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Case studies of Case studies of Wafer Sort Floor Problems Wafer Sort Floor Problems Darren James Darren James SWTW Committee SWTW Committee Member Member

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Page 1: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Case studies of Case studies of Wafer Sort Floor Problems Wafer Sort Floor Problems

Darren JamesDarren JamesSWTW Committee SWTW Committee

MemberMember

Page 2: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Applying What We Learned• We’ve completed Gage R&R Study• We know we have a solid metrology tool• We know the limits of our metrology tool

• Now What?

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 22

Page 3: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Where to apply metrology• Process monitor• New process validation

– Test at Temperature – Pad Shrink– New Technology (i.e. copper pads)

• Probe card qualification• Probe technology comparison• New equipment qualification• Maintenance monitoring• Tool evaluation and selection

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 33

Page 4: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

PROCESS MONITOR

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 44

Page 5: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

August 09

Fab Process Issue

A process issue, pad discoloration, was found during the experiment. WaferWoRx300 picked up the discoloration of the pads as extremely large scrub marks. This was reported back to the fab.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 55

Page 6: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Real-time Process Feedback

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 66

Pietzschmann, et al, SWTW 2005

Page 7: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Controlling the sort process

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 77

Page 8: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

NEW PROCESS VALIDATION

•Test at Temperature•Pad Shrink

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 88

Page 9: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Thermal Movement of Probe Card

dependency on: - probe card construction- used stiffener material- PCB properties

(1) Z movement probe arrayrange: up to 110umtime: over 2h preheatingdirection: -Z or/and +Z

(2) X & Y material expansionrange: up to 15um / 150mmtime: < 20min of preheatingdirection: star like

(3) X or Y drift probe arrayrange: up to 35umtime: over 5h preheatingdirection: X or Y

(4) Single needle movementrange: 3…15umtime: 1st h of preheatingdirection: each needle different

-100

-75

-50

-25

0

25

50

75

0 10 20 30 40 50 60 70 80

Time [min]

Time [min]

Z-po

sitio

n [

m]

Pietzschmann, et al, SWTW 2005

Page 10: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1010

• Comparison of Y Wafer Scale between 2 wafers. Probed at 88°C (L) and 150°C (R).

• Y Wafer Scale identifies whether the die-to-die step size is accurate in the Y axis.

• An 8x1 probe card array was used to probe this wafer (outlined by black box).

• 88°C has an error of approx 7µ (aqua-orange), 150°C of approx 33µ (light blue-orange).

Thermal Movement of Probe Card

Page 11: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Thermal Drift

Marks were drifting off of the pads during the probing process. A thermal drift was found on WaferWoRx300, changes to the prober settings helped to correct this issue.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1111

Page 12: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Advanced Optical Analysis - Offset/scaling @ temp Assessment

hot cold

clearance X ~12mclearance Y ~ 9m

clearance X ~16mclearance Y ~14m

Scrub X/Y-Position Error Scrub X/Y-Position Error

Probe Card Verification at Temperature

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1212

Pietzschmann, et al, SWTW 2005

Page 13: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

PMA scrub measurements w/prober errors removed

PCA – scrub measurements

Validating Pad Shrink

Stacking all of the scrub marks to evaluate total sort process CpK

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1313

Evaluating the probe card by removing prober and setup error

Page 14: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

max. 8.4mavg. 4.0mstdev. 1.9m

significant improvement in probing process stability

2,5µm

First examples had to be reworked in every case

Spec ≥7µm

first delivery after feedback

Pad Edge Distance Worst Case

11,5µmSpec ≥7µm

max. 19.5mavg. 10.9mstdev. 5m

7,5µm

scrub mark analysis

3,5µm

0µm 9µm

12,5µm

7,5µm

Test at Temperature – Thermal movement analysis

Scrub X/Y-Position Error– Avg. per die

Scrub X/Y-Position Error– Avg. per die

Probe card verification

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1414

Pietzschmann, et al, SWTW 2005

Page 15: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

PROBE CARD QUALIFICATIONPROBE CARD QUALIFICATION

June 7 to 10, 2009June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test WorkshopIEEE SW Test Workshop 151515

