Device Maker: Incoming test of masks

Elpida MemoryPowerchip (Taiwan)Rexchip (Taiwan)Samsung (Korea)TSMC (Taiwan)

10 Billion YenPhotomaskInspection

System

2007～

2008～

Position in market and customers of our major products [Semiconductor related]

World market and our market share(Our estimate for 2008)

Customers byproduct:Product category

Major customers (in alphabetical order)


100%

0%

Lasertec Others

40%

60%

Lasertec Others

【FPD Related System】World market and our market share(Our estimate for 2008)

Market position of core products: FPD Related System

Customers byproduct:Product category

Major customers (in alphabetical order)

Dai Nippon PrintingHOYALG Micron (Korea)PKL (Korea)SK ElectronicsSupermask (China)Toppan Printing

Mask Maker2~3 Billion Yen

Large sizePhotomask

Inspection Systemsfor LCD

AUO (Taiwan)CMO (Taiwan)CPT (Taiwan)Dainippon PrintingLG Display (Korea)Samsung (Korea)SharpToppan Printing

Color Filter Maker

5~7 Billion Yen

Color Filter Inspection and

Repair Systems for LCD


Reduced Projection Exposure Tool

LightSourceProjectionSystem

Mask

Wafer

Several tens of photomasks (circuit patterns) are needed for making one semiconductor device. One set of photomasks produces devices of several hundreds to several ten thousands.Defects of photomasks at upstream of semiconductor manufacturing processes lead to occurrence of crucial problems in semiconductor manufacturing.

The finer the patterns become, the shorter the light source wavelength must be and the following light sources are currently employed; g-line (436 nm) of high pressure mercury lamp, i-line (365 nm), KrF excimer laser (248 nm), ArF excimer laser (193 nm) and such.

Mask Blanks Transparent quartz substrate for making photomask (6 inch sq. 0.25 inch thickness)

Mask Circuit pattern is exposed and developed on Mask Blanks. (Reticle)

Semiconductor Device

Mask Pattern is transferred and baked on wafer by light (Reduced Projection Exposure)Semiconductor devices are formed on wafer after many processes including etching.

Note that masks for LCD works in the same way. Pattern fineness does not need to be as high as those for semiconductors due to the large panel size and patterns are exposed on a panel by proximity exposure in general, not by reduced projection exposure.

Reference; Outline of semiconductor device manufacturing

Schematics of Reduced Projection Exposure

Mask Sample Wafer Sample


Omni-focal

Image3D Image

Only those images in focus are synthesized and an image with allparts are in focus (omnifocal image) can be generated. Further, those images can be displayed in 3D mode.

For reference; An example of optics technology application

These photos are placed in a textbook for junior high published by Tokyo Shoseki PublishingConfocal Optics

company profile - irtv net · title: microsoft powerpoint - 090819 英語会社概要.ppt author:...

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