Page 16: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Blank/un-patterned wafer analysisVector view of scrub X-Y position

Vector view

New Probe Technology Validation

• Evaluating a new probe card

• Plot shows a thermal scaling affect

• Card did not pass incoming Q/A

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1616

Page 17: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Comparison Major Scrub Lengths

probe card with new stiffener

X 1min PMI inspection

XX

X

Xdiff. 4m

diff. 20m

diff. 11m

diff. 8m

5min manual operator stop

125°C

old probe card

XX

X

Xdiff. 17m

diff. 18mdiff. 22m

125°C

diff. 18m

same product

Validating Probe Card Design

Thermal effects caused by probe card stiffener.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1717

New stiffener design provided better performance

Page 18: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Loaded Planarity Deflection

Automated Deflection Test

• Deflection of probe card from no over travel until all probes are touching ~5 microns

• Low probes no deflection• High probes drift up as the probe card is over travelled

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1818

Page 19: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Probe Card Deflection Graph

Plotting actual position versus expected position, shift is seen and Z loading increases causing pins to translate up with card deflection.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 1919

Page 20: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

PROBE TECHNOLOGY

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2020

Page 21: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Comparing Probe Card Technologies

Comparing different probe card technologies and validating which on will work with new smaller pad sizes.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2121

Pietzschmann, et al, SWTW 2005

Page 22: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2222

MEMS card Quad DUTCantilever Dual DUT

Comparing Probe Card Technologies

Comparing different probe card technologies.This plot shows scrub length.

Page 23: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

August 09

Card to Card same prober

Test was ran to determine variance between two different types of cantilever probecards. The same prober, prober settings, same time and temperature were used. Obvious difference found in theamount of pad damage between probe tip types. Less damage to pads while maintaining good contact with die is better.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2323

Page 24: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

EQUIPMENT COMPARISON

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2424

Page 25: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

prober to prober

Chuck tilt is present Card planarityCard to Chuck parallelism

Double touch is occurring during probe mark inspect on prober

Test was ran to determine prober to prober variance. The same card, same prober settings, same time and temperature were used. Chuck tilt and head stage to chuck parallelism were found and fixed.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2525

Page 26: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

August 09

Translation Effects

Note the change not only in area of the same probe mark from one td to the next, but also in shape and direction of scrub. This is due to effects of deflection and translation.

Some marks were failing probe mark inspection on the edges of the die. After running WaferWorx300, translation was determined to be the leading factor.

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2626

Page 27: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

MAINTENANCE MONITOR

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2727

Page 28: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Using the Data to Address Equipment Problems

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2828

Page 29: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Maintenance Validation

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 2929

Page 30: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Scaling & Stepping Errors

Stage Stepping Accuracy

Stage Stepping

0

2

4

6

8

10

Y Scale X Scale

Mic

rons

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 3030

Page 31: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Setup Validation

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 3131

Page 32: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Probe Card Setup Errors

Operator Setupresults in X-Axis Offset Error

Page 33: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Prober Setup Error

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 3333

Page 34: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

TOOL EVALUATION

Page 35: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Failure Signature Example – chuck movement (theta)

standard vertical probe card : all needles scrub in one direction

This movement reduces the scrub length= online cleaning necessary

new vertical probe card : half of the needle scrub in opposite direction

problem overlap zones

highestfailure rate

Consistent pad damage = lowerfailure rate

Inconsistent pad damage = higherfailure rate

Prober vs Probe Card

Pietzschmann, et al, SWTW 2005

Page 36: Case studies of Wafer Sort Floor Problems · Where to apply metrology • Process monitor • New process validation – Test at Temperature –Pkn Sdairh – New Technology (i.e

Acknowledgements• Frank Pietzschmann

• Equipment used to gather the data

June 7 to 10, 2009June 7 to 10, 2009 IEEE SW Test WorkshopIEEE SW Test Workshop 3